KR910009167B1 - 알루미늄 전해 커패시터용 고전압 박지의 에칭 공정 - Google Patents

알루미늄 전해 커패시터용 고전압 박지의 에칭 공정 Download PDF

Info

Publication number
KR910009167B1
KR910009167B1 KR1019840008066A KR840008066A KR910009167B1 KR 910009167 B1 KR910009167 B1 KR 910009167B1 KR 1019840008066 A KR1019840008066 A KR 1019840008066A KR 840008066 A KR840008066 A KR 840008066A KR 910009167 B1 KR910009167 B1 KR 910009167B1
Authority
KR
South Korea
Prior art keywords
aluminum
foil
etching
high voltage
tunnel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019840008066A
Other languages
English (en)
Korean (ko)
Other versions
KR850005016A (ko
Inventor
라즈 아로라 멀크
Original Assignee
노스 아메리칸 필립스 코포레이션
토마스 에이. 브라이어디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 노스 아메리칸 필립스 코포레이션, 토마스 에이. 브라이어디 filed Critical 노스 아메리칸 필립스 코포레이션
Publication of KR850005016A publication Critical patent/KR850005016A/ko
Application granted granted Critical
Publication of KR910009167B1 publication Critical patent/KR910009167B1/ko
Expired legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/055—Etched foil electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
KR1019840008066A 1983-12-20 1984-12-18 알루미늄 전해 커패시터용 고전압 박지의 에칭 공정 Expired KR910009167B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US563345 1983-12-20
US563,345 1983-12-20
US06/563,345 US4474657A (en) 1983-12-20 1983-12-20 Single step electro chemical etch process for high volt aluminum anode foil

Publications (2)

Publication Number Publication Date
KR850005016A KR850005016A (ko) 1985-08-19
KR910009167B1 true KR910009167B1 (ko) 1991-10-31

Family

ID=24250139

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840008066A Expired KR910009167B1 (ko) 1983-12-20 1984-12-18 알루미늄 전해 커패시터용 고전압 박지의 에칭 공정

Country Status (5)

