KR20230153446A - 직접 결합을 위한 접촉 구조 - Google Patents
직접 결합을 위한 접촉 구조 Download PDFInfo
- Publication number
- KR20230153446A KR20230153446A KR1020237033687A KR20237033687A KR20230153446A KR 20230153446 A KR20230153446 A KR 20230153446A KR 1020237033687 A KR1020237033687 A KR 1020237033687A KR 20237033687 A KR20237033687 A KR 20237033687A KR 20230153446 A KR20230153446 A KR 20230153446A
- Authority
- KR
- South Korea
- Prior art keywords
- conductive
- clause
- less
- contact structure
- conductive feature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H01L24/08—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
-
- H01L24/05—
-
- H01L24/80—
-
- H01L2224/0346—
-
- H01L2224/03462—
-
- H01L2224/05541—
-
- H01L2224/05547—
-
- H01L2224/05569—
-
- H01L2224/05999—
-
- H01L2224/08121—
-
- H01L2224/08145—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
- H10W72/01908—Manufacture or treatment of bond pads using permanent auxiliary members, e.g. using alignment marks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
- H10W72/01931—Manufacture or treatment of bond pads using blanket deposition
- H10W72/01933—Manufacture or treatment of bond pads using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating
- H10W72/01935—Manufacture or treatment of bond pads using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating by plating, e.g. electroless plating or electroplating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/072—Connecting or disconnecting of bump connectors
- H10W72/07231—Techniques
- H10W72/07236—Soldering or alloying
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/923—Bond pads having multiple stacked layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/921—Structures or relative sizes of bond pads
- H10W72/925—Bond pads having a filler embedded in a matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/941—Dispositions of bond pads
- H10W72/942—Dispositions of bond pads relative to underlying supporting features, e.g. bond pads, RDLs or vias
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/90—Bond pads, in general
- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/011—Manufacture or treatment of pads or other interconnections to be direct bonded
- H10W80/031—Changing or setting shapes of the pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/102—Controlling the environment during the bonding, e.g. the temperature or pressure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/301—Bonding techniques, e.g. hybrid bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/301—Bonding techniques, e.g. hybrid bonding
- H10W80/312—Bonding techniques, e.g. hybrid bonding characterised by the direct bonding of electrically conductive pads
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/301—Bonding techniques, e.g. hybrid bonding
- H10W80/327—Bonding techniques, e.g. hybrid bonding characterised by the direct bonding of insulating parts, e.g. of silicon oxide layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W80/00—Direct bonding of chips, wafers or substrates
- H10W80/701—Direct bonding of chips, wafers or substrates characterised by the pads after the direct bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/791—Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads
- H10W90/792—Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads between multiple chips
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/791—Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads
- H10W90/794—Package configurations characterised by the relative positions of pads or connectors relative to package parts of direct-bonded pads between a chip and a stacked insulating package substrate, interposer or RDL
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163156290P | 2021-03-03 | 2021-03-03 | |
| US63/156,290 | 2021-03-03 | ||
| PCT/US2022/018574 WO2022187402A1 (en) | 2021-03-03 | 2022-03-02 | Contact structures for direct bonding |
| US17/684,841 | 2022-03-02 | ||
| US17/684,841 US20220285303A1 (en) | 2021-03-03 | 2022-03-02 | Contact structures for direct bonding |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230153446A true KR20230153446A (ko) | 2023-11-06 |
Family
ID=83117308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237033687A Pending KR20230153446A (ko) | 2021-03-03 | 2022-03-02 | 직접 결합을 위한 접촉 구조 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220285303A1 (enExample) |
| EP (1) | EP4302325A4 (enExample) |
| JP (1) | JP2024513304A (enExample) |
| KR (1) | KR20230153446A (enExample) |
| CN (1) | CN117256047A (enExample) |
| TW (1) | TW202238765A (enExample) |
| WO (1) | WO2022187402A1 (enExample) |
Families Citing this family (104)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7109092B2 (en) | 2003-05-19 | 2006-09-19 | Ziptronix, Inc. | Method of room temperature covalent bonding |
| US8735219B2 (en) | 2012-08-30 | 2014-05-27 | Ziptronix, Inc. | Heterogeneous annealing method and device |
| US10886250B2 (en) | 2015-07-10 | 2021-01-05 | Invensas Corporation | Structures and methods for low temperature bonding using nanoparticles |
| US9953941B2 (en) | 2015-08-25 | 2018-04-24 | Invensas Bonding Technologies, Inc. | Conductive barrier direct hybrid bonding |
| US10204893B2 (en) | 2016-05-19 | 2019-02-12 | Invensas Bonding Technologies, Inc. | Stacked dies and methods for forming bonded structures |
| US10672663B2 (en) | 2016-10-07 | 2020-06-02 | Xcelsis Corporation | 3D chip sharing power circuit |
| US10580735B2 (en) | 2016-10-07 | 2020-03-03 | Xcelsis Corporation | Stacked IC structure with system level wiring on multiple sides of the IC die |
| US10607136B2 (en) | 2017-08-03 | 2020-03-31 | Xcelsis Corporation | Time borrowing between layers of a three dimensional chip stack |
| TWI822659B (zh) | 2016-10-27 | 2023-11-21 | 美商艾德亞半導體科技有限責任公司 | 用於低溫接合的結構和方法 |
| US10002844B1 (en) | 2016-12-21 | 2018-06-19 | Invensas Bonding Technologies, Inc. | Bonded structures |
| WO2018125673A2 (en) | 2016-12-28 | 2018-07-05 | Invensas Bonding Technologies, Inc | Processing stacked substrates |
| US20180182665A1 (en) | 2016-12-28 | 2018-06-28 | Invensas Bonding Technologies, Inc. | Processed Substrate |
| TWI837879B (zh) | 2016-12-29 | 2024-04-01 | 美商艾德亞半導體接合科技有限公司 | 具有整合式被動構件的接合結構 |
| US10629577B2 (en) | 2017-03-16 | 2020-04-21 | Invensas Corporation | Direct-bonded LED arrays and applications |
| US10515913B2 (en) | 2017-03-17 | 2019-12-24 | Invensas Bonding Technologies, Inc. | Multi-metal contact structure |
| US10508030B2 (en) | 2017-03-21 | 2019-12-17 | Invensas Bonding Technologies, Inc. | Seal for microelectronic assembly |
| US10269756B2 (en) | 2017-04-21 | 2019-04-23 | Invensas Bonding Technologies, Inc. | Die processing |
| US10879212B2 (en) | 2017-05-11 | 2020-12-29 | Invensas Bonding Technologies, Inc. | Processed stacked dies |
| US10446441B2 (en) | 2017-06-05 | 2019-10-15 | Invensas Corporation | Flat metal features for microelectronics applications |
| US10217720B2 (en) | 2017-06-15 | 2019-02-26 | Invensas Corporation | Multi-chip modules formed using wafer-level processing of a reconstitute wafer |
| US10840205B2 (en) | 2017-09-24 | 2020-11-17 | Invensas Bonding Technologies, Inc. | Chemical mechanical polishing for hybrid bonding |
| US11031285B2 (en) | 2017-10-06 | 2021-06-08 | Invensas Bonding Technologies, Inc. | Diffusion barrier collar for interconnects |
| US11011503B2 (en) | 2017-12-15 | 2021-05-18 | Invensas Bonding Technologies, Inc. | Direct-bonded optoelectronic interconnect for high-density integrated photonics |
| US11380597B2 (en) | 2017-12-22 | 2022-07-05 | Invensas Bonding Technologies, Inc. | Bonded structures |
| US10727219B2 (en) | 2018-02-15 | 2020-07-28 | Invensas Bonding Technologies, Inc. | Techniques for processing devices |
| US11169326B2 (en) | 2018-02-26 | 2021-11-09 | Invensas Bonding Technologies, Inc. | Integrated optical waveguides, direct-bonded waveguide interface joints, optical routing and interconnects |
| US11256004B2 (en) | 2018-03-20 | 2022-02-22 | Invensas Bonding Technologies, Inc. | Direct-bonded lamination for improved image clarity in optical devices |
| US10991804B2 (en) | 2018-03-29 | 2021-04-27 | Xcelsis Corporation | Transistor level interconnection methodologies utilizing 3D interconnects |
| US11056348B2 (en) | 2018-04-05 | 2021-07-06 | Invensas Bonding Technologies, Inc. | Bonding surfaces for microelectronics |
| US10790262B2 (en) | 2018-04-11 | 2020-09-29 | Invensas Bonding Technologies, Inc. | Low temperature bonded structures |
| US11244916B2 (en) | 2018-04-11 | 2022-02-08 | Invensas Bonding Technologies, Inc. | Low temperature bonded structures |
| US10964664B2 (en) | 2018-04-20 | 2021-03-30 | Invensas Bonding Technologies, Inc. | DBI to Si bonding for simplified handle wafer |
| US11004757B2 (en) | 2018-05-14 | 2021-05-11 | Invensas Bonding Technologies, Inc. | Bonded structures |
| US11276676B2 (en) | 2018-05-15 | 2022-03-15 | Invensas Bonding Technologies, Inc. | Stacked devices and methods of fabrication |
| US10923413B2 (en) | 2018-05-30 | 2021-02-16 | Xcelsis Corporation | Hard IP blocks with physically bidirectional passageways |
| WO2019241417A1 (en) | 2018-06-13 | 2019-12-19 | Invensas Bonding Technologies, Inc. | Tsv as pad |
| US11393779B2 (en) | 2018-06-13 | 2022-07-19 | Invensas Bonding Technologies, Inc. | Large metal pads over TSV |
| US10910344B2 (en) | 2018-06-22 | 2021-02-02 | Xcelsis Corporation | Systems and methods for releveled bump planes for chiplets |
| US11664357B2 (en) | 2018-07-03 | 2023-05-30 | Adeia Semiconductor Bonding Technologies Inc. | Techniques for joining dissimilar materials in microelectronics |
| WO2020010136A1 (en) | 2018-07-06 | 2020-01-09 | Invensas Bonding Technologies, Inc. | Molded direct bonded and interconnected stack |
| WO2020010265A1 (en) | 2018-07-06 | 2020-01-09 | Invensas Bonding Technologies, Inc. | Microelectronic assemblies |
| US12406959B2 (en) | 2018-07-26 | 2025-09-02 | Adeia Semiconductor Bonding Technologies Inc. | Post CMP processing for hybrid bonding |
| US11515291B2 (en) | 2018-08-28 | 2022-11-29 | Adeia Semiconductor Inc. | Integrated voltage regulator and passive components |
| US11296044B2 (en) | 2018-08-29 | 2022-04-05 | Invensas Bonding Technologies, Inc. | Bond enhancement structure in microelectronics for trapping contaminants during direct-bonding processes |
| US11011494B2 (en) | 2018-08-31 | 2021-05-18 | Invensas Bonding Technologies, Inc. | Layer structures for making direct metal-to-metal bonds at low temperatures in microelectronics |
| US11158573B2 (en) | 2018-10-22 | 2021-10-26 | Invensas Bonding Technologies, Inc. | Interconnect structures |
| US11244920B2 (en) | 2018-12-18 | 2022-02-08 | Invensas Bonding Technologies, Inc. | Method and structures for low temperature device bonding |
| KR20210104742A (ko) | 2019-01-14 | 2021-08-25 | 인벤사스 본딩 테크놀로지스 인코포레이티드 | 접합 구조체 |
| US11387202B2 (en) | 2019-03-01 | 2022-07-12 | Invensas Llc | Nanowire bonding interconnect for fine-pitch microelectronics |
| US11901281B2 (en) | 2019-03-11 | 2024-02-13 | Adeia Semiconductor Bonding Technologies Inc. | Bonded structures with integrated passive component |
| US10854578B2 (en) | 2019-03-29 | 2020-12-01 | Invensas Corporation | Diffused bitline replacement in stacked wafer memory |
| US11205625B2 (en) | 2019-04-12 | 2021-12-21 | Invensas Bonding Technologies, Inc. | Wafer-level bonding of obstructive elements |
| US11373963B2 (en) | 2019-04-12 | 2022-06-28 | Invensas Bonding Technologies, Inc. | Protective elements for bonded structures |
