KR20230126170A - Exposure method and exposure device - Google Patents

Abstract

(Problem) Even if there is an exposure head that cannot be exposed due to a problem or the like, exposure is supplemented without lowering the positional accuracy.
(Solution) The exposure method includes a step of irradiating light with a first exposure pattern from a first exposure head toward a first exposure area, and a step of irradiating light with a second exposure pattern from the first exposure head toward a second exposure area. A step of irradiating light with a third exposure pattern from the second exposure head toward a third exposure area, and a step of irradiating light with a fourth exposure pattern from the second exposure head toward the fourth exposure area. do.

Description

Exposure method, and exposure apparatus {EXPOSURE METHOD AND EXPOSURE DEVICE}

The technology disclosed herein relates to exposure of a substrate. Substrates to be processed include, for example, semiconductor wafers, glass substrates for liquid crystal display devices, substrates for flat panel displays (FPD) such as organic EL (electroluminescence) displays, substrates for optical disks, substrates for magnetic disks, and optical disk substrates. A substrate for a magnetic disk, a glass substrate for a photomask, a ceramic substrate, a substrate for a field emission display (ie, FED), or a substrate for a solar cell, and the like are included.

BACKGROUND ART Conventionally, an exposure apparatus that exposes an exposure area on a substrate using a plurality of exposure heads is known (for example, refer to Patent Literature 1).

In such an exposure apparatus, exposure is performed to each exposure area in charge of a plurality of exposure heads. And when any 1 exposure head cannot expose the exposure area|region which it handles by a problem, additional exposure is performed for supplementation separately by another exposure head.

Japanese Unexamined Patent Publication No. 2008-116646

In the prior art, when there is an exposure area that cannot be exposed, additional exposure is performed separately for supplementation, but the additional exposure causes the exposure head to perform an operation different from a normal exposure operation. Therefore, operation control becomes complicated, and the positional accuracy of exposure may deteriorate.

The technology disclosed in this specification is made in view of the problems described above, and is a technology for supplementing exposure without lowering the positional accuracy even when there is an exposure head that cannot perform exposure due to a problem or the like.

An exposure method that is a first aspect of the technology disclosed in this specification is an exposure method using an exposure apparatus including a first exposure head and a second exposure head, wherein the exposure apparatus is applied to a substrate on which a plurality of exposure regions are formed. exposure is performed, and the first exposure head sets a first exposure pattern corresponding to a first exposure area among a plurality of the exposure areas and a second exposure pattern corresponding to a second exposure area among a plurality of the exposure areas. It is capable of irradiating light, and the second exposure head has a third exposure pattern corresponding to a third exposure area among a plurality of the exposure areas and a fourth exposure pattern corresponding to a fourth exposure area among a plurality of the exposure areas. A step of being able to irradiate light and moving a plurality of the exposure areas relative to the first exposure head and the second exposure head, and the first exposure area being located at the exposure position of the first exposure head In the state, the step of irradiating light with the first exposure pattern from the first exposure head toward the first exposure area, and the second exposure area is located at the exposure position of the first exposure head. In a state, a step of irradiating light with the second exposure pattern from the first exposure head toward the second exposure area; and in a state where the third exposure area is located at the exposure position of the second exposure head, the second exposure pattern A step of irradiating light from the exposure head toward the third exposure area with the third exposure pattern, and in a state where the fourth exposure area is located at the exposure position of the second exposure head, from the second exposure head and irradiating light with the fourth exposure pattern toward the fourth exposure area.

An exposure method, which is a second aspect of the technology disclosed in this specification, relates to the exposure method of the first aspect, and includes light irradiated from the first exposure head to the first exposure area, and light emitted from the first exposure head to the second exposure area. Which of the light radiated to the exposure area, the light radiated to the third exposure area from the second exposure head, and the light radiated to the fourth exposure area from the second exposure head corresponds to the exposure area Do not expose for

An exposure method, which is a third aspect of the technology disclosed in this specification, relates to the exposure method of the first or second aspect, wherein the light irradiated from the first exposure head to the first exposure area, and the exposure method from the first exposure head Any one of the light radiated to the second exposure area, the light radiated to the third exposure area from the second exposure head, and the light radiated to the fourth exposure area from the second exposure head is blocked.

An exposure method, which is a fourth aspect of the technology disclosed herein, relates to the exposure method according to any one of the first to third aspects, wherein the first exposure head and the second exposure head are arranged in a first direction, Each of the plurality of exposure regions is arranged in the first direction, and the step of relatively moving the plurality of exposure regions is a step of moving the plurality of exposure regions along the first direction.

An exposure method, which is a fifth aspect of the technology disclosed herein, relates to the exposure method according to any one of the first to fourth aspects, wherein the first exposure area and the second exposure area are formed adjacent to each other, and the first exposure area and the second exposure area are formed adjacent to each other. The third exposure area and the fourth exposure area are formed adjacent to each other.

An exposure method that is a sixth aspect of the technique disclosed in this specification relates to the exposure method of any one of the first to fifth aspects, wherein the first exposure area and the third exposure area are the same exposure area.

An exposure method, which is a seventh aspect of the technology disclosed in this specification, is related to the exposure method, which is a fourth aspect, wherein the first exposure head and the second exposure head are arranged adjacent to each other in the first direction, and the second The exposure area and the third exposure area are the same area, and the first exposure area, the second exposure area, and the fourth exposure area are arranged adjacent to the first direction in order, and the first exposure area Either of the light radiated from the head to the second exposure area and the light radiated from the second exposure head to the third exposure area is blocked.

An exposure apparatus, which is an eighth aspect of the technology disclosed in this specification, includes a first exposure head and a second exposure head for exposing a substrate, a plurality of exposure areas are formed in the substrate, and the One exposure head is capable of irradiating light with a first exposure pattern corresponding to a first exposure area among a plurality of the exposure areas and a second exposure pattern corresponding to a second exposure area among a plurality of the exposure areas, 2 exposure heads are capable of irradiating light with a third exposure pattern corresponding to a third exposure area among a plurality of the exposure areas and a fourth exposure pattern corresponding to a fourth exposure area among a plurality of the exposure areas; A moving unit for moving the exposure area relative to the first exposure head and the second exposure head, and a control unit for controlling exposure operations of the first exposure head and the second exposure head, After the control unit irradiates light from the first exposure head toward the first exposure area in a state where the first exposure area is located at the exposure position of the first exposure head, the first exposure pattern 2 In a state where the exposure area is located at the exposure position of the first exposure head, light is radiated from the first exposure head toward the second exposure area in the second exposure pattern, and the control unit controls the third exposure area. After irradiating light from the second exposure head toward the third exposure area with the third exposure pattern in a state where the exposure area is located at the exposure position of the second exposure head, the fourth exposure area is In a state where the second exposure head is located at the exposure position, light is irradiated from the second exposure head toward the fourth exposure area in the fourth exposure pattern.

