JPH05239656A - プラズマを形成する方法および装置 - Google Patents

プラズマを形成する方法および装置

Info

Publication number
JPH05239656A
JPH05239656A JP4210619A JP21061992A JPH05239656A JP H05239656 A JPH05239656 A JP H05239656A JP 4210619 A JP4210619 A JP 4210619A JP 21061992 A JP21061992 A JP 21061992A JP H05239656 A JPH05239656 A JP H05239656A
Authority
JP
Japan
Prior art keywords
plasma
reaction chamber
substrate
forming
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4210619A
Other languages
English (en)
Japanese (ja)
Inventor
Christopher John Howard Wort
ジョン ハワード ウオート クリストファー
Ricardo Simon Sussmann
シモン サスマン リカルド
Harry Richard Holliday
リチャード ホリデイ ハリー
Dennis Charles Hawkins
チャールズ ホーキンズ デニス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Beers Industrial Diamond Division Pty Ltd
Original Assignee
De Beers Industrial Diamond Division Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Beers Industrial Diamond Division Pty Ltd filed Critical De Beers Industrial Diamond Division Pty Ltd
Publication of JPH05239656A publication Critical patent/JPH05239656A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/02—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
JP4210619A 1991-06-28 1992-06-29 プラズマを形成する方法および装置 Pending JPH05239656A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9114014.5 1991-06-28
GB919114014A GB9114014D0 (en) 1991-06-28 1991-06-28 Plasma assisted diamond synthesis

Publications (1)

Publication Number Publication Date
JPH05239656A true JPH05239656A (ja) 1993-09-17

Family

ID=10697507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4210619A Pending JPH05239656A (ja) 1991-06-28 1992-06-29 プラズマを形成する方法および装置

Country Status (10)

Country Link
EP (1) EP0520832B1 (enExample)
JP (1) JPH05239656A (enExample)
KR (1) KR930000181A (enExample)
AT (1) ATE135752T1 (enExample)
AU (1) AU1862392A (enExample)
CA (1) CA2072455A1 (enExample)
DE (1) DE69209163T2 (enExample)
GB (1) GB9114014D0 (enExample)
TW (1) TW262626B (enExample)
ZA (1) ZA924765B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006501122A (ja) * 2002-09-30 2006-01-12 インスティテュート・オブ・アプライド・フィズィックス・アールエーエス Ｓｈｆ放電プラズマ中の気相からダイヤモンド膜を堆積する高速方法及び該方法を実行する装置
US11155915B1 (en) 2020-04-13 2021-10-26 Wave Power Technology Inc. Artificial diamond production device and microwave transmitting module thereof
JP2021172534A (ja) * 2020-04-21 2021-11-01 宏碩系統股▲フン▼有限公司 合成ダイヤモンドの製造装置
JP2023115614A (ja) * 2022-02-08 2023-08-21 宏碩系統股▲フン▼有限公司 人工ダイヤモンドプラズマ生成機器
US12084759B2 (en) 2022-01-07 2024-09-10 Wave Power Technology Inc. Artificial diamond plasma production device

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5328550A (en) * 1992-10-02 1994-07-12 At&T Bell Laboratories Thinning a diamond body by means of molten rare-earth-containing alloys
DE10156615B4 (de) * 2001-11-17 2004-10-07 Forschungszentrum Karlsruhe Gmbh Einrichtung zur Erzeugung eines örtlich variierbaren Elektron-Zyklotron-Resonanz-Mikrowellen-Niederdruckplasmas
US6845734B2 (en) 2002-04-11 2005-01-25 Micron Technology, Inc. Deposition apparatuses configured for utilizing phased microwave radiation
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
US7866343B2 (en) 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US6904935B2 (en) 2002-12-18 2005-06-14 Masco Corporation Of Indiana Valve component with multiple surface layers
US8555921B2 (en) 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US7866342B2 (en) 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
RU2357001C2 (ru) * 2007-07-25 2009-05-27 Ооо "Твинн" Способ получения изделий из поликристаллического алмаза
DE102008035917B4 (de) * 2008-08-01 2010-06-17 Eads Deutschland Gmbh Blitzschutz von Radomen und Sende-/Empfangsvorrichtungen
CN113373425B (zh) * 2020-03-10 2022-06-10 宏硕系统股份有限公司 人造钻石生产装置及其微波发射模块

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4434188A (en) * 1981-12-17 1984-02-28 National Institute For Researches In Inorganic Materials Method for synthesizing diamond
AU560521B2 (en) * 1982-10-18 1987-04-09 Energy Conversion Devices Inc. Layered amorphous semiconductor alloys

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006501122A (ja) * 2002-09-30 2006-01-12 インスティテュート・オブ・アプライド・フィズィックス・アールエーエス Ｓｈｆ放電プラズマ中の気相からダイヤモンド膜を堆積する高速方法及び該方法を実行する装置
US11155915B1 (en) 2020-04-13 2021-10-26 Wave Power Technology Inc. Artificial diamond production device and microwave transmitting module thereof
JP2021172534A (ja) * 2020-04-21 2021-11-01 宏碩系統股▲フン▼有限公司 合成ダイヤモンドの製造装置
US12084759B2 (en) 2022-01-07 2024-09-10 Wave Power Technology Inc. Artificial diamond plasma production device
JP2023115614A (ja) * 2022-02-08 2023-08-21 宏碩系統股▲フン▼有限公司 人工ダイヤモンドプラズマ生成機器

Also Published As

Publication number Publication date
GB9114014D0 (en) 1991-08-14
DE69209163D1 (de) 1996-04-25
EP0520832A1 (en) 1992-12-30
CA2072455A1 (en) 1992-12-29
ATE135752T1 (de) 1996-04-15
TW262626B (enExample) 1995-11-11
AU1862392A (en) 1993-01-07
KR930000181A (ko) 1993-01-15
ZA924765B (en) 1993-03-31
DE69209163T2 (de) 1996-08-01
EP0520832B1 (en) 1996-03-20

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