| US11610846B2 (en) | 2019-04-12 | 2023-03-21 | Adeia Semiconductor Bonding Technologies Inc. | Protective elements for bonded structures including an obstructive element |
| US11355404B2 (en) | 2019-04-22 | 2022-06-07 | Invensas Bonding Technologies, Inc. | Mitigating surface damage of probe pads in preparation for direct bonding of a substrate |
| US11385278B2 (en) | 2019-05-23 | 2022-07-12 | Invensas Bonding Technologies, Inc. | Security circuitry for bonded structures |
| US12374641B2 (en) | 2019-06-12 | 2025-07-29 | Adeia Semiconductor Bonding Technologies Inc. | Sealed bonded structures and methods for forming the same |
| US11296053B2 (en) | 2019-06-26 | 2022-04-05 | Invensas Bonding Technologies, Inc. | Direct bonded stack structures for increased reliability and improved yield in microelectronics |
| US12080672B2 (en) | 2019-09-26 | 2024-09-03 | Adeia Semiconductor Bonding Technologies Inc. | Direct gang bonding methods including directly bonding first element to second element to form bonded structure without adhesive |
| US12113054B2 (en) | 2019-10-21 | 2024-10-08 | Adeia Semiconductor Technologies Llc | Non-volatile dynamic random access memory |
| US11862602B2 (en) | 2019-11-07 | 2024-01-02 | Adeia Semiconductor Technologies Llc | Scalable architecture for reduced cycles across SOC |
| US11762200B2 (en) | 2019-12-17 | 2023-09-19 | Adeia Semiconductor Bonding Technologies Inc. | Bonded optical devices |
| US11876076B2 (en) | 2019-12-20 | 2024-01-16 | Adeia Semiconductor Technologies Llc | Apparatus for non-volatile random access memory stacks |
| US11721653B2 (en) | 2019-12-23 | 2023-08-08 | Adeia Semiconductor Bonding Technologies Inc. | Circuitry for electrical redundancy in bonded structures |
| CN121793755A (zh) | 2019-12-23 | 2026-04-03 | 隔热半导体粘合技术公司 | 用于接合结构的电冗余 |
| CN115943489A (zh) | 2020-03-19 | 2023-04-07 | 隔热半导体粘合技术公司 | 用于直接键合结构的尺寸补偿控制 |
| US11742314B2 (en) | 2020-03-31 | 2023-08-29 | Adeia Semiconductor Bonding Technologies Inc. | Reliable hybrid bonded apparatus |
| US11735523B2 (en) * | 2020-05-19 | 2023-08-22 | Adeia Semiconductor Bonding Technologies Inc. | Laterally unconfined structure |
| US11631647B2 (en) | 2020-06-30 | 2023-04-18 | Adeia Semiconductor Bonding Technologies Inc. | Integrated device packages with integrated device die and dummy element |
| US11728273B2 (en) | 2020-09-04 | 2023-08-15 | Adeia Semiconductor Bonding Technologies Inc. | Bonded structure with interconnect structure |
| US11764177B2 (en) | 2020-09-04 | 2023-09-19 | Adeia Semiconductor Bonding Technologies Inc. | Bonded structure with interconnect structure |
| US11264357B1 (en) | 2020-10-20 | 2022-03-01 | Invensas Corporation | Mixed exposure for large die |
| KR20230097121A (ko) | 2020-10-29 | 2023-06-30 | 아데이아 세미컨덕터 본딩 테크놀로지스 인코포레이티드 | 직접 접합 방법 및 구조체 |
| US12456662B2 (en) | 2020-12-28 | 2025-10-28 | Adeia Semiconductor Bonding Technologies Inc. | Structures with through-substrate vias and methods for forming the same |
| WO2022147430A1 (en) | 2020-12-28 | 2022-07-07 | Invensas Bonding Technologies, Inc. | Structures with through-substrate vias and methods for forming the same |
| CN116848631A (zh) | 2020-12-30 | 2023-10-03 | 美商艾德亚半导体接合科技有限公司 | 具有导电特征的结构及其形成方法 |
| WO2022189283A1 (en) * | 2021-03-06 | 2022-09-15 | Atotech Deutschland GmbH & Co. KG | Method for copper-to-copper direct bonding and assembly |
| US12525572B2 (en) | 2021-03-31 | 2026-01-13 | Adeia Semiconductor Bonding Technologies Inc. | Direct bonding and debonding of carrier |
| EP4315411A4 (en) | 2021-03-31 | 2025-04-30 | Adeia Semiconductor Bonding Technologies Inc. | DIRECT BINDING METHODS AND STRUCTURES |
| US12176321B2 (en) * | 2021-03-31 | 2024-12-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor packages and method of forming the same |
| JP2024528964A (ja) | 2021-08-02 | 2024-08-01 | アデイア セミコンダクター ボンディング テクノロジーズ インコーポレイテッド | ボンデッド構造体用の保護半導体素子 |
