KR840007797A - 방사성오염금속의 제염방법(除染方法) - Google Patents

방사성오염금속의 제염방법(除染方法) Download PDF

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Publication number
KR840007797A
KR840007797A KR1019840000744A KR840000744A KR840007797A KR 840007797 A KR840007797 A KR 840007797A KR 1019840000744 A KR1019840000744 A KR 1019840000744A KR 840000744 A KR840000744 A KR 840000744A KR 840007797 A KR840007797 A KR 840007797A
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South Korea
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decontamination
radioactive
contaminated
residue
metal
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KR1019840000744A
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English (en)
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KR900000343B1 (ko
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다쓰오(외 2) 이즈미다
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미다 가쓰시게
가부시기가이샤 히다찌 세이사꾸쇼
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Publication of KR840007797A publication Critical patent/KR840007797A/ko
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/28—Treating solids
    • G21F9/30—Processing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Electrochemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Food Science & Technology (AREA)
  • Processing Of Solid Wastes (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)

Abstract

내용 없음.

Description

방사성오염금속의 제염방법(除染方法)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 전해시간과 연마랑과의 관계를 나타낸 선도.

Claims (9)

  1. 방사성물질에 의해 표면이 오염된 금속을 전해제염하는 방법에 있어서 중성염의 수용액을 전해액으로서 사용하여 제염대상금속을 교번전해 함으로써 방사능으로 오염된 산화피막층 및 금속표면을 제거하는 것을 특징으로 하는 방사성오염속의 제염방법.
  2. 상기 교번전해에 있어서, 음국전해시간을 양극전해시간의 2∼10배로 하는 것을 특징으로 하는 톡허청구의 범위 1기재의 방사성 오염금속의 제염방법.
  3. 중성염은 염산염, 황산염, 질산염 및 인산염으로 이루어진 군에서 선택된 1종 또는 2종 이상의 염인 것을 특징으로 하는 특허청구의 범위 1기재의 방사성 오염금속의 제염방법.
  4. 방사성물질에 의해 표면이 오염된 금속을 제해제염하는 방법에 있어서, 중성염의 수용액을 전해액으로서 사용하여 제염대상금속을 교번전해함으로써 방사능으로 오염된 산화피막층 및 금속표면을 제거하며, 이어서 전해액중에 포함되는 제염잔사를 분해하여, 이 잔사에 고화재를 가하여 고화하는 것을 특징으로 하는 방사성오염속의 제염방법.
  5. 상기 교번전해에 있어서 음극전해시간을 양극전해시간의 2∼10내로 하는 것을 특징으로 하는 특허청구의 범위 4기재의 방사성오염금속의 제염방법.
  6. 중성염은 염산염, 황산염, 질산염 및 인산염으로 이루어진 군에서 선택된 21종 또는 2종 이상의 염인 것을 특징으로 하는 특허청구의 범위 4기재의 방사성오염금속의 제염방법.
  7. 상기 제염잔사의 분리, 고화에 있어서 제염잔사를 탈수농축후, 물유리와 혼합하여 고화하는 것을 특징으로 하는 특허청구의 범위 4기재의 방사성오염금속의 제염방법.
  8. 상기 제염잔사의 탈수농축에 있어서, 원심분리법을 사용하는 것을 특징으로하는 특허청구의 범위 7기재의 방사성오염금속의 제염방법.
  9. 제염잔사와 물유리와의 혼합비는 1 : 2∼1 : 3인 것을 특징으로 하는 특허청구의 범위 7기재의 방사성오염금속의 제염방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019840000744A 1983-02-23 1984-02-16 방사성오염금속의 제염방법(除染方法) KR900000343B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP27703 1983-02-23
JP58027703A JPS59154400A (ja) 1983-02-23 1983-02-23 放射性汚染金属の除染方法
JP83-27703 1983-02-23

Publications (2)

Publication Number Publication Date
KR840007797A true KR840007797A (ko) 1984-12-10
KR900000343B1 KR900000343B1 (ko) 1990-01-25

Family

ID=12228339

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019840000744A KR900000343B1 (ko) 1983-02-23 1984-02-16 방사성오염금속의 제염방법(除染方法)

Country Status (5)

Country Link
US (1) US4481089A (ko)
EP (1) EP0125401B1 (ko)
JP (1) JPS59154400A (ko)
KR (1) KR900000343B1 (ko)
DE (1) DE3464292D1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100514612B1 (ko) * 2002-11-14 2005-09-16 주식회사 데콘엔지니어링 중성염 전해연마를 이용한 방사능 오염 금속의 제염장치

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US4615776A (en) * 1983-10-21 1986-10-07 Shinko-Pfaudler Company Electrolytic decontamination process and process for reproducing decontaminating electrolyte by electrodeposition and apparatuses therefore
FR2565021B1 (fr) * 1984-05-25 1992-03-06 Toshiba Kk Appareil de decontamination de dechets metalliques radioactifs
JPH0634095B2 (ja) * 1985-03-13 1994-05-02 上村工業株式会社 放射能汚染金属廃棄物の除染方法
US4654126A (en) * 1985-10-07 1987-03-31 International Business Machines Corporation Process for determining the plating activity of an electroless plating bath
SE462286B (sv) * 1988-10-13 1990-05-28 Avesta Ab Saett vid framstaellning av rostfria band och plaatar med god ytjaemnhet och glans
US5160590A (en) * 1989-09-06 1992-11-03 Kawasaki Steel Corp. Electrolytic processing method for electrolytically processing metal surface
DE4110128A1 (de) * 1990-04-09 1991-11-07 Westinghouse Electric Corp Dekontamination von radioaktiv verseuchten metallen
US5098533A (en) * 1991-02-06 1992-03-24 International Business Machines Corp. Electrolytic method for the etch back of encapsulated copper-Invar-copper core structures
US5865965A (en) * 1994-02-01 1999-02-02 Kabushiki Kaisha Toshiba Apparatus for electrochemical decontamination of radioactive metallic waste
TW288145B (ko) * 1994-02-01 1996-10-11 Toshiba Co Ltd
DE4420139C1 (de) * 1994-06-09 1995-12-07 Kraftanlagen En Und Industriea Verfahren zur elektrochemischen Dekontamination von radioaktiv belasteten Oberflächen von Metallkomponenten aus kerntechnischen Anlagen
US7384529B1 (en) 2000-09-29 2008-06-10 The United States Of America As Represented By The United States Department Of Energy Method for electrochemical decontamination of radioactive metal
US20100072059A1 (en) * 2008-09-25 2010-03-25 Peters Michael J Electrolytic System and Method for Enhanced Radiological, Nuclear, and Industrial Decontamination
KR101289231B1 (ko) * 2011-12-16 2013-07-29 재단법인 포항산업과학연구원 방사성 원소 함량이 낮은 지르콘 정광의 제조방법
CN104389011B (zh) * 2014-11-27 2017-01-18 中国原子能科学研究院 一种电化学去污电解液

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US2492047A (en) * 1946-03-30 1949-12-20 Du Pont Bleaching wood pulp
US2468006A (en) * 1948-06-23 1949-04-19 J H Shoemaker Electrolytic cleaning of metal
FR1237777A (fr) * 1959-06-20 1960-08-05 Jacquet Hispano Suiza Perfectionnements apportés aux moyens pour séparer ou éliminer des éléments radio-actifs à la surface de pièces ou ensembles
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100514612B1 (ko) * 2002-11-14 2005-09-16 주식회사 데콘엔지니어링 중성염 전해연마를 이용한 방사능 오염 금속의 제염장치

Also Published As

Publication number Publication date
DE3464292D1 (en) 1987-07-23
US4481089A (en) 1984-11-06
JPS59154400A (ja) 1984-09-03
EP0125401A1 (en) 1984-11-21
EP0125401B1 (en) 1987-06-16
JPH052960B2 (ko) 1993-01-13
KR900000343B1 (ko) 1990-01-25

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