An exposure apparatus, which is a ninth aspect of the technique disclosed in this specification, is related to the exposure apparatus, which is an eighth aspect, and emits light emitted by the first exposure head and the second exposure head based on control by the control unit. A light shielding unit capable of being selectively blocked and a sensor configured to detect states of the first exposure head and the second exposure head are further provided, and the moving unit divides the plurality of exposure areas into the first exposure head and the first exposure head. It is configured to move in a first direction with respect to two exposure heads, the first exposure head and the second exposure head are arranged adjacent to each other in the first direction, and the second exposure area and the third exposure area are the same. areas, the first exposure area, the second exposure area, and the fourth exposure area are arranged adjacent to each other in the first direction in the order, and the controller controls the first exposure area based on information from the sensor. It is configured to detect the presence or absence of a problem with one exposure head and the second exposure head, and the control unit, when no problem with the first exposure head and the second exposure head is detected, from the first exposure head When one of the light irradiated to the second exposure area and the light irradiated from the second exposure head to the third exposure area is configured to be blocked by the light blocking unit, and a problem with the first exposure head is detected , When a problem with the second exposure head is detected without at least blocking the light irradiated to the third exposure area from the second exposure head by the light blocking portion, the light blocking portion at least the light blocking portion It is configured not to block the light irradiated to the second exposure area from the first exposure head by the light blocking part.

According to at least the first and eighth aspects of the technology disclosed in this specification, exposure operations of various variations can be realized using a plurality of exposure heads by irradiating light a plurality of times using a plurality of exposure heads, respectively. there is. Therefore, even if one of the plurality of exposure heads is in a state in which exposure cannot be performed due to a problem or the like, exposure can be supplemented by predetermined irradiation of light from other exposure heads a plurality of times without lowering the positional accuracy of exposure.

In addition, the objective, characteristic, aspect, and advantage related to the technology disclosed in this specification will become more clear from the detailed description and accompanying drawings shown below.

1 is a side view showing the configuration of an exposure apparatus according to the present embodiment.
2 is a plan view showing the configuration of the exposure apparatus according to the present embodiment.
3 is a diagram showing an example of a relationship between an exposure area on a substrate and a plurality of exposure heads during normal operation.
4 : is a figure which conceptually shows the structure of a some exposure head.
5 is a diagram conceptually showing a connection configuration between each drive unit and control unit of the exposure apparatus.
6 : is a figure which shows the structure of exposure apparatus centering on a control part for each function.
7 is a flowchart showing an example of the flow of operation of the exposure apparatus.
8 is a plan view showing an operating state of the exposure apparatus.
9 is a plan view showing an operating state of the exposure apparatus.
10 is a plan view showing an operating state of the exposure apparatus.
11 is a plan view showing an operating state of the exposure apparatus.
12 is a plan view showing an operating state of the exposure apparatus.
13 is a plan view showing an operating state of the exposure apparatus.
14 is a plan view showing an operating state of the exposure apparatus.
15 is a plan view showing an operating state of the exposure apparatus.
16 is a plan view showing an operating state of the exposure apparatus.
17 is a plan view showing an operating state of the exposure apparatus.
18 is a plan view showing an operating state of the exposure apparatus.
19 is a plan view showing an operating state of the exposure apparatus.
20 is a plan view showing an operating state of the exposure apparatus.
21 is a plan view showing an operating state of the exposure apparatus.
22 is a plan view showing an operating state of the exposure apparatus.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment is described, referring an accompanying drawing. In the following embodiments, detailed features and the like are also shown for description of the technique, but they are examples, and all of them are not necessarily essential features for the embodiment to be practicable.

In addition, the drawings are shown schematically, and for convenience of description, appropriately, omission of the configuration or simplification of the configuration is made in the drawings. Moreover, the mutual relationship of the size and position of the structure etc. which respectively appear in different drawings is not necessarily accurately described, but can be changed suitably. In addition, even in drawings such as a plan view rather than a cross-sectional view, hatching may be added in order to facilitate understanding of the content of the embodiment.

In addition, in the description shown below, the same code|symbol is attached|subjected to the same component, and it is assumed that their names and functions are also the same. Therefore, a detailed description of them may be omitted in order to avoid duplication.

In addition, in the description described in this specification, when a certain component is described as "including," "includes," or "has", unless otherwise specified, exclusive content excluding the existence of other components not an expression

In addition, even if ordinal numbers such as "first" or "second" are sometimes used in the description described in this specification, these terms are used for convenience in order to facilitate understanding of the content of the embodiments. , the content of the embodiment is not limited to the order that can occur by these ordinal numbers.

In addition, in the description described in this specification, "... Forward axis” or “… Expressions such as "axis negative direction" are shown in the figure. Let the direction along the arrow of the axis be the forward direction, and as shown... The direction opposite to the arrow of the axis is the negative direction.

In addition, in the description described in the present specification, a specific position such as "top", "bottom", "left", "right", "side", "bottom", "table" or "rib" or the like Even if terms meaning directions are used, these terms are used for convenience in order to facilitate understanding of the content of the embodiments, and are not related to the position or direction when the embodiments are actually implemented. .

<Embodiment>

Hereinafter, the exposure apparatus and exposure method according to this embodiment will be described.

<About configuration of exposure device>

1 is a side view showing the configuration of an exposure apparatus 1 according to the present embodiment. 2 is a plan view showing the configuration of the exposure apparatus 1 according to the present embodiment. Exposure apparatus 1 is, for example, in the process of manufacturing color filters of a liquid crystal display device, for drawing a predetermined pattern on the upper surface of a glass substrate for color filters (hereinafter, simply referred to as "substrate"). It is a device.

1 and 2, the exposure apparatus 1 includes a stage 10 for holding a substrate 9, a stage drive unit 20 connected to the stage 10, and arranged in the X-axis direction. A head portion 30 having a plurality of exposure heads (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e), and each in the device A control unit 50 for controlling the operation of the driving unit is provided. In addition, the exposure apparatus 1 may further include an irradiation light imaging unit 40 for imaging light (irradiated light) emitted from each exposure head.

The stage 10 has a flat outer shape and is a holding part for arranging and holding the substrate 9 on the upper surface in a horizontal posture. A plurality of suction holes (not shown here) are formed on the upper surface of the stage 10 . For this reason, when the board|substrate 9 is arrange|positioned on the stage 10, the board|substrate 9 is fixed to the upper surface of the stage 10 by the suction pressure of a suction hole. Further, on the surface of the substrate 9 held on the stage 10, a layer of a photosensitive material such as a color resist is formed.

The stage driving unit 20 is a mechanism for moving the stage 10 in the main scanning direction (Y-axis direction), sub-scanning direction (X-axis direction), and rotational direction (rotational direction around the Z-axis). The stage drive unit 20 includes a rotating mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, and a support plate that moves the support plate 22 in the sub-scanning direction. A sub-scanning mechanism 23, a base plate 24 supporting the support plate 22 via the sub-scanning mechanism 23, and a main scanning mechanism 25 moving the base plate 24 in the main scanning direction are provided. do.

The rotation mechanism 21 includes a linear motor 21a composed of a mover attached to the end of the stage 10 on the Y-axis negative direction side and a stator attached to the upper surface of the support plate 22. provide In addition, a rotating shaft 21b is formed between the lower surface side of the central portion of the stage 10 and the supporting plate 22 . For this reason, when the linear motor 21a is operated, the mover moves in the X-axis direction along the stator, and the stage 10 rotates within a range of a predetermined angle around the rotation shaft 21b on the support plate 22. do.

The sub-scanning mechanism 23 includes a linear motor 23a composed of a mover mounted on the lower surface of the support plate 22 and a stator attached to the upper surface of the base plate 24 . Also, between the support plate 22 and the base plate 24, a pair of guide portions 23b extending in the sub-scanning direction are formed. For this reason, when the linear motor 23a is operated, the support plate 22 moves in the sub-scanning direction along the guide portion 23b on the base plate 24.

The main scanning mechanism 25 includes a linear motor 25a constituted by a mover mounted on the lower surface of the base plate 24 and a stator laid on the base 60 of the exposure apparatus 1. Also, between the base plate 24 and the base 60, a pair of guide portions 25b extending in the main scanning direction are formed. For this reason, when the linear motor 25a is operated, the base plate 24 moves in the main scanning direction along the guide part 25b on the base 60.

The head portion 30 is a mechanism for irradiating a predetermined pattern of pulsed light onto the upper surface of the substrate 9 held on the stage 10 . The head part 30 includes a frame 31 installed on the base 60 so as to exceed the stage 10 and the stage driving part 20, and 5 parts mounted on the frame 31 at equal intervals along the sub-scanning direction. It has two exposure heads (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e). One laser oscillator 34 is connected to each exposure head via an illumination optical system 33 . Also, a laser driver 35 is connected to the laser oscillator 34 .

For this reason, when the laser drive part 35 is operated, pulsed light is oscillated from the laser oscillator 34, and the oscillated pulsed light is introduced into each exposure head via the illumination optical system 33.

Inside each exposure head, an emitting unit 36 for emitting the pulsed light introduced from the illumination optical system 33 downward, an aperture unit 37 for partially blocking the pulsed light, and a pulsed light A projection optical system 38 for forming an image on the upper surface of the substrate 9 is provided. In the aperture unit 37, an aperture AP, which is a glass plate on which a predetermined light-shielding pattern is formed, is set. The pulsed light emitted from the emitting unit 36 is partially blocked when passing through the aperture AP set in the aperture unit 37, and enters the projection optical system 38 as a light flux of a predetermined pattern. Then, by irradiating the upper surface of the substrate 9 with the pulsed light that has passed through the projection optical system 38, a predetermined pattern is drawn on the photosensitive material on the substrate 9.

Moreover, as an example conceptually shown in FIG. 1, the aperture driving part 39 for adjusting the position of the aperture AP set in the aperture unit 37 is provided in each exposure head. The aperture driving unit 39 can select a pattern to be projected onto the substrate 9 or adjust the projected position of the pattern by adjusting the horizontal position (including inclination in the horizontal plane) of the aperture AP. there is. Further, the aperture driving unit 39 can also prohibit irradiation of the pulsed light by blocking the entire irradiation area of the pulsed light with the light-shielding portion of the aperture AP. The aperture drive unit 39 can be configured by combining a plurality of linear motors, for example.

3 is a diagram showing an example of a relationship between an exposure area on the substrate 9 and a plurality of exposure heads during normal operation. As an example is shown in FIG. 3 , a plurality of exposure heads are arranged at equal intervals (for example, at intervals of 200 mm) along the sub-scanning direction (X-axis direction). When performing an exposure process (drawing process), pulsed light is irradiated from each exposure head, moving the stage 10 in the main scanning direction. Thereby, a plurality of patterns are drawn in the main scanning direction on the upper surface of the substrate 9 with a predetermined exposure width W (eg, 50 mm width).

When writing in the main scanning direction is completed one time, the exposure apparatus 1 moves the stage 10 in the sub-scanning direction by an amount corresponding to the exposure width W, and moves the stage 10 again in the main scanning direction, respectively. Pulsed light is irradiated from the exposure head of the In this way, the exposure apparatus 1 repeats drawing in the main scanning direction a predetermined number of times (for example, 4 times) while shifting the substrate 9 in the sub-scanning direction by the exposure width W of the exposure head. Thus, a pattern for a color filter is formed on the substrate 9.

In this way, the exposure area on the substrate 9 corresponds to each exposure head (exposure head 32a, exposure head 32b, exposure head 32c, exposure head 32d, and exposure head 32e). It is divided into five strip-like exposure areas Aa, exposure areas Ab, exposure areas Ac, exposure areas Ad, and exposure areas Ae, and arranged in the X-axis direction. In addition, the number of exposure heads and the number of exposure areas do not necessarily need to coincide, and the case where either number is large may be sufficient.

Each exposure head can expose with respect to a some exposure area|region. For example, the exposure head 32a can expose the exposure area Aa and the exposure area Ab, and the exposure head 32b can expose the exposure area Aa, the exposure area Ab, and the exposure area Ac. exposure is possible, and the exposure head 32c is capable of exposure to the exposure area Ab, the exposure area Ac and the exposure area Ad, and the exposure head 32d is capable of exposure to the exposure area Ac, the exposure area Ad and It can be exposed to the exposure area Ae, and the exposure head 32e can be exposed to the exposure area Ad and the exposure area Ae. In addition, the exposure area|region which allows exposure is not limited to the case of the exposure area of the position corresponding to each exposure head as mentioned above, and the exposure area adjacent to it. When an example is shown in FIG. 3 , among the above, the exposure area at the position corresponding to each exposure head (namely, the exposure area Aa for the exposure head 32a and the exposure area Ab for the exposure head 32b) , the exposure area Ac for the exposure head 32c, the exposure area Ad for the exposure head 32d, and the exposure area Ae for the exposure head 32e).

4 : is a figure which conceptually shows the structure of a some exposure head. As an example is shown in FIG. 4 , the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head 32e have an aperture AP, an aperture driving unit 39 ), the projection optical system 38 and the like. Then, all of these element parts operate normally, so that the substrate 9 is irradiated with normal pulsed light.

Returning to FIGS. 1 and 2 , the irradiated light imaging unit 40 is a mechanism for imaging pulsed light emitted from each exposure head. The irradiated light imaging unit 40 includes a CCD camera 41, a guide rail 42, and a camera driving mechanism 43 constituted by a linear motor or the like. The CCD camera 41 is arranged so that the imaging direction is directed upward. Further, when the camera drive mechanism 43 is operated, the CCD camera 41 moves in the sub-scanning direction along the guide rail 42 attached to the side of the base plate 24 on the Y-axis positive direction side.

When using the CCD camera 41, first, the main scanning mechanism 25 is operated to position the base plate 24 so that the CCD camera 41 is located below the head portion 30 (Fig. 1 and state of Figure 2). Then, the pulsed light emitted from each exposure head is captured by the CCD camera 41 while the camera drive mechanism 43 is operated to move the CCD camera 41 in the sub-scanning direction. Image data obtained by shooting is transmitted from the CCD camera 41 to the control unit 50 . The transferred image data is used, for example, for determination of the presence or absence of a problem in the corresponding exposure head.

The control unit 50 is a processing unit for controlling the operation of each drive unit in the exposure apparatus 1 . FIG. 5 is a diagram conceptually showing a connection configuration between each driving unit of the exposure apparatus 1 and the control unit 50. As shown in FIG.

As an example shown in FIG. 5 , the control unit 50 includes a rotating mechanism 21, a sub-scanning mechanism 23, a main scanning mechanism 25, a laser driving unit 35, an illumination optical system 33, a projection optical system 38 , the aperture driving unit 39, the CCD camera 41 and the camera driving mechanism 43 are electrically connected, and these operations are controlled. In addition, the control unit 50 is constituted by, for example, a computer having a CPU or a memory, and the computer operates according to a program installed in the computer to perform the above control.

<About the function of the exposure device>

6 is a diagram showing the configuration of the exposure apparatus 1 centering on the control unit 50 for each function. As an example shown in FIG. 6 , the control unit 50 includes a stage position adjusting unit 53, an irradiation control unit (irradiation control unit 54a, an irradiation control unit 54b), and an irradiation control unit ( 54c), an irradiation control unit 54d and an irradiation control unit 54e), and a control switching determining unit 55 are formed.

