KR910020197A - 공업용 다이아몬드 코팅의 제조방법 - Google Patents

공업용 다이아몬드 코팅의 제조방법 Download PDF

Info

Publication number
KR910020197A
KR910020197A KR1019910008814A KR910008814A KR910020197A KR 910020197 A KR910020197 A KR 910020197A KR 1019910008814 A KR1019910008814 A KR 1019910008814A KR 910008814 A KR910008814 A KR 910008814A KR 910020197 A KR910020197 A KR 910020197A
Authority
KR
South Korea
Prior art keywords
coating
diamond
heat resistant
diamond coating
substrate
Prior art date
Application number
KR1019910008814A
Other languages
English (en)
Other versions
KR930007149B1 (ko
Inventor
순페이 야마자끼
미누시마 타카시
Original Assignee
순페이 야마자끼
가부시키가이샤 한도오따이 에네루기 겐큐쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 순페이 야마자끼, 가부시키가이샤 한도오따이 에네루기 겐큐쇼 filed Critical 순페이 야마자끼
Publication of KR910020197A publication Critical patent/KR910020197A/ko
Application granted granted Critical
Publication of KR930007149B1 publication Critical patent/KR930007149B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

내용 없음

Description

공업용 다이아몬드 코팅의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1a도∼제1c도는 선행기술에 따른 다이아몬드 코팅의 제조 방법을 보인 단면도, 제2도는 본 발명에 따른 다이아몬드 코팅의 제조방법을 설명하기 위한 CVD장치를 보조하는 마이크로 웨이브를 보인 개략도.

Claims (15)

  1. 코팅으로 부터 다이아몬드 구조와 다른 형태인 카본의 제거단계와, 상기 코팅에서 생성된 빈 공간을 채우는 단계를 구비하는 것을 특징으로 하는 표면상에 피복된 공업용 다이아몬드 코팅의 제조방법.
  2. 제1항에 있어서, 상기 제거 단계와 에칭에 의해 실행되는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  3. 제1항에 있어서, 상기 코팅이 증착에 의해 생성되는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  4. 제1항에 있어서, 상기 열저항 물질이 접착제인 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  5. 기재상에 다이아몬드 코팅을 생성시키고, 접착수단에 의해 상기 표면에 상기 다이아몬드 코팅을 결합시키고, 상기 기재를 상기 다이아몬드 코팅으로 부터 제거하고, 상기 코팅에서 상기 다이아몬드 구조와 다른 형태인 카본을 제거하고 제거후 상기 코팅에 생성된 빈 공간을 열저항 물질로 채워지는 것으로 구성되는 것을 특징으로 하는 표면상에 코팅된 공업용 다이아몬드 코팅의 제조방법.
  6. 제5항에 있어서, 상기 제거 단계가 에칭에 의해 실행되는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  7. 제5항에 있어서, 상기 코팅이 상기 기재상에 증착에 의해 생성되는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  8. 제5항에 있어서, 상기 열저항 물질의 접착제인 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  9. 기재상에 다이아몬드 코팅을 생성시키고 상기 코팅으로 부터 다이아몬드 구조와 다른 형태의 카본을 제거하고, 제거후 상기 코팅에서 생성된 빈 공간을 채우기 위하여 상기 코팅과 상기 표면 사이에 공급된 열저항 접착제수단에 의해 상기 표면과 상기 다이아몬드 코팅을 결합시키는 것으로 구성되는 것을 특징으로 하는 표면상에 코팅된 공업용 다이아몬드 코팅의 제조방법.
  10. 제9항에 있어서, 상기 제거 단계가 에칭에 의해 실해되는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  11. 제9항에 있어서, 상기 다이아몬드로 부터 상기 기재를 제거하는 단계를 더 구성하고 있는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  12. 제9항에 있어서, 상기 코팅이 증착에 의해 생성되는 것을 특징으로 하는 공업용 다이아몬드 코팅의 제조방법.
  13. 표면상에 생성된 공업용 다이아몬드 코팅에 있어서, 결정들 사이에 공간을 이룬 다수의 다이아몬드 결정들로 구성된 상기 코팅이 열저항 물질로 채워지는 것을 특징으로 하는 공업용 다이아몬드 코팅.
  14. 제13항에 있어서, 상기 열저항 물질이 접착제인 것을 특징으로 하는 공업용 다이아몬드 코팅.
  15. 제13항에 있어서, 상기 표면이 기계공구의 작업표면인 것을 특징으로 하는 공업용 다이아몬드 코팅.
    ※ 참고사항 : 최초출원 내용에 의하여 공개되는 것임.
KR1019910008814A 1990-05-30 1991-05-29 공업용 다이아몬드 코팅 및 그 형성방법 KR930007149B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2-140226 1990-05-30
JP2140226A JP2840788B2 (ja) 1990-05-30 1990-05-30 ダイヤモンド成分を含む表面保護膜

