KR920004019A - 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법 - Google Patents

슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법 Download PDF

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KR920004019A
KR920004019A KR1019910014819A KR910014819A KR920004019A KR 920004019 A KR920004019 A KR 920004019A KR 1019910014819 A KR1019910014819 A KR 1019910014819A KR 910014819 A KR910014819 A KR 910014819A KR 920004019 A KR920004019 A KR 920004019A
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vortex
liquid
slurry
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오. 토레그로자 루이스
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조셉 알. 필립스
캐미르, 인코오포레이티드
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Abstract

내용 없음

Description

슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 장치를 부분 절개한 사시도,
제2도는 제 1도와 같은 구조2개를 상호 연결한 약도,
제3도는 스트리핑 가스를 이용하여 액체에서 스트립성 조성물을 제거하는 방법인 제1도와 유사한 도면.

Claims (10)

  1. 슬러리 고체와 화학적으로 반응하는 가스(24)를 가진 슬러리(22)에서 고체의 화학적 처리를 효과적으로 하기위한 방법에 있어서, 와류부(23)의 제 1단부(11)로 슬러리가 유입하는 단계(a)와, 슬러리 고체와 가스가 화학적으로 반응하는 와류에서 슬러리와 접촉하기 위해 와류의 외부에서 (16-19를 통하여)화학적으로 반응하는 가스를 유입하는 단계(b)와, 제 1단부와 마주하는 와류의 제 2단부(20)에서 처리한 슬러리를 제거하는 단계(c)와, 와류의 제 1단부에서(14)를 통하여 어떤 잔존 가스(25)를 제거하는 단계(d)로 이루어지는 것을 특징으로 하는 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법.
  2. 제 1항에 있어서, 와류를 둘러싸는 회전벽(16)의 가스다공질 표면을 이용하며, 단계(b)는 가스가 슬러리로 유입될때 가스가 미세한 거품형상으로 있기 위하여 가스다공질 벽을 통한 가스(24)의 유입에 의하여 행하여지는 것을 특징으로 하는 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법.
  3. 제 2항에 있어서, 단계(a)는 세분된 셀룰로오스 섬유상 재료 슬러리의 사용에 의해 행하게 되고, 단계(b)는 슬러리 셀룰로오스 재료와 반응하기 위해 가스를 함유한 오존의 추가에 의해 행해지며, 단계(a)는 슬러리의 pH가 약 2-7의 범위로 행해지고, 모든 단계는 약 25∼75。C의 온도에서 행해지는 것을 특징으로 하는 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법.
  4. 제 3항에 있어서, 단계(a)는 약 10-30 psig의 압력이며, 단계(b)는 약2-10 psig의 압력이고, 단계(a)는 약1-3%의 고체 농도에서 세분된 셀롤로오스 섬유상 재료 슬러리의 마련에 의해 추가로 행해지는 것을 특징으로 하는 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법.
  5. 제 2항에 있어서, 단계(b)는 약1-200u의 크기의 기공을 가진 구멍의 가스다공질벽(16)을 마련함으로써 행해지는 것을 특징으로 하는 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법.
  6. 제 1항에 있어서, 와류의 제 2단부에서 제 2와류의 제 1단부로 슬러리의 통과단계(e)와, 제 2와류에서 슬러리의 재료와 반응하기 위하여 가스를 유입하는 단계(f)와, 제 2와류의 제 2단부에서 처리된 슬러리를 제거하는 단계(g)와, 제 2와류의 제 1단부에서 단계(b)의 와류로 유입되기 위한 잔존가스의 통과 단계(h)를 추가 단계로 구성하는 것을 특징으로 하는 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법.