Country Link
US (1) US4474657A (enExample)
EP (1) EP0147896B1 (enExample)
JP (1) JPS6123798A (enExample)
KR (1) KR910009167B1 (enExample)
DE (1) DE3469572D1 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4525249A (en) * 1984-07-16 1985-06-25 North American Philips Corporation Two step electro chemical and chemical etch process for high volt aluminum anode foil
US4518471A (en) * 1984-08-29 1985-05-21 North American Philips Corporation Two step electrochemical etch process for high volt aluminum anode foil
JP2787801B2 (ja) * 1994-03-10 1998-08-20 日本蓄電器工業株式会社 電解コンデンサ用アルミニウム電極箔のエッチング方法
FR2755111B1 (fr) * 1996-10-28 1998-12-31 Ceric Dispositif pour le transport de produits ceramiques
US6168706B1 (en) 1998-12-11 2001-01-02 Pacesetter, Inc. Process for producing high etch gains for electrolytic capacitor manufacturing
US6238810B1 (en) 1999-04-07 2001-05-29 Pacesetter, Inc. Process for using surface active agents to produce high etch gains for electrolytic capacitor manufacturing
US6224738B1 (en) 1999-11-09 2001-05-01 Pacesetter, Inc. Method for a patterned etch with electrolytically grown mask
US6325551B1 (en) 1999-12-08 2001-12-04 New Focus, Inc. Method and apparatus for optically aligning optical fibers with optical devices
US6736956B1 (en) 2001-05-07 2004-05-18 Pacesetter, Inc. Non-uniform etching of anode foil to produce higher capacitance gain without sacrificing foil strength
US6858126B1 (en) 2002-11-06 2005-02-22 Pacesetter, Inc. High capacitance anode and system and method for making same
US7452473B1 (en) 2003-10-06 2008-11-18 Pacesetter, Inc. Laser marking of raw aluminum anode foil to induce uniform patterning etching
US7150767B1 (en) 2003-11-03 2006-12-19 Pacesetter, Inc. Method for producing an electrode for a capacitor from foil
US7578924B1 (en) 2004-07-29 2009-08-25 Pacesetter, Inc. Process for producing high etch gains for electrolytic capacitor manufacturing
US7445646B1 (en) 2004-08-06 2008-11-04 Pacesetter, Inc. Method of producing an anode for an electrolytic capacitor
US8535507B1 (en) 2008-01-11 2013-09-17 Pacesetter, Inc. Electrochemical drilling system and process for improving electrical porosity of etched anode foil
US8206600B2 (en) * 2008-09-15 2012-06-26 Pacesetter, Inc. Nanoimprinting of an optic to control the etch pattern on electrolytic capacitor foil
US9090986B1 (en) 2014-01-30 2015-07-28 Pacesetter, Inc. Method for making electrode foils having reduced particle detachment and reduced leakage current
CN104630871B (zh) * 2015-01-13 2017-08-18 肇庆华锋电子铝箔股份有限公司 一种低压硬质高比容铝电极箔的腐蚀工艺方法
US10072349B2 (en) 2016-01-05 2018-09-11 Pacesetter, Inc. Etch solutions having bis(perfluoroalkylsulfonyl)imides, and use thereof to form anode foils with increased capacitance
US9978529B2 (en) 2016-01-11 2018-05-22 Pacesetter, Inc. Oxide on edges of metal anode foils
US10090112B2 (en) 2016-01-15 2018-10-02 Pacesetter, Inc. Use of etch resist masked anode frame for facilitation of laser cutting, particle and leakage current reduction
US9969030B2 (en) 2016-05-12 2018-05-15 Pacesetter, Inc. Laser drilling of metal foils for assembly in an electrolytic capacitor
US9852849B2 (en) 2016-05-27 2017-12-26 Pacesetter, Inc. Using etch resist patterns and formation for facilitation of laser cutting, particle and leakage current reduction
US9976226B2 (en) 2016-07-28 2018-05-22 Pacesetter, Inc. Method of stressing oxides
US10240249B2 (en) 2016-12-02 2019-03-26 Pacesetter, Inc. Use of nonafluorobutanesulfonic acid in a low pH etch solution to increase aluminum foil capacitance
US10422050B2 (en) 2016-12-02 2019-09-24 Pacesetter, Inc. Process for using persulfate in a low pH etch solution to increase aluminum foil capacitance
US10309033B2 (en) 2016-12-02 2019-06-04 Pacesetter, Inc. Process additives to reduce etch resist undercutting in the manufacture of anode foils
US10894157B2 (en) 2017-04-04 2021-01-19 Pacesetter, Inc. Laser marking of raw anode foil to induce uniform pattering and etching with oxide passivation mask
CN110729130B (zh) * 2019-09-11 2021-04-06 南通南辉电子材料股份有限公司 一种适用于小片宽电极箔生产的化成方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2209712A (en) * 1937-05-06 1940-07-30 Joseph B Brennan Method of treating aluminum
GB966627A (en) * 1962-04-09 1964-08-12 British Dielectric Res Ltd Improvements in or relating to the electrolytic etching of anodisable metal foil
CH578781A5 (enExample) * 1973-07-09 1976-08-13 Alusuisse
JPS5125439A (enExample) * 1974-08-28 1976-03-02 Fujitsu Ltd
JPS5264659A (en) * 1975-11-21 1977-05-28 Nippon Chikudenki Kougiyou Kk Method of etching aluminum foil for electrolytic capacitor
JPS5479462A (en) * 1977-12-06 1979-06-25 Showa Aluminium Co Ltd Aluminium alloy foil for electrolyte capacitor anode
DE2801218C3 (de) * 1978-01-12 1980-11-20 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum elektrolytischen Ätzen einer rekristallisierten Aluminiumfolie und deren Verwendung
US4201836A (en) * 1978-08-28 1980-05-06 Polychrome Corporation Aluminum substrates grained with a saturated solution of aluminum salts of mineral acids
US4315806A (en) * 1980-09-19 1982-02-16 Sprague Electric Company Intermittent AC etching of aluminum foil
JPS5766618A (en) * 1980-10-13 1982-04-22 Showa Aluminium Co Ltd Aluminum alloy foil for electrolytic condenser electrode
JPS5766617A (en) * 1980-10-13 1982-04-22 Showa Aluminium Co Ltd Aluminum alloy foil for electrolytic condenser electrode
JPS5766616A (en) * 1980-10-13 1982-04-22 Showa Aluminium Co Ltd Method of producing alumihum foil for electrolytic condenser electrode
US4332652A (en) * 1980-11-28 1982-06-01 Sprague Electric Company AC Etching of aluminum capacitor foil
JPS6059982B2 (ja) * 1980-12-09 1985-12-27 昭和アルミニウム株式会社 電解コンデンサ電極用アルミニウム箔の製造方法
US4332651A (en) * 1981-05-20 1982-06-01 Sprague Electric Company AC Etching of aluminum capacitor foil
US4336113A (en) * 1981-06-26 1982-06-22 American Hoechst Corporation Electrolytic graining of aluminum with hydrogen peroxide and nitric or hydrochloric acid
JPS5757856A (en) * 1981-07-24 1982-04-07 Showa Alum Corp Aluminum alloy foil for electrolytic capacitor
US4376686A (en) * 1981-11-16 1983-03-15 Sprague Electric Company AC Etching of aluminum capacitor foil

Also Published As

Publication number Publication date
KR850005016A (ko) 1985-08-19
DE3469572D1 (en) 1988-04-07
EP0147896B1 (en) 1988-03-02
JPH0551680B2 (enExample) 1993-08-03
JPS6123798A (ja) 1986-02-01
US4474657A (en) 1984-10-02
EP0147896A1 (en) 1985-07-10

Similar Documents

Publication Publication Date Title
KR910009167B1 (ko) 알루미늄 전해 커패시터용 고전압 박지의 에칭 공정
KR920004509B1 (ko) 고전압 캐패시터용 알루미늄 양극 박막 및 그 에칭 공정
US4518471A (en) Two step electrochemical etch process for high volt aluminum anode foil
US5503718A (en) Method of etching aluminum foil for electrolytic capacitors
US4676879A (en) Method for the production of an aluminum foil for electrolytic _capacitors, and electrolytic capacitors thus produced
US4484252A (en) Pulsed in etching of aluminum foil for use in electrolytic capacitors
US2755237A (en) Electrolytically etched condenser electrode
JP2004186696A (ja) 電解コンデンサ用電極およびその製造方法
JP2758040B2 (ja) 電解コンデンサ用電極のエッチング方法
JPH08264391A (ja) 電解コンデンサ用アルミニウム箔のエッチング方法
US4381231A (en) DC Etching of aluminum electrolytic capacitor foil
US4332651A (en) AC Etching of aluminum capacitor foil
SU361219A1 (ru) Йпесоюзная
US4376686A (en) AC Etching of aluminum capacitor foil
JPH10172869A (ja) 電解コンデンサ用アルミ電極箔およびその製造方法
JPH07272983A (ja) アルミ電解コンデンサ用電極箔およびその製造方法
JP3496465B2 (ja) アルミ電解コンデンサ用電極箔の製造方法
JPH08241832A (ja) アルミ電解コンデンサ用電極箔の製造方法
SU876802A1 (ru) Электролит дл анодировани алюмини
JPH09246108A (ja) アルミ電解コンデンサ用電極箔の製造方法
KR920010628B1 (ko) 알루미늄 전해 콘덴서용 화성박 유전체 피막의 결정화 방법
JPS63299309A (ja) アルミニウム電解コンデンサ用電極箔の製造方法
KR930003433B1 (ko) 전해 콘덴서용 알루미늄박의 에칭액 및 이를 사용하는 에칭방법
JP3722466B2 (ja) 電解コンデンサ用アルミニウム箔
JPH0266925A (ja) アルミニウム電解コンデンサ用電極箔のエッチング方法

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

St.27 status event code: A-2-2-Q10-Q13-nap-PG1605

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 19950928

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 19961101

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 19961101