KR930002537A - 기판 이송장치 - Google Patents

기판 이송장치 Download PDF

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Publication number
KR930002537A
KR930002537A KR1019920010796A KR920010796A KR930002537A KR 930002537 A KR930002537 A KR 930002537A KR 1019920010796 A KR1019920010796 A KR 1019920010796A KR 920010796 A KR920010796 A KR 920010796A KR 930002537 A KR930002537 A KR 930002537A
Authority
KR
South Korea
Prior art keywords
substrates
substrate
substrate holder
plate
conductive material
Prior art date
Application number
KR1019920010796A
Other languages
English (en)
Inventor
랏츠 루돌프
Original Assignee
페터 좀머캄프, 에리히 투테
레이볼드 앗크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 페터 좀머캄프, 에리히 투테, 레이볼드 앗크티엔게젤샤프트 filed Critical 페터 좀머캄프, 에리히 투테
Publication of KR930002537A publication Critical patent/KR930002537A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음.

Description

기판 이송장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도면의 본 발명에 따른 장치의 단면도.

Claims (3)

  1. 다수의 스테이션, 대략 판형의, 편평한, 평행육면체의 구조를 가진 기판홀더(16)를 구비하고 있으며, 상기 기판홀더는 상기 스테이션을 통해 수직으로 예정된 이송로를 따라 이동될 수 있고, 상기 기판홀더(16)에 고정된 기판(22,23)의 하부에 있는 그 하단부(15)에 설치된 레일(13,14)과 협력작용하며, 기판홀더(16)는 상부에서부터 그 하단부(15) 영역으로 뻗은, 레일(13,14)에 대해 평행한 갱형태의 리세스(24)를 갖고 있고, 스테이션을 통한 통과시 기판홀더(16) 상부에 있는 상단벽(4C)에 설치된, 하부로 수직으로 뻗은 부재(11)가 상기 리세스(24)에삽입되는, 진공코팅시스템의 기판 이송장치에 있어서, 바람직하게는 자성재료로 이루어진 손가락 또는 판형부재(11)가 적어도 하나의 전류가 흐르는 도체를 갖으며, 상기 도체는 부재(11)를 등진 기판(22,23)의 측면에 배열되거나 기판에 견고히 연결된, 전도성 재료로된 판, 박막 또는 층(27,28)과 협력작용하고 이것과 함께 유도가열 부재를 형성하는 것을 특징으로 하는 기판이송장치.
  2. 제1항에 있어서, 기판홀더(16)는 공지된 방식으로 프레임 형태로 형성되어 평행한 면에 배열된 2개의 측면부(16a,16b)를 갖으며, 상기 측면부들은 그들사이에 갱형태의 리세스(24)를 형성하고 그 윈도우형 개구(25,26)에 기판(22,23)이 삽입될 수 있으며, 측면부(16a,16b)는 하단부(15)와 일체로 형성되거나, 리벳, 나사 또는 링크로 하단부(15)에 연결되고 전도성 재료로된 판 또는 박막(27,28)의 외측치수는 그것이 윈도우형 리세스(25,26)에 삽입될 수 있고 거기에 고정될 수 있도록 설정되는 것을 특징으로 하는 기판이송장치.
  3. 제1항에 있어서, 전도성 재료로된 판이 기판(22,23)과 일체로 형성되고, 바람직하게는 기판(22,23)의 뒷면 또는 캐소드(19,20)를 향한 기판(22,23)의 측면상에 층으로 배열되는 것을 특징으로 하는 기판이송장치.
    ※참고사항:최초출원 내용에 의하여 공개하는 것임.
KR1019920010796A 1991-07-31 1992-06-22 기판 이송장치 KR930002537A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP4125334.5 1991-07-31
DE4125334A DE4125334C2 (de) 1991-07-31 1991-07-31 Vorrichtung für den Transport von Substraten

Publications (1)

Publication Number Publication Date
KR930002537A true KR930002537A (ko) 1993-02-23

Family

ID=6437393

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920010796A KR930002537A (ko) 1991-07-31 1992-06-22 기판 이송장치

Country Status (5)

Country Link
EP (1) EP0525279B1 (ko)
JP (1) JP2740420B2 (ko)
KR (1) KR930002537A (ko)
DE (2) DE4125334C2 (ko)
SG (1) SG165494G (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6264804B1 (en) 2000-04-12 2001-07-24 Ske Technology Corp. System and method for handling and masking a substrate in a sputter deposition system
DE102007052524B4 (de) 2007-11-01 2012-05-31 Von Ardenne Anlagentechnik Gmbh Transportmittel und Vakuumbeschichtungsanlage für Substrate unterschiedlicher Größe
DE102011085789B4 (de) 2011-11-04 2015-02-12 Von Ardenne Gmbh Vertikale Durchlaufbeschichtungsanlage zur kontinuierlichen Vakuumbeschichtung von Substraten
US9527244B2 (en) 2014-02-10 2016-12-27 Global Filtration Systems Apparatus and method for forming three-dimensional objects from solidifiable paste
DE102014104011A1 (de) 2014-03-24 2015-09-24 Aixtron Se Vorrichtung zum Abscheiden von Nanotubes
DE102014104009A1 (de) * 2014-03-24 2015-09-24 Aixtron Se Auf seinen beiden voneinander wegweisenden Breitseiten je ein Substrat tragender Substratträger

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042128A (en) * 1975-11-26 1977-08-16 Airco, Inc. Substrate transfer apparatus for a vacuum coating system
US4141811A (en) * 1978-04-24 1979-02-27 Atlantic Richfield Company Plasma etching process for the manufacture of solar cells
JPS5739430U (ko) * 1980-08-14 1982-03-03
DE3107914A1 (de) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum beschichten von formteilen durch katodenzerstaeubung
DE3623970A1 (de) * 1986-07-16 1988-01-28 Leybold Heraeus Gmbh & Co Kg Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen
DE3702775A1 (de) * 1987-01-30 1988-08-11 Leybold Ag Vorrichtung zum quasi-kontinuierlichen behandeln von substraten
CA1333547C (en) * 1987-09-11 1994-12-20 Victor Alexander Ettel Metal coating of inorganic fibers and solid particulates
EP0346815A3 (en) * 1988-06-13 1990-12-19 Asahi Glass Company Ltd. Vacuum processing apparatus and transportation system thereof
JP2714833B2 (ja) * 1988-12-18 1998-02-16 日本真空技術株式会社 仕込・取出室
DE4029905C2 (de) * 1990-09-21 1993-10-28 Leybold Ag Vorrichtung für den Transport von Substraten

Also Published As

Publication number Publication date
EP0525279A1 (de) 1993-02-03
DE4125334A1 (de) 1993-02-04
SG165494G (en) 1995-06-16
DE4125334C2 (de) 1999-08-19
JPH05195207A (ja) 1993-08-03
EP0525279B1 (de) 1994-09-21
JP2740420B2 (ja) 1998-04-15
DE59200528D1 (de) 1994-10-27

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