GB8925091D0 - Vapor cleaning and drying method and apparatus - Google Patents

Vapor cleaning and drying method and apparatus

Info

Publication number
GB8925091D0
GB8925091D0 GB898925091A GB8925091A GB8925091D0 GB 8925091 D0 GB8925091 D0 GB 8925091D0 GB 898925091 A GB898925091 A GB 898925091A GB 8925091 A GB8925091 A GB 8925091A GB 8925091 D0 GB8925091 D0 GB 8925091D0
Authority
GB
United Kingdom
Prior art keywords
drying method
vapor cleaning
vapor
cleaning
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB898925091A
Other versions
GB2224639A (en
GB2224639B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB8925091D0 publication Critical patent/GB8925091D0/en
Publication of GB2224639A publication Critical patent/GB2224639A/en
Application granted granted Critical
Publication of GB2224639B publication Critical patent/GB2224639B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
GB8925091A 1988-11-15 1989-11-07 Vapor cleaning and drying method and apparatus Expired - Fee Related GB2224639B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63286748A JP2544971B2 (en) 1988-11-15 1988-11-15 Steam cleaning and drying equipment

Publications (3)

Publication Number Publication Date
GB8925091D0 true GB8925091D0 (en) 1989-12-28
GB2224639A GB2224639A (en) 1990-05-16
GB2224639B GB2224639B (en) 1993-03-24

Family

ID=17708524

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8925091A Expired - Fee Related GB2224639B (en) 1988-11-15 1989-11-07 Vapor cleaning and drying method and apparatus

Country Status (6)

Country Link
JP (1) JP2544971B2 (en)
KR (1) KR930007614B1 (en)
DE (1) DE3937864C2 (en)
FR (1) FR2638984B1 (en)
GB (1) GB2224639B (en)
NL (1) NL8902810A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142873A (en) * 1990-02-15 1992-09-01 E. I. Du Pont De Nemours And Company Vapor control system for vapor degreasing/defluxing equipment
US5470154A (en) * 1991-04-18 1995-11-28 Osaka Sanso Kogyo Ltd. Method of cleaning the reflector mirror in an optical dew point meter and an optical dew point meter equipped with a cleaning device
US5351419A (en) * 1992-07-27 1994-10-04 Motorola, Inc. Method for vapor drying
JP3151613B2 (en) * 1997-06-17 2001-04-03 東京エレクトロン株式会社 Cleaning / drying method and apparatus
DE102011121019A1 (en) * 2011-12-13 2013-06-13 Thermo Electron Led Gmbh Cleaning procedure for the working space of a incubator
KR101395716B1 (en) * 2012-09-26 2014-05-16 주식회사 코디엠 Glass substrate drying apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB988038A (en) * 1962-05-14 1965-03-31 Du Pont Method and apparatus for cleaning metals and other materials with boiling solvents
DE6610651U (en) * 1967-04-24 1975-04-30 Walter Becker STEAM CLEANER.
NL7010229A (en) * 1970-07-22 1972-01-12
US4569695A (en) * 1983-04-21 1986-02-11 Nec Corporation Method of cleaning a photo-mask
DE3509122C3 (en) * 1985-03-14 1995-03-23 Gerald Dipl Ing Harms Process for cleaning objects with the aid of solvents and device therefor
US4777804A (en) * 1987-08-26 1988-10-18 Texas Instruments Incorporated Method and apparatus for easing surface particle removal by size increase

Also Published As

Publication number Publication date
DE3937864A1 (en) 1990-06-21
JPH02133925A (en) 1990-05-23
KR930007614B1 (en) 1993-08-14
GB2224639A (en) 1990-05-16
KR900007493A (en) 1990-06-01
DE3937864C2 (en) 1994-11-24
GB2224639B (en) 1993-03-24
JP2544971B2 (en) 1996-10-16
FR2638984B1 (en) 1996-08-09
NL8902810A (en) 1990-06-01
FR2638984A1 (en) 1990-05-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20081107