KR900004599B1 - 금속표면에의 실리콘 확산 피막의 형성 방법 및 금속보호방법 - Google Patents

금속표면에의 실리콘 확산 피막의 형성 방법 및 금속보호방법 Download PDF

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KR900004599B1
KR900004599B1 KR1019860010574A KR860010574A KR900004599B1 KR 900004599 B1 KR900004599 B1 KR 900004599B1 KR 1019860010574 A KR1019860010574 A KR 1019860010574A KR 860010574 A KR860010574 A KR 860010574A KR 900004599 B1 KR900004599 B1 KR 900004599B1
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South Korea
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metal
hydrogen
silicon
atmosphere
silane
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KR1019860010574A
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Korean (ko)
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KR870006229A (ko
Inventor
레오폴도 카브리라 알러잔드로
프란시스 키르너 존
알빈 밀러 로버트
피어란 토찌 로날드
Original Assignee
에어 프로덕츠 앤드 케미칼스 인코오포레이티드
이.유진 인니스
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Publication of KR870006229A publication Critical patent/KR870006229A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • C23C10/34—Embedding in a powder mixture, i.e. pack cementation
    • C23C10/36—Embedding in a powder mixture, i.e. pack cementation only one element being diffused
    • C23C10/44—Siliconising
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
    • C23C10/08—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases only one element being diffused
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/60—After-treatment

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
KR1019860010574A 1985-12-11 1986-12-11 금속표면에의 실리콘 확산 피막의 형성 방법 및 금속보호방법 Expired KR900004599B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US807,890 1985-12-11
US06/807,890 US4714632A (en) 1985-12-11 1985-12-11 Method of producing silicon diffusion coatings on metal articles

Publications (2)

Publication Number Publication Date
KR870006229A KR870006229A (ko) 1987-07-10
KR900004599B1 true KR900004599B1 (ko) 1990-06-30

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KR1019860010574A Expired KR900004599B1 (ko) 1985-12-11 1986-12-11 금속표면에의 실리콘 확산 피막의 형성 방법 및 금속보호방법

Country Status (8)

Country Link
US (1) US4714632A (enExample)
EP (1) EP0226130A3 (enExample)
JP (1) JPS62151554A (enExample)
KR (1) KR900004599B1 (enExample)
CN (1) CN86108935A (enExample)
BR (1) BR8606145A (enExample)
DK (1) DK592286A (enExample)
ZA (1) ZA869325B (enExample)

