JP2009288740A - Pattern drawing device and pattern drawing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pattern drawing device and a pattern drawing method for providing high drawing qualities while preventing fluctuation in air on the optical path of an optical system in a light irradiation part. <P>SOLUTION: In a drawing process, supplying a driving current (including a standby current) is interrupted to motors 71a, 72a, 73a, limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and an encoder 73f placed near the optical path of a projection optical system. This prevents heat generation in the motors 71a, 72a, 73a, limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f in the drawing process, and prevents generation of fluctuation of air due to heat on the optical path of the projection optical system 62. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention provides a pattern on the main surface of a substrate such as a glass substrate for a color filter, a glass substrate for a flat panel display (liquid crystal display device, plasma display device, organic EL display device, etc.), a semiconductor substrate, a printed substrate, or a recording disk substrate. The present invention relates to a pattern drawing apparatus and a pattern drawing method.

  2. Description of the Related Art As a device used in a substrate manufacturing process, there is known a pattern drawing device that draws a pattern on a main surface of a substrate by irradiating light on the main surface of the substrate on which a layer of a photosensitive material is formed. The pattern drawing apparatus includes a stage on which a substrate is placed and a light irradiation unit that irradiates light on the main surface of the substrate placed on the stage, and the stage is intermittently moved from the light irradiation unit while moving the stage in the horizontal direction. By irradiating with light, a predetermined pattern is drawn on the main surface of the substrate.

  A conventional pattern drawing apparatus is disclosed in Patent Document 1, for example.

JP 2008-51866 A

  The light irradiation unit of the pattern drawing apparatus has an optical system composed of a plurality of optical members such as lenses and mirrors. In addition, the light irradiation unit further includes a drive mechanism for changing the positions of these optical members in order to adjust the focus and magnification of the irradiation light. The drive mechanism is composed of a plurality of elements such as a motor and a sensor, and these elements operate by receiving a current supplied from the power supply device, thereby changing the position of each optical member.

  However, elements such as motors and sensors generate heat slightly in the energized state, and the surface temperature rises. For this reason, a gentle upward airflow may occur on the optical path of the optical system due to the heat generated by these elements. When such air fluctuation occurs during the drawing process, the position of the light irradiated on the main surface of the substrate also fluctuates, which may cause unevenness in the pattern formed on the main surface of the substrate. .

  In particular, when a plurality of optical members and a drive mechanism are housed in one housing, it is considered that air fluctuations generated by the heat generated by the drive mechanism easily reach the optical path of the optical system. The above problem was more serious.

  The present invention has been made in view of such circumstances, and a pattern drawing apparatus and a pattern capable of preventing the occurrence of air fluctuation on the optical path of the optical system in the light irradiation unit and obtaining high drawing quality. An object is to provide a drawing method.

  In order to solve the above problems, the invention according to claim 1 is a pattern drawing apparatus for drawing a pattern on a main surface of a substrate by irradiating light to the main surface of the substrate on which the layer of the photosensitive material is formed. A stage on which the substrate is placed, a light irradiation unit that irradiates light on the main surface of the substrate placed on the stage, and a control unit that controls the light irradiation unit, the light irradiation unit, An optical system, a heat source that is disposed near the optical path of the optical system and operates while being heated by energization, and a housing that houses the optical system and the heat source, and the control unit includes: When the light irradiation unit irradiates light on the main surface of the substrate placed on the stage, the current supplied to the heat source is lower than the operating current value for setting the heat source to the operating state. Control processing that suppresses the value is performed.

  According to a second aspect of the present invention, in the pattern drawing apparatus according to the first aspect, the control unit generates the heat when the light irradiation unit irradiates light on a main surface of the substrate placed on the stage. Control processing for cutting off the current supplied to the power source is performed.

  The invention according to claim 3 is the pattern drawing apparatus according to claim 1 or 2, wherein the light irradiation unit includes at least two heat sources arranged vertically in the housing, The control unit performs the control process on at least the heat source disposed on the lower side of the two heat sources.

  According to a fourth aspect of the present invention, in the pattern drawing apparatus according to any one of the first to third aspects, the heat generation source is a drive element that varies a position of an optical element constituting the optical system. It is characterized by.

  According to a fifth aspect of the present invention, in the pattern drawing apparatus according to the fourth aspect, the optical element is a lens or a mirror, and the drive element is changed by the optical system by changing a position of the optical element. The focus adjustment or magnification adjustment of the irradiated light is performed.

  According to a sixth aspect of the present invention, in the pattern drawing apparatus according to any one of the first to fifth aspects, the heat generation source is a measurement unit that performs a predetermined measurement process inside the housing. Features.

  The invention according to claim 7 is the pattern writing apparatus according to any one of claims 1 to 6, wherein the light irradiation unit includes a plurality of light beams on a main surface of the substrate placed on the stage. A plurality of optical systems that simultaneously irradiate a plurality of heat sources, a plurality of heat sources arranged in the vicinity of the optical paths of the plurality of optical systems, and a housing that houses the plurality of optical systems and the plurality of heat sources. It is characterized by having.

  The invention according to claim 8 is the pattern drawing apparatus according to any one of claims 1 to 7, further comprising moving means for relatively moving the stage and the light irradiation unit. To do.

  The invention according to claim 9 is a pattern drawing method for drawing a pattern on the main surface of the substrate by irradiating light from the light irradiation unit to the main surface of the substrate placed on the stage. An adjustment process for adjusting an optical system housed together with the heat generation source in one housing by operating a heat generation source that operates with heat generation when energized, and a current supplied to the heat generation source, An irradiating step of irradiating light from the light irradiating unit while suppressing to a value lower than an operating current value for bringing the heat source into an operating state.

  According to invention of Claims 1-8, when the light irradiation part irradiates light to the main surface of the substrate placed on the stage, the control part of the pattern drawing apparatus serves as a heat source of the light irradiation part. The supplied current is suppressed to a value lower than the operating current value for setting the heat source to the operating state. For this reason, the heat generation of the heat generation source during the drawing process can be suppressed, and the occurrence of air fluctuation due to heat on the optical path of the light irradiation unit can be prevented. Therefore, high drawing quality can be obtained.

  In particular, according to the second aspect of the present invention, the control unit controls the current supplied to the heat source when the light irradiation unit irradiates light to the main surface of the substrate placed on the stage. Process. For this reason, it is possible to eliminate the heat generated by the heat source during the drawing process, and to prevent the air from fluctuating due to heat on the optical path. Therefore, higher drawing quality can be obtained.

  In particular, according to the third aspect of the present invention, the light irradiation unit has at least two heat generation sources arranged above and below in the housing, and the control unit includes at least the lower of the two heat generation sources. Control processing is performed on the heat source arranged on the side. For this reason, generation | occurrence | production of an updraft inside a housing | casing can be suppressed effectively.

  In particular, according to the fourth aspect of the present invention, the heat generation source is a drive element that varies the position of the optical element constituting the optical system. For this reason, it is possible to prevent the occurrence of air fluctuation due to the heat generated by the drive element.

  In particular, according to the invention described in claim 6, the heat generation source is a measurement unit that performs a predetermined measurement process inside the housing. For this reason, it is possible to prevent the occurrence of air fluctuation due to the heat generated by the measuring means.

  In particular, according to the invention described in claim 7, the light irradiation unit includes a plurality of optical systems that simultaneously irradiate a plurality of light beams onto the main surface of the substrate placed on the stage, and a plurality of optical systems. A plurality of heat sources arranged in the vicinity of the optical path, and a housing for housing the plurality of optical systems and the plurality of heat sources. For this reason, it is possible to prevent the occurrence of air fluctuation due to heat on each optical path of the plurality of optical systems.

  According to the invention described in claim 9, the pattern drawing method accommodates the heat irradiation source together with the heat generation source in the light irradiation unit by operating the heat generation source that operates while generating heat by energization. Adjustment process for adjusting the optical system, and drawing that irradiates light from the light irradiation unit while suppressing the current supplied to the heat source to a value lower than the operating current value for setting the heat source to the operating state A process. For this reason, the heat generation of the heat generation source in the drawing process can be suppressed, and the occurrence of air fluctuation due to heat on the optical path of the light irradiation unit can be prevented. Therefore, high drawing quality can be obtained.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. 1 to 9 referred to in the following description, FIGS. 1 to 5 show a common XYZ orthogonal coordinate system in order to clarify the positional relationship and the operation direction of each part of the pattern drawing apparatus 1. ing.

<1. Configuration of pattern drawing apparatus>
FIG. 1 is a side view of a pattern drawing apparatus 1 according to an embodiment of the present invention. In FIG. 1, the frame 31 is shown in a vertical section in order to clearly show the housing 32 and the optical head 33. FIG. 2 is a top view of the pattern drawing apparatus 1.

