KR940002732B1 - Mask for lithographic patterning and manufacturing method thereof - Google Patents
Mask for lithographic patterning and manufacturing method thereofInfo
- Publication number
- KR940002732B1 KR940002732B1 KR8916091A KR890016091A KR940002732B1 KR 940002732 B1 KR940002732 B1 KR 940002732B1 KR 8916091 A KR8916091 A KR 8916091A KR 890016091 A KR890016091 A KR 890016091A KR 940002732 B1 KR940002732 B1 KR 940002732B1
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- manufacturing
- lithographic patterning
- lithographic
- patterning
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28067188A JP2725319B2 (ja) | 1988-11-07 | 1988-11-07 | 荷電粒子線マスクの製造方法 |
JP63-280671 | 1988-11-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR900008661A KR900008661A (ko) | 1990-06-04 |
KR940002732B1 true KR940002732B1 (en) | 1994-03-31 |
Family
ID=17628308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR8916091A KR940002732B1 (en) | 1988-11-07 | 1989-11-07 | Mask for lithographic patterning and manufacturing method thereof |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0368089B1 (ko) |
JP (1) | JP2725319B2 (ko) |
KR (1) | KR940002732B1 (ko) |
DE (1) | DE68921547T2 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5234781A (en) * | 1988-11-07 | 1993-08-10 | Fujitsu Limited | Mask for lithographic patterning and a method of manufacturing the same |
FR2681855B1 (fr) * | 1991-09-27 | 1993-12-31 | Corning Inc | Procede de production de composants en optique integree par echange d'ions utilisant un masque en silicium, et procedes pour la realisation et l'elimination finale dudit masque. |
US5326426A (en) * | 1991-11-14 | 1994-07-05 | Tam Andrew C | Undercut membrane mask for high energy photon patterning |
CN1196175C (zh) | 2000-05-25 | 2005-04-06 | 凸版印刷株式会社 | 转印掩模的制造方法 |
US6372391B1 (en) * | 2000-09-25 | 2002-04-16 | The University Of Houston | Template mask lithography utilizing structured beam |
US7232631B2 (en) | 2003-05-08 | 2007-06-19 | Dai Nippon Prinitng Co., Ltd. | Mask for charged particle beam exposure, and method of forming the same |
WO2023138081A1 (en) * | 2022-01-21 | 2023-07-27 | The Hong Kong University Of Science And Technology | Corrugated high-resolution shadow masks |
CN115747712A (zh) * | 2022-08-25 | 2023-03-07 | 京东方科技集团股份有限公司 | 掩膜板及其制造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4022927A (en) * | 1975-06-30 | 1977-05-10 | International Business Machines Corporation | Methods for forming thick self-supporting masks |
JPS5337366U (ko) * | 1976-09-03 | 1978-04-01 | ||
IT1109829B (it) * | 1977-07-05 | 1985-12-23 | Ibm | Processo di fabbricazione di cercuiti integrati |
DE2922416A1 (de) * | 1979-06-01 | 1980-12-11 | Ibm Deutschland | Schattenwurfmaske zum strukturieren von oberflaechenbereichen und verfahren zu ihrer herstellung |
US4708919A (en) * | 1985-08-02 | 1987-11-24 | Micronix Corporation | Process for manufacturing a mask for use in X-ray photolithography using a monolithic support and resulting structure |
DE3677005D1 (de) * | 1986-05-06 | 1991-02-21 | Ibm Deutschland | Maske fuer die ionen-, elektronen- oder roentgenstrahllithographie und verfahren zur ihrer herstellung. |
US4897360A (en) * | 1987-12-09 | 1990-01-30 | Wisconsin Alumni Research Foundation | Polysilicon thin film process |
-
1988
- 1988-11-07 JP JP28067188A patent/JP2725319B2/ja not_active Expired - Lifetime
-
1989
- 1989-10-27 EP EP89119950A patent/EP0368089B1/en not_active Expired - Lifetime
- 1989-10-27 DE DE68921547T patent/DE68921547T2/de not_active Expired - Fee Related
- 1989-11-07 KR KR8916091A patent/KR940002732B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH02126630A (ja) | 1990-05-15 |
KR900008661A (ko) | 1990-06-04 |
DE68921547D1 (de) | 1995-04-13 |
EP0368089A2 (en) | 1990-05-16 |
DE68921547T2 (de) | 1995-07-06 |
JP2725319B2 (ja) | 1998-03-11 |
EP0368089A3 (en) | 1991-05-22 |
EP0368089B1 (en) | 1995-03-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application | ||
J2X1 | Appeal (before the patent court) |
Free format text: APPEAL AGAINST DECISION TO DECLINE REFUSAL |
|
E902 | Notification of reason for refusal | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20070328 Year of fee payment: 14 |
|
LAPS | Lapse due to unpaid annual fee |