KR890004204A - 감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네가티브 릴리프 복사물의 생산방법 - Google Patents

감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네가티브 릴리프 복사물의 생산방법 Download PDF

Info

Publication number
KR890004204A
KR890004204A KR1019880009936A KR880009936A KR890004204A KR 890004204 A KR890004204 A KR 890004204A KR 1019880009936 A KR1019880009936 A KR 1019880009936A KR 880009936 A KR880009936 A KR 880009936A KR 890004204 A KR890004204 A KR 890004204A
Authority
KR
South Korea
Prior art keywords
photosensitive
exposed
composition
photosensitive composition
triazine
Prior art date
Application number
KR1019880009936A
Other languages
English (en)
Other versions
KR960015635B1 (ko
Inventor
스탈호펜 파울
베르너 프라스 한스
Original Assignee
베틀라우퍼, 오일러
훽스트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 베틀라우퍼, 오일러, 훽스트 아크티엔게젤샤프트 filed Critical 베틀라우퍼, 오일러
Publication of KR890004204A publication Critical patent/KR890004204A/ko
Application granted granted Critical
Publication of KR960015635B1 publication Critical patent/KR960015635B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

내용 없음

Description

감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네카티브 릴리프 복사물의 생산방법.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 물에 불용성이고 알칼리성 수용액에 가용성인 결합체, 감광성 1,2-퀴논 디아지드 또는 광선에 노출되는 경우에 산이 분리되는 화합물 및 적어도 하나의 산-분리성 C-0-C그룹을 갖는 화합물을 함유하는 감광성 혼합물, 및 열경화를 촉진하는 물질로서 일반식(Ⅰ)의 대칭성 트리아진-알킬(아릴)-에테르로 실질적으로 이루어짐을 특징으로 하는 감광성 조성물.
    상기식에서, R은 각각 알킬 또는 알케닐 그룹에 1 내지 4개의 탄소원자를 갖는 알킬, 알릴, 알콕시, 알콕시카보닐, 알콕시카보닐알케닐, 아릴옥시, 할로겐 또는 니트로그룹이고 ; n은 1 내지 3이다.
  2. 제 1 항에 있어서, R이 메틸, 이소부틸, 에톡시, 에톡시카보닐, 레톡시카보닐에테닐, 브롬 또는 니트로그룹이고, n이 1 또는 3인 일반식(Ⅰ)의 화합물이 존재하는 감광성 조성물.
  3. 제 1 항에 있어서, 감광성 조성물의 비휘발성 성분의 중량을 기준으로, 일반식(Ⅰ)에 상응하는 화합물을 0.5 내지 30중량% 함유하는 감광성 조성물.
  4. 제 1 항에 있어서. 2,4,6-트리스((4-메틸페녹시)-5-트리아진, 2,4.6-트리스-(4-에톡시카보닐-페녹시)-5-트리아진 또는 2,4,6-트리스-(2,4,6-트리브로모페녹시)-5-트리아진이 열경화 촉진물질로서 존재하는 감광성 조성물.
  5. 지지체 및 지지체에 사용되며 제 1 항 내지 제 4 항에서 청구한 조성물을 함유하는 감광성 층으로 이루어짐을 특징으로 하는 감광성 복사물질.
  6. 제 1 항 내지 제 4 항중에서 청구한 조성물의 감광성 층으로 퍼복된 지지체를 포함하는 정상직인 포지티브-작용성 감광성 복사 물질을 영상 노출시킨 다음, 가열하고, 냉각시킨후, 완전 노출시키고, 수성 알칼리성 현상액으로 현상한 다음, 임의로 베이킹하여 네가티브 릴리프 복사물을 생산하는 방법.
  7. 제 6 항에 있어서, 영상 노출된 몰질을 80˚내지 150℃의 온도 범위에서 가열하는 방법.
  8. 제 6 항 또는 제 7 항에 있어서, 영상 노출된 물질을 10초 내지 10분간 가열하는 방법.
  9. 제 6 항 내지 제 8 항중 어느 한 항에 있어서, 동일한 복사층에 네가티브 및 포지티브 복사물을 생산하기 위해, 냉각후, 물질을 아직 노출되지 않고 원본을 추가로 가하여 미리 차단시킨 충 영역에서 영상 노출시키고, 수성 알칼리성 현상액으로 현상하는 방법.
    ※ 참고사항 : 최초출원내용에 의하여 공개하는 것임.
KR1019880009936A 1987-08-05 1988-08-04 감광성 조성물, 이로부터 제조한 감광성 복사물질 및 네가티브 릴리프 복사물의 생산방법 KR960015635B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19873725949 DE3725949A1 (de) 1987-08-05 1987-08-05 Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DEP3725949.0 1987-08-05