| KR20240059637A (ko) | 2021-09-24 | 2024-05-07 | 아데이아 세미컨덕터 본딩 테크놀로지스 인코포레이티드 | 능동 인터포저를 가진 결합 구조체 |
| US12563749B2 (en) | 2021-10-28 | 2026-02-24 | Adeia Semiconductor Bonding Technologies Inc | Stacked electronic devices |
| US12604771B2 (en) | 2021-10-28 | 2026-04-14 | Adeia Semiconductor Bonding Technologies Inc. | Direct bonding methods and structures |
| US12557615B2 (en) | 2021-12-13 | 2026-02-17 | Adeia Semiconductor Technologies Llc | Methods for bonding semiconductor elements |
| JP2025500315A (ja) | 2021-12-20 | 2025-01-09 | アデイア セミコンダクター ボンディング テクノロジーズ インコーポレイテッド | ダイパッケージの熱電冷却 |
| JP7720589B2 (ja) * | 2022-02-28 | 2025-08-08 | 新光電気工業株式会社 | 接続構造体、半導体装置及び接続構造体の製造方法 |
| KR102878102B1 (ko) * | 2022-03-02 | 2025-10-28 | 삼성전자주식회사 | 반도체 패키지 |
| US20230299029A1 (en) * | 2022-03-16 | 2023-09-21 | Adeia Semiconductor Bonding Technologies Inc. | Expansion control for bonding |
| US12512425B2 (en) | 2022-04-25 | 2025-12-30 | Adeia Semiconductor Bonding Technologies Inc. | Expansion controlled structure for direct bonding and method of forming same |
| JP2025517291A (ja) | 2022-05-23 | 2025-06-05 | アデイア セミコンダクター ボンディング テクノロジーズ インコーポレイテッド | ボンデッド構造体のための試験用素子 |
| US12293982B2 (en) * | 2022-06-14 | 2025-05-06 | Nanya Technology Corporation | Semiconductor structure having hybrid bonding pad |
| US12266622B2 (en) * | 2022-06-14 | 2025-04-01 | Nanya Technology Corporation | Method of manufacturing semiconductor structure having hybrid bonding pad |
| US12532780B2 (en) * | 2022-08-22 | 2026-01-20 | Micron Technology, Inc. | Hybrid bonding for semiconductor device assemblies |
| US20240128217A1 (en) * | 2022-10-14 | 2024-04-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and manufacturing method thereof |
| TWI859609B (zh) * | 2022-10-21 | 2024-10-21 | 國立陽明交通大學 | 電性連接體與其形成方法 |
| TWI854373B (zh) * | 2022-11-22 | 2024-09-01 | 樂鑫材料科技股份有限公司 | 背晶金屬化薄膜結構及其形成方法 |
| US12506114B2 (en) | 2022-12-29 | 2025-12-23 | Adeia Semiconductor Bonding Technologies Inc. | Directly bonded metal structures having aluminum features and methods of preparing same |
| US12545010B2 (en) * | 2022-12-29 | 2026-02-10 | Adeia Semiconductor Bonding Technologies Inc. | Directly bonded metal structures having oxide layers therein |
| US20240254645A1 (en) * | 2023-01-27 | 2024-08-01 | Applied Materials, Inc. | Low temperature hybrid bonding metallization |
| US12341083B2 (en) | 2023-02-08 | 2025-06-24 | Adeia Semiconductor Bonding Technologies Inc. | Electronic device cooling structures bonded to semiconductor elements |
| US12598962B2 (en) | 2023-03-14 | 2026-04-07 | Adeia Semiconductor Bonding Technologies Inc. | System and method for bonding transparent conductor substrates |
| TWI853498B (zh) * | 2023-03-20 | 2024-08-21 | 旺宏電子股份有限公司 | 接合結構、半導體晶片及其製造方法 |
| US12500143B2 (en) | 2023-03-20 | 2025-12-16 | Macronix International Co., Ltd. | Bonding structure, semiconductor chip and fabricating method thereof |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5755859A (en) * | 1995-08-24 | 1998-05-26 | International Business Machines Corporation | Cobalt-tin alloys and their applications for devices, chip interconnections and packaging |
| US6984571B1 (en) | 1999-10-01 | 2006-01-10 | Ziptronix, Inc. | Three dimensional device integration method and integrated device |
| US6902987B1 (en) | 2000-02-16 | 2005-06-07 | Ziptronix, Inc. | Method for low temperature bonding and bonded structure |
| US7109092B2 (en) | 2003-05-19 | 2006-09-19 | Ziptronix, Inc. | Method of room temperature covalent bonding |
| US7485968B2 (en) | 2005-08-11 | 2009-02-03 | Ziptronix, Inc. | 3D IC method and device |
| US8609540B2 (en) * | 2011-06-20 | 2013-12-17 | Tessera, Inc. | Reliable packaging and interconnect structures |
| US9048283B2 (en) * | 2012-06-05 | 2015-06-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Hybrid bonding systems and methods for semiconductor wafers |
| US9331038B2 (en) * | 2013-08-29 | 2016-05-03 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor interconnect structure |
| JP6165127B2 (ja) * | 2014-12-22 | 2017-07-19 | 三菱重工工作機械株式会社 | 半導体装置及び半導体装置の製造方法 |
| US9741620B2 (en) | 2015-06-24 | 2017-08-22 | Invensas Corporation | Structures and methods for reliable packages |
| US10886250B2 (en) * | 2015-07-10 | 2021-01-05 | Invensas Corporation | Structures and methods for low temperature bonding using nanoparticles |
| US9728521B2 (en) | 2015-07-23 | 2017-08-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Hybrid bond using a copper alloy for yield improvement |
| US9852988B2 (en) | 2015-12-18 | 2017-12-26 | Invensas Bonding Technologies, Inc. | Increased contact alignment tolerance for direct bonding |
| US10446441B2 (en) * | 2017-06-05 | 2019-10-15 | Invensas Corporation | Flat metal features for microelectronics applications |
| US11195748B2 (en) | 2017-09-27 | 2021-12-07 | Invensas Corporation | Interconnect structures and methods for forming same |
| US11011494B2 (en) * | 2018-08-31 | 2021-05-18 | Invensas Bonding Technologies, Inc. | Layer structures for making direct metal-to-metal bonds at low temperatures in microelectronics |
| US11244920B2 (en) * | 2018-12-18 | 2022-02-08 | Invensas Bonding Technologies, Inc. | Method and structures for low temperature device bonding |
-
2022
- 2022-03-02 KR KR1020237033687A patent/KR20230153446A/ko active Pending
- 2022-03-02 US US17/684,841 patent/US20220285303A1/en active Pending
- 2022-03-02 CN CN202280030820.8A patent/CN117256047A/zh active Pending
- 2022-03-02 JP JP2023553418A patent/JP2024513304A/ja active Pending
- 2022-03-02 WO PCT/US2022/018574 patent/WO2022187402A1/en not_active Ceased
- 2022-03-02 EP EP22764005.9A patent/EP4302325A4/en active Pending
- 2022-03-03 TW TW111107795A patent/TW202238765A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20220285303A1 (en) | 2022-09-08 |
| TW202238765A (zh) | 2022-10-01 |
| WO2022187402A1 (en) | 2022-09-09 |
| CN117256047A (zh) | 2023-12-19 |
| JP2024513304A (ja) | 2024-03-25 |
| EP4302325A1 (en) | 2024-01-10 |
| EP4302325A4 (en) | 2025-01-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20230153446A (ko) | 직접 결합을 위한 접촉 구조 | |
| US12154880B2 (en) | Method and structures for low temperature device bonding | |
| US12512425B2 (en) | Expansion controlled structure for direct bonding and method of forming same | |
| US12125784B2 (en) | Interconnect structures | |
| US20230132632A1 (en) | Diffusion barriers and method of forming same | |
| US12132020B2 (en) | Low temperature bonded structures | |
| JP2024501016A (ja) | 基板貫通ビアを有する構造体及びそれを形成する方法 | |
| TW202335054A (zh) | 具有用於直接接合的導電特徵的結構及形成其之方法 | |
| CN116830256A (zh) | 具有贯穿衬底过孔的结构及其形成方法 | |
| US12622307B2 (en) | Controlled grain growth for bonding and bonded structure with controlled grain growth | |
| TW202341359A (zh) | 用於黏晶之受控的晶粒成長及具有受控的晶粒成長之經黏晶結構 | |
| WO2023122697A1 (en) | Controlled grain growth for bonding and bonded structure with controlled grain growth |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| D13 | Search requested |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D13-SRH-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| D13-X000 | Search requested |
St.27 status event code: A-1-2-D10-D13-srh-X000 |
|
| D14 | Search report completed |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D14-SRH-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| D14-X000 | Search report completed |
St.27 status event code: A-1-2-D10-D14-srh-X000 |
|
| D21 | Rejection of application intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |
|
| P11 | Amendment of application requested |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13 | Application amended |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |