KR910009608A - 성층방법 및 이 방법에 의하여 성층된 공작물 - Google Patents
성층방법 및 이 방법에 의하여 성층된 공작물Info
- Publication number
- KR910009608A KR910009608A KR1019890018805A KR900018805A KR910009608A KR 910009608 A KR910009608 A KR 910009608A KR 1019890018805 A KR1019890018805 A KR 1019890018805A KR 900018805 A KR900018805 A KR 900018805A KR 910009608 A KR910009608 A KR 910009608A
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- oxide
- nitride
- workpiece
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
- C23C14/3478—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Materials For Medical Uses (AREA)
- Dry Shavers And Clippers (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH4192/89-2 | 1989-11-22 | ||
| CH4192/89A CH680369A5 (enExample) | 1989-11-22 | 1989-11-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR910009608A true KR910009608A (ko) | 1991-06-28 |
Family
ID=4271503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019890018805A Withdrawn KR910009608A (ko) | 1989-11-22 | 1990-11-20 | 성층방법 및 이 방법에 의하여 성층된 공작물 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5192578A (enExample) |
| EP (1) | EP0432090B1 (enExample) |
| JP (1) | JP3294263B2 (enExample) |
| KR (1) | KR910009608A (enExample) |
| AT (1) | ATE117380T1 (enExample) |
| CH (1) | CH680369A5 (enExample) |
| DE (1) | DE59008302D1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5503725A (en) * | 1991-04-29 | 1996-04-02 | Novatech | Method and device for treatment of products in gas-discharge plasma |
| DE4127317C2 (de) * | 1991-08-17 | 1999-09-02 | Leybold Ag | Einrichtung zum Behandeln von Substraten |
| CA2078245A1 (en) * | 1991-09-23 | 1993-03-24 | Roland Dubach | Machining tools |
| CH689767A5 (de) * | 1992-03-24 | 1999-10-15 | Balzers Hochvakuum | Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage. |
| CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
| FR2693789B1 (fr) * | 1992-07-17 | 1994-10-07 | Trouvay & Cauvin Ets | Générateur de vapeur à cloisons poreuses. |
| DE4396720C1 (de) * | 1992-12-23 | 2003-07-17 | Unaxis Balzers Ag | Verfahren und Anlage zur Schichtabscheidung und Verwendung der Anlage |
| US5690796A (en) * | 1992-12-23 | 1997-11-25 | Balzers Aktiengesellschaft | Method and apparatus for layer depositions |
| WO1996031899A1 (en) * | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
| EP1186681B1 (de) * | 2000-09-05 | 2010-03-31 | Oerlikon Trading AG, Trübbach | Vakuumanlage mit koppelbarem Werkstückträger |
| US6858333B2 (en) * | 2002-10-09 | 2005-02-22 | Kennametal Inc. | Tool with wear resistant low friction coating and method of making the same |
| US7226670B2 (en) | 2003-04-28 | 2007-06-05 | Oc Oerlikon Balzers Ag | Work piece with a hard film of AlCr-containing material, and process for its production |
| EP1627094B1 (de) * | 2003-04-28 | 2018-10-24 | Oerlikon Surface Solutions AG, Pfäffikon | Werkstück mit alcr-haltiger hartstoffschicht |
| US20050205415A1 (en) * | 2004-03-19 | 2005-09-22 | Belousov Igor V | Multi-component deposition |
| US8080323B2 (en) | 2007-06-28 | 2011-12-20 | Kennametal Inc. | Cutting insert with a wear-resistant coating scheme exhibiting wear indication and method of making the same |
| US20090004449A1 (en) * | 2007-06-28 | 2009-01-01 | Zhigang Ban | Cutting insert with a wear-resistant coating scheme exhibiting wear indication and method of making the same |
| US8652589B2 (en) | 2008-01-25 | 2014-02-18 | Oerlikon Trading Ag, Truebbach | Permeation barrier layer |
| CN108203810B (zh) * | 2017-12-20 | 2020-05-26 | 中国科学院兰州化学物理研究所 | 类富勒烯碳/类石墨烯氮化硼多层超滑薄膜的制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH631743A5 (de) * | 1977-06-01 | 1982-08-31 | Balzers Hochvakuum | Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage. |
| FR2483848A1 (fr) * | 1980-06-06 | 1981-12-11 | Stephanois Rech Mec | Procede pour la fabrication d'une couche composite resistant a la fois au grippage, a l'abrasion, a la corrosion et a la fatigue par contraintes alternees, et couche composite ainsi obtenue |
| US4596719A (en) * | 1981-02-24 | 1986-06-24 | Wedtech Corp. | Multilayer coating method and apparatus |
| US4428808A (en) * | 1981-04-01 | 1984-01-31 | Westinghouse Electric Corp. | Method for obtaining oriented gold and piezoelectric films |
| US4540596A (en) * | 1983-05-06 | 1985-09-10 | Smith International, Inc. | Method of producing thin, hard coating |
| US4673477A (en) * | 1984-03-02 | 1987-06-16 | Regents Of The University Of Minnesota | Controlled vacuum arc material deposition, method and apparatus |
| SE453474B (sv) * | 1984-06-27 | 1988-02-08 | Santrade Ltd | Kompoundkropp belagd med skikt av polykristallin diamant |
| DE3428951A1 (de) * | 1984-08-06 | 1986-02-13 | Leybold-Heraeus GmbH, 5000 Köln | Mit einer deckschicht aus gold oder einem goldhaltigen material ueberzogener dekorativer gebrauchsgegenstand und verfahren zu seiner herstellung |
| CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
| JPS6221778A (ja) * | 1985-07-17 | 1987-01-30 | 東芝タンガロイ株式会社 | 立方晶窒化ホウ素被覆体及びその製造方法 |
| AT388394B (de) * | 1987-01-09 | 1989-06-12 | Vni Instrument Inst | Verfahren zur herstellung von schneidwerkzeug |
| DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
| US4842710A (en) * | 1987-03-23 | 1989-06-27 | Siemens Aktiengesellschaft | Method of making mixed nitride films with at least two metals |
| CA1332324C (en) * | 1987-03-30 | 1994-10-11 | Jun Shioya | Method for producing thin film of oxide superconductor |
| EP0385283B1 (de) * | 1989-03-03 | 1993-12-08 | Balzers Aktiengesellschaft | Verfahren zur Beschichtung von Hartmetallgrundkörpern und Hartmetallwerkzeug hergestellt nach dem Verfahren |
| DE58909591D1 (de) * | 1989-08-21 | 1996-03-14 | Balzers Hochvakuum | Beschichtetes Werkstück mit einer Mischkristallbeschichtung, Verfahren zu dessen Herstellung, sowie Vorrichtung zur Durchführung des Verfahrens |
-
1989
- 1989-11-22 CH CH4192/89A patent/CH680369A5/de not_active IP Right Cessation
-
1990
- 1990-11-09 EP EP90810864A patent/EP0432090B1/de not_active Expired - Lifetime
- 1990-11-09 AT AT90810864T patent/ATE117380T1/de active
- 1990-11-09 DE DE59008302T patent/DE59008302D1/de not_active Expired - Lifetime
- 1990-11-14 US US07/613,390 patent/US5192578A/en not_active Expired - Lifetime
- 1990-11-20 KR KR1019890018805A patent/KR910009608A/ko not_active Withdrawn
- 1990-11-22 JP JP31566890A patent/JP3294263B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0432090A2 (de) | 1991-06-12 |
| JP3294263B2 (ja) | 2002-06-24 |
| EP0432090A3 (en) | 1992-01-02 |
| ATE117380T1 (de) | 1995-02-15 |
| DE59008302D1 (de) | 1995-03-02 |
| CH680369A5 (enExample) | 1992-08-14 |
| JPH03207854A (ja) | 1991-09-11 |
| EP0432090B1 (de) | 1995-01-18 |
| US5192578A (en) | 1993-03-09 |
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