The stage position adjusting unit 53 is a processing unit for adjusting the position of the stage 10 . The stage position adjustment part 53 moves the stage 10 so that it may be located above the exposure area which each exposure head handles by sending a control signal to the stage drive part 20.

The irradiation control unit (irradiation control unit 54a, irradiation control unit 54b, irradiation control unit 54c, irradiation control unit 54d, and irradiation control unit 54e) performs irradiation operation of pulsed light on a plurality of exposure areas to be exposed. processing unit for control.

Further, the control switch determining unit 55 determines the irradiation control signal Sa output from each of the irradiation control unit 54a, the irradiation control unit 54b, the irradiation control unit 54c, the irradiation control unit 54d, and the irradiation control unit 54e. , the irradiation control signal (Sb), the irradiation control signal (Sc), the irradiation control signal (Sd), and the irradiation control signal (Se), respectively, by the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure It is a processing part for assigning to the head 32d and the exposure head 32e. The control switching determination unit 55 determines at least two signals (exposure A signal representing a pattern) is assigned to the exposure head, respectively. Thereby, each exposure head can expose a some exposure area by multiple times of exposure operation|movement.

<About operation of exposure device>

Next, the operation of the exposure apparatus 1 will be described. 7 is a flowchart showing an example of the flow of the operation of the exposure apparatus 1 . 8, 9 and 10 are plan views showing operating states of the exposure apparatus 1. As shown in FIG. In addition, in a series of operations described below, the control unit 50 includes the rotating mechanism 21, the sub-scanning mechanism 23, the main scanning mechanism 25, the laser driving unit 35, the illumination optical system 33, the projection optical system ( 38), the aperture driving unit 39, the CCD camera 41, the camera driving mechanism 43, and the like are controlled by operation.

With the substrate 9 set on the stage 10, the exposure apparatus 1 includes the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head ( 32e), irradiation of light is performed on a plurality of exposure areas (exposure area (Aa), exposure area (Ab), exposure area (Ac), exposure area (Ad), and exposure area (Ae)) respectively responsible. Execute (step ST1). That is, while controlling the stage driving unit 20 to move the substrate 9 in the main scanning direction and the sub scanning direction, the exposure start position of the exposure area in charge is positioned below each exposure head. And the pulse light of the corresponding exposure pattern is irradiated from several exposure heads (all exposure heads in this embodiment).

Specifically, as shown in Fig. 8, the exposure head 32a emits light in a pattern that does not contribute to exposure, such as a dummy pattern, since the exposure area is not located at the corresponding exposure position, and the exposure head 32b ) is exposed to the exposure area Aa located at the exposure position in the exposure pattern based on the irradiation control signal Sa, and the exposure head 32c is exposed in the exposure pattern based on the irradiation control signal Sb at the exposure position The exposure area Ab located at the exposure head 32d exposes the exposure area Ac located at the exposure position with an exposure pattern based on the irradiation control signal Sc, and the exposure head 32d exposes light. (32e) exposes the exposure area Ad located at the exposure position with an exposure pattern based on the irradiation control signal Sd. At this time, since the exposure area Ae is not located in the exposure position of any exposure head, the exposure area Ae is not exposed. In addition, an exposure position is a position to which the light irradiated from an exposure head arrives and can expose suitably, and corresponds to the position right below each exposure head, for example. Incidentally, irradiating light in a pattern that does not contribute to exposure means irradiating light in an aspect in which an exposure pattern is not formed on the exposure area. The aspect in which an exposure pattern is not formed on the exposure area may be, for example, a state in which the entire irradiated area of the pulsed light is blocked by the light blocking portion of the aperture AP. Further, in the case where the illumination optical system 33 has a configuration including a spatial light modulator (DMD or GLV, etc.), the aspect in which an exposure pattern is not formed on the exposure area is that the spatial light modulator does not reflect the pulsed light to the exposure area. The state in which the spatial light modulator is controlled may be in a state in which it is not.

Next, the exposure area located at the exposure position of each exposure head is irradiated with light for the second time with a corresponding exposure pattern while moving by one exposure area along the sub-scanning direction (X-axis negative direction) ( Step ST2). Here, an irradiation control signal (signal indicating an exposure pattern) corresponding to a different exposure area is input to each exposure head so that a different exposure area can be exposed at each time of exposure operation scheduled for a plurality of times. Therefore, although the exposure area|region located in the exposure position of each exposure head differs from the exposure area|region in step ST1 in step ST2, the light of the exposure pattern corresponding from each exposure head is irradiated suitably.

Specifically, as an example is shown in Fig. 9, the exposure head 32a exposes the exposure area Aa located at the exposure position with an exposure pattern based on the irradiation control signal Sa, and the exposure head 32b ) is exposed in the exposure area Ab located at the exposure position in the exposure pattern based on the irradiation control signal Sb, and the exposure head 32c is exposed in the exposure pattern based on the irradiation control signal Sc at the exposure position. The exposure area Ac located at the exposure position is exposed, and the exposure head 32d exposes the exposure area Ad located at the exposure position in an exposure pattern based on the irradiation control signal Sd, (32e) exposes the exposure area Ae located at the exposure position with an exposure pattern based on the irradiation control signal Se.

Further, while moving the exposure area by one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area located at the exposure position of each exposure head is irradiated with light for the third time with a corresponding exposure pattern (step ST3). ). As described above, since an irradiation control signal (signal indicating an exposure pattern) corresponding to a different exposure area is input to each exposure head so that a different exposure area can be exposed in each time of exposure operation scheduled for a plurality of times, Light of a corresponding exposure pattern is appropriately irradiated from each exposure head.

Specifically, as an example is shown in FIG. 10, the exposure head 32a exposes the exposure area Ab located at the exposure position with an exposure pattern based on the irradiation control signal Sb, and the exposure head 32b ) is exposed in the exposure area Ac located at the exposure position in the exposure pattern based on the irradiation control signal Sc, and the exposure head 32c is exposed in the exposure pattern based on the irradiation control signal Sd at the exposure position The exposure area Ad located at the exposure head 32d exposes the exposure area Ae located at the exposure position with an exposure pattern based on the irradiation control signal Se, and the exposure head 32d exposes light. In (32e), light is irradiated in a pattern that does not contribute to exposure, such as a dummy pattern, since the exposure area is not located at the corresponding exposure position. At this time, since the exposure area Aa is not located in the exposure position of any exposure head, the exposure area Aa is not exposed.

In this way, the exposure area Aa and the exposure area Ae can be exposed twice, and the exposure area Ab, the exposure area Ac and the exposure area Ad can be exposed three times. there is.

Here, since an irradiation control signal indicating an exposure pattern is input to each exposure head so that a plurality of exposure areas can be exposed, if the light of the exposure pattern corresponding to the exposure area located at the exposure position is irradiated, the above response It may not be a relationship. That is, it is not limited to the case where irradiation control signals (signals indicating exposure patterns) corresponding to a plurality of exposure areas adjacent to each other are input to one exposure head, and irradiation control signals corresponding to a plurality of non-adjacent exposure areas. may be a case where is input to one exposure head. However, when an irradiation control signal corresponding to a plurality of exposure areas adjacent to each other is input to one exposure head, relative movement between the exposure head and the corresponding exposure area for exposing a plurality of exposure areas is performed. can be done minimally Therefore, since the amount of operation of the exposure head can be reduced, the time required for exposure can be reduced, and the positional accuracy of exposure can be maintained high.

