KR20230140481A - 임프린트 장치, 임프린트 방법, 저장 매체, 및 물품 제조 방법 - Google Patents

임프린트 장치, 임프린트 방법, 저장 매체, 및 물품 제조 방법 Download PDF

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Publication number
KR20230140481A
KR20230140481A KR1020230034515A KR20230034515A KR20230140481A KR 20230140481 A KR20230140481 A KR 20230140481A KR 1020230034515 A KR1020230034515 A KR 1020230034515A KR 20230034515 A KR20230034515 A KR 20230034515A KR 20230140481 A KR20230140481 A KR 20230140481A
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KR
South Korea
Prior art keywords
imprint
gas supply
substrate
gas
mold
Prior art date
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Pending
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KR1020230034515A
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English (en)
Korean (ko)
Inventor
겐이치 고바야시
Original Assignee
캐논 가부시끼가이샤
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Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230140481A publication Critical patent/KR20230140481A/ko
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020230034515A 2022-03-24 2023-03-16 임프린트 장치, 임프린트 방법, 저장 매체, 및 물품 제조 방법 Pending KR20230140481A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2022-047720 2022-03-24
JP2022047720A JP2023141408A (ja) 2022-03-24 2022-03-24 インプリント装置、インプリント方法、コンピュータプログラム、及び、物品の製造方法

Publications (1)

Publication Number Publication Date
KR20230140481A true KR20230140481A (ko) 2023-10-06

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Family Applications (1)

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KR1020230034515A Pending KR20230140481A (ko) 2022-03-24 2023-03-16 임프린트 장치, 임프린트 방법, 저장 매체, 및 물품 제조 방법

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US (2) US12504683B2 (https=)
JP (1) JP2023141408A (https=)
KR (1) KR20230140481A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7669199B2 (ja) * 2021-06-07 2025-04-28 キヤノン株式会社 インプリント装置、インプリント方法、コンピュータプログラム、及び物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7090716B2 (en) 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
JP2011146447A (ja) * 2010-01-12 2011-07-28 Canon Inc インプリント装置及び物品の製造方法
JP6294679B2 (ja) * 2014-01-21 2018-03-14 キヤノン株式会社 インプリント装置及び物品の製造方法
JP6632270B2 (ja) * 2014-09-08 2020-01-22 キヤノン株式会社 インプリント装置、インプリント方法および物品の製造方法
JP6700777B2 (ja) * 2015-12-24 2020-05-27 キヤノン株式会社 インプリント装置、情報処理装置および物品製造方法
JP2019091741A (ja) 2017-11-10 2019-06-13 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6995593B2 (ja) * 2017-12-06 2022-01-14 キヤノン株式会社 インプリント方法、インプリント装置及び物品の製造方法
JP7262930B2 (ja) * 2018-04-26 2023-04-24 キヤノン株式会社 型を用いて基板上の組成物を成形する成形装置、成形方法、および物品の製造方法
JP7204464B2 (ja) * 2018-12-12 2023-01-16 キヤノン株式会社 インプリント方法、インプリント装置および物品製造方法
JP7669199B2 (ja) * 2021-06-07 2025-04-28 キヤノン株式会社 インプリント装置、インプリント方法、コンピュータプログラム、及び物品の製造方法
JP7731831B2 (ja) * 2022-03-11 2025-09-01 キオクシア株式会社 インプリント方法、半導体装置の製造方法、及びインプリント装置

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Publication number Publication date
US20230305388A1 (en) 2023-09-28
US20260063987A1 (en) 2026-03-05
JP2023141408A (ja) 2023-10-05
US12504683B2 (en) 2025-12-23

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