Publications (2)

Publication Number Publication Date
KR890004204A true KR890004204A (ko) 1989-04-20
KR960015635B1 KR960015635B1 (ko) 1996-11-18

Family

ID=6333093

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880009936A KR960015635B1 (ko) 1987-08-05 1988-08-04 감광성 조성물, 이로부터 제조한 감광성 복사물질 및 네가티브 릴리프 복사물의 생산방법

Country Status (6)

Country Link
US (2) US4889788A (ko)
EP (1) EP0303108B1 (ko)
JP (1) JPS6455553A (ko)
KR (1) KR960015635B1 (ko)
BR (1) BR8803865A (ko)
DE (2) DE3725949A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5200293A (en) * 1989-02-23 1993-04-06 Ciba-Geigy Corporation Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
US5026633A (en) * 1989-07-27 1991-06-25 Minnesota Mining And Manufacturing Company Color photothermographic materials with development accelerator
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4009558A1 (de) * 1990-03-24 1991-09-26 Bayer Ag Mischungen aus polyarylensulfiden, glasfasern und nitroaryloxyheterocyclen
DE4013575C2 (de) * 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien
DE4032162A1 (de) * 1990-10-10 1992-04-16 Basf Ag Strahlungsempfindliches gemisch, enthaltend saeurelabile gruppierungen und verfahren zur herstellung von reliefmustern und reliefbildern
US5876895A (en) * 1992-12-24 1999-03-02 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
US5667931A (en) * 1995-01-27 1997-09-16 Korea Kumho Petrochemical Co., Ltd. Positive photoresist composition containing quinone diazide 5-triazine esterification compound
US6326368B1 (en) * 1996-03-27 2001-12-04 Dupont Pharmaceuticals Company Aryloxy- and arylthiosubstituted pyrimidines and triazines and derivatives thereof
US5719004A (en) * 1996-08-07 1998-02-17 Clariant Finance (Bvi) Limited Positive photoresist composition containing a 2,4-dinitro-1-naphthol
JP4042142B2 (ja) * 2000-09-08 2008-02-06 Ｊｓｒ株式会社 Ｅｌ表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびｅｌ表示素子
JP2002341521A (ja) * 2001-05-17 2002-11-27 Sumitomo Chem Co Ltd 感放射線性樹脂組成物
KR20100006952A (ko) * 2008-07-11 2010-01-22 삼성전자주식회사 포토레지스트 조성물, 이를 이용한 금속 패턴의 형성 방법및 표시 기판의 제조 방법
JP5578044B2 (ja) 2010-11-19 2014-08-27 信越化学工業株式会社 ポジ型リフトオフレジスト組成物及びパターン形成方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3515552A (en) * 1966-09-16 1970-06-02 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using
US3536489A (en) * 1966-09-16 1970-10-27 Minnesota Mining & Mfg Heterocyclic iminoaromatic-halogen containing photoinitiator light sensitive compositions
ZA6807938B (ko) * 1967-12-04
US3645743A (en) * 1968-08-27 1972-02-29 Agfa Gevaert Ag Process for hardening protein layers
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US4196003A (en) * 1974-02-01 1980-04-01 Fuji Photo Film Co., Ltd. Light-sensitive o-quinone diazide copying composition
CH621416A5 (ko) * 1975-03-27 1981-01-30 Hoechst Ag
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
JPS5474728A (en) * 1977-11-28 1979-06-15 Fuji Photo Film Co Ltd Photosensitive composition
DE2829512A1 (de) * 1978-07-05 1980-01-17 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2829511A1 (de) * 1978-07-05 1980-01-24 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
US4302189A (en) * 1979-03-29 1981-11-24 University Of Sydney Denture retention
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
GB2082339B (en) * 1980-08-05 1985-06-12 Horsell Graphic Ind Ltd Lithographic printing plates and method for processing
DE3039926A1 (de) * 1980-10-23 1982-05-27 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
DE3325023A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
IE57143B1 (en) * 1984-06-01 1992-05-06 Rohm & Haas Photosensitive coating compositions,thermally stable coating prepared from them,and the use of such coatings in forming thermally stable polymer images

