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Application filed by 김주용, 현대전자산업 주식회사filedCritical김주용
Priority to KR1019940003872ApriorityCriticalpatent/KR950025864A/en
Publication of KR950025864ApublicationCriticalpatent/KR950025864A/en
Preparing Plates And Mask In Photomechanical Process
(AREA)
Abstract
본 발명은 포토마스크 제작방법에 관한 것으로, 특히 하나의 필드에 여러 다이의 패턴을 함유한 포토마스크에 있어서, 상기 각 다이(10,20,30,40)에는 서로 다른 층의 소자 패턴이 형성된 것을 특징으로 함으로써 본 발명은 평가용 포토마스크 제작의 원자절감과 제작시간 단축 효과를 얻을 수 있다.The present invention relates to a method of manufacturing a photomask, and in particular, in a photomask containing a pattern of several dies in one field, each die (10, 20, 30, 40) is formed with a device pattern of a different layer According to the present invention, the present invention can obtain the effect of reducing the atomic time and manufacturing time of the photomask for evaluation.
Description
포토마스크 제작방법How to make photo mask
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도는 본 발명에 따른 일실시예의 포토마스크 단면도.2 is a cross-sectional view of a photomask of one embodiment according to the present invention.
Claims (1)
하나의 필드에 여러 다이의 패턴을 함유한 포토마스크에 있어서, 상기 각 다이(10,20,30,40)에는 서로 다른 층의 소자 패턴이 형성된 것을 특징으로 하는 포토마스크.A photomask containing a pattern of several dies in one field, wherein each die (10, 20, 30, 40) is formed with a device pattern of different layers.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940003872A1994-02-281994-02-28
How to make photo mask
KR950025864A
(en)