Moreover, the positional relationship between an exposure head and an exposure area should just be changed when the head part 30 and the board|substrate 9 are moved relatively. That is, the case where the head part 30 moves may be sufficient, and the case where both move may be sufficient.

Moreover, the frequency|count of irradiation of the light from each exposure head is not limited to said 3 times, What is necessary is just multiple times.

Exposure including double exposure and triple exposure can be realized by irradiation with light a plurality of times as described above. Moreover, if irradiation of the light of at least one part exposure head is interrupted, various exposure different from the above is realizable. That is, even if one of the plurality of exposure heads is in a state in which exposure cannot be performed due to a problem or the like, another exposure can be performed by simply changing the operation of the light blocking portion of the aperture AP from the normal operation as shown in FIGS. 8 to 16. Exposure can be supplemented by light irradiation of the head a plurality of times. Therefore, the degree of freedom of the exposure operation can be improved while maintaining high positional accuracy compared to the case of performing the exposure operation for supplementation separately.

Next, a modified example of the operation of the exposure apparatus 1 will be described. 11, 12 and 13 are plan views showing operating states of the exposure apparatus 1. As shown in FIG.

With the substrate 9 set on the stage 10, the exposure apparatus 1 includes the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head ( 32e), light is irradiated to the exposure areas each responsible for (exposure area (Aa), exposure area (Ab), exposure area (Ac), exposure area (Ad), and exposure area (Ae)). .

Specifically, as an example shown in Fig. 11, the exposure head 32a irradiates light in a pattern that does not contribute to exposure, such as a dummy pattern, and the exposure head 32b exposes based on the irradiation control signal Sa. Light is irradiated toward the area Aa, the exposure head 32c irradiates light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32d emits light toward the irradiation control signal Sc Based on this, light is radiated toward the exposure area Ac, and the exposure head 32e radiates light toward the exposure area Ad based on the irradiation control signal Sd. At this time, since the exposure area Ae is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Ae.

Here, in each exposure head, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in each exposure head, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 11, exposure is not performed for each exposure area. In addition, as shown in FIG. 11, exposure may not be performed by the light-shielding portion, or exposure may be prevented by irradiating light in a pattern that does not contribute to exposure such as a dummy pattern without blocking light at the light-shielding portion. do.

Next, light irradiation of the 2nd time is performed with the corresponding exposure pattern with respect to the exposure area located in the exposure position of each exposure head, moving for one exposure area in the sub-scanning direction (X-axis negative direction).

Specifically, as an example shown in FIG. 12 , the exposure head 32a exposes the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32b transmits light to the irradiation control signal Sb Based on the exposure area Ab, the exposure head 32c exposes the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32d receives the irradiation control signal ( The exposure area Ad is exposed based on Sd), and the exposure head 32e exposes the exposure area Ae based on the irradiation control signal Se.

In addition, while moving for one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area located at the exposure position of each exposure head is irradiated with light for the third time with a corresponding exposure pattern.

Specifically, as an example shown in FIG. 13 , the exposure head 32a irradiates light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32b emits light based on the irradiation control signal Sc ), the exposure head 32c irradiates light toward the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32d irradiates light Light is irradiated toward the exposure area Ae based on the control signal Se, and the exposure head 32e irradiates light in a pattern that does not contribute to exposure, such as a dummy pattern. At this time, since the exposure area Aa is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Aa.

Here, in each exposure head, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in each exposure head, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 13, exposure is not performed for each exposure area. In addition, as shown in FIG. 13, exposure may not be performed by the light-shielding portion, or exposure may be prevented by irradiating light in a pattern that does not contribute to exposure such as a dummy pattern without blocking light at the light-shielding portion. do.

In this way, one exposure can be performed for all exposure areas.

Next, another modified example of the operation of the exposure apparatus 1 will be described. 14, 15 and 16 are plan views showing operating states of the exposure apparatus 1. As shown in FIG.

With the substrate 9 set on the stage 10, the exposure apparatus 1 includes the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head ( 32e), light is irradiated to the exposure areas each responsible for (exposure area (Aa), exposure area (Ab), exposure area (Ac), exposure area (Ad), and exposure area (Ae)). .

Specifically, as an example shown in Fig. 14, the exposure head 32a irradiates light in a pattern that does not contribute to exposure, such as a dummy pattern, and the exposure head 32b emits light based on the irradiation control signal Sa. Light is irradiated toward the area Aa, the exposure head 32c irradiates light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32d emits light toward the irradiation control signal Sc Based on this, light is radiated toward the exposure area Ac, and the exposure head 32e radiates light toward the exposure area Ad based on the irradiation control signal Sd. At this time, since the exposure area Ae is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Ae.

Here, in the exposure head 32a and the exposure head 32c, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in the exposure head 32a and the exposure head 32c, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 14, the exposure area Ab is not exposed. Moreover, excessive light out of the board|substrate 9 can be suppressed by interrupting irradiation of the light from the exposure head 32a.

Next, light irradiation of the 2nd time is performed with the corresponding exposure pattern with respect to the exposure area located in the exposure position of each exposure head, moving for one exposure area in the sub-scanning direction (X-axis negative direction).

Specifically, as an example shown in FIG. 15 , the exposure head 32a irradiates light toward the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32b emits light based on the irradiation control signal Sb ), the exposure head 32c irradiates light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32d irradiates light Light is radiated toward the exposure area Ad based on the control signal Sd, and the exposure head 32e radiates light toward the exposure area Ae based on the irradiation control signal Se.

Here, in the exposure head 32c, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in the exposure head 32c, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 15, exposure is not performed on the exposure area Ac.

In addition, while moving for one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area located at the exposure position of each exposure head is irradiated with light for the third time with a corresponding exposure pattern.

Specifically, as an example shown in FIG. 16 , the exposure head 32a irradiates light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32b emits light based on the irradiation control signal Sc ), the exposure head 32c irradiates light toward the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32d irradiates light Light is irradiated toward the exposure area Ae based on the control signal Se, and the exposure head 32e irradiates light in a pattern that does not contribute to exposure, such as a dummy pattern. At this time, since the exposure area Aa is not located at the exposure position of any exposure head, light is not irradiated toward the exposure area Aa.

Here, in the exposure head 32c and the exposure head 32e, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in the exposure head 32c and the exposure head 32e, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 16, the exposure area Ad is not exposed. Moreover, excessive light out of the board|substrate 9 can be suppressed by interrupting irradiation of the light from the exposure head 32e.

In this way, exposure can be performed twice for all exposure areas. In addition, since the exposure positions of the arranged different exposure heads are placed in one exposure area in order and double exposure is performed, when performing double exposure using the same exposure head, exposure is performed up to the required exposure start position. An operation to return the head, that is, a drive operation in the forward direction of the X axis becomes unnecessary. Therefore, the amount of operation of the exposure head can be reduced, the time required for exposure can be reduced, and the positional accuracy of exposure can be maintained high.

Next, another modified example of the operation of the exposure apparatus 1 will be described. In the said modified example, the case where the exposure head 32a cannot irradiate light by a problem is assumed. Regarding the determination of the problem of the exposure head 32a, for example, information such as the position, line width or light quantity of the pulsed light emitted from each exposure head photographed by the CCD camera 41 (sensor) is used as a control unit. (50) is acquired from image data. And by comparing these information with the information of an ideal irradiation pattern, it can be determined whether appropriate pulsed light is being irradiated from the exposure head. 17, 18 and 19 are plan views showing operating states of the exposure apparatus 1. As shown in FIG.

