KR910008791A - 위상시프터를 갖는 마스크와 그 제조방법 및 그 마스크를 사용한 패턴형성방법 - Google Patents

위상시프터를 갖는 마스크와 그 제조방법 및 그 마스크를 사용한 패턴형성방법

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Publication number
KR910008791A
KR910008791A KR1019900015243A KR900015243A KR910008791A KR 910008791 A KR910008791 A KR 910008791A KR 1019900015243 A KR1019900015243 A KR 1019900015243A KR 900015243 A KR900015243 A KR 900015243A KR 910008791 A KR910008791 A KR 910008791A
Authority
KR
South Korea
Prior art keywords
mask
manufacturing
phase shifter
pattern forming
forming method
Prior art date
Application number
KR1019900015243A
Other languages
English (en)
Other versions
KR0184277B1 (ko
Inventor
아끼라 이마이
노리오 하세가와
히로시 후꾸다
도시히꼬 다나까
Original Assignee
가부시끼가이샤 히다찌세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 히다찌세이사꾸쇼 filed Critical 가부시끼가이샤 히다찌세이사꾸쇼
Publication of KR910008791A publication Critical patent/KR910008791A/ko
Application granted granted Critical
Publication of KR0184277B1 publication Critical patent/KR0184277B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019900015243A 1989-10-09 1990-09-26 위상시프터를 갖는 마스크와 그 제조방법 및 그 마스크를 사용한 패턴형성방법 KR0184277B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1262157A JPH03125150A (ja) 1989-10-09 1989-10-09 マスク及びマスク作製方法
JP1-262157 1989-10-09

Publications (2)

Publication Number Publication Date
KR910008791A true KR910008791A (ko) 1991-05-31
KR0184277B1 KR0184277B1 (ko) 1999-04-15

Family

ID=17371856

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900015243A KR0184277B1 (ko) 1989-10-09 1990-09-26 위상시프터를 갖는 마스크와 그 제조방법 및 그 마스크를 사용한 패턴형성방법

Country Status (2)

Country Link
JP (1) JPH03125150A (ko)
KR (1) KR0184277B1 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69028871T2 (de) * 1989-04-28 1997-02-27 Fujitsu Ltd Maske, Herstellungsverfahren und Musterherstellung mit einer solchen Maske
JP2798796B2 (ja) * 1990-07-18 1998-09-17 沖電気工業株式会社 パターン形成方法
JP2674400B2 (ja) * 1991-12-13 1997-11-12 富士通株式会社 パターン形成方法とホトマスク
JP2917879B2 (ja) * 1995-10-31 1999-07-12 日本電気株式会社 フォトマスク及びその製造方法
US7172838B2 (en) 2002-09-27 2007-02-06 Wilhelm Maurer Chromeless phase mask layout generation
KR100778863B1 (ko) * 2006-12-29 2007-11-22 동부일렉트로닉스 주식회사 패턴 형성 방법
JP2013041202A (ja) * 2011-08-19 2013-02-28 Dainippon Printing Co Ltd レジストマスクおよびパターン形成体の製造方法
US8563199B2 (en) * 2011-10-07 2013-10-22 Seagate Technology Llc Forming a bridging feature using chromeless phase-shift lithography

Also Published As

Publication number Publication date
KR0184277B1 (ko) 1999-04-15
JPH03125150A (ja) 1991-05-28

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