KR900007717B1 - 도금전류 자동전환 제어장치 - Google Patents

도금전류 자동전환 제어장치 Download PDF

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Publication number
KR900007717B1
KR900007717B1 KR1019840007989A KR840007989A KR900007717B1 KR 900007717 B1 KR900007717 B1 KR 900007717B1 KR 1019840007989 A KR1019840007989 A KR 1019840007989A KR 840007989 A KR840007989 A KR 840007989A KR 900007717 B1 KR900007717 B1 KR 900007717B1
Authority
KR
South Korea
Prior art keywords
plating
current
circuit
plating current
line speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019840007989A
Other languages
English (en)
Korean (ko)
Other versions
KR850004814A (ko
Inventor
가쓰미 나가노
미찌오 사또오
히로오 고시
하루오 고오모도
시게하루 하마다
야스오 시이노기
Original Assignee
미쯔비시 덴끼 가부시기가이샤
가다야마 니하찌로오
신닛뽄세이데쓰 가부시기가이샤
다께다 유다까
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔비시 덴끼 가부시기가이샤, 가다야마 니하찌로오, 신닛뽄세이데쓰 가부시기가이샤, 다께다 유다까 filed Critical 미쯔비시 덴끼 가부시기가이샤
Publication of KR850004814A publication Critical patent/KR850004814A/ko
Application granted granted Critical
Publication of KR900007717B1 publication Critical patent/KR900007717B1/ko
Expired legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1019840007989A 1983-12-16 1984-12-15 도금전류 자동전환 제어장치 Expired KR900007717B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP58-237714 1983-12-16
JP??83-237714 1983-12-16
JP58237714A JPS60128298A (ja) 1983-12-16 1983-12-16 メツキ電流自動切換制御装置

Publications (2)

Publication Number Publication Date
KR850004814A KR850004814A (ko) 1985-07-27
KR900007717B1 true KR900007717B1 (ko) 1990-10-19

Family

ID=17019407

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840007989A Expired KR900007717B1 (ko) 1983-12-16 1984-12-15 도금전류 자동전환 제어장치

Country Status (4)

Country Link
US (1) US4765878A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS60128298A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR900007717B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3445850A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2704241B1 (fr) * 1993-04-22 1995-06-30 Lorraine Laminage Procede de regulation d'electro-deposition sur une bande de metal.
US6203685B1 (en) 1999-01-20 2001-03-20 International Business Machines Corporation Apparatus and method for selective electrolytic metallization/deposition utilizing a fluid head
US6516233B1 (en) * 2000-06-15 2003-02-04 Lambda Emi, Inc. Pulse plating rectifiers and methods, systems and computer program products for controlling pulse plating rectifiers in master/slave mode
DE20104072U1 (de) * 2001-03-08 2001-06-07 Siemens AG, 80333 München Galvanikanlage
CA2700052A1 (en) * 2007-09-20 2009-04-02 Siemens Aktiengesellschaft Power control device of a power supply system of an electrochemical coating facility
US20100306097A1 (en) * 2007-09-21 2010-12-02 Siemens Aktiengesellschaft Decentralized energy system and method for distributing energy in a decentralized energy system
CN104988573B (zh) * 2015-05-27 2017-08-08 广州杰赛科技股份有限公司 一种电路板的电镀方法及装置
US10358738B2 (en) * 2016-09-19 2019-07-23 Lam Research Corporation Gap fill process stability monitoring of an electroplating process using a potential-controlled exit step
US10345834B2 (en) * 2017-08-09 2019-07-09 Qualcomm Incorporated Sensing total current of distributed load circuits independent of current distribution using distributed voltage averaging

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2744230A (en) * 1952-07-28 1956-05-01 Clark Controller Co Automatic current regulating apparatus
NL111250C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1959-09-04
JPS4853181A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1971-11-04 1973-07-26
DE2831949A1 (de) * 1978-07-18 1980-02-07 Schering Ag Regeleinrichtung fuer galvanogleichrichter mit informationsspeicherung und -verarbeitung
US4240881A (en) * 1979-02-02 1980-12-23 Republic Steel Corporation Electroplating current control
GB2085922B (en) * 1980-10-15 1984-01-25 Metal Box Co Ltd Electrocoating apparatus
JPS58140820A (ja) * 1982-02-16 1983-08-20 Nippon Steel Corp メツキ電流自動切換制御装置

Also Published As

Publication number Publication date
DE3445850A1 (de) 1985-06-27
DE3445850C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-08-14
US4765878A (en) 1988-08-23
JPS60128298A (ja) 1985-07-09
KR850004814A (ko) 1985-07-27

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