KR890016073A - 제4급 암모늄기 함유 실리콘 수지 미분말 - Google Patents

제4급 암모늄기 함유 실리콘 수지 미분말 Download PDF

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Publication number
KR890016073A
KR890016073A KR1019890004867A KR890004867A KR890016073A KR 890016073 A KR890016073 A KR 890016073A KR 1019890004867 A KR1019890004867 A KR 1019890004867A KR 890004867 A KR890004867 A KR 890004867A KR 890016073 A KR890016073 A KR 890016073A
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KR
South Korea
Prior art keywords
quaternary ammonium
group
silicone resin
ammonium group
fine powder
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KR1019890004867A
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English (en)
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KR920007763B1 (ko
Inventor
겐지 사이또오
히로시 기무라
Original Assignee
이찌세 와따루
도시바 실리콘 가부시끼가이샤
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Publication of KR890016073A publication Critical patent/KR890016073A/ko
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Publication of KR920007763B1 publication Critical patent/KR920007763B1/ko

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/12Powdering or granulating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04Polysiloxanes

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)

Abstract

내용 없음

Description

제 4 급 암모늄기 함유 실리콘 수지 미분말
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제 1 도는 실시예 1에서 얻어진 실리콘 수지 미분말의 KBr 정제법에 의한 IR 분광 분석의 스펙트럼을 나타내는 그래프. 제 2 도는 폴리 메틸 시르세스키 옥산 미분말의 KBr 정제법에 의한 IR 분광 분석의 스펙트럼을 나타내는 그래프. 제 3 도는 실시예 1에서 얻어진 실리콘 수지 미분말의 XMA 차트를 나타낸다.

Claims (3)

  1. RSiO3/2단위 (식중 R은 1가의 치환 또는 비치환의 탄화수소기를 나타낸다)또는 RSiO3/2단위 및 SiO2단위로 되고 또한 분자중의 R의 0.1몰% 이상이 제 4 급 암모늄기 함유 탄소 관능성기인 것을 특징으로 하는 제 4 급 암모늄기 함유 실리콘 수지 미분말.
  2. 제 1 항에 있어서, 구성단위로서 20몰% 이하량의 R2SiO 단위(식중, R의 의미는 전술과 같다)를 함유하는 것을 특징으로 하는 제 4 급 암모늄기 함유 실리콘 수지 미분말.
  3. 제 1 항 또는 제 2 항에 있어서, 제 4 급 암모늄기 함유 탄소 관능성기가 일반식 :
    (식중 R1은 알킬기를 나타내고 Q1은 탄소수 3-6의 알킬렌기를 나타내고, Q2는 탄소수 2-4의 알킬렌기를 나타내고 X-는 음이온을 나타낸다)로 표시되는 Q1의 탄소원자를 통해서 규소원자에 결합하는 제 4 급 암모늄기 함유기인 것을 특징으로 하는 실리콘 수지 미분말.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890004867A 1988-04-19 1989-04-13 제4급 암모늄기 함유 실리콘 수지 미분말 KR920007763B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63094547A JP2603291B2 (ja) 1988-04-19 1988-04-19 第4級アンモニウム基含有シリコーン樹脂微粉末
JP?63-94547 1988-04-19
JP94547 1988-04-19

Publications (2)

Publication Number Publication Date
KR890016073A true KR890016073A (ko) 1989-11-28
KR920007763B1 KR920007763B1 (ko) 1992-09-17

Family

ID=14113336

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890004867A KR920007763B1 (ko) 1988-04-19 1989-04-13 제4급 암모늄기 함유 실리콘 수지 미분말

Country Status (7)

Country Link
US (1) US5204432A (ko)
JP (1) JP2603291B2 (ko)
KR (1) KR920007763B1 (ko)
DE (1) DE3912877A1 (ko)
FR (1) FR2630121B1 (ko)
GB (1) GB2219302B (ko)
IT (1) IT1231578B (ko)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5152984A (en) * 1990-11-20 1992-10-06 Dow Corning Corporation Hair fixatives
FR2724661B1 (fr) * 1994-09-16 1997-10-24 Rhone Poulenc Chimie Dispersion silicone aqueuse, reticulable en un elastomere adherent, selon un mecanisme reactionnel de condensation
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
JP2001192452A (ja) * 2000-01-13 2001-07-17 Ge Toshiba Silicones Co Ltd 球状シリコーン微粒子およびその製造方法
WO2003044600A1 (en) 2001-11-15 2003-05-30 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
JP5348843B2 (ja) * 2003-10-07 2013-11-20 ハネウエル・インターナシヨナル・インコーポレーテツド 集積回路用途の被覆およびハードマスク組成物、これらの製造方法および使用
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
EP1574491B1 (en) * 2004-03-11 2009-05-13 Corning Incorporated Ceramic composition with silsesquioxane polymer
US8901268B2 (en) * 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US20080157065A1 (en) * 2004-08-03 2008-07-03 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
JP2008534714A (ja) * 2005-03-22 2008-08-28 バイオセーフ インク. 優れた持続性の抗菌特性を有する、無溶媒のシリコン含有第4級アンモニウムを含むポリマー抗菌剤の作製法
EP2040550A2 (en) * 2006-07-14 2009-04-01 Ciba Holding Inc. Polysiloxane antimicrobials
WO2009108574A2 (en) * 2008-02-25 2009-09-03 Honeywell International Inc. Processable inorganic and organic polymer formulations, methods of production and uses thereof
DE102009045669A1 (de) * 2009-10-14 2011-04-21 Wacker Chemie Ag Verfahren zur Herstellung von Organooligosilsesquioxanen
JP2013515154A (ja) * 2009-12-22 2013-05-02 ダウ コーニング コーポレーション 水分散性のシリコーン樹脂
EP2567812B1 (en) * 2011-09-12 2015-06-17 Agfa-Gevaert PET-C based security laminates and documents
KR102276501B1 (ko) * 2014-04-21 2021-07-12 고에이 가가쿠 가부시키가이샤 폴리실록산 공중합체 및 그것을 함유하는 대전 방지제
JP6179668B2 (ja) * 2014-04-21 2017-08-16 信越化学工業株式会社 ポリシロキサン共重合体並びにそれを含有する帯電防止剤及び樹脂組成物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2972598A (en) * 1956-10-12 1961-02-21 Union Carbide Corp Organosilicon salts and process for producing the same
GB956276A (en) * 1960-07-06 1964-04-22 Wolfen Filmfab Veb Process for the manufacture of thermostable organo silicon anion exchangers
BE674475A (ko) * 1964-12-31 1966-04-15
CH106968D (ko) * 1965-01-21 1900-01-01
DE2015199A1 (de) * 1970-03-28 1971-10-21 Baur E Zusammenklappbare Kabelrolle
US4377675A (en) * 1979-09-24 1983-03-22 Dow Corning Corporation Amorphous materials derived from aqueous metal ammine siliconate solutions
DE3120195C2 (de) * 1981-05-21 1986-09-04 Degussa Ag, 6000 Frankfurt Polymere Ammoniumverbindungen mit kieselsäureartigem Grundgerüst, Verfahren zu ihrer Herstellung und Verwendung
GB2107725B (en) * 1981-10-03 1985-02-27 Dow Corning Siloxane quaternary ammonium salt preparation
CA1210019A (en) * 1982-03-24 1986-08-19 Alan J. Isquith Insoluble polymeric contact preservatives
US4424297A (en) * 1982-07-08 1984-01-03 Dow Corning Corporation Colloidal silesquioxanes
DE3404702A1 (de) * 1984-02-10 1985-09-05 Degussa Ag, 6000 Frankfurt Platin- und/oder palladium-haltige organopolysiloxan-ammoniumverbindungen, verfahren zu ihrer herstellung und verwendung
DE3643894A1 (de) * 1986-12-22 1988-06-23 Degussa Rhodium-haltige organopolysiloxan-ammoniumverbindungen, verfahren zu ihrer herstellung und verwendung
DE3719086C1 (de) * 1987-06-06 1988-10-27 Goldschmidt Ag Th Diquartaere Polysiloxane,deren Herstellung und Verwendung in kosmetischen Zubereitungen
DE3800564C1 (ko) * 1988-01-12 1989-03-16 Degussa Ag, 6000 Frankfurt, De

Also Published As

Publication number Publication date
GB2219302A (en) 1989-12-06
GB8908478D0 (en) 1989-06-01
DE3912877A1 (de) 1989-11-02
FR2630121A1 (fr) 1989-10-20
JP2603291B2 (ja) 1997-04-23
IT1231578B (it) 1991-12-18
JPH01266137A (ja) 1989-10-24
GB2219302B (en) 1992-02-12
FR2630121B1 (fr) 1993-01-22
US5204432A (en) 1993-04-20
IT8947855A0 (it) 1989-04-17
KR920007763B1 (ko) 1992-09-17

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