KR910014891A - 엠보싱된 정보를 함유하는 광학적으로 판독 가능한 매체의 제조방법 - Google Patents

엠보싱된 정보를 함유하는 광학적으로 판독 가능한 매체의 제조방법 Download PDF

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KR910014891A
KR910014891A KR1019910000780A KR910000780A KR910014891A KR 910014891 A KR910014891 A KR 910014891A KR 1019910000780 A KR1019910000780 A KR 1019910000780A KR 910000780 A KR910000780 A KR 910000780A KR 910014891 A KR910014891 A KR 910014891A
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South Korea
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embossed
film
photocurable film
substrate
photocurable
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KR1019910000780A
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English (en)
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피. 슈바르츠만 펠릭스
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앨런슨 지. 보웬, 쥬니어
이. 아이. 듀우판 드 네모아 앤드 캄파니
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Publication of KR910014891A publication Critical patent/KR910014891A/ko

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276—Replicating a master hologram without interference recording
    • G03H1/028—Replicating a master hologram without interference recording by embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0833—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using actinic light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/60—Releasing, lubricating or separating agents
    • B29C33/62—Releasing, lubricating or separating agents based on polymers or oligomers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0002—Condition, form or state of moulded material or of the material to be shaped monomers or prepolymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/722—Decorative or ornamental articles
    • B29L2031/7224—Holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G03H2001/185—Applying a curing step

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Holo Graphy (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

내용 없음

Description

엠보싱된 정보를 함유하는 광학적으로 판독 가능한 매체의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 홀로그래피성 광학 요소를 제조하는 본 발명의 공정을 도식적으로 나타낸 것임. 제2도는 본 발명에 사용되는 공정 및 홀로그래피성 요소를 좀 더 상세히 나타낸 것임. 제3도는 적층단계 후 블랭크(blank) 시트 기판을 사용하여 본 발명의 실시 태양을 제조한 후 이 시트로부터 디스크를 절단하는 인-라인(in-line) 제조 공정을 개략적으로 도시한 것임.

Claims (12)

  1. (a) 건조 광경화성 막을 치수적으로 안정하고 광학적으로 투명한 기판의 표면에 도포시키고, (b) 적어도 3 : 1의 위상비를 가지는 홀로그램(hologram)의 역 양각상을 함유하는 스탭퍼(stamper)를 양각 홀르그래피성상을 함유하는 광경화성 막을 노출된 표면에 압접시킴으로써 상기 면을 엠보싱시키고, (c) 광경화성 막이 스텝퍼와 접하고 있는 동안 광경화성 막을 유효하게 경화시키기 위하여 화학선을 투명 기판 및 광경화성 막을 통해 통과시키고, (d) 스탬퍼를 엠보싱된 광경화 막으로부터 분리시키는 순차 공정으로 이루어짐을 특징으로 하는 양각 홀로그램(hologram)을 가지는 광학 상 요소(element)의 제조 방법.
  2. 제1항에 있어서, 중합성 보호층을 엠보싱 공정 이후에 엠보싱된 광경화 막의 표면에 도포시킴을 특징으로 하는 방법.
  3. 제1항에 있어서, 적층 전에 기판을 미리 형성시킴을 특징으로 하는 방법.
  4. 제1항에 있어서, 기판이 적층 전에는 시트 형태이며, 적층시킨 후에는 디스크로 형성됨을 특징으로 하는 방법.
  5. 제1항에 있어서, 기판을 폴리카르보네이트, 폴리(메틸 마트크릴 레이트) 또는 유리로 제조함을 특징으로 하는 방법.
  6. 제1항에 있어서, 광경화성 막의 크리프 점도가 적어도 20메가포이즈임을 특징으로 하는 방법.
  7. (a) 광학적으로 투명한 건조 광경화성 막을 치수적으로 안정한 기판의 표면에 도포시키고, (b) 광경화성 막의 노출된 표면을 양각 홀로그램의 표면을 사용하여 엠보싱시키고, (c) 광경화된 막을 양각 홀로그램으로 부터 분리시키고, (d) 엠보싱된 광경화성 막을 스탬퍼로서 제1항의 방법중에 사용하는 순차 공정에 의하여 스탬퍼를 제조함을 특징으로 하는, 양각 홀로그램을 가지는 광학 요소의 제조 방법.
  8. 제7항에 있어서, 이형층을 (d) 공정 전에 광경화된 막에 도포시킴을 특징으로 하는 방법.
  9. 제8항에 있어서, 이형층이 Al 또는 Cr임을 특징으로 하는 방법.
  10. 제8항에 있어서, 이형층이 낮은 표면 에너지 고상 유기 중합체임을 특징으로 하는 방법.
  11. 제10항에 있어서, 낮은 표면 에너지 고상 유기 중합체가 불소중합체임을 특징으로 하는 방법.
  12. 제1항에 있어서, 역 양각 상의 위상비가 적어도 10 : 1임을 특징으로 하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910000780A 1990-01-18 1991-01-18 엠보싱된 정보를 함유하는 광학적으로 판독 가능한 매체의 제조방법 KR910014891A (ko)

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US46693590A 1990-01-18 1990-01-18
US466935 1990-01-18

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KR910014891A true KR910014891A (ko) 1991-08-31

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Country Link
EP (1) EP0439050B1 (ko)
JP (1) JPH04212192A (ko)
KR (1) KR910014891A (ko)
CN (1) CN1054840A (ko)
CA (1) CA2034542A1 (ko)
DE (1) DE69118413T2 (ko)

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KR101119726B1 (ko) * 2009-11-12 2012-03-22 이충희 입체 또는 홀로그램 인쇄방법

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EP0817713B1 (de) * 1995-03-31 2000-03-22 Forschungszentrum Karlsruhe GmbH Verfahren und vorrichtung zur herstellung von zweischichtigen, lichtleitenden mikrostrukturen durch abformtechnik
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JP2002530231A (ja) * 1998-11-19 2002-09-17 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ラッカー塗装された基材表面を装飾的にデザインする方法
WO2000030854A1 (en) * 1998-11-19 2000-06-02 Nilpeter A/S Method and device for rotational moulding of surface relief structures
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JP4533542B2 (ja) * 2001-02-07 2010-09-01 出光興産株式会社 マイクロエンボスシートの製造方法
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US20080047930A1 (en) * 2006-08-23 2008-02-28 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate
US7875313B2 (en) * 2007-04-05 2011-01-25 E. I. Du Pont De Nemours And Company Method to form a pattern of functional material on a substrate using a mask material
EP3495886A1 (de) * 2017-12-06 2019-06-12 Covestro Deutschland AG Klebstofffreier photopolymerschichtaufbau
JP7288247B2 (ja) * 2018-12-07 2023-06-07 日産化学株式会社 インプリント用レプリカモールド及びその作製方法

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CA2034542A1 (en) 1991-07-19
EP0439050B1 (en) 1996-04-03
EP0439050A3 (en) 1992-11-25
CN1054840A (zh) 1991-09-25
JPH04212192A (ja) 1992-08-03
DE69118413T2 (de) 1996-08-08
EP0439050A2 (en) 1991-07-31
DE69118413D1 (de) 1996-05-09

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