Publications (2)

Publication Number Publication Date
KR910020197A true KR910020197A (ko) 1991-12-19
KR930007149B1 KR930007149B1 (ko) 1993-07-30

Family

ID=15263842

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910008814A KR930007149B1 (ko) 1990-05-30 1991-05-29 공업용 다이아몬드 코팅 및 그 형성방법

Country Status (5)

Country Link
US (1) US5254141A (ko)
EP (1) EP0459807B1 (ko)
JP (1) JP2840788B2 (ko)
KR (1) KR930007149B1 (ko)
DE (1) DE69107244T2 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651947B2 (ja) * 1990-03-26 1997-09-10 株式会社半導体エネルギー研究所 ダイヤモンド薄膜コーティング部材およびダイヤモンド薄膜コーティング方法
JPH059735A (ja) * 1991-07-09 1993-01-19 Kobe Steel Ltd ダイヤモンドの気相合成方法
US6007591A (en) * 1995-03-07 1999-12-28 Nihon Micro Coating Co., Ltd. Abrasive sheet and method for producing same
JP2983154B2 (ja) * 1995-03-29 1999-11-29 株式会社椿本チエイン 工具保持装置
FR2738832B1 (fr) * 1995-09-18 1997-12-12 Suisse Electronique Microtech Procede d'obtention d'une couche de diamant sur un support en matiere plastique et produit ainsi obtenu
CA2258388C (en) * 1998-01-20 2002-04-16 Philip M. Fabis Surface processing of thin film cvd diamond coatings for improved resistive properties and integrated circuit packages incorporating processed coatings
US6524357B2 (en) 2000-06-30 2003-02-25 Saint-Gobain Abrasives Technology Company Process for coating superabrasive with metal
WO2002002844A2 (en) 2000-06-30 2002-01-10 Saint-Gobain Abrasives, Inc. Process for coating superabrasive particles with metal
US20060147631A1 (en) * 2005-01-04 2006-07-06 Lev Leonid C Method for making diamond coated substrates, articles made therefrom, and method of drilling
US20080187769A1 (en) * 2006-04-13 2008-08-07 3M Innovative Properties Metal-coated superabrasive material and methods of making the same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3942959A (en) * 1967-12-22 1976-03-09 Fabriksaktiebolaget Eka Multilayered flexible abrasive containing a layer of electroconductive material
US4101698A (en) * 1975-07-14 1978-07-18 Avery International Corp. Elastomeric reflective metal surfaces
US4179324A (en) * 1977-11-28 1979-12-18 Spire Corporation Process for fabricating thin film and glass sheet laminate
JPS622133A (ja) * 1985-06-28 1987-01-08 Shin Etsu Chem Co Ltd ミクロト−ム用ダイヤモンドコ−テイング刃およびその製造方法
US4776862A (en) * 1987-12-08 1988-10-11 Wiand Ronald C Brazing of diamond
JPH01153228A (ja) * 1987-12-10 1989-06-15 Asahi Daiyamondo Kogyo Kk 気相合成ダイヤモンド工具の製造法
JP2607592B2 (ja) * 1988-02-18 1997-05-07 住友電気工業株式会社 高耐摩耗性多結晶ダイヤモンド工具及びその製造方法
JP2631708B2 (ja) * 1988-07-29 1997-07-16 株式会社石塚研究所 改良された微細ダイヤモンド砥粒およびその製造方法
US4919974A (en) * 1989-01-12 1990-04-24 Ford Motor Company Making diamond composite coated cutting tools
ZA901817B (en) * 1989-06-15 1991-04-24 Gen Electric Tools employing a large or irregularly shaped diamond abrasive
US4968326A (en) * 1989-10-10 1990-11-06 Wiand Ronald C Method of brazing of diamond to substrate
US5082359A (en) * 1989-11-28 1992-01-21 Epion Corporation Diamond films and method of growing diamond films on nondiamond substrates
JP2651947B2 (ja) * 1990-03-26 1997-09-10 株式会社半導体エネルギー研究所 ダイヤモンド薄膜コーティング部材およびダイヤモンド薄膜コーティング方法

