KR960012345A - Silicon Wafer Cleaning Method - Google Patents
Silicon Wafer Cleaning Method Download PDFInfo
- Publication number
- KR960012345A KR960012345A KR1019940024728A KR19940024728A KR960012345A KR 960012345 A KR960012345 A KR 960012345A KR 1019940024728 A KR1019940024728 A KR 1019940024728A KR 19940024728 A KR19940024728 A KR 19940024728A KR 960012345 A KR960012345 A KR 960012345A
- Authority
- KR
- South Korea
- Prior art keywords
- deionized water
- silicon wafer
- rinse
- cleaning method
- wafer cleaning
- Prior art date
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 실리콘웨이퍼의 세정방법에 관한 것으로서, 실리콘웨이퍼 표면을 HB4OH가 포함된 세정용액으로 식각한 후 상온의 탈이온수와 고온의 탈이온수로 차례로 1차 및 2차 린스를 하고 상기 탈이온수를 제거하여 건조시키는 것을 특징으로 한다. 따라서, 1차 린스에 의해 안정화시킨 후 2차 린스에 의해 불안정한 댕글링결합 및 무질서도를 증가시키지 않고 세정용액을 완전히 제거하므로 표면의 조도가 감속된다.The present invention relates to a method for cleaning a silicon wafer, and the surface of the silicon wafer is etched with a cleaning solution containing HB 4 OH, and then the primary and secondary rinse with deionized water at room temperature and high temperature deionized water in that order and deionized water. It is characterized by removing to dry. Therefore, the surface roughness is reduced because the cleaning solution is completely removed without increasing the unstable dangling bonds and disorder by the second rinse after stabilization by the first rinse.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 세정방법에 따른 실리콘웨이퍼 표면의 조도를 나타내는 사진.Figure 2 is a photograph showing the roughness of the surface of the silicon wafer according to the cleaning method of the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940024728A KR960012345A (en) | 1994-09-29 | 1994-09-29 | Silicon Wafer Cleaning Method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940024728A KR960012345A (en) | 1994-09-29 | 1994-09-29 | Silicon Wafer Cleaning Method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960012345A true KR960012345A (en) | 1996-04-20 |
Family
ID=66766753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940024728A KR960012345A (en) | 1994-09-29 | 1994-09-29 | Silicon Wafer Cleaning Method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960012345A (en) |
-
1994
- 1994-09-29 KR KR1019940024728A patent/KR960012345A/en not_active Application Discontinuation
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A201 | Request for examination | ||
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E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |