KR930022146A - 평탄하지 않은 기판 표면을 선택적으로 노출하는 방법 및 장치 - Google Patents

평탄하지 않은 기판 표면을 선택적으로 노출하는 방법 및 장치 Download PDF

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Publication number
KR930022146A
KR930022146A KR1019930005570A KR930005570A KR930022146A KR 930022146 A KR930022146 A KR 930022146A KR 1019930005570 A KR1019930005570 A KR 1019930005570A KR 930005570 A KR930005570 A KR 930005570A KR 930022146 A KR930022146 A KR 930022146A
Authority
KR
South Korea
Prior art keywords
substrate surface
prism element
adjacent
photosensitive material
prism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019930005570A
Other languages
English (en)
Korean (ko)
Inventor
제임스 맥페든 프센시스
프렌시스 웨버 마이클
Original Assignee
게리 리 그리스울드
미네소타 마이닝 앤드 매뉴팩츄어링 컴패니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 게리 리 그리스울드, 미네소타 마이닝 앤드 매뉴팩츄어링 컴패니 filed Critical 게리 리 그리스울드
Publication of KR930022146A publication Critical patent/KR930022146A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/949—Energy beam treating radiation resist on semiconductor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
KR1019930005570A 1992-04-03 1993-04-02 평탄하지 않은 기판 표면을 선택적으로 노출하는 방법 및 장치 Withdrawn KR930022146A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/863,402 1992-04-03
US07/863,402 US5292625A (en) 1992-04-03 1992-04-03 Method for selectively exposing an uneven substrate surface

Publications (1)

Publication Number Publication Date
KR930022146A true KR930022146A (ko) 1993-11-23

Family

ID=25341038

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019930005570A Withdrawn KR930022146A (ko) 1992-04-03 1993-04-02 평탄하지 않은 기판 표면을 선택적으로 노출하는 방법 및 장치

Country Status (4)

Country Link
US (1) US5292625A (https=)
EP (1) EP0564364A2 (https=)
JP (1) JPH0649673A (https=)
KR (1) KR930022146A (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5365356A (en) * 1992-08-11 1994-11-15 Minnesota Mining And Manufacturing Company Method of fabricating an encapsulated liquid crystal display
US5629784A (en) * 1994-04-12 1997-05-13 Ois Optical Imaging Systems, Inc. Liquid crystal display with holographic diffuser and prism sheet on viewer side
US6077560A (en) * 1997-12-29 2000-06-20 3M Innovative Properties Company Method for continuous and maskless patterning of structured substrates
US5963284A (en) * 1998-04-01 1999-10-05 Ois Optical Imaging Systems, Inc. LCD with diffuser having diffusing particles therein located between polarizers
EP1001311A1 (en) * 1998-11-16 2000-05-17 International Business Machines Corporation Patterning device
US7354519B1 (en) 2003-02-03 2008-04-08 Hutchinson Technology Incorporated Method and apparatus for fabricating a stent
US8097400B2 (en) * 2005-02-22 2012-01-17 Hewlett-Packard Development Company, L.P. Method for forming an electronic device
US8803028B1 (en) 2005-04-13 2014-08-12 Genlyte Thomas Group, Llc Apparatus for etching multiple surfaces of luminaire reflector

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA827832A (en) * 1969-11-18 E. Clark Harold Image formation and projection
DE1252061B (https=) * 1962-07-02
NL7808899A (nl) * 1978-08-30 1980-03-04 Philips Nv Weergeefinrichting met vloeibaar kristal.
US4218302A (en) * 1979-08-02 1980-08-19 U.S. Philips Corporation Electrophoretic display devices
JPS60230601A (ja) * 1984-05-01 1985-11-16 Masayasu Negishi 膜処理方法
JPS61156003A (ja) * 1984-12-27 1986-07-15 Sharp Corp 回折格子の製造方法
CA1270934C (en) * 1985-03-20 1990-06-26 SPATIAL PHASE MODULATED MASKS AND METHODS FOR MAKING THESE MASKS AND PHASE DIFFRACTION GRATINGS
GB8629223D0 (en) * 1986-12-06 1987-01-14 Emi Plc Thorn Replication of carriers

Also Published As

Publication number Publication date
US5292625A (en) 1994-03-08
EP0564364A2 (en) 1993-10-06
EP0564364A3 (https=) 1995-01-18
JPH0649673A (ja) 1994-02-22

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PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

PC1203 Withdrawal of no request for examination

St.27 status event code: N-1-6-B10-B12-nap-PC1203

WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid
R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000