KR20250041166A - 포지티브형 감광성 수지 조성물 - Google Patents

포지티브형 감광성 수지 조성물 Download PDF

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Publication number
KR20250041166A
KR20250041166A KR1020257006213A KR20257006213A KR20250041166A KR 20250041166 A KR20250041166 A KR 20250041166A KR 1020257006213 A KR1020257006213 A KR 1020257006213A KR 20257006213 A KR20257006213 A KR 20257006213A KR 20250041166 A KR20250041166 A KR 20250041166A
Authority
KR
South Korea
Prior art keywords
group
component
photosensitive resin
resin composition
positive photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257006213A
Other languages
English (en)
Korean (ko)
Inventor
하루키 츠지모토
히로유키 오무라
Original Assignee
닛산 가가쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 닛산 가가쿠 가부시키가이샤 filed Critical 닛산 가가쿠 가부시키가이샤
Publication of KR20250041166A publication Critical patent/KR20250041166A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/62—Monocarboxylic acids having ten or more carbon atoms; Derivatives thereof
    • C08F220/70—Nitriles; Amides; Imides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020257006213A 2022-07-26 2023-07-11 포지티브형 감광성 수지 조성물 Pending KR20250041166A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022118917 2022-07-26
JPJP-P-2022-118917 2022-07-26
PCT/JP2023/025625 WO2024024502A1 (ja) 2022-07-26 2023-07-11 ポジ型感光性樹脂組成物

Publications (1)

Publication Number Publication Date
KR20250041166A true KR20250041166A (ko) 2025-03-25

Family

ID=89706197

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257006213A Pending KR20250041166A (ko) 2022-07-26 2023-07-11 포지티브형 감광성 수지 조성물

Country Status (5)

Country Link
JP (1) JPWO2024024502A1 (https=)
KR (1) KR20250041166A (https=)
CN (1) CN119604817A (https=)
TW (1) TW202422225A (https=)
WO (1) WO2024024502A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20260018439A (ko) * 2024-07-31 2026-02-09 주식회사 헤라켐테크놀러지 감광성 수지 조성물 및 이를 이용하여 패턴을 형성하는 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1154270A (ja) 1997-07-30 1999-02-26 Seiko Epson Corp 有機ｅｌ素子用組成物および有機ｅｌ素子の製造方法
JP2000187111A (ja) 1998-12-21 2000-07-04 Seiko Epson Corp カラーフィルタ基板
JP2009258669A (ja) 2008-03-27 2009-11-05 Toppan Printing Co Ltd パターン形成基板、パターン形成基板の製造方法、カラーフィルタ、液晶表示装置
JP2015172742A (ja) 2014-02-18 2015-10-01 旭硝子株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
JP6744577B2 (ja) 2014-12-04 2020-08-19 日産化学株式会社 ポジ型感光性樹脂組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012226044A (ja) * 2011-04-18 2012-11-15 Hitachi Chem Co Ltd ポジ型感光性樹脂組成物、レジストパターンの製造方法、半導体装置及び電子デバイス
KR102601182B1 (ko) * 2017-04-21 2023-11-09 닛산 가가쿠 가부시키가이샤 감광성 수지 조성물

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1154270A (ja) 1997-07-30 1999-02-26 Seiko Epson Corp 有機ｅｌ素子用組成物および有機ｅｌ素子の製造方法
JP2000187111A (ja) 1998-12-21 2000-07-04 Seiko Epson Corp カラーフィルタ基板
JP2009258669A (ja) 2008-03-27 2009-11-05 Toppan Printing Co Ltd パターン形成基板、パターン形成基板の製造方法、カラーフィルタ、液晶表示装置
JP2015172742A (ja) 2014-02-18 2015-10-01 旭硝子株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
JP6744577B2 (ja) 2014-12-04 2020-08-19 日産化学株式会社 ポジ型感光性樹脂組成物

Also Published As

Publication number Publication date
WO2024024502A1 (ja) 2024-02-01
TW202422225A (zh) 2024-06-01
JPWO2024024502A1 (https=) 2024-02-01
CN119604817A (zh) 2025-03-11

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Date Code Title Description
PA0105 International application

Patent event date: 20250225

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application