KR890004204A - 감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네가티브 릴리프 복사물의 생산방법 - Google Patents

감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네가티브 릴리프 복사물의 생산방법 Download PDF

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Publication number
KR890004204A
KR890004204A KR1019880009936A KR880009936A KR890004204A KR 890004204 A KR890004204 A KR 890004204A KR 1019880009936 A KR1019880009936 A KR 1019880009936A KR 880009936 A KR880009936 A KR 880009936A KR 890004204 A KR890004204 A KR 890004204A
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South Korea
Prior art keywords
photosensitive
exposed
composition
photosensitive composition
triazine
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KR1019880009936A
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English (en)
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KR960015635B1 (ko
Inventor
스탈호펜 파울
베르너 프라스 한스
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베틀라우퍼, 오일러
훽스트 아크티엔게젤샤프트
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Publication of KR890004204A publication Critical patent/KR890004204A/ko
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Publication of KR960015635B1 publication Critical patent/KR960015635B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

내용 없음

Description

감광성 조성물, 이로부터 제조한 감광성 복사 물질 및 네카티브 릴리프 복사물의 생산방법.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 물에 불용성이고 알칼리성 수용액에 가용성인 결합체, 감광성 1,2-퀴논 디아지드 또는 광선에 노출되는 경우에 산이 분리되는 화합물 및 적어도 하나의 산-분리성 C-0-C그룹을 갖는 화합물을 함유하는 감광성 혼합물, 및 열경화를 촉진하는 물질로서 일반식(Ⅰ)의 대칭성 트리아진-알킬(아릴)-에테르로 실질적으로 이루어짐을 특징으로 하는 감광성 조성물.
    상기식에서, R은 각각 알킬 또는 알케닐 그룹에 1 내지 4개의 탄소원자를 갖는 알킬, 알릴, 알콕시, 알콕시카보닐, 알콕시카보닐알케닐, 아릴옥시, 할로겐 또는 니트로그룹이고 ; n은 1 내지 3이다.
  2. 제 1 항에 있어서, R이 메틸, 이소부틸, 에톡시, 에톡시카보닐, 레톡시카보닐에테닐, 브롬 또는 니트로그룹이고, n이 1 또는 3인 일반식(Ⅰ)의 화합물이 존재하는 감광성 조성물.
  3. 제 1 항에 있어서, 감광성 조성물의 비휘발성 성분의 중량을 기준으로, 일반식(Ⅰ)에 상응하는 화합물을 0.5 내지 30중량% 함유하는 감광성 조성물.
  4. 제 1 항에 있어서. 2,4,6-트리스((4-메틸페녹시)-5-트리아진, 2,4.6-트리스-(4-에톡시카보닐-페녹시)-5-트리아진 또는 2,4,6-트리스-(2,4,6-트리브로모페녹시)-5-트리아진이 열경화 촉진물질로서 존재하는 감광성 조성물.
  5. 지지체 및 지지체에 사용되며 제 1 항 내지 제 4 항에서 청구한 조성물을 함유하는 감광성 층으로 이루어짐을 특징으로 하는 감광성 복사물질.
  6. 제 1 항 내지 제 4 항중에서 청구한 조성물의 감광성 층으로 퍼복된 지지체를 포함하는 정상직인 포지티브-작용성 감광성 복사 물질을 영상 노출시킨 다음, 가열하고, 냉각시킨후, 완전 노출시키고, 수성 알칼리성 현상액으로 현상한 다음, 임의로 베이킹하여 네가티브 릴리프 복사물을 생산하는 방법.
  7. 제 6 항에 있어서, 영상 노출된 몰질을 80˚내지 150℃의 온도 범위에서 가열하는 방법.
  8. 제 6 항 또는 제 7 항에 있어서, 영상 노출된 물질을 10초 내지 10분간 가열하는 방법.
  9. 제 6 항 내지 제 8 항중 어느 한 항에 있어서, 동일한 복사층에 네가티브 및 포지티브 복사물을 생산하기 위해, 냉각후, 물질을 아직 노출되지 않고 원본을 추가로 가하여 미리 차단시킨 충 영역에서 영상 노출시키고, 수성 알칼리성 현상액으로 현상하는 방법.
    ※ 참고사항 : 최초출원내용에 의하여 공개하는 것임.
KR1019880009936A 1987-08-05 1988-08-04 감광성 조성물, 이로부터 제조한 감광성 복사물질 및 네가티브 릴리프 복사물의 생산방법 KR960015635B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3725949.0 1987-08-05
DE19873725949 DE3725949A1 (de) 1987-08-05 1987-08-05 Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien

Publications (2)

Publication Number Publication Date
KR890004204A true KR890004204A (ko) 1989-04-20
KR960015635B1 KR960015635B1 (ko) 1996-11-18

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KR1019880009936A KR960015635B1 (ko) 1987-08-05 1988-08-04 감광성 조성물, 이로부터 제조한 감광성 복사물질 및 네가티브 릴리프 복사물의 생산방법

Country Status (6)

Country Link
US (2) US4889788A (ko)
EP (1) EP0303108B1 (ko)
JP (1) JPS6455553A (ko)
KR (1) KR960015635B1 (ko)
BR (1) BR8803865A (ko)
DE (2) DE3725949A1 (ko)

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Also Published As

Publication number Publication date
EP0303108B1 (de) 1994-02-23
DE3887936D1 (de) 1994-03-31
KR960015635B1 (ko) 1996-11-18
US4889788A (en) 1989-12-26
DE3725949A1 (de) 1989-02-16
JPS6455553A (en) 1989-03-02
BR8803865A (pt) 1989-02-21
EP0303108A2 (de) 1989-02-15
US4990429A (en) 1991-02-05
EP0303108A3 (en) 1990-10-24

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