KR20250140559A - 학습 모델 적합 영역 검지 장치, 학습 모델 적합 영역 검지 방법, 그리고 학습 모델 운용 방법 - Google Patents

학습 모델 적합 영역 검지 장치, 학습 모델 적합 영역 검지 방법, 그리고 학습 모델 운용 방법

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Publication number
KR20250140559A
KR20250140559A KR1020257027850A KR20257027850A KR20250140559A KR 20250140559 A KR20250140559 A KR 20250140559A KR 1020257027850 A KR1020257027850 A KR 1020257027850A KR 20257027850 A KR20257027850 A KR 20257027850A KR 20250140559 A KR20250140559 A KR 20250140559A
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KR
South Korea
Prior art keywords
image
information
model
learning
model suitable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257027850A
Other languages
English (en)
Korean (ko)
Inventor
무네또시 우누마
소따 고마쯔
마사요시 이시까와
야스따까 도요다
도모유끼 오꾸다
다까히로 모또요시
Original Assignee
주식회사 히타치하이테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 주식회사 히타치하이테크 filed Critical 주식회사 히타치하이테크
Publication of KR20250140559A publication Critical patent/KR20250140559A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
    • G05B23/0267—Fault communication, e.g. human machine interface [HMI]
    • G05B23/027—Alarm generation, e.g. communication protocol; Forms of alarm
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N20/00—Machine learning
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T3/00—Geometric image transformations in the plane of the image
    • G06T3/40—Scaling of whole images or parts thereof, e.g. expanding or contracting
    • G06T3/4053—Scaling of whole images or parts thereof, e.g. expanding or contracting based on super-resolution, i.e. the output image resolution being higher than the sensor resolution
    • G06T3/4076—Scaling of whole images or parts thereof, e.g. expanding or contracting based on super-resolution, i.e. the output image resolution being higher than the sensor resolution using the original low-resolution images to iteratively correct the high-resolution images
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/60—Image enhancement or restoration using machine learning, e.g. neural networks
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/10—Segmentation; Edge detection
    • G06T7/11—Region-based segmentation
    • H01L22/10—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20081—Training; Learning
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Software Systems (AREA)
  • Artificial Intelligence (AREA)
  • Mathematical Physics (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • Data Mining & Analysis (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Human Computer Interaction (AREA)
  • Quality & Reliability (AREA)
  • Image Analysis (AREA)
  • Image Processing (AREA)
  • Facsimile Image Signal Circuits (AREA)
  • Manufacturing & Machinery (AREA)
KR1020257027850A 2023-04-25 2023-04-25 학습 모델 적합 영역 검지 장치, 학습 모델 적합 영역 검지 방법, 그리고 학습 모델 운용 방법 Pending KR20250140559A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/016216 WO2024224467A1 (ja) 2023-04-25 2023-04-25 学習モデル適合領域検知装置、学習モデル適合領域検知方法、並びに学習モデル運用方法

Publications (1)

Publication Number Publication Date
KR20250140559A true KR20250140559A (ko) 2025-09-25

Family

ID=93256054

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257027850A Pending KR20250140559A (ko) 2023-04-25 2023-04-25 학습 모델 적합 영역 검지 장치, 학습 모델 적합 영역 검지 방법, 그리고 학습 모델 운용 방법

Country Status (4)

Country Link
JP (1) JPWO2024224467A1 (https=)
KR (1) KR20250140559A (https=)
CN (1) CN120752649A (https=)
WO (1) WO2024224467A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021095256A1 (ja) 2019-11-15 2021-05-20 オリンパス株式会社 画像処理システム、画像処理方法、及び、プログラム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022070236A1 (ja) * 2020-09-29 2022-04-07 株式会社日立ハイテク 画質改善システム及び画質改善方法
JP7724114B2 (ja) * 2021-09-06 2025-08-15 川崎重工業株式会社 学習済モデルの構築方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021095256A1 (ja) 2019-11-15 2021-05-20 オリンパス株式会社 画像処理システム、画像処理方法、及び、プログラム

Also Published As

Publication number Publication date
WO2024224467A1 (ja) 2024-10-31
CN120752649A (zh) 2025-10-03
TW202443446A (zh) 2024-11-01
JPWO2024224467A1 (https=) 2024-10-31

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