Also Published As

Publication number Publication date
EP0459807B1 (en) 1995-02-08
KR930007149B1 (ko) 1993-07-30
JP2840788B2 (ja) 1998-12-24
DE69107244D1 (de) 1995-03-23
DE69107244T2 (de) 1995-05-24
JPH0437695A (ja) 1992-02-07
US5254141A (en) 1993-10-19
EP0459807A1 (en) 1991-12-04

Similar Documents

Publication Publication Date Title
KR910020197A (ko) 공업용 다이아몬드 코팅의 제조방법
WO2003088340A3 (de) Verfahren zur herstellung strukturierter schichten auf substraten
WO2002043124A3 (fr) Procede de fabrication d'un substrat contenant une couche mince sur un support et substrat obtenu par ce procede
DK1009621T3 (da) Fremgangsmåde til fremstilling af et formlegeme
DE69109224D1 (de) Verfahren zum Bedecken eines Substrates mit einer Oberflächenschicht aus der Dampfphase und Vorrichtung zum Anwenden eines derartigen Verfahrens.
KR930702114A (ko) 접합체 강화 화학적 증착 및 물리적 증착 피복 절삭공구
ATE239612T1 (de) Diamantbeschichtete werkzeuge und verfahren zur herstellung
IT1180102B (it) Procedimento per la fabbricazione di guarnizioni di tenuta rinforzate e prodotto ottenuto col procedimento
DE68917477T2 (de) Verfahren zur schaffung einer grenzschicht zwischen substrat und atmosphäre.
DE69222110D1 (de) Verfahren zum Herstellen einer Halbeiteranordnung, wobei auf der Oberfläche einer Halbleiterscheibe aus einem Prozessgas eine Materialschicht abgeschieden wird
ES2126337T3 (es) Metodo para fabricar un material laminar que tiene una superficie fibrosa.
CA2204086A1 (en) Production of diamond film
AT400041B (de) Hartmetall-substrat mit diamantschicht hoher haftfestigkeit
EP0335248A3 (en) Graphite brazing fixture coated with composite layers of titanium carbide and titanium nitride
ATE454484T1 (de) Verfahren zum herstellen von glatten barriereschichten und verbundmaterial mit glatter barriereschicht
FI940722A0 (fi) Menetelmä ja laite toisiinsa sitomalla liitettävien substraattien pinoamiseksi
DE69703005T2 (de) Verfahren zum Herstellen einer Dünnschicht aus Metallfluorid auf einem Substrat
MX9302481A (es) Procedimiento para la deposicion de un revestimiento de latex sobre una pieza de elastomero y pieza compuesta a base de elastomero de silicona que tiene un revestimiento de latex.
DK1135306T3 (da) Emballagemateriale med høj trykegnethed og genanvendelighed, og fremgangsmåde for dets fremstilling
ATE136159T1 (de) Verfahren zum herstellen einer abgeschiedenen schicht, und verfahren zum herstellen einer halbleitervorrichtung
ES2139685T3 (es) Procedimiento para la fabricacion de una unidad modular venturi para un aparato lavador venturi; unidad modular venturi y aparato lavador venturi.
TW330314B (en) Method for optimizing the adhesion between extruded material and passive layer
FR2827309B1 (fr) Procede de fabrication de materiaux composites diamantes
CA2177013A1 (en) Spinning Substrate Holder for Cutting Tool Inserts for Improved Arc-Jet Diamond Deposition
TW200511393A (en) Manufacturing process for a multilayer structure

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20080711

Year of fee payment: 16

LAPS Lapse due to unpaid annual fee