  7. 회전벽의 가스 다공질 표면을 이용하여 가스(324)와 액체(322)가 화학적으로 반응하기 위한 방법에 있어서, 와류(323)의 제 1단부(311)로 액체를 유입하는 단계(a)와, 가스가 액체로 유입될때 가스가 미세한 거품 형상으로 있기 위하여 가스 다공질벽(316)을 통한 가스의 유입에 의하여 가스와 액체가 화학적으로 반응하는 와류에서 액체와 접촉하기 위해 와류의 외부에서 가스를 유입하는 단계(b)와, 제 1단부와 마주하는 와류의 제 2단부(30)에서 처리된 액체(326)을 제거하는 단계(c)와, 와류의 제 1단부(314)에서 어떤 잔존가스(325)를 제거하는 단계(d),로 이루어지는 것을 특징으로 하는 회전벽의 가스 다공질 벽을 이용한 가스와 액체가 화학적으로 반응하기 위한 방법.
  8. 스트리핑 가스(124)와 회전벽(16)의 가스 다공질 표면을 이용하여 액체(122)에서 스트립성 조성물을 제거(stripping)하기 위한 방법에 있어서, 와류(123)의 제 1단부(11)를 스트립성 조성물을 가진 액체의 유입단계(a)와, 가스가 액체로 유입될때 가스가 미세한 거품 형상으로 있기 위하여 가스 다공질 벽(16)을 통한 스트리밍 가스의 유입에 의하여 스트리핑 가스와 액체 스트립성 조성물이 반응하는 와류에서 액체와 접촉하기 위하여 와류(116-119)의 외부에서 스트리핑 가스를 유입하는 단계(b)와, 제 1단부와 마주하는 와류의 제 2단부(120)에서 처리된 액체(126)을 제거하는 단계(c)와, 와류의 제 1단부에서(114를 통하여) 스트립성 조성물과 잔존 스트리핑 가스(125)를 제거하는 단계(d)로 이루어지는 것을 특징으로 하는 액체에서 스트립성 조성물을 제거하는 방법.
  9. 흡수 액체(222)에서 흡수성 조성물과, 오존, 염소, 이산화염소, 이산화황, 이산화탄소 및 암모니아로 구성된 그룹에서 선택된 가스(224)의 흡수방법에 있어서, 와류(223)의 제 1단부로 액체를 흡수하는 단계(a)와, 흡수액체에 의해 흡수된 흡수성 가스 조성물인 와류에서 액체와 접촉하기 위하여 와류의 외부에서(216-219를 통하여)흡수성 조성물을 가진 가스를 유입하는 단계(b)와, 제 1단부와 마주하는 와류의 제 2단부(220)에서 흡수성 조성물을 가진 액체(226)을 제거하는 단계(c)와, 와류의 제 1단부에서(214를 통하여)흡수성 조성물 없는 잔존가스(225)를 제거하는 단계(d)로 이루어지는 것을 특징으로 하는 가스의 흡수방법.
  10. 제 7항에 있어서, 와류의 제 2단부 인접부인 와류의 중심부에서(33을 통하여) 어느 정도의 잔존가스를 제거하는 단계(e)를 추가하는 것을 특징으로 하는 회전벽의 가스 다공질벽을 이용한 가스와 액체가 화학적으로 반응하기 위한 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910014819A 1990-08-28 1991-08-27 슬러리와 가스의 화학적 처리를 효과적으로 하기 위한 방법 KR920004019A (ko)

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US07/573,975 1990-08-28
US07/573,975 US5405497A (en) 1990-08-28 1990-08-28 Method of chemically reacting a liquid with a gas in a vortex

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CA2042630A1 (en) * 1990-09-27 1992-03-28 Louis O. Torregrossa Method and apparatus for beneficiating waste-waters
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US5472567A (en) 1995-12-05
JPH04245991A (ja) 1992-09-02
US5405497A (en) 1995-04-11
BR9102790A (pt) 1992-04-28
AU638338B2 (en) 1993-06-24
EP0475930A1 (en) 1992-03-18
FI913939A0 (fi) 1991-08-21
MX9100657A (es) 1992-04-01
ZA915052B (en) 1992-03-25

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