With the substrate 9 set on the stage 10, the exposure apparatus 1 uses the exposure head 32b, the exposure head 32c, the exposure head 32d and the exposure head 32e, Light is irradiated to the exposure areas (exposure area (Aa), exposure area (Ab), exposure area (Ac), exposure area (Ad), and exposure area (Ae)) respectively responsible.

Specifically, as an example is shown in Fig. 17, the exposure head 32b irradiates light toward the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32c emits light based on the irradiation control signal Sb ), the exposure head 32d irradiates light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32e irradiates light Light is radiated toward the exposure area Ad based on the control signal Sd. At this time, since the exposure area Ae is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Ae.

In addition, in the exposure head 32a, light is not irradiated due to a problem, but in the exposure head 32a, by driving the aperture driver 39, the entire irradiation area of the pulsed light is of the aperture AP. It is blocked by the shading part. That is, in the exposure head 32a, irradiation of light is interrupted.

Next, light irradiation of the 2nd time is performed with the corresponding exposure pattern with respect to the exposure area located in the exposure position of each exposure head, moving for one exposure area in the sub-scanning direction (X-axis negative direction).

Specifically, as an example is shown in FIG. 18, the exposure head 32b irradiates light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32c emits light based on the irradiation control signal Sc ), the exposure head 32d irradiates light toward the exposure area Ad based on the irradiation control signal Sd, and the exposure head 32e irradiates light Light is radiated toward the exposure area Ae based on the control signal Se.

Here, in the exposure head 32a, the exposure head 32b, the exposure head 32c, and the exposure head 32d, by driving the aperture driver 39, the entire irradiation area of the pulsed light is of the aperture AP. It is blocked by the shading part. That is, in the exposure head 32a, the exposure head 32b, the exposure head 32c, and the exposure head 32d, irradiation of light is interrupted. As a result, in the operation shown in the example of FIG. 18, exposure is not performed on the exposure area Aa, the exposure area Ab, the exposure area Ac, and the exposure area Ad.

In addition, while moving for one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area located at the exposure position of each exposure head is irradiated with light for the third time with a corresponding exposure pattern.

Specifically, as an example shown in Fig. 19, the exposure head 32b irradiates light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32c emits light based on the irradiation control signal Sd ), the exposure head 32d irradiates light toward the exposure area Ae based on the irradiation control signal Se, and the exposure head 32e emits light toward the exposure area Ad. Light is irradiated in a pattern that does not contribute to exposure of the pattern or the like. At this time, since the exposure area Aa is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Aa.

Here, in each exposure head, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in each exposure head, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 19, exposure is not performed on all exposure areas.

In this way, even when the exposure head 32a cannot irradiate light due to a problem, only the operation of the light blocking portion of the aperture AP is changed from the normal operation as shown in FIGS. 8 to 16 Thus, one exposure can be performed for all exposure areas.

Next, another modified example of the operation of the exposure apparatus 1 will be described. In the said modified example, the case where the exposure head 32a, the exposure head 32c, and the exposure head 32e cannot irradiate light by a problem is assumed. 20, 21 and 22 are plan views showing operating states of the exposure apparatus 1. As shown in FIG.

In the state where the substrate 9 is set on the stage 10, the exposure apparatus 1 uses the exposure head 32b and the exposure head 32d to set the exposure area (exposure area Aa) each responsible for. , exposure area (Ab), exposure area (Ac), exposure area (Ad), and exposure area (Ae) are irradiated with light.

Specifically, as an example is shown in Fig. 20, the exposure head 32b irradiates light toward the exposure area Aa based on the irradiation control signal Sa, and the exposure head 32d emits light based on the irradiation control signal Sc ), light is irradiated toward the exposure area Ac. At this time, since the exposure area Ae is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Ae.

In addition, in the exposure head 32a, the exposure head 32c, and the exposure head 32e, light is not irradiated by a problem, but in the exposure head 32a, the exposure head 32c, and the exposure head 32e , the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39 . That is, in the exposure head 32a, the exposure head 32c, and the exposure head 32e, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 20, exposure is not performed on the exposure area Ab and the exposure area Ad.

Next, light irradiation of the 2nd time is performed with the corresponding exposure pattern with respect to the exposure area located in the exposure position of each exposure head, moving for one exposure area in the sub-scanning direction (X-axis negative direction).

Specifically, as an example shown in FIG. 21 , the exposure head 32b irradiates light toward the exposure area Ab based on the irradiation control signal Sb, and the exposure head 32d emits light based on the irradiation control signal Sd ), light is irradiated toward the exposure area Ad.

Here, in the exposure head 32a, the exposure head 32c, and the exposure head 32e, the entire irradiation area of the pulsed light is blocked by the light shielding portion of the aperture AP by driving the aperture driver 39. That is, in the exposure head 32a, the exposure head 32c, and the exposure head 32e, irradiation of light is interrupted. As a result, in the operation shown in the example of Fig. 21, exposure is not performed on the exposure area Aa, the exposure area Ac, and the exposure area Ae.

In addition, while moving for one exposure area in the sub-scanning direction (X-axis negative direction), the exposure area located at the exposure position of each exposure head is irradiated with light for the third time with a corresponding exposure pattern.

Specifically, as an example shown in Fig. 22, the exposure head 32b irradiates light toward the exposure area Ac based on the irradiation control signal Sc, and the exposure head 32d emits light based on the irradiation control signal (Se ), light is irradiated toward the exposure area Ae. At this time, since the exposure area Aa is not located in the exposure position of any exposure head, light is not irradiated toward the exposure area Aa.

Here, in the exposure head 32a, the exposure head 32b, the exposure head 32c, and the exposure head 32e, by driving the aperture driver 39, the entire irradiation area of the pulsed light is of the aperture AP. It is blocked by the shading part. That is, in the exposure head 32a, the exposure head 32b, the exposure head 32c, and the exposure head 32e, irradiation of light is interrupted. As a result, in the operation shown in the example of FIG. 22, exposure is not performed on the exposure area Ab, the exposure area Ac, and the exposure area Ad.

In this way, even if the exposure head 32a, the exposure head 32c, and the exposure head 32e cannot irradiate light due to a problem, the aperture can be changed from the normal operation as shown in FIGS. 8 to 16. Only by changing the operation of the light blocking portion of (AP), one exposure can be performed for all exposure areas.

<About the effect produced by the embodiment described above>

Next, an example of the effect produced by the embodiment described above is shown. In the following description, the effect is described based on the specific configurations exemplified in the embodiments described above, but may be substituted with other specific configurations exemplified in the present specification to the extent that the same effects are produced. That is, in the following, for convenience, only one of the corresponding specific configurations may be representatively described, but the representatively described specific configurations may be substituted with other corresponding specific configurations.