Also Published As

Publication number Publication date
EP0303108A3 (en) 1990-10-24
DE3887936D1 (de) 1994-03-31
US4990429A (en) 1991-02-05
JPS6455553A (en) 1989-03-02
DE3725949A1 (de) 1989-02-16
EP0303108A2 (de) 1989-02-15
US4889788A (en) 1989-12-26
KR960015635B1 (ko) 1996-11-18
BR8803865A (pt) 1989-02-21
EP0303108B1 (de) 1994-02-23

Similar Documents

Publication Publication Date Title
KR890004204A (ko) 감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네가티브 릴리프 복사물의 생산방법
BR8403441A (pt) Processo para a obtencao de copias em relevo negativas,bem como material de copia e mistura fotossensivel para tal processo
KR860004334A (ko) 방사선감수성 조성물, 이를 사용하여 제조한 기록물질 및 내열성 기록 양각 상의 제조방법
JPS5646234A (en) Electrophotographic receptor
KR840001484A (ko) 제막(除膜) 조성물 및 내막식(耐膜蝕) 제거방법
KR890007117A (ko) 염료를 함유하는 양성-작용성 감광성 조성물 및 이 조성물로부터 제조된 양성-작용성 감광성 기록물질
ES516391A0 (es) Un procedimiento para revelar capas de reproduccion negativas.
KR900018737A (ko) 방사능 민감성 혼합물 및 양각패턴의 제조방법
JPS5786829A (en) Direct positive silver halide photosensitive material
GB1405628A (en) Method for imaging and for recording information
BR8500146A (pt) Sistema fotorresistente negativo,superficie e processo para formacao de imagem na mesma
KR850001443A (ko) 광 저항성 조성물
JPS566247A (en) Electrostatic image developing toner
ATE12704T1 (de) Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial.
JPS5521013A (en) Direct positive image formation method
KR890015067A (ko) 감광성 수지 조성물 및 이를 사용한 패턴 형성법
JPS55113033A (en) Silver halide photographic material
DE2964976D1 (en) Photographic image enhancement method employing luminescence
ATE125046T1 (de) Photothermographisches element und photothermographisches verfahren.
KR890007120A (ko) 염료를 함유하는 양성-작용성 감광성 조성물 및 이러한 조성물로부터 제조된 양성-작용성 감광성 기록물질
US3068098A (en) Photographic diffusion transfer process
JPS5579436A (en) Sliver halide photographic material
KR910015887A (ko) 감광성 혼합물, 이로부터 제조된 감광성 기록물질, 및 양각 기록물의 제조방법
DE3664824D1 (en) Process for producing a positive photoresist
US3578456A (en) Non-silver photosensitive composition sensitized with rubrene

Legal Events

Date Code Title Description
A201 Request for examination
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
NORF Unpaid initial registration fee