KR900004704A - 단량체부를 함유한 할로메틸-1,3,5-트리아진 - Google Patents

단량체부를 함유한 할로메틸-1,3,5-트리아진 Download PDF

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KR900004704A
KR900004704A KR1019890012839A KR890012839A KR900004704A KR 900004704 A KR900004704 A KR 900004704A KR 1019890012839 A KR1019890012839 A KR 1019890012839A KR 890012839 A KR890012839 A KR 890012839A KR 900004704 A KR900004704 A KR 900004704A
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compound
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KR1019890012839A
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KR970005533B1 (ko
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알랜 보남 제임스
알랜 로스맨 미첼
죤 그랜트 리차드
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도날드 밀러 셀
미네소타 마이닝 앤드 매뉴팩츄어링 컴패니
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/16—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom
    • C07D251/18—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to only one ring carbon atom with nitrogen atoms directly attached to the two other ring carbon atoms, e.g. guanamines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/22—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

내용 없음

Description

단량체부를 함유한 할로메틸-1,3,5-트리아진
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (16)

  1. 트리아진 핵상에 탄소원자에 결합된 최소한 하나의 할로메틸치환체와 트리아진핵의 다른 탄소원자에 결합된 적어도 하나의 중합성 단량체부를 가지며, 그 중합성 단량체부는 유리 라디칼 또는 이온성 사슬 중합화를 할 수 있는, 1,3,5-트리아진 화합물.
  2. 제1항에 있어서, 적어도 하나의 할로메틸기가 트리할로메틸기인 화합물.
  3. 제2항에 있어서, 트리할로메틸기가 트리클로로메틸기, 트리브로모메틸기와 트리아이오도메틸기로 구성된 군으로부터 선택되는 화합물.
  4. 제1항에 있어서, 상기 단량체부가 아크릴레이트기, 메타크릴레이트기, 아크릴아미드기, 비닐 에테르기, 알릴 에테르기, 에폭시드기, 알릴 아민기로 구성된 군으로부터 선택된 화합물.
  5. 감방사성(radiation-sensitive) 조성물로, (1) 에틸렌적으로 불포화된 중합성 화합물과 (2) 제1항에 의한 화합물로 이루어지는 조성물.
  6. 하기식을 가지는 화합물.
    이 식에서, A는 모노-, 디- 및 트리할로메틸기로 구성되는 군으로부터 선택되며, Y는 A, L-M, NH2, NHR, NR2, OR 및 R'로 구성되는 군으로부터 선택되는데, R은 치환 또는 비치환된 알킬기, 또는 치환 또는 비치환된 아릴기, R'는 치환 또는 비치환된 알킬기, 치환 또는 비치환된 아릴기, 치환 또는 비치환된 알케닐기, 또는 치환 또는 비치환된 헤테로시클릭 방향족기를 나타내며, M은 유리라디칼 또는 이온성 사슬 중합화를 겪을 수 있는 적어도 하나의 단량체부를 나타내며, L은 트리아진핵에 단량체부를 결합시키는 기 또는 공유결합을 나타낸다.
  7. 제6항에 있어서, A가 트리할로메틸기인 화합물.
  8. 제7항에 있어서, 트리할로메틸기가 트리클로로메틸, 트리브로모메틸과 트리아이오도메틸로 구성된 군으로부터 선택되는 화합물.
  9. 제8항에 있어서, 트리할로메틸기가 트리클로로메틸과 트리브로모메틸로 구성된 군으로부터 선택되는 화합물.
  10. 제6항에 있어서, M이 아크릴레이트기, 메타크릴레이트기, 아크릴아미드기, 비닐 에테르기, 알릴 에테르기, 에폭시드기와 알릴아민기로 구성되는 군으로부터 선택된 단량체부인 화합물.
  11. 제6항에 있어서, Y가 A를 의미하는 화합물.
  12. 제6항에 있어서, Y가 L-M을 의미하는 화합물.
  13. 제6항에 있어서, R'가 치환 또는 비치환된 아릴기인 화합물.
  14. 제6항에 있어서, R'가 치환 또는 비치환된 헤테로시클릭 방향족기인 화합물.
  15. 제6항에 있어서, R'가 치환 또는 비치환된 알케닐기인 화합물.
  16. 감방사성 조성물로, (1) 에틸렌적으로 불포화된 중합성 화합물과 (2) 제6항에 의한 화합물로 이루어지는 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890012839A 1988-09-07 1989-09-06 단량체부를 함유한 할로메틸-1,3,5-트리아진 및 이를 포함하는 감방사성 조성물 KR970005533B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US24169188A 1988-09-07 1988-09-07
US241691 1988-09-07
US241,691 1988-09-07

Publications (2)

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KR900004704A true KR900004704A (ko) 1990-04-12
KR970005533B1 KR970005533B1 (ko) 1997-04-17

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EP (1) EP0359430B1 (ko)
JP (1) JP2825547B2 (ko)
KR (1) KR970005533B1 (ko)
DE (1) DE68922556T2 (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5387682A (en) * 1988-09-07 1995-02-07 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
CA2034274A1 (en) * 1990-02-07 1991-08-08 James A. Bonham Polymers containing halomethyl-1,3,5-triazine moieties
US5298361A (en) * 1991-08-30 1994-03-29 Minnesota Mining And Manufacturing Company Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator
GB9121795D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
DE59609362D1 (de) * 1995-11-02 2002-07-25 Agfa Gevaert Nv Substituierte s-Triazine und Verfahren zu ihrer Herstellung
JP3929556B2 (ja) * 1997-07-24 2007-06-13 富士フイルム株式会社 感放射線性着色組成物
DE10259460A1 (de) 2002-12-19 2004-07-01 Tesa Ag Transparente Acrylathaftklebemasse mit einem Füllstoff
DE102004018546A1 (de) * 2004-04-14 2005-11-03 Basf Ag Strahlungshärtbare 1,3,5-Triazincarbamate und -harnstoffe
DE102004018544A1 (de) * 2004-04-14 2005-11-03 Basf Ag Verfahren zur Herstellung von 1,3,5-Triazincarbamaten und -harnstoffen
JP4805018B2 (ja) * 2006-05-22 2011-11-02 富士フイルム株式会社 光重合性組成物、カラーフィルタ、及びその製造方法
KR100796517B1 (ko) 2006-07-18 2008-01-21 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 이미지센서컬러필터
CN114437364B (zh) * 2022-01-26 2023-02-28 青岛科技大学 金属耦合三嗪多孔有机框架及其构筑方法和催化co2与环氧化物耦合制备环状碳酸酯应用

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* Cited by examiner, † Cited by third party
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JPS5928328B2 (ja) * 1977-11-29 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5989303A (ja) * 1982-11-12 1984-05-23 Fuji Photo Film Co Ltd 光重合性組成物
US4758497A (en) * 1985-08-22 1988-07-19 Polychrome Corporation Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds

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Publication number Publication date
KR970005533B1 (ko) 1997-04-17
JP2825547B2 (ja) 1998-11-18
JPH02149570A (ja) 1990-06-08
EP0359430B1 (en) 1995-05-10
DE68922556T2 (de) 1996-01-18
EP0359430A3 (en) 1990-04-11
EP0359430A2 (en) 1990-03-21
DE68922556D1 (de) 1995-06-14

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