KR950018626A - 녹색 금 합금 피막 및 그의 제조 방법 - Google Patents

녹색 금 합금 피막 및 그의 제조 방법 Download PDF

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KR950018626A
KR950018626A KR1019930027954A KR930027954A KR950018626A KR 950018626 A KR950018626 A KR 950018626A KR 1019930027954 A KR1019930027954 A KR 1019930027954A KR 930027954 A KR930027954 A KR 930027954A KR 950018626 A KR950018626 A KR 950018626A
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South Korea
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gold
film
metal
gold alloy
oxide
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KR1019930027954A
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KR960008148B1 (ko
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김순광
이세광
김원목
윤종식
이면학
박병완
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김은영
한국과학기술연구원
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/02—Alloys based on gold
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3421—Cathode assembly for sputtering apparatus, e.g. Target using heated targets

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

본 발명은 금/금속 질화물, 금/금속 산화물 또는 금/금속 질화-산화물이 혼합되어 있는 복합 미세 구조의 녹색 금 합금 피막 및 그의 제조 방법에 관한 것이다.

Description

녹색 금 합금 피막 및 그의 제조 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 순금 박막 및 금/니켈 합금 박막의 반사 분광 특성을 도시한 그래프
제2도는 본 발명의 성막법을 실시하기 위한 이온 도금(ion plating) 장치의 개략도.
제3도는 본 발명의 성막법에 따라 중량비 90/10의 금/알루미늄 합금 증발원을 이용하여 박막의 두께 방향 조성 프로필(Auger Depth Profile)을 도시한 그래프.

Claims (10)

  1. 금/금속 질화물/, 금/금속 산화물, 또는 금/금속 질화-산화물의 복합 구조를 가지며, 금의 조성이 피막 표면으로부터 피막 내부를 향하여 감소하는 구배를 갖는 것이 특징인 녹색 금 합금 피막.
  2. 제1항에 있어서, 금 합금을 이루는 원소가 알루미늄, 실리콘 및 탄탈륨으로 이루어진 군 중에서 선택되는 것인 피막.
  3. 제1항에 있어서, 금속 질화물, 금속 산화물 또는 금속 질화-산화물막이 가시광선을 투과시키는 것인 피막.
  4. 제1항에 있어서, 피막의 두께는 100 내지 10,000옹스트롬 범위인 것인 피막.
  5. 질소, 산소, 질소/산소 혼합 가스 또는 이들을 함유한 불활성 가스의 플라스마 분위기하에서 금 합금 증발원을 가열 증발시켜 기판상에 증착시키는 것으로 이루어지는 것이 특징인 금/금속 질화물, 금/금속 산화물 또는 금/금속 질화-산화물의 복합 미세 구조를 갖는 녹색 금 합금 피막의 제조 방법.
  6. 제5항에 있어서, 피막이 마그네트론 스퍼터링법, 이온 빔 스퍼터링법 및 이온 도금법으로 이루어진 군 중에서 선택된 방법에 의해 제조되는 것인 방법.
  7. 제5항에 있어서, 금 합금 증발원이 전기 저항 가열법, 전자총 가열법, 할로우 캐소드 가열법 및 고주파 유도 용해법으로 이루어진 군 중에서 선택된 방법에 의해 가열되는 것인 방법.
  8. 제5항에 있어서, 기판의인가 전압이 0 내지 1,000볼트인 방법.
  9. 제5항에 있어서, 기판의 가열 온도가 실온 내지 800℃인 방법.
  10. 제5 내지 제9항 어느 한 항의 방법에 의해 형성된 녹색 금 합금 피막을 갖는 물품.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019930027954A 1993-12-16 1993-12-16 녹색 금 합금 피막 및 그의 제조 방법 KR960008148B1 (ko)

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KR1019930027954A KR960008148B1 (ko) 1993-12-16 1993-12-16 녹색 금 합금 피막 및 그의 제조 방법

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KR1019930027954A KR960008148B1 (ko) 1993-12-16 1993-12-16 녹색 금 합금 피막 및 그의 제조 방법

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KR950018626A true KR950018626A (ko) 1995-07-22
KR960008148B1 KR960008148B1 (ko) 1996-06-20

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100317730B1 (ko) * 1999-11-29 2001-12-24 김덕중 산화피막 형성방법
KR100823956B1 (ko) * 2005-12-24 2008-04-22 키스타 주식회사 전자부품의 착색방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100317730B1 (ko) * 1999-11-29 2001-12-24 김덕중 산화피막 형성방법
KR100823956B1 (ko) * 2005-12-24 2008-04-22 키스타 주식회사 전자부품의 착색방법

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