FR2638984B1 - Appareil et procede de nettoyage par vapeur et sechage - Google Patents

Appareil et procede de nettoyage par vapeur et sechage

Info

Publication number
FR2638984B1
FR2638984B1 FR8914930A FR8914930A FR2638984B1 FR 2638984 B1 FR2638984 B1 FR 2638984B1 FR 8914930 A FR8914930 A FR 8914930A FR 8914930 A FR8914930 A FR 8914930A FR 2638984 B1 FR2638984 B1 FR 2638984B1
Authority
FR
France
Prior art keywords
drying
steam cleaning
steam
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8914930A
Other languages
English (en)
Other versions
FR2638984A1 (fr
Inventor
Yuzo Shibuya
Ryozo Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of FR2638984A1 publication Critical patent/FR2638984A1/fr
Application granted granted Critical
Publication of FR2638984B1 publication Critical patent/FR2638984B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
FR8914930A 1988-11-15 1989-11-14 Appareil et procede de nettoyage par vapeur et sechage Expired - Fee Related FR2638984B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63286748A JP2544971B2 (ja) 1988-11-15 1988-11-15 蒸気洗浄乾燥装置

Publications (2)

Publication Number Publication Date
FR2638984A1 FR2638984A1 (fr) 1990-05-18
FR2638984B1 true FR2638984B1 (fr) 1996-08-09

Family

ID=17708524

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8914930A Expired - Fee Related FR2638984B1 (fr) 1988-11-15 1989-11-14 Appareil et procede de nettoyage par vapeur et sechage

Country Status (6)

Country Link
JP (1) JP2544971B2 (fr)
KR (1) KR930007614B1 (fr)
DE (1) DE3937864C2 (fr)
FR (1) FR2638984B1 (fr)
GB (1) GB2224639B (fr)
NL (1) NL8902810A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142873A (en) * 1990-02-15 1992-09-01 E. I. Du Pont De Nemours And Company Vapor control system for vapor degreasing/defluxing equipment
US5470154A (en) * 1991-04-18 1995-11-28 Osaka Sanso Kogyo Ltd. Method of cleaning the reflector mirror in an optical dew point meter and an optical dew point meter equipped with a cleaning device
US5351419A (en) * 1992-07-27 1994-10-04 Motorola, Inc. Method for vapor drying
JP3151613B2 (ja) * 1997-06-17 2001-04-03 東京エレクトロン株式会社 洗浄・乾燥処理方法及びその装置
DE102011121019A1 (de) * 2011-12-13 2013-06-13 Thermo Electron Led Gmbh Reinigungsverfahren für den Nutzraum eines Brutschranks
KR101395716B1 (ko) * 2012-09-26 2014-05-16 주식회사 코디엠 유리기판 건조장치

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB988038A (en) * 1962-05-14 1965-03-31 Du Pont Method and apparatus for cleaning metals and other materials with boiling solvents
DE6610651U (de) * 1967-04-24 1975-04-30 Walter Becker Dampfreinigungsgeraet.
NL7010229A (fr) * 1970-07-22 1972-01-12
US4569695A (en) * 1983-04-21 1986-02-11 Nec Corporation Method of cleaning a photo-mask
DE3509122C3 (de) * 1985-03-14 1995-03-23 Gerald Dipl Ing Harms Verfahren zur Reinigung von Gegenständen mit Hilfe von Lösungsmitteln sowie Vorrichtung hierzu
US4777804A (en) * 1987-08-26 1988-10-18 Texas Instruments Incorporated Method and apparatus for easing surface particle removal by size increase

Also Published As

Publication number Publication date
DE3937864A1 (de) 1990-06-21
KR930007614B1 (ko) 1993-08-14
JPH02133925A (ja) 1990-05-23
NL8902810A (nl) 1990-06-01
JP2544971B2 (ja) 1996-10-16
KR900007493A (ko) 1990-06-01
DE3937864C2 (de) 1994-11-24
GB8925091D0 (en) 1989-12-28
GB2224639B (en) 1993-03-24
FR2638984A1 (fr) 1990-05-18
GB2224639A (en) 1990-05-16

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20090731