KR930000181A - 다이아몬드 합성을 돕는 플라즈마 형성방법 - Google Patents
다이아몬드 합성을 돕는 플라즈마 형성방법 Download PDFInfo
- Publication number
- KR930000181A KR930000181A KR1019920011419A KR920011419A KR930000181A KR 930000181 A KR930000181 A KR 930000181A KR 1019920011419 A KR1019920011419 A KR 1019920011419A KR 920011419 A KR920011419 A KR 920011419A KR 930000181 A KR930000181 A KR 930000181A
- Authority
- KR
- South Korea
- Prior art keywords
- plasma
- substrate
- reaction chamber
- microwave radiation
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract 11
- 229910003460 diamond Inorganic materials 0.000 title claims abstract 6
- 239000010432 diamond Substances 0.000 title claims abstract 6
- 230000015572 biosynthetic process Effects 0.000 title 2
- 238000003786 synthesis reaction Methods 0.000 title 1
- 239000007789 gas Substances 0.000 claims abstract 18
- 239000000758 substrate Substances 0.000 claims abstract 17
- 230000005855 radiation Effects 0.000 claims abstract 10
- 150000001722 carbon compounds Chemical class 0.000 claims abstract 4
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract 4
- 239000001257 hydrogen Substances 0.000 claims abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract 4
- 229910010293 ceramic material Inorganic materials 0.000 claims abstract 2
- 238000004519 manufacturing process Methods 0.000 claims abstract 2
- 239000000203 mixture Substances 0.000 claims 5
- 239000002243 precursor Substances 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 2
- 230000003993 interaction Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 230000001419 dependent effect Effects 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/02—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Composite Materials (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB919114014A GB9114014D0 (en) | 1991-06-28 | 1991-06-28 | Plasma assisted diamond synthesis |
| GB9114014.5 | 1991-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR930000181A true KR930000181A (ko) | 1993-01-15 |
Family
ID=10697507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920011419A Withdrawn KR930000181A (ko) | 1991-06-28 | 1992-06-27 | 다이아몬드 합성을 돕는 플라즈마 형성방법 |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0520832B1 (enExample) |
| JP (1) | JPH05239656A (enExample) |
| KR (1) | KR930000181A (enExample) |
| AT (1) | ATE135752T1 (enExample) |
| AU (1) | AU1862392A (enExample) |
| CA (1) | CA2072455A1 (enExample) |
| DE (1) | DE69209163T2 (enExample) |
| GB (1) | GB9114014D0 (enExample) |
| TW (1) | TW262626B (enExample) |
| ZA (1) | ZA924765B (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5328550A (en) * | 1992-10-02 | 1994-07-12 | At&T Bell Laboratories | Thinning a diamond body by means of molten rare-earth-containing alloys |
| DE10156615B4 (de) * | 2001-11-17 | 2004-10-07 | Forschungszentrum Karlsruhe Gmbh | Einrichtung zur Erzeugung eines örtlich variierbaren Elektron-Zyklotron-Resonanz-Mikrowellen-Niederdruckplasmas |
| US6845734B2 (en) * | 2002-04-11 | 2005-01-25 | Micron Technology, Inc. | Deposition apparatuses configured for utilizing phased microwave radiation |
| RU2215061C1 (ru) | 2002-09-30 | 2003-10-27 | Институт прикладной физики РАН | Высокоскоростной способ осаждения алмазных пленок из газовой фазы в плазме свч-разряда и плазменный реактор для его реализации |
| US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
| US6904935B2 (en) | 2002-12-18 | 2005-06-14 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
| US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
| US20070026205A1 (en) | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
| RU2357001C2 (ru) * | 2007-07-25 | 2009-05-27 | Ооо "Твинн" | Способ получения изделий из поликристаллического алмаза |
| DE102008035917B4 (de) * | 2008-08-01 | 2010-06-17 | Eads Deutschland Gmbh | Blitzschutz von Radomen und Sende-/Empfangsvorrichtungen |
| CN113373425B (zh) * | 2020-03-10 | 2022-06-10 | 宏硕系统股份有限公司 | 人造钻石生产装置及其微波发射模块 |
| US11155915B1 (en) | 2020-04-13 | 2021-10-26 | Wave Power Technology Inc. | Artificial diamond production device and microwave transmitting module thereof |
| JP7074795B2 (ja) * | 2020-04-21 | 2022-05-24 | 宏碩系統股▲フン▼有限公司 | 合成ダイヤモンドの製造装置及びこれに用いられるマイクロ波発射モジュール |
| US12084759B2 (en) | 2022-01-07 | 2024-09-10 | Wave Power Technology Inc. | Artificial diamond plasma production device |
| JP7250969B1 (ja) * | 2022-02-08 | 2023-04-03 | 宏碩系統股▲フン▼有限公司 | 人工ダイヤモンドプラズマ生成機器 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4434188A (en) * | 1981-12-17 | 1984-02-28 | National Institute For Researches In Inorganic Materials | Method for synthesizing diamond |
| AU560521B2 (en) * | 1982-10-18 | 1987-04-09 | Energy Conversion Devices Inc. | Layered amorphous semiconductor alloys |
-
1991
- 1991-06-28 GB GB919114014A patent/GB9114014D0/en active Pending
-
1992
- 1992-06-26 AU AU18623/92A patent/AU1862392A/en not_active Abandoned
- 1992-06-26 ZA ZA924765A patent/ZA924765B/xx unknown
- 1992-06-26 CA CA002072455A patent/CA2072455A1/en not_active Abandoned
- 1992-06-27 KR KR1019920011419A patent/KR930000181A/ko not_active Withdrawn
- 1992-06-29 EP EP92305950A patent/EP0520832B1/en not_active Expired - Lifetime
- 1992-06-29 DE DE69209163T patent/DE69209163T2/de not_active Expired - Fee Related
- 1992-06-29 JP JP4210619A patent/JPH05239656A/ja active Pending
- 1992-06-29 AT AT92305950T patent/ATE135752T1/de not_active IP Right Cessation
- 1992-07-10 TW TW081105485A patent/TW262626B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| ATE135752T1 (de) | 1996-04-15 |
| GB9114014D0 (en) | 1991-08-14 |
| TW262626B (enExample) | 1995-11-11 |
| EP0520832B1 (en) | 1996-03-20 |
| JPH05239656A (ja) | 1993-09-17 |
| DE69209163D1 (de) | 1996-04-25 |
| DE69209163T2 (de) | 1996-08-01 |
| EP0520832A1 (en) | 1992-12-30 |
| ZA924765B (en) | 1993-03-31 |
| AU1862392A (en) | 1993-01-07 |
| CA2072455A1 (en) | 1992-12-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 19920627 |
|
| PG1501 | Laying open of application | ||
| PC1203 | Withdrawal of no request for examination | ||
| WITN | Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid |