KR20250077469A - 감광성 조성물, 경화물, 전자 부품, 및 경화물의 제조 방법 - Google Patents

감광성 조성물, 경화물, 전자 부품, 및 경화물의 제조 방법 Download PDF

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KR20250077469A
KR20250077469A KR1020257007613A KR20257007613A KR20250077469A KR 20250077469 A KR20250077469 A KR 20250077469A KR 1020257007613 A KR1020257007613 A KR 1020257007613A KR 20257007613 A KR20257007613 A KR 20257007613A KR 20250077469 A KR20250077469 A KR 20250077469A
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South Korea
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group
resin
acid
photosensitive composition
compound
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KR1020257007613A
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English (en)
Korean (ko)
Inventor
유고 타니가키
히토시 아라키
타카유키 카네키
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도레이 카부시키가이샤
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
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    • C08G73/101—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
    • C08G73/1014—Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents in the form of (mono)anhydrid
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    • C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
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    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
KR1020257007613A 2022-09-28 2023-09-14 감광성 조성물, 경화물, 전자 부품, 및 경화물의 제조 방법 Pending KR20250077469A (ko)

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Application Number Priority Date Filing Date Title
JPJP-P-2022-154556 2022-09-28
JP2022154556 2022-09-28
PCT/JP2023/033519 WO2024070725A1 (ja) 2022-09-28 2023-09-14 感光性組成物、硬化物、電子部品、及び硬化物の製造方法

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KR20250077469A true KR20250077469A (ko) 2025-05-30

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Country Link
US (1) US20260079397A1 (https=)
EP (1) EP4597224A1 (https=)
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