KR920006355B1 - 락톤을 이용한 금속의 용해 방법 및 그 조성물 - Google Patents
락톤을 이용한 금속의 용해 방법 및 그 조성물 Download PDFInfo
- Publication number
- KR920006355B1 KR920006355B1 KR1019840000910A KR840000910A KR920006355B1 KR 920006355 B1 KR920006355 B1 KR 920006355B1 KR 1019840000910 A KR1019840000910 A KR 1019840000910A KR 840000910 A KR840000910 A KR 840000910A KR 920006355 B1 KR920006355 B1 KR 920006355B1
- Authority
- KR
- South Korea
- Prior art keywords
- lactone
- liter
- concentration
- hydrogen peroxide
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyesters Or Polycarbonates (AREA)
- Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/524,965 US4437927A (en) | 1983-08-22 | 1983-08-22 | Dissolution of metals utilizing a lactone |
| US524,965 | 1983-08-22 | ||
| US524965 | 1983-08-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR850002837A KR850002837A (ko) | 1985-05-20 |
| KR920006355B1 true KR920006355B1 (ko) | 1992-08-03 |
Family
ID=24091373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019840000910A Expired KR920006355B1 (ko) | 1983-08-22 | 1984-02-24 | 락톤을 이용한 금속의 용해 방법 및 그 조성물 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4437927A (enExample) |
| JP (1) | JPS6050187A (enExample) |
| KR (1) | KR920006355B1 (enExample) |
| CA (1) | CA1194392A (enExample) |
| CH (1) | CH666058A5 (enExample) |
| DE (1) | DE3430344A1 (enExample) |
| FR (1) | FR2551077B1 (enExample) |
| GB (1) | GB2147548B (enExample) |
| IT (1) | IT1176620B (enExample) |
| NL (1) | NL8401753A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3135718A1 (fr) * | 2022-05-20 | 2023-11-24 | Expleo France | Composition, son utilisation pour recycler un matériau à base de résine époxyde et procédé de recyclage associé |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1119969A (en) * | 1965-04-27 | 1968-07-17 | Lancy Lab | Metal cleaning |
| JPS5286933A (en) * | 1976-01-14 | 1977-07-20 | Tokai Electro Chemical Co | Method of treating surface of copper and copper alloy |
| US4158592A (en) * | 1977-11-08 | 1979-06-19 | Dart Industries Inc. | Dissolution of metals utilizing a H2 O2 -sulfuric acid solution catalyzed with ketone compounds |
| US4158593A (en) | 1977-11-08 | 1979-06-19 | Dart Industries Inc. | Dissolution of metals utilizing a H2 O2 -sulfuric acid solution catalyzed with selenium compounds |
| US4236957A (en) | 1979-06-25 | 1980-12-02 | Dart Industries Inc. | Dissolution of metals utilizing an aqueous H2 SOY --H2 O.sub. -mercapto containing heterocyclic nitrogen etchant |
-
1983
- 1983-08-22 US US06/524,965 patent/US4437927A/en not_active Expired - Lifetime
-
1984
- 1984-02-23 CA CA000448148A patent/CA1194392A/en not_active Expired
- 1984-02-24 KR KR1019840000910A patent/KR920006355B1/ko not_active Expired
- 1984-03-15 GB GB08406799A patent/GB2147548B/en not_active Expired
- 1984-04-03 FR FR8405235A patent/FR2551077B1/fr not_active Expired
- 1984-05-11 JP JP59093056A patent/JPS6050187A/ja active Granted
- 1984-05-30 NL NL8401753A patent/NL8401753A/nl not_active Application Discontinuation
- 1984-08-15 CH CH3921/84A patent/CH666058A5/de not_active IP Right Cessation
- 1984-08-17 DE DE19843430344 patent/DE3430344A1/de not_active Withdrawn
- 1984-08-21 IT IT22376/84A patent/IT1176620B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| GB2147548B (en) | 1987-02-25 |
| DE3430344A1 (de) | 1985-03-14 |
| CA1194392A (en) | 1985-10-01 |
| JPS6050187A (ja) | 1985-03-19 |
| FR2551077A1 (fr) | 1985-03-01 |
| IT1176620B (it) | 1987-08-18 |
| IT8422376A0 (it) | 1984-08-21 |
| GB8406799D0 (en) | 1984-04-18 |
| CH666058A5 (de) | 1988-06-30 |
| FR2551077B1 (fr) | 1988-01-08 |
| US4437927A (en) | 1984-03-20 |
| JPH0427305B2 (enExample) | 1992-05-11 |
| KR850002837A (ko) | 1985-05-20 |
| NL8401753A (nl) | 1985-03-18 |
| GB2147548A (en) | 1985-05-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR920006356B1 (ko) | 글리콜 에테르를 이용한 금속의 용해방법 및 그 조성물 | |
| KR920006352B1 (ko) | 금속의 용해방법 | |
| CA1215301A (en) | Nickel etching process and solution | |
| US4462861A (en) | Etchant with increased etch rate | |
| US4130455A (en) | Dissolution of metals-utilizing H2 O2 -H2 SO4 -thiosulfate etchant | |
| US4236957A (en) | Dissolution of metals utilizing an aqueous H2 SOY --H2 O.sub. -mercapto containing heterocyclic nitrogen etchant | |
| KR920006351B1 (ko) | ε-카프로락탐을 이용한 금속의 용해 방법 및 그 조성물 | |
| US4140646A (en) | Dissolution of metals with a selenium catalyzed H2 O2 -H2 SO4 etchant containing t-butyl hydroperoxide | |
| US4233113A (en) | Dissolution of metals utilizing an aqueous H2 O2 -H2 SO4 -thioamide etchant | |
| KR920006353B1 (ko) | 피롤리돈을 이용한 금속의 용해 방법 및 그 조성물 | |
| KR920006354B1 (ko) | 푸란 유도체를 이용한 금속의 용해 방법 및 그 조성물 | |
| US4158593A (en) | Dissolution of metals utilizing a H2 O2 -sulfuric acid solution catalyzed with selenium compounds | |
| KR920006355B1 (ko) | 락톤을 이용한 금속의 용해 방법 및 그 조성물 | |
| CA1115627A (en) | Metal-dissolution solution containing sulfuric acid, hydrogen peroxide and mono-or dihydro-substituted cycloparaffin | |
| US4158592A (en) | Dissolution of metals utilizing a H2 O2 -sulfuric acid solution catalyzed with ketone compounds | |
| US4233111A (en) | Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -3-sulfopropyldithiocarbamate etchant | |
| US4525240A (en) | Dissolution of metals utilizing tungsten | |
| US4522683A (en) | Dissolution of metals utilizing tungsten-diol combinations | |
| US4233112A (en) | Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -polysulfide etchant | |
| JP2002129359A (ja) | 金属スズまたはスズ合金をエッチングする方法ならびに金属スズまたはスズ合金のエッチング液 | |
| Luke | Etching of copper with sulphuric acid/hydrogen peroxide solutions | |
| KR820000569B1 (ko) | 금속의 용해방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| G160 | Decision to publish patent application | ||
| PG1605 | Publication of application before grant of patent |
St.27 status event code: A-2-2-Q10-Q13-nap-PG1605 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
|
| FPAY | Annual fee payment |
Payment date: 19950728 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 19960804 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 19960804 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |