KR960011851B1 - 이온원용 증발기 - Google Patents

이온원용 증발기 Download PDF

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Publication number
KR960011851B1
KR960011851B1 KR1019880005546A KR880005546A KR960011851B1 KR 960011851 B1 KR960011851 B1 KR 960011851B1 KR 1019880005546 A KR1019880005546 A KR 1019880005546A KR 880005546 A KR880005546 A KR 880005546A KR 960011851 B1 KR960011851 B1 KR 960011851B1
Authority
KR
South Korea
Prior art keywords
evaporator
crucible
radiation
axis
crucibles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019880005546A
Other languages
English (en)
Korean (ko)
Other versions
KR880014646A (ko
Inventor
사또 슈
이. 에반스 2세 루이스
Original Assignee
배리언 어소이에이츠 인코포레이티드
스탠리 젯, 코올
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 배리언 어소이에이츠 인코포레이티드, 스탠리 젯, 코올 filed Critical 배리언 어소이에이츠 인코포레이티드
Publication of KR880014646A publication Critical patent/KR880014646A/ko
Application granted granted Critical
Publication of KR960011851B1 publication Critical patent/KR960011851B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1019880005546A 1987-05-15 1988-05-13 이온원용 증발기 Expired - Fee Related KR960011851B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/051,076 US4791273A (en) 1987-05-15 1987-05-15 Vaporizer system for ion source
US051,076 1987-05-15

Publications (2)

Publication Number Publication Date
KR880014646A KR880014646A (ko) 1988-12-24
KR960011851B1 true KR960011851B1 (ko) 1996-09-03

Family

ID=21969179

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880005546A Expired - Fee Related KR960011851B1 (ko) 1987-05-15 1988-05-13 이온원용 증발기

Country Status (6)

Country Link
US (1) US4791273A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0291341B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS6463246A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR960011851B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1276319C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3860057D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5674574A (en) * 1996-05-20 1997-10-07 Micron Technology, Inc. Vapor delivery system for solid precursors and method regarding same
US6244575B1 (en) 1996-10-02 2001-06-12 Micron Technology, Inc. Method and apparatus for vaporizing liquid precursors and system for using same
US6280793B1 (en) 1996-11-20 2001-08-28 Micron Technology, Inc. Electrostatic method and apparatus for vaporizing precursors and system for using same
WO2001043157A1 (en) * 1999-12-13 2001-06-14 Semequip, Inc. Ion implantation ion source, system and method
JP3485104B2 (ja) 2001-04-24 2004-01-13 日新電機株式会社 イオン源用オーブン
US7326937B2 (en) * 2005-03-09 2008-02-05 Verian Semiconductor Equipment Associates, Inc. Plasma ion implantation systems and methods using solid source of dopant material
US7622722B2 (en) * 2006-11-08 2009-11-24 Varian Semiconductor Equipment Associates, Inc. Ion implantation device with a dual pumping mode and method thereof
US8673082B2 (en) * 2011-01-20 2014-03-18 Sharp Kabushiki Kaisha Crucible and deposition apparatus
US9287079B2 (en) * 2014-07-02 2016-03-15 Varian Semiconductor Equipment Associates, Inc. Apparatus for dynamic temperature control of an ion source
US10672602B2 (en) 2014-10-13 2020-06-02 Arizona Board Of Regents On Behalf Of Arizona State University Cesium primary ion source for secondary ion mass spectrometer
CN104534437A (zh) * 2014-12-30 2015-04-22 陆宇光 用大功率双螺旋红外线加热灯管加热的光波蒸汽锅炉
US10954594B2 (en) 2015-09-30 2021-03-23 Applied Materials, Inc. High temperature vapor delivery system and method
US9928983B2 (en) * 2016-06-30 2018-03-27 Varian Semiconductor Equipment Associates, Inc. Vaporizer for ion source

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2862441A (en) * 1954-12-09 1958-12-02 Gen Electric Toaster-oven cooking appliance
US3155813A (en) * 1962-02-23 1964-11-03 Little Inc A Mirror assembly for an arc imaging furnace
US3619562A (en) * 1970-01-22 1971-11-09 Gen Motors Corp Movable reflector infrared heater
FR2145012A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1971-07-06 1973-02-16 Thomson Csf
GB1361771A (en) * 1972-02-15 1974-07-30 Leybold Heraeus Verwaltung Apparatus for heating material by means of a electron beam in a vacuum
US4015029A (en) * 1975-06-27 1977-03-29 Xerox Corporation Selenium and selenium alloy evaporation technique
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
US4516052A (en) * 1981-06-02 1985-05-07 Dublier Scientific Limited Dispenser for ion source
IT1190892B (it) * 1982-06-24 1988-02-24 Guido Birocchi Struttura di generatore di vapore per stiratura ed usi accessori
JPS59165356A (ja) * 1983-03-09 1984-09-18 Hitachi Ltd イオン源
JPS59169125A (ja) * 1983-03-16 1984-09-25 Ushio Inc 半導体ウエハ−の加熱方法
US4503087A (en) * 1983-08-29 1985-03-05 Varian Associates, Inc. Process for high temperature drive-in diffusion of dopants into semiconductor wafers
DD251436A1 (de) * 1986-07-28 1987-11-11 Akad Wissenschaften Ddr Ionenquelle

Also Published As

Publication number Publication date
DE3860057D1 (de) 1990-04-19
KR880014646A (ko) 1988-12-24
US4791273A (en) 1988-12-13
EP0291341B1 (en) 1990-03-14
JPS6463246A (en) 1989-03-09
CA1276319C (en) 1990-11-13
EP0291341A1 (en) 1988-11-17
JPH0415575B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-03-18

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