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FR2649995B1 (fr) * 1989-07-19 1993-08-13 Air Liquide Procede de siliciuration d'aciers par depot chimique en phase gazeuse
US5064691A (en) * 1990-03-02 1991-11-12 Air Products And Chemicals, Inc. Gas phase borosiliconization of ferrous surfaces
DE69205320T2 (de) * 1991-04-17 1996-03-14 Air Liquide CVD-Verfahren zum Herstellen einer Siliziumdiffusionsschicht und/oder Überzug auf der Oberfläche eines Metallsubstrates.
US5254369A (en) * 1991-04-17 1993-10-19 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method of forming a silicon diffusion and/or overlay coating on the surface of a metallic substrate by chemical vapor deposition
TW203633B (enExample) * 1991-06-03 1993-04-11 L Air Liquide Sa Pour L Expl Des Proce
CA2070145A1 (en) * 1991-06-03 1992-12-04 Yao-En Li Process for passivating metal surfaces to enhance the stability of gaseous hydride mixtures at low concentration in contact therewith
DE19610318C1 (de) * 1996-03-15 1997-11-20 Siemens Ag Verwendung eines silicierten Substrats als Verbundleiterplatte in einer Hochtemperatur-Brennstoffzelle
US6503347B1 (en) 1996-04-30 2003-01-07 Surface Engineered Products Corporation Surface alloyed high temperature alloys
CA2175439C (en) 1996-04-30 2001-09-04 Sabino Steven Anthony Petrone Surface alloyed high temperature alloys
US6544406B1 (en) * 1997-12-08 2003-04-08 Harvest Energy Technology Inc. Ion implantation of antifoulants for reducing coke deposits
US6015285A (en) * 1998-01-30 2000-01-18 Gas Research Institute Catalytic combustion process
DE10060469A1 (de) * 2000-12-06 2002-07-04 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium
US20040175578A1 (en) * 2003-03-05 2004-09-09 Smith David A. Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments
US7070833B2 (en) * 2003-03-05 2006-07-04 Restek Corporation Method for chemical vapor deposition of silicon on to substrates for use in corrosive and vacuum environments
US20060057418A1 (en) * 2004-09-16 2006-03-16 Aeromet Technologies, Inc. Alluminide coatings containing silicon and yttrium for superalloys and method of forming such coatings
US8932164B2 (en) * 2007-03-29 2015-01-13 Daido Kogyo Co., Ltd. Wear-resistant chain
EP2151423A1 (en) 2008-07-29 2010-02-10 Total Petrochemicals Research Feluy Process to make olefins from organics with reduced side reactions.
US20100273010A1 (en) * 2009-03-19 2010-10-28 Robert Froehlich Silicide-coated metal surfaces and methods of utilizing same
WO2010123873A1 (en) * 2009-04-20 2010-10-28 Ae Polysilicon Corporation A reactor with silicide-coated metal surfaces
TWI496936B (zh) * 2009-04-20 2015-08-21 Jiangsu Zhongneng Polysilicon Technology Dev Co Ltd 用於製造高純度多晶矽之方法及裝置
EP2421640A1 (en) * 2009-04-20 2012-02-29 Ae Polysilicon Corporation Methods and system for cooling a reaction effluent gas
US9777368B2 (en) 2009-10-27 2017-10-03 Silcotek Corp. Chemical vapor deposition coating, article, and method
KR101790206B1 (ko) 2010-10-05 2017-10-25 실코텍 코포레이션 내마모성 코팅, 물건 및 방법
DE102012211242A1 (de) * 2012-06-29 2014-01-02 Robert Bosch Gmbh Verfahren zum Bearbeiten der Oberfläche eines Bauteils
EP2781691A1 (en) * 2013-03-19 2014-09-24 Alstom Technology Ltd Method for reconditioning a hot gas path part of a gas turbine
WO2014186470A1 (en) 2013-05-14 2014-11-20 Silcotek Corp. Vapor phase treatment of amorphous carbon films with (perfluoro 1,1,2,2 tetrahydroalkyl)trialkoxysilane
US11292924B2 (en) 2014-04-08 2022-04-05 Silcotek Corp. Thermal chemical vapor deposition coated article and process
US9915001B2 (en) 2014-09-03 2018-03-13 Silcotek Corp. Chemical vapor deposition process and coated article
WO2016039429A1 (ja) * 2014-09-10 2016-03-17 新日鐵住金株式会社 拡散接合し難いオーステナイト系ステンレス鋼板
US10316408B2 (en) 2014-12-12 2019-06-11 Silcotek Corp. Delivery device, manufacturing system and process of manufacturing
WO2017040623A1 (en) 2015-09-01 2017-03-09 Silcotek Corp. Thermal chemical vapor deposition coating
US10323321B1 (en) 2016-01-08 2019-06-18 Silcotek Corp. Thermal chemical vapor deposition process and coated article
US10487403B2 (en) 2016-12-13 2019-11-26 Silcotek Corp Fluoro-containing thermal chemical vapor deposition process and article
US11161324B2 (en) 2017-09-13 2021-11-02 Silcotek Corp. Corrosion-resistant coated article and thermal chemical vapor deposition coating process
CN108914052B (zh) * 2018-06-07 2020-06-23 界首市金龙机械设备有限公司 一种翻转驾驶室的锁止机构用锁止板的成型方法
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CN114427072A (zh) * 2020-10-14 2022-05-03 中国石油化工股份有限公司 一种合金在线处理方法、合金及应用
CN116024519A (zh) * 2021-10-26 2023-04-28 中国石油化工股份有限公司 减缓结焦的轻烃芳构化反应器及其制备方法与应用
CN115896684B (zh) * 2022-11-25 2025-02-14 江苏星铖新材料科技有限公司 一种在铜合金表面渗硅的方法

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Also Published As

Publication number Publication date
DK592286D0 (da) 1986-12-10
DK592286A (da) 1987-06-12
JPS6319589B2 (enExample) 1988-04-23
BR8606145A (pt) 1987-09-22
KR870006229A (ko) 1987-07-10
US4714632A (en) 1987-12-22
CN86108935A (zh) 1987-07-29
ZA869325B (en) 1988-08-31
EP0226130A3 (en) 1989-03-29
EP0226130A2 (en) 1987-06-24
JPS62151554A (ja) 1987-07-06

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