KR20230142334A - Tcp 윈도우들을 위한 하이브리드 액체/공기 냉각 시스템 - Google Patents

Tcp 윈도우들을 위한 하이브리드 액체/공기 냉각 시스템 Download PDF

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Publication number
KR20230142334A
KR20230142334A KR1020227045239A KR20227045239A KR20230142334A KR 20230142334 A KR20230142334 A KR 20230142334A KR 1020227045239 A KR1020227045239 A KR 1020227045239A KR 20227045239 A KR20227045239 A KR 20227045239A KR 20230142334 A KR20230142334 A KR 20230142334A
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KR
South Korea
Prior art keywords
dielectric window
faraday shield
cooling
cooling channels
assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020227045239A
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English (en)
Korean (ko)
Inventor
안드레아 알베르티
사라바나프리얀 스리라만
존 드루어리
알렉산더 밀러 패터슨
Original Assignee
램 리써치 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20230142334A publication Critical patent/KR20230142334A/ko
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020227045239A 2021-02-10 2022-02-07 Tcp 윈도우들을 위한 하이브리드 액체/공기 냉각 시스템 Pending KR20230142334A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163147802P 2021-02-10 2021-02-10
US63/147,802 2021-02-10
PCT/US2022/015479 WO2022173695A1 (en) 2021-02-10 2022-02-07 Hybrid liquid/air cooling system for tcp windows

Publications (1)

Publication Number Publication Date
KR20230142334A true KR20230142334A (ko) 2023-10-11

Family

ID=82838704

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020227045239A Pending KR20230142334A (ko) 2021-02-10 2022-02-07 Tcp 윈도우들을 위한 하이브리드 액체/공기 냉각 시스템

Country Status (4)

Country Link
US (1) US20230245854A1 (https=)
JP (1) JP2024506289A (https=)
KR (1) KR20230142334A (https=)
WO (1) WO2022173695A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250095970A1 (en) * 2023-09-14 2025-03-20 Applied Materials, Inc. Plasma processing chamber lid cooling
WO2025101320A1 (en) * 2023-11-08 2025-05-15 Lam Research Corporation Composite window with liquid cooling for inductively coupled plasma processing system

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6036878A (en) * 1996-02-02 2000-03-14 Applied Materials, Inc. Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna
US6287435B1 (en) * 1998-05-06 2001-09-11 Tokyo Electron Limited Method and apparatus for ionized physical vapor deposition
US6652711B2 (en) * 2001-06-06 2003-11-25 Tokyo Electron Limited Inductively-coupled plasma processing system
WO2003029513A1 (en) * 2001-09-28 2003-04-10 Tokyo Electron Limited Hybrid plasma processing apparatus
US20050145341A1 (en) * 2003-11-19 2005-07-07 Masaki Suzuki Plasma processing apparatus
JP2007012734A (ja) * 2005-06-29 2007-01-18 Matsushita Electric Ind Co Ltd プラズマエッチング装置及びプラズマエッチング方法
US20110168673A1 (en) * 2008-07-04 2011-07-14 Tokyo Electron Limited Plasma processing apparatus, plasma processing method, and mechanism for regulating temperature of dielectric window
US9978565B2 (en) * 2011-10-07 2018-05-22 Lam Research Corporation Systems for cooling RF heated chamber components
US9437400B2 (en) * 2012-05-02 2016-09-06 Lam Research Corporation Insulated dielectric window assembly of an inductively coupled plasma processing apparatus
US9885493B2 (en) * 2013-07-17 2018-02-06 Lam Research Corporation Air cooled faraday shield and methods for using the same
US10510511B2 (en) * 2013-10-31 2019-12-17 Semes Co., Ltd. Apparatus for treating substrate
JP6262115B2 (ja) * 2014-02-10 2018-01-17 東京エレクトロン株式会社 基板処理方法及び基板処理装置
KR102262657B1 (ko) * 2014-10-13 2021-06-08 삼성전자주식회사 플라즈마 처리 장치
US20160118284A1 (en) * 2014-10-22 2016-04-28 Panasonic Intellectual Property Management Co., Ltd. Plasma processing apparatus
CN206432233U (zh) * 2017-01-19 2017-08-22 江苏鲁汶仪器有限公司 刻蚀机的下电极载片台
JP6918642B2 (ja) * 2017-08-25 2021-08-11 東京エレクトロン株式会社 冷媒用の流路を有する部材、冷媒用の流路を有する部材の制御方法及び基板処理装置

Also Published As

Publication number Publication date
US20230245854A1 (en) 2023-08-03
JP2024506289A (ja) 2024-02-13
WO2022173695A1 (en) 2022-08-18

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