According to the embodiment described above, in the exposure method, the first exposure head includes the first exposure pattern corresponding to the first exposure area among the plurality of exposure areas and the second exposure pattern corresponding to the second exposure area among the plurality of exposure areas. It is possible to irradiate light with two exposure patterns. Here, the 1st exposure head corresponds to one of the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head 32e, for example. In addition, the 1st exposure area and the 2nd exposure area are two different, for example, exposure area (Aa), exposure area (Ab), exposure area (Ac), exposure area (Ad), and exposure area (Ae). corresponding to each. Further, the first exposure pattern and the second exposure pattern include, for example, an exposure pattern based on the irradiation control signal Sa, an exposure pattern based on the irradiation control signal Sb, and an exposure pattern based on the irradiation control signal Sc. They respectively correspond to two different ones among the exposure pattern, the exposure pattern based on the irradiation control signal Sd, and the exposure pattern based on the irradiation control signal Se. The second exposure head may irradiate light with a third exposure pattern corresponding to a third exposure area among a plurality of exposure areas and a fourth exposure pattern corresponding to a fourth exposure area among a plurality of exposure areas. Here, the 2nd exposure head is 1 different from the 1st exposure head among the exposure head 32a, the exposure head 32b, the exposure head 32c, the exposure head 32d, and the exposure head 32e, for example. responding to dogs. In addition, the third exposure area and the fourth exposure area are, for example, two different exposure areas (Aa), exposure areas (Ab), exposure areas (Ac), exposure areas (Ad), and exposure areas (Ae). corresponding to each. Further, the third exposure pattern and the fourth exposure pattern are, for example, an exposure pattern based on the irradiation control signal Sa, an exposure pattern based on the irradiation control signal Sb, and an exposure pattern based on the irradiation control signal Sc. They respectively correspond to two different ones among the exposure pattern, the exposure pattern based on the irradiation control signal Sd, and the exposure pattern based on the irradiation control signal Se. And a some exposure area|region is moved relatively with respect to the exposure head 32a and the exposure head 32b. Then, in a state where the exposure area Aa is located at the exposure position of the exposure head 32a, light is irradiated from the exposure head 32a toward the exposure area Aa in an exposure pattern based on the irradiation control signal Sa. Further, in a state where the exposure area Ab is located at the exposure position of the exposure head 32a, light is emitted from the exposure head 32a toward the exposure area Ab in an exposure pattern based on the irradiation control signal Sb. investigate Then, in a state where the exposure area Ac is located at the exposure position of the exposure head 32b, light is irradiated from the exposure head 32b toward the exposure area Ac in an exposure pattern based on the irradiation control signal Sc. Further, in a state where the exposure area Ad is located at the exposure position of the exposure head 32b, light is emitted from the exposure head 32b toward the exposure area Ad in an exposure pattern based on the irradiation control signal Sd. investigate

According to such a structure, exposure operation|movement of various variations is realizable using a some exposure head by irradiating light several times using a some exposure head, respectively. Therefore, even if one of the plurality of exposure heads is in a state in which exposure cannot be performed due to a problem or the like, another exposure can be performed by simply changing the operation of the light blocking portion of the aperture AP from the normal operation as shown in FIGS. 8 to 16. Since the exposure can be supplemented by irradiating the head with light a predetermined number of times, the degree of freedom of the exposure operation can be improved while maintaining high positional accuracy of the exposure.

In addition, when other components exemplified in the present specification are appropriately added to the above configurations, that is, when other configurations in the present specification not mentioned as the above configurations are appropriately added, the same effect can be produced.

Moreover, according to embodiment described above, whichever of each light irradiated to the exposure area different from the exposure head 32a and each light irradiated to the exposure area different from the exposure head 32b corresponds to exposure No exposure is performed on the area. According to such a structure, by setting which one of the light irradiated multiple times by each exposure head is not exposed (for example, a dummy pattern, etc.), various variations using a plurality of exposure heads can be achieved. Exposure operation (for example, when normal exposure (single exposure) is performed for all exposure areas, or when double exposure is performed for all exposure areas) can be realized. In addition, by changing the pattern of the light emitted from the exposure head without performing an operation of turning off the power of the exposure head so as not to expose, a state in which exposure can be performed again (for example, a state in which the intensity of the irradiated light is stable) can be achieved. You can save time until

Moreover, according to embodiment described above, either of each light irradiated to different exposure areas from exposure head 32a and each light irradiated to different exposure areas from exposure head 32b is blocked. According to such a structure, exposure operation of various variations using a plurality of exposure heads (for example, normal exposure for all exposure areas (for example, normal exposure ( When performing single exposure), or when performing double exposure for all exposure areas, etc.) can be realized. That is, even if any of the plurality of exposure heads is in a state in which exposure cannot be performed due to a problem or the like, various variations of exposure operation can be realized. In addition, by blocking the light irradiated from the exposure head without performing an operation of turning off the power of the exposure head, the time until a state in which exposure can be repeated (for example, a state in which the intensity of the irradiated light is stabilized) is reached. You can save.

Moreover, according to embodiment described above, exposure head 32a and exposure head 32b are arranged in a 1st direction. Here, the first direction corresponds to, for example, the X-axis direction. Each of the plurality of exposure areas is arranged in the X-axis direction. Then, the step of relatively moving the plurality of exposure regions is a step of moving the plurality of exposure regions along the X-axis direction. According to such a configuration, a plurality of exposure heads are arranged along the direction in which the exposure regions are arranged, and the exposure position of one exposure head is changed by moving the exposure head along the direction in which the exposure regions are arranged. , can be efficiently positioned in a plurality of exposure areas. Therefore, since the amount of operation can be reduced by limiting the operation direction of the exposure head to one direction, the time required for exposure can be reduced, and the positional accuracy of exposure can be maintained high.

Moreover, according to embodiment described above, exposure area|region Aa and exposure area|region Ab are formed adjacently. Moreover, the exposure area Ac and the exposure area Ad are formed adjacently. According to such a structure, the relative movement between the exposure head and the corresponding exposure area for exposing a plurality of exposure areas can be minimized. Therefore, since the amount of operation of the exposure head can be reduced, the time required for exposure can be reduced, and the positional accuracy of exposure can be maintained high.

Moreover, according to the embodiment described above, the 1st exposure area|region and the 3rd exposure area|region are the same exposure area|region. According to such a structure, it is possible to perform double exposure with respect to one exposure area using different exposure heads. Therefore, for example, exposure required when performing double exposure using the same exposure head, if the exposure positions of the two exposure heads arranged are sequentially located in one exposure area and double exposure is carried out. A drive operation for returning the exposure head to the starting position, that is, a drive operation on the opposite side to the drive operation in the sub-scan direction for exposure (drive operation in the negative X-axis direction) becomes unnecessary. Therefore, since the amount of operation of the exposure head can be reduced, the time required for exposure can be reduced, and the positional accuracy of exposure can be maintained high.

According to the embodiment described above, the exposure apparatus includes the exposure head 32a and the exposure head 32b for exposing the substrate 9, and a plurality of exposure areas, the exposure head 32a and the exposure head. It is provided with the moving part which moves relative to (32b), and the control part 50 for controlling the exposure operation of the exposure head 32a and the exposure head 32b. Here, the moving unit corresponds to, for example, the stage driving unit 20 or the like. Here, a plurality of exposure areas are formed on the substrate 9 . In addition, the exposure head 32a transmits an exposure pattern based on the irradiation control signal Sa corresponding to the exposure area Aa of the plurality of exposure areas, and an irradiation control corresponding to the exposure area Ab of the plurality of exposure areas. Light can be irradiated with an exposure pattern based on the signal Sb. In addition, the exposure head 32b transmits an exposure pattern based on the irradiation control signal Sc corresponding to the exposure area Ac of the plurality of exposure areas, and an irradiation control corresponding to the exposure area Ad of the plurality of exposure areas. Light can be irradiated with an exposure pattern based on the signal Sd. Then, the control unit 50, in a state where the exposure area Aa is located at the exposure position of the exposure head 32a, from the exposure head 32a toward the exposure area Aa based on the irradiation control signal Sa Light is irradiated in an exposure pattern, and in a state where the exposure area Ab is located at the exposure position of the exposure head 32a, from the exposure head 32a toward the exposure area Ab, to the irradiation control signal Sb Light is irradiated with the exposure pattern based on it. In addition, the control unit 50, in a state where the exposure area Ac is located at the exposure position of the exposure head 32b, directs the light from the exposure head 32b toward the exposure area Ac based on the irradiation control signal Sc. Light is irradiated in an exposure pattern, and in a state where the exposure area Ad is located at the exposure position of the exposure head 32b, from the exposure head 32b toward the exposure area Ad to the irradiation control signal Sd. Light is irradiated with the exposure pattern based on it.

According to such a structure, exposure operation|movement of various variations is realizable using a some exposure head by irradiating light several times using a some exposure head, respectively. Therefore, even if one of the plurality of exposure heads is in a state in which exposure cannot be performed due to a problem or the like, the operation of the light blocking portion of the aperture AP is changed from the normal operation as shown in FIGS. 8 to 16, and other Since the exposure can be supplemented by irradiation of a plurality of times of light scheduled in advance of the exposure head, the degree of freedom of exposure operation can be improved while maintaining high positional accuracy of exposure.

In addition, when other components exemplified in the present specification are appropriately added to the above configurations, that is, when other configurations in the present specification not mentioned as the above configurations are appropriately added, the same effect can be produced.

<About the modified example of the embodiment described above>

In the embodiments described above, dimensions, shapes, relative arrangement relationships, or implementation conditions of each component may also be described, but these are examples in all aspects and are not intended to be limiting.

1: exposure device
9: Substrate
32a: exposure head
32b: exposure head
32c: exposure head
32d: exposure head
32e: exposure head
50: control unit
Aa: exposure area
Ab: exposure area
Ac: exposure area
Ad: exposure area
Ae: exposure area

Claims (9)

As an exposure method using an exposure apparatus provided with a 1st exposure head and a 2nd exposure head,
The exposure apparatus exposes a substrate on which a plurality of exposure areas are formed,
The first exposure head is capable of irradiating light with a first exposure pattern corresponding to a first exposure area among a plurality of exposure areas and a second exposure pattern corresponding to a second exposure area among a plurality of exposure areas,
The second exposure head can irradiate light with a third exposure pattern corresponding to a third exposure area among a plurality of exposure areas and a fourth exposure pattern corresponding to a fourth exposure area among a plurality of exposure areas,
A step of relatively moving a plurality of said exposure areas with respect to said 1st exposure head and said 2nd exposure head;
irradiating light with the first exposure pattern from the first exposure head toward the first exposure area in a state where the first exposure area is located at an exposure position of the first exposure head;
irradiating light with the second exposure pattern from the first exposure head toward the second exposure area in a state where the second exposure area is located at the exposure position of the first exposure head;
irradiating light with the third exposure pattern from the second exposure head toward the third exposure area in a state where the third exposure area is located at the exposure position of the second exposure head;
In a state where the fourth exposure area is located at the exposure position of the second exposure head, a step of irradiating light with the fourth exposure pattern from the second exposure head toward the fourth exposure area,
exposure method. According to claim 1,
Light radiated to the first exposure area from the first exposure head, light radiated to the second exposure area from the first exposure head, light radiated to the third exposure area from the second exposure head, and Which of the lights irradiated from the second exposure head to the fourth exposure area does not expose the corresponding exposure area,
exposure method. According to claim 1 or 2,
Light radiated to the first exposure area from the first exposure head, light radiated to the second exposure area from the first exposure head, light radiated to the third exposure area from the second exposure head, and Which of the lights irradiated to the fourth exposure area from the second exposure head is blocked,
exposure method. According to claim 1 or 2,
The first exposure head and the second exposure head are arranged in a first direction,
Each of the plurality of exposure areas is arranged in the first direction;
The step of relatively moving the plurality of exposure areas is a step of moving the plurality of exposure areas along the first direction,
exposure method. According to claim 1 or 2,
The first exposure area and the second exposure area are formed adjacent to each other,
The third exposure area and the fourth exposure area are formed adjacent to each other,
exposure method. According to claim 1 or 2,
The first exposure area and the third exposure area are the same exposure area,
exposure method. According to claim 4,
The first exposure head and the second exposure head are arranged adjacent to each other in the first direction,
The second exposure area and the third exposure area are the same area, and the first exposure area, the second exposure area, and the fourth exposure area are arranged adjacently in the first direction in the order,
Which of the light irradiated to the second exposure area from the first exposure head and the light irradiated to the third exposure area from the second exposure head is blocked,
exposure method. It is provided with a 1st exposure head and a 2nd exposure head for performing exposure with respect to a board|substrate,
A plurality of exposure areas are formed on the substrate,
The first exposure head is capable of irradiating light with a first exposure pattern corresponding to a first exposure area among a plurality of exposure areas and a second exposure pattern corresponding to a second exposure area among a plurality of exposure areas,
The second exposure head can irradiate light with a third exposure pattern corresponding to a third exposure area among a plurality of exposure areas and a fourth exposure pattern corresponding to a fourth exposure area among a plurality of exposure areas,
A moving part for moving a plurality of the exposure areas relative to the first exposure head and the second exposure head;
A control unit for controlling exposure operations of the first exposure head and the second exposure head,
After the control unit irradiates light with the first exposure pattern toward the first exposure area from the first exposure head in a state where the first exposure area is located at the exposure position of the first exposure head, the In a state where the second exposure area is located at the exposure position of the first exposure head, light is irradiated from the first exposure head toward the second exposure area with the second exposure pattern,
After the control unit irradiates light with the third exposure pattern toward the third exposure area from the second exposure head in a state where the third exposure area is located at the exposure position of the second exposure head, In a state where the fourth exposure area is located at the exposure position of the second exposure head, irradiating light from the second exposure head toward the fourth exposure area with the fourth exposure pattern,
exposure device. According to claim 8,
A light shielding portion capable of selectively blocking light emitted from the first exposure head and the second exposure head based on control by the control unit;
Further comprising a sensor configured to detect states of the first exposure head and the second exposure head,
The moving unit is configured to move the plurality of exposure areas in a first direction with respect to the first exposure head and the second exposure head,
The first exposure head and the second exposure head are arranged adjacent to each other in the first direction,
The second exposure area and the third exposure area are the same area, and the first exposure area, the second exposure area, and the fourth exposure area are arranged adjacently in the first direction in the order,
The control unit is configured to detect the presence or absence of problems in the first exposure head and the second exposure head based on information from the sensor,
The control unit,
When the problem of the first exposure head and the second exposure head is not detected, the light irradiated from the first exposure head to the second exposure area, and the light irradiated from the second exposure head to the third exposure area While being configured so that one side of the light to be blocked by the light blocking portion,
When a problem with the first exposure head is detected, at least the light irradiated from the second exposure head to the third exposure area by the light blocking unit is not blocked by the light blocking unit, and the second exposure head When a problem of is detected, at least the light irradiated to the second exposure area from the first exposure head by the light blocking portion is not blocked by the light blocking portion,
exposure device.