DE69020023D1 - Feinmusterherstellungsverfahren. - Google Patents

Feinmusterherstellungsverfahren.

Info

Publication number
DE69020023D1
DE69020023D1 DE69020023T DE69020023T DE69020023D1 DE 69020023 D1 DE69020023 D1 DE 69020023D1 DE 69020023 T DE69020023 T DE 69020023T DE 69020023 T DE69020023 T DE 69020023T DE 69020023 D1 DE69020023 D1 DE 69020023D1
Authority
DE
Germany
Prior art keywords
manufacturing process
fine pattern
pattern manufacturing
fine
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69020023T
Other languages
English (en)
Other versions
DE69020023T2 (de
Inventor
Kazuhiko Hashimoto
Taichi Koizumi
Kenji Kawakita
Noboru Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69020023D1 publication Critical patent/DE69020023D1/de
Publication of DE69020023T2 publication Critical patent/DE69020023T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
DE1990620023 1989-03-27 1990-03-26 Feinmusterherstellungsverfahren. Expired - Fee Related DE69020023T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7531989A JPH02251962A (ja) 1989-03-27 1989-03-27 微細パターン形成材料およびパターン形成方法

Publications (2)

Publication Number Publication Date
DE69020023D1 true DE69020023D1 (de) 1995-07-20
DE69020023T2 DE69020023T2 (de) 1996-02-01

Family

ID=13572822

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1990620023 Expired - Fee Related DE69020023T2 (de) 1989-03-27 1990-03-26 Feinmusterherstellungsverfahren.

Country Status (3)

Country Link
EP (1) EP0390038B1 (de)
JP (1) JPH02251962A (de)
DE (1) DE69020023T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5066566A (en) * 1990-07-31 1991-11-19 At&T Bell Laboratories Resist materials
JP2751779B2 (ja) * 1992-08-28 1998-05-18 日本電気株式会社 光分解性高分子化合物およびフォトレジスト組成物
RU2153986C2 (ru) 1996-04-23 2000-08-10 Хорселл Грэфик Индастриз Лимитед Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
KR100407601B1 (ko) * 2000-06-15 2003-12-01 주식회사 미뉴타텍 열처리 및 모세관 현상을 이용한 열경화성 고분자박막상의 미세 패턴 형성 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5590954A (en) * 1978-12-29 1980-07-10 Toray Ind Inc Photoconductor
JPS55156940A (en) * 1979-05-25 1980-12-06 Agency Of Ind Science & Technol Macromolecular composition sensitive to light and radiation
JPS55164825A (en) * 1979-06-08 1980-12-22 Agency Of Ind Science & Technol Polymer positive image forming method
JPS6059353A (ja) * 1983-09-13 1985-04-05 Toshiba Corp 電子写真感光体
JPS63250188A (ja) * 1987-04-07 1988-10-18 三菱樹脂株式会社 プリント配線板用絶縁基材
JPH01245251A (ja) * 1988-03-28 1989-09-29 Canon Inc パターン形成用材料
JP2641246B2 (ja) * 1988-04-27 1997-08-13 キヤノン株式会社 パターン形成用材料およびパターン形成方法

Also Published As

Publication number Publication date
DE69020023T2 (de) 1996-02-01
JPH02251962A (ja) 1990-10-09
EP0390038B1 (de) 1995-06-14
EP0390038A2 (de) 1990-10-03
EP0390038A3 (de) 1991-11-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee