KR910020502A - 광영상성 폴리이미드 코팅물 - Google Patents

광영상성 폴리이미드 코팅물 Download PDF

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Publication number
KR910020502A
KR910020502A KR1019910007401A KR910007401A KR910020502A KR 910020502 A KR910020502 A KR 910020502A KR 1019910007401 A KR1019910007401 A KR 1019910007401A KR 910007401 A KR910007401 A KR 910007401A KR 910020502 A KR910020502 A KR 910020502A
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South Korea
Prior art keywords
polyimide coating
polyimide
photoimaging
photoimageable
mole
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KR1019910007401A
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English (en)
Inventor
덩 노 데이브드
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랄프 챨스 메드허스트
아모코 코포레이션
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Publication of KR910020502A publication Critical patent/KR910020502A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10—Coating
    • C03C25/104—Coating to obtain optical fibres
    • C03C25/106—Single coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

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  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음

Description

광영상성 폴리이미드 코팅물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (20)

  1. 하기 일반식의 반복 유니트를 포함하는 광영상성 플리이미드 코팅물(photoimageable polyimide coating).
    상기식에서,
    R1은
    약 1내지 약 100몰% 및 4가 감광성 잔기 약 99내지 약 0몰%를 함유하고;
    R2는
    약 1내지 약 100몰% 및 2가 감광성 잔기 약 99내지 약 0몰%를 함유한다.
  2. 제1항에 있어서, 추가로 공개시제를 포함하는 광영상성 폴리이미드 코팅몰.
  3. 제1항에 있어서, 수 평균 분자량이 10,000g/mol 이상인 광영상성 폴리이미드 코팅물.
  4. 제1항에 있어서, 4가 감광성 잔기가 벤조폐논 잔기인 광영상성 폴리이미드 코팅물.
  5. 제4항에 있어서, R1이 벤조폐논 잔기 약 30내지 약 99몰%를 포함하는 광영상성 폴리이미드 코팅물.
  6. 제4항에 있어서, R1이 벤조폐논 잔기 약 50내지 약 99몰%를 포함하는 광영상성 폴리이미드 코팅물.
  7. 제4항에 있어서, R1이 벤조폐논 잔기 약 50내지 약 602몰%를 포함하는 광영상성 폴리이미드 코팅물.
  8. 두께가 약 10마이크론 이상인, 제1항의 광영상성 폴리이미드 코팅물.
  9. 하기 일반식의 반복 유니트를 포함하는 광영상성 폴리이미드.
    상기식에서,
    R1은
    약 70내지 약 1몰% 및 4가 벤조폐논 잔기 약 30내지 약 99몰%를 함유하고;
    R2는또는
    약 100몰%를 함유한다.
  10. 제9항에 있어서, R1이 약 50내지 약 99몰%의 4가 벤조폐논 잔기인 광영상성 폴리이미드.
  11. 제9항에 있어서, R1이 약 50내지 약 60몰%의 4가 벤조폐논 잔기인 광영상성 폴리이미드.
  12. 제9항에 있어서, 수 평균 분자량이 10,000g/mol 이상인 광영상성 폴리이미드.
  13. 용액 용매 및 제9항의 광영상성 폴리이미드를 포함하는 영역.
  14. 2,3,5,6―테트라메틸―1,4―페닐렌 디아민으로 구성된 디아민 성분과 2,2,―비스(3,4―디카복시페닐)-헥사플루오로프로판 이무수물 및 3,3′,4,4′―벤조페논 테트라카복실산 이무수물로 구성된 이무수물 성분의 중합성 축합 생성물을 포함하고 3,3′,4,4′―벤조페논 테트라카복실산 이무수물 약 50내지 약 60몰%를 함유하며 수 평균 분자량이 10,000g/mol 이상인 폴리이미드.
  15. 용액 용매 및 제14항의 광영상성 폴리이미드를 포함하는 용액.
  16. 제1항의 광영상성 폴리이미드 코팅물층 하나 이상으로 코팅된 기판 하나 이상을 포함하는 다층 구조물.
  17. 제9항의 공영상성 폴리이미드 코팅물층 하나 이상으로 코팅된 기판 하나 이상을 포함하는 다층 구조물.
  18. 제14항의 광영상성 폴리이미드 코팅물층 하나 이상으로 코팅된 기판 하나 이상을 포함하는 다층 구조물.
  19. a)제1항의 광영상성 폴리이미드 코팅물층으로 기판을 코팅하고; b)광영상성 폴리이미드 코팅물의 선택면적을 차폐물로 차폐시켜 은폐된 광영상성 폴리이미드 코팅물 및 노출된 광영상성 폴리이미드 코팅물 형태를 제공하고; c)노출된 광영상성 폴리이미드 코팅물을 화학선을 사용하여 가교결합시키고; d)차폐물을 제거하고; e)비노출 광영상성 폴리이미드 코팅물을 에칭 조성물을 사용하여 제거함을 특징으로 하여, 광영상성 폴리이미드 코팅물을 에칭하는 방법.
  20. a)제9항의 광영상성 폴리이미드 코팅물층으로 기판을 코팅하고; b)광영상성 폴리이키드 코팅물의 선택면적을 차폐물로 차폐시켜 은폐된 광영상성 폴리이미드 코킹물 및 노출된 광영상성 폴리이미드 코팅물 형태를 제공하고; c)노출된 광영상성 폴리이미드 코팅물을 화학선을 사용하여 가교결합시키고; d)차폐물을 제거하고; e)비노출 광영상성 폴리이미드 코팅물을 에칭 조성물을 사용하여 제거함을 특징으로 하여, 광영상성 폴리이미드 코팅물을 에칭하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910007401A 1990-05-08 1991-05-08 광영상성 폴리이미드 코팅물 KR910020502A (ko)

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US52236390A 1990-05-08 1990-05-08
US522,363 1990-05-08

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US (3) US5501941A (ko)
EP (1) EP0456463A3 (ko)
JP (1) JP3024008B2 (ko)
KR (1) KR910020502A (ko)
CA (1) CA2040994A1 (ko)
IE (1) IE911543A1 (ko)

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US5532110A (en) 1996-07-02
IE911543A1 (en) 1991-11-20
EP0456463A2 (en) 1991-11-13
US5599655A (en) 1997-02-04
JP3024008B2 (ja) 2000-03-21
EP0456463A3 (en) 1992-01-22
US5501941A (en) 1996-03-26
JPH04226460A (ja) 1992-08-17
CA2040994A1 (en) 1991-11-09

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