KR960017910A - 니켈 증착 도금강판의 제조방법 - Google Patents

니켈 증착 도금강판의 제조방법 Download PDF

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KR960017910A
KR960017910A KR1019940029277A KR19940029277A KR960017910A KR 960017910 A KR960017910 A KR 960017910A KR 1019940029277 A KR1019940029277 A KR 1019940029277A KR 19940029277 A KR19940029277 A KR 19940029277A KR 960017910 A KR960017910 A KR 960017910A
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South Korea
Prior art keywords
steel sheet
nickel
plated
plated steel
present
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KR1019940029277A
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KR0138041B1 (ko
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최병대
신정철
전중환
박치록
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신창식
한국신철강기술연구조합
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Priority to KR1019940029277A priority Critical patent/KR0138041B1/ko
Publication of KR960017910A publication Critical patent/KR960017910A/ko
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Publication of KR0138041B1 publication Critical patent/KR0138041B1/ko

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5806Thermal treatment

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

본 발명은 전자빔 가열방식으로 니켈을 강판에 증착시켜 니켈 증착 도금강판을 제조하는 방법에 있어서, 니켈 도금층의 두께를 4㎛ 이상 증착시킨 후 질소가스, 알곤가스 또는 진공에 의한 불활성 분위기 중에서 440℃ 이상이고 소지강판의 기계적 특성을 변화시키지 않는 범위내에서 열처리하는 니켈 증착 도금강판의 제조방법에 관한 것이다. 일반적으로 진공증착법으로 도금된 니켈 도금강판은 피막에 존재하는 구멍결함으로 내식성이 떨어지는 단점이 있다.
본 발명은 진공증착 후 열처리를 하여 주므로서 구멍결함의 수를 줄여 주어 니켈 도금강판의 내식성을 향상시킬 수 있다는 잇점이 있다.

Description

니켈 증착 도금강판의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (2)

  1. 전자빔 가열방식으로 니켈을 강판에 증착시켜 니켈 증착 도금강판을 제조하는 방법에 있어서, 니켈 도금층의 두께를 4㎛ 이상 증착시킨 후 불활성 분위기에서 440℃ 이상이고 소지강판의 기계적 특성을 변화시키지않는 온도범위에서 열처리하는 니켈 중착 도금강판의 제조방법.
  2. 제1항에 있어서, 불활성 분위기가 질소가스, 알곤가스 또는 진공에 의해서 되는 니켈 증착 도금강판의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940029277A 1994-11-09 1994-11-09 니켈 증착 도금강판의 제조방법 KR0138041B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940029277A KR0138041B1 (ko) 1994-11-09 1994-11-09 니켈 증착 도금강판의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940029277A KR0138041B1 (ko) 1994-11-09 1994-11-09 니켈 증착 도금강판의 제조방법

Publications (2)

Publication Number Publication Date
KR960017910A true KR960017910A (ko) 1996-06-17
KR0138041B1 KR0138041B1 (ko) 1998-07-15

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940029277A KR0138041B1 (ko) 1994-11-09 1994-11-09 니켈 증착 도금강판의 제조방법

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KR (1) KR0138041B1 (ko)

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KR0138041B1 (ko) 1998-07-15

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