KR860004459A - 열처리 방법 - Google Patents

열처리 방법

Info

Publication number
KR860004459A
KR860004459A KR1019850007292A KR850007292A KR860004459A KR 860004459 A KR860004459 A KR 860004459A KR 1019850007292 A KR1019850007292 A KR 1019850007292A KR 850007292 A KR850007292 A KR 850007292A KR 860004459 A KR860004459 A KR 860004459A
Authority
KR
South Korea
Prior art keywords
heat treatment
treatment method
heat
treatment
Prior art date
Application number
KR1019850007292A
Other languages
English (en)
Other versions
KR900000560B1 (ko
Inventor
히데유끼 테라오카
Original Assignee
다이닛뽄 스크린 세이조오 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이닛뽄 스크린 세이조오 가부시기가이샤 filed Critical 다이닛뽄 스크린 세이조오 가부시기가이샤
Publication of KR860004459A publication Critical patent/KR860004459A/ko
Application granted granted Critical
Publication of KR900000560B1 publication Critical patent/KR900000560B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/40—Arrangements of controlling or monitoring devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1019850007292A 1984-11-26 1985-10-04 열처리 방법 KR900000560B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59-248889 1984-11-26
JP59248889A JPS61127133A (ja) 1984-11-26 1984-11-26 熱処理方法

Publications (2)

Publication Number Publication Date
KR860004459A true KR860004459A (ko) 1986-06-23
KR900000560B1 KR900000560B1 (ko) 1990-01-31

Family

ID=17184950

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019850007292A KR900000560B1 (ko) 1984-11-26 1985-10-04 열처리 방법

Country Status (3)

Country Link
US (1) US4678432A (ko)
JP (1) JPS61127133A (ko)
KR (1) KR900000560B1 (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623935B2 (ja) * 1988-02-09 1994-03-30 大日本スクリーン製造株式会社 再現性を高めた熱処理制御方法
US4846674A (en) * 1988-02-10 1989-07-11 Microdot Inc. Method and apparatus for heating removably attachable heading tool dies
US5273424A (en) * 1990-03-23 1993-12-28 Tokyo Electron Sagami Limited Vertical heat treatment apparatus
US5359693A (en) * 1991-07-15 1994-10-25 Ast Elektronik Gmbh Method and apparatus for a rapid thermal processing of delicate components
US5296683A (en) * 1991-08-19 1994-03-22 Henny Penny Corporation Preheating method and apparatus for use in a food oven
US5528018A (en) * 1991-08-19 1996-06-18 Henny Penny Corporation Programmable load compensation method and apparatus for use in a food
US5688422A (en) * 1995-04-28 1997-11-18 Henny Penny Corporation Programmable fan control method and apparatus for use in a food oven
JP3654684B2 (ja) * 1995-05-01 2005-06-02 東京エレクトロン株式会社 処理方法及び処理装置
US6204484B1 (en) * 1998-03-31 2001-03-20 Steag Rtp Systems, Inc. System for measuring the temperature of a semiconductor wafer during thermal processing
US20080314892A1 (en) * 2007-06-25 2008-12-25 Graham Robert G Radiant shield
JP5751235B2 (ja) * 2012-10-19 2015-07-22 トヨタ自動車株式会社 電池用電極の製造方法及び装置
JP7288745B2 (ja) 2018-09-13 2023-06-08 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置
JP7199888B2 (ja) * 2018-09-20 2023-01-06 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置
JP7080145B2 (ja) 2018-09-20 2022-06-03 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3623712A (en) * 1969-10-15 1971-11-30 Applied Materials Tech Epitaxial radiation heated reactor and process
JPS53120075A (en) * 1977-03-30 1978-10-20 Shinku Riko Kk Temperature control device
JPS57147237A (en) * 1981-03-06 1982-09-11 Sony Corp Heat treatment device
JPS5870536A (ja) * 1981-10-22 1983-04-27 Fujitsu Ltd レ−ザアニ−ル方法
JPS58501927A (ja) * 1981-12-31 1983-11-10 インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン シリコン・ウエハ中の酸素析出を減少させるための方法

Also Published As

Publication number Publication date
KR900000560B1 (ko) 1990-01-31
US4678432A (en) 1987-07-07
JPH0230179B2 (ko) 1990-07-04
JPS61127133A (ja) 1986-06-14

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