KR970048918A - Halftone Phase Inversion Mask Manufacturing Method - Google Patents

Halftone Phase Inversion Mask Manufacturing Method Download PDF

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Publication number
KR970048918A
KR970048918A KR1019950050921A KR19950050921A KR970048918A KR 970048918 A KR970048918 A KR 970048918A KR 1019950050921 A KR1019950050921 A KR 1019950050921A KR 19950050921 A KR19950050921 A KR 19950050921A KR 970048918 A KR970048918 A KR 970048918A
Authority
KR
South Korea
Prior art keywords
halftone phase
mask
phase shift
phase inversion
light shielding
Prior art date
Application number
KR1019950050921A
Other languages
Korean (ko)
Inventor
정우영
김학문
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019950050921A priority Critical patent/KR970048918A/en
Publication of KR970048918A publication Critical patent/KR970048918A/en

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Abstract

본 발명은 하프톤 위상반전마스크 제조방법에 있어서, 투명 기판 상에 불투명막과 위상반전물질 및 차광막을 차례로 형성하고, 마스크 프레임의 바깥쪽에만 차광막이 형성되도록 패터닝하여 하프톤 위상반전마스크 원판을 형성하는 것을 특징으로 하는 위상반전마스크 제조방법에 관한 것으로, 하프톤 위상반전마스크제작시 마스크 프레임 테두리 바깥쪽에 불투명 링을 형성시키지 않기 때문에, 기존의 크롬 마스크와 같은 양의 데이타만 필요하게 되어 종래 보다 마스크 제작시간을 단축할 수 있다.In the method of manufacturing a halftone phase shift mask, an opaque film, a phase shift material, and a light shielding film are sequentially formed on a transparent substrate, and patterned so that a light shielding film is formed only on the outer side of the mask frame to form a halftone phase shift mask disc. The present invention relates to a method of manufacturing a phase inversion mask, which does not form an opaque ring on the outer edge of a mask frame when a halftone phase inversion mask is manufactured. Production time can be shortened.

Description

하프톤 위상반전마스크 제조 방법Halftone Phase Inversion Mask Manufacturing Method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제3도는 본 발명의 일실시예에 따른 하프톤 위상반전마스크 제조 공정도.Figure 3 is a halftone phase inversion mask manufacturing process according to an embodiment of the present invention.

Claims (2)

하프톤 위상반전마스크 제조방법에 있어서, 투명 기판 상에 불투명막과 위상반전물질 및 차광막을 차례로 형성하고, 마스크 프레임의 바깥쪽에만 차광막이 형성되도록 패터닝하여 하프톤 위상반전마스크 원판을 형성하는 것을 특징으로 하는 위상반전마스크 제조 방법.In the method of manufacturing a halftone phase shift mask, an opaque film, a phase shift material, and a light shielding film are sequentially formed on a transparent substrate, and patterned so that a light shielding film is formed only on the outer side of the mask frame to form a halftone phase shift mask disc. Phase inversion mask manufacturing method. 제1항에 있어서, 상기 차광막 물질은 크롬인 것을 특징으로 하는 위상반전마스크 제조 방법.The method of claim 1, wherein the light shielding material is chromium. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950050921A 1995-12-16 1995-12-16 Halftone Phase Inversion Mask Manufacturing Method KR970048918A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950050921A KR970048918A (en) 1995-12-16 1995-12-16 Halftone Phase Inversion Mask Manufacturing Method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950050921A KR970048918A (en) 1995-12-16 1995-12-16 Halftone Phase Inversion Mask Manufacturing Method

Publications (1)

Publication Number Publication Date
KR970048918A true KR970048918A (en) 1997-07-29

Family

ID=66595114

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950050921A KR970048918A (en) 1995-12-16 1995-12-16 Halftone Phase Inversion Mask Manufacturing Method

Country Status (1)

Country Link
KR (1) KR970048918A (en)

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