KR900007493A - 증기청소 및 건조방법과 장치 - Google Patents

증기청소 및 건조방법과 장치

Info

Publication number
KR900007493A
KR900007493A KR1019890016488A KR890016488A KR900007493A KR 900007493 A KR900007493 A KR 900007493A KR 1019890016488 A KR1019890016488 A KR 1019890016488A KR 890016488 A KR890016488 A KR 890016488A KR 900007493 A KR900007493 A KR 900007493A
Authority
KR
South Korea
Prior art keywords
drying method
steam cleaning
steam
cleaning
drying
Prior art date
Application number
KR1019890016488A
Other languages
English (en)
Other versions
KR930007614B1 (ko
Inventor
유우조오 시부야
료오조오 나까무라
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR900007493A publication Critical patent/KR900007493A/ko
Application granted granted Critical
Publication of KR930007614B1 publication Critical patent/KR930007614B1/ko

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
KR1019890016488A 1988-11-15 1989-11-14 증기청소 및 건조방법과 장치 KR930007614B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63286748A JP2544971B2 (ja) 1988-11-15 1988-11-15 蒸気洗浄乾燥装置
JP63-286748 1988-11-15

Publications (2)

Publication Number Publication Date
KR900007493A true KR900007493A (ko) 1990-06-01
KR930007614B1 KR930007614B1 (ko) 1993-08-14

Family

ID=17708524

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890016488A KR930007614B1 (ko) 1988-11-15 1989-11-14 증기청소 및 건조방법과 장치

Country Status (6)

Country Link
JP (1) JP2544971B2 (ko)
KR (1) KR930007614B1 (ko)
DE (1) DE3937864C2 (ko)
FR (1) FR2638984B1 (ko)
GB (1) GB2224639B (ko)
NL (1) NL8902810A (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142873A (en) * 1990-02-15 1992-09-01 E. I. Du Pont De Nemours And Company Vapor control system for vapor degreasing/defluxing equipment
US5470154A (en) * 1991-04-18 1995-11-28 Osaka Sanso Kogyo Ltd. Method of cleaning the reflector mirror in an optical dew point meter and an optical dew point meter equipped with a cleaning device
US5351419A (en) * 1992-07-27 1994-10-04 Motorola, Inc. Method for vapor drying
JP3151613B2 (ja) * 1997-06-17 2001-04-03 東京エレクトロン株式会社 洗浄・乾燥処理方法及びその装置
DE102011121019A1 (de) * 2011-12-13 2013-06-13 Thermo Electron Led Gmbh Reinigungsverfahren für den Nutzraum eines Brutschranks
KR101395716B1 (ko) * 2012-09-26 2014-05-16 주식회사 코디엠 유리기판 건조장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB988038A (en) * 1962-05-14 1965-03-31 Du Pont Method and apparatus for cleaning metals and other materials with boiling solvents
DE6610651U (de) * 1967-04-24 1975-04-30 Walter Becker Dampfreinigungsgeraet.
NL7010229A (ko) * 1970-07-22 1972-01-12
US4569695A (en) * 1983-04-21 1986-02-11 Nec Corporation Method of cleaning a photo-mask
DE3509122C3 (de) * 1985-03-14 1995-03-23 Gerald Dipl Ing Harms Verfahren zur Reinigung von Gegenständen mit Hilfe von Lösungsmitteln sowie Vorrichtung hierzu
US4777804A (en) * 1987-08-26 1988-10-18 Texas Instruments Incorporated Method and apparatus for easing surface particle removal by size increase

Also Published As

Publication number Publication date
JPH02133925A (ja) 1990-05-23
GB2224639A (en) 1990-05-16
GB2224639B (en) 1993-03-24
DE3937864A1 (de) 1990-06-21
KR930007614B1 (ko) 1993-08-14
FR2638984B1 (fr) 1996-08-09
GB8925091D0 (en) 1989-12-28
DE3937864C2 (de) 1994-11-24
FR2638984A1 (fr) 1990-05-18
NL8902810A (nl) 1990-06-01
JP2544971B2 (ja) 1996-10-16

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