  The pattern drawing apparatus 1 is configured to display a liquid crystal display on a color resist formed on an upper surface of a glass substrate (hereinafter simply referred to as “substrate”) 9 for a color filter in a manufacturing process of a color filter which is a component of a liquid crystal display device. It is an apparatus for drawing a regular pattern that is a pixel of the apparatus. As shown in FIGS. 1 and 2, the pattern writing apparatus 1 mainly includes a stage 10 that holds the substrate 9, a stage moving mechanism 20 that moves the stage 10, and a head that irradiates the upper surface of the substrate 9 with pulsed light. Unit 30, irradiation light photographing unit 40 for photographing irradiation light from head unit 30, and control unit 50.

  The stage 10 has a flat outer shape, and is a holding unit for placing and holding the substrate 9 on the upper surface thereof in a horizontal posture. A number of suction holes (not shown) are formed on the upper surface of the stage 10. For this reason, when the substrate 9 is placed on the stage 10, the substrate 9 is attracted and fixed to the upper surface of the stage 10 by the suction pressure of the suction holes. In this embodiment, a layer of a color resist (photosensitive material) is formed in advance on the upper surface (main surface) of the substrate 9 to be subjected to the drawing process.

  The stage moving mechanism 20 moves the stage 10 with respect to the base 11 of the apparatus 1 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotating direction (rotating direction around the Z-axis). It is a mechanism for making it. The stage moving mechanism 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. And a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

  The rotation mechanism 21 includes a linear motor 21 a that includes a mover attached to the end of the stage 10 on the −Y side and a stator laid on the upper surface of the support plate 22. Further, a rotary bearing mechanism 21 b is provided between the lower surface side of the center portion of the stage 10 and the support plate 22. When the linear motor 21a is operated, the mover moves in the sub-scanning direction along the stator, and the stage 10 rotates within a predetermined angle range around the rotation axis of the rotary bearing mechanism 21b.

  The sub-scanning mechanism 23 has a linear motor 23 a that generates a propulsive force in the sub-scanning direction by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. The sub-scanning mechanism 23 has a pair of guide rails 23 b that guide the support plate 22 along the sub-scanning direction with respect to the base plate 24. When the linear motor 23a is operated, the support plate 22 and the stage 10 move in the sub-scanning direction along the guide rail 23b on the base plate 24.

  The main scanning mechanism 25 includes a linear motor 25 a that generates a propulsive force in the main scanning direction by a mover attached to the lower surface of the base plate 24 and a stator laid on the upper surface of the base 11. The main scanning mechanism 25 includes a pair of guide rails 25b that guide the base plate 24 along the main scanning direction with respect to the base 11. When the linear motor 25a is operated, the base plate 24, the support plate 22, and the stage 10 move in the main scanning direction along the guide rail 25b on the base 11.

  The head unit 30 is a light irradiation unit that irradiates the pulsed light PL toward the upper surface of the substrate 9 held on the stage 10. The head unit 30 includes a frame 31 laid on the base 11 so as to straddle the stage 10 and the stage moving mechanism 20, a housing 32 fixed to the frame 31, and an interior of the housing 32 in the sub-scanning direction. And seven optical heads 33 arranged at equal intervals along the line.

  The seven optical heads 33 are optically connected to one laser oscillator 35 via the illumination optical system 34. The laser oscillator 35 is connected to a laser driving unit 36 that performs on / off driving of the laser oscillator 35. When the laser driving unit 36 is operated, the pulsed light PL is emitted from the laser oscillator 35, and the pulsed light PL is introduced into each optical head 33 inside the housing 32 through the illumination optical system 34.

  Each optical head 33 includes a mask unit 61 that partially shields the pulsed light PL, and a projection optical system 62 that irradiates the upper surface of the substrate 9 with the pulsed light PL that has passed through the mask unit 61. The mask unit 61 is mounted with a mask M which is a glass plate having a light transmitting portion and a light shielding portion corresponding to a pattern to be drawn. The pulsed light PL introduced into the housing 32 is partially shielded according to the pattern on the mask M when passing through the mask unit 61 and is projected as a light beam shaped into a predetermined pattern shape. Incident to Then, the upper surface of the substrate 9 is irradiated with the pulsed light PL through the projection optical system 62, and the pattern is drawn on the upper surface of the substrate 9 by exposing the color resist on the substrate 9.

  The seven optical heads 33 are arranged at equal intervals (for example, at intervals of 200 mm) along the sub-scanning direction. When pulse light is intermittently irradiated from each optical head 33 while moving the stage 10 in the + Y direction, the pattern on the mask M is repeatedly projected onto the upper surface of the substrate 9, and predetermined exposure is performed as shown in FIG. A plurality of pattern groups having a width D (for example, a width of 50 mm) are drawn on the upper surface of the substrate 9. When the drawing in the main scanning direction is completed once, the pattern drawing apparatus 1 moves the stage 10 by the exposure width D in the + X direction. Thereafter, the pattern drawing apparatus 1 intermittently irradiates pulse light from each optical head 33 while moving the stage 10 in the −Y direction. As described above, the pattern drawing apparatus 1 repeats the drawing of the pattern in the main scanning direction a predetermined number of times (for example, four times) while shifting the substrate 9 in the sub-scanning direction by the exposure width of the optical head 33, so that FIG. As shown in FIG. 5, a regular pattern for color filters is formed on the entire drawing region of the substrate 9.

  FIG. 5 is a diagram schematically showing the housing 32 and the configuration of the optical head 33 disposed therein. As shown in FIG. 5, the housing 32 includes a partition wall 323 that partitions the internal space of the housing 32 into an upper chamber 321 and a lower chamber 322. The mask unit 61 of the optical head 33 is disposed in an upper chamber 321 formed above the partition wall 323, and the projection optical system 62 is disposed in a lower chamber 322 formed below the partition wall 323.

  In addition, openings 32 a, 32 b, and 32 c are formed on the upper wall (upper surface) of the housing 32, the partition wall 323, and the bottom wall (bottom surface) of the housing 32 at positions that intersect the optical path of the optical head 33, respectively. ing. The pulsed light PL irradiated from the illumination optical system 34 is introduced into the housing 32 through the opening 32a, passes through the mask unit 61, the opening 32b, the projection optical system 62, and the opening 32c, and then the housing. 32 is emitted downward.

  As shown in FIG. 5, the projection optical system 62 includes a first zoom lens 621, a second zoom lens 622, and a focus lens 623. The first zoom lens 621, the second zoom lens 622, and the focus lens 623 are connected to drive mechanisms 71, 72, and 73 for changing the position of each lens. The drive mechanisms 71, 72, and 73 are disposed in the vicinity of the optical path of the projection optical system 62, and are housed inside the lower chamber 322 of the housing 32 together with the first zoom lens 621, the second zoom lens 622, and the focus lens 623. ing.

  The drive mechanism 71 connected to the first zoom lens 621 includes a motor 71a, a ball screw 71b rotated by the motor 71a, a nut 71c screwed to the ball screw 71b, and two limit sensors 71d and 71e. Yes. When the motor 71a is operated, the ball screw 71b rotates, and the first zoom lens 621 connected to the nut 71c and the nut 71c moves within the range of the region sandwiched between the detection positions of the limit sensors 71d and 71e.

  The drive mechanism 72 connected to the second zoom lens 622 includes a motor 72a, a ball screw 72b rotated by the motor 72a, a nut 72c screwed to the ball screw 72b, and two limit sensors 72d and 72e. Yes. When the motor 72a is operated, the ball screw 72b rotates, and the second zoom lens 622 connected to the nut 72c and the nut 72c moves within the range of the region sandwiched between the detection positions of the limit sensors 72d and 72e.

  In this way, the pattern drawing apparatus 1 operates the driving mechanisms 71 and 72 to change the positions of the first zoom lens 621 and the second zoom lens 622, so that the pulse light PL irradiated on the upper surface of the substrate 9 is changed. Adjust the magnification (ie, the magnification of the projected pattern).

  The drive mechanism 73 connected to the focus lens 623 includes a motor 73a, a ball screw 73b rotated by the motor 73a, a nut 73c screwed to the ball screw 73b, two limit sensors 73d and 73e, and a rotation angle of the motor 73a. And an encoder 73f for detecting. When the motor 73a is operated, the ball screw 73b rotates, and the focus lens 623 connected to the nut 73c and the nut 73c moves within the range of the region sandwiched between the detection positions of the limit sensors 73d and 73e. The encoder 73f detects the rotation angle of the motor 73c and outputs a detection signal.

  In this manner, the pattern drawing apparatus 1 adjusts the focus of the pulsed light PL irradiated on the upper surface of the substrate 9 by operating the drive mechanism 73 to change the position of the focus lens 62.

  FIG. 6 is a block diagram showing the configuration of a control system that supplies electric power and electrically controls the motors 71a, 72a, 73a, limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f. FIG. In FIG. 6, a solid line arrow indicates a power supply path (power supply line), and a broken line arrow indicates a control signal transmission path (control line). 6 shows the configuration of the control system for the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f of one optical head 33. A control system as shown in FIG. 6 is equivalent to the motors 71a, 72a, 73a of the head 33, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f.

  The motors 71a, 72a, and 73a are connected to driver units 81, 82, and 83 that supply driving currents to the motors 71a, 72a, and 73a, respectively. The driver unit 83 is also connected to the encoder 73f. The driver unit 83 provides a drive current to the encoder 73f and also receives a detection signal transmitted from the encoder 73f. The driver units 81, 82, and 83 are connected to the position control unit 84 through control lines. The driver units 81, 82, and 83 are connected to a device power supply 86 via a power line, and a switch circuit 85 that switches on / off of electricity is inserted in the power line.

  When the switch circuit 85 is turned on (energized state), power is supplied from the device power supply 86 to each of the driver units 81, 82, 83. In this state, each driver unit 81, 82, 83 gives drive current to each motor 71 a, 72 a, 73 a and encoder 73 f based on a control signal from the position control unit 84. The motors 71a, 72a, 73a and the encoder 73f are brought into an operation state by a given drive current and perform their respective operations. On the other hand, when the switch circuit 85 is turned off (non-energized state), the supply of power from the device power supply 86 to the driver units 81, 82, 83 is stopped, and therefore, the motors 71a, 72a, 73a and the encoder 73f are stopped. Current supply is also cut off.

  The limit sensors 71d, 71e, 72d, 72e, 73d, and 73e are connected to the position control unit 84 through control lines, respectively. The limit sensors 71d, 71e, 72d, 72e, 73d, and 73e are connected to the position control unit 84 through power supply lines, and a switch circuit 87 that switches on / off of electricity is inserted in the power supply lines. ing. The position control unit 84 is connected to the apparatus power supply via a power line.

  When the switch circuit 87 is turned on (energized state), drive current is supplied from the apparatus power supply 86 to the limit sensors 71d, 71e, 72d, 72e, 73d, and 73e via the position control unit 84. Each of the limit sensors 71d, 71e, 72d, 72e, 73d, and 73e is brought into an operating state by a given driving current, and performs each detection operation. Detection signals generated in the limit sensors 71d, 71e, 72d, 72e, 73d, and 73e are transmitted to the position control unit 84 through the control lines. On the other hand, when the switch circuit 87 is turned off (non-energized state), the supply of drive current from the position control unit 84 to the limit sensors 71d, 71e, 72d, 72e, 73d, 73e is cut off.

  The control unit 50 of the pattern drawing apparatus 1 is connected to the position control unit 84 and the two switch circuits 85 and 87 via control lines. The controller 50 supplies driving current to the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f by switching on and off the switch circuits 85, 87. And a state in which the supply of the drive current to these is cut off.

  Returning to FIG. 1 and FIG. 2, description of other parts of the pattern drawing apparatus 1 will be continued.

  The irradiation light photographing unit 40 is a mechanism for photographing the pulsed light emitted from each optical head 33. The irradiation light photographing unit 40 includes a CCD camera 41, a guide rail 42 fixed to the end on the + Y side of the base plate 24, and a camera moving mechanism 43 that moves the CCD camera 41 in the sub-scanning direction along the guide rail 42. Have The camera moving mechanism 43 is realized as, for example, a linear motor provided between the CCD camera 41 and the guide rail 42.

  When photographing by the irradiation light photographing unit 40, first, the base plate 24 is moved so that the CCD camera 41 is positioned below the head unit 30 (so as to be in the state of FIGS. 1 and 2). Then, while moving the CCD camera 41 in the sub-scanning direction along the guide rail 42, the pulse light PL is irradiated from each optical head 33, and the irradiated pulse light PL is photographed by the CCD camera 41. Image data acquired by the CCD camera 41 is transmitted to the control unit 50 and used to adjust the light amount, position, magnification, focus, and the like of the pulsed light PL emitted from each optical head 33.

  The control unit 50 is an information processing unit for controlling the operation of each unit of the pattern drawing apparatus 1 while executing various arithmetic processes. FIG. 7 is a block diagram illustrating a connection configuration between each unit of the pattern drawing apparatus 1 and the control unit 50. As shown in FIG. 7, the control unit 50 includes the linear motors 21a, 23a, 25a, the illumination optical system 34, the laser drive unit 36, the CCD camera 41, the camera moving mechanism 43, the mask unit 61, and the position control unit 84. , And the switch circuits 85 and 87. The control unit 50 is constituted by, for example, a computer having a CPU and a memory, and performs operation control of the above-described units when the computer operates according to a program installed in the computer.

<2. Operation of pattern drawing device>
Next, an example of the operation of the pattern drawing apparatus 1 will be described with reference to the flowchart of FIG.

  When processing the substrate 9 in the pattern drawing apparatus 1, first, calibration processing for adjusting the state of the pulsed light PL irradiated from the optical head 33 is performed (step S1). In the calibration process, first, the CCD camera 41 is disposed below the head unit 30 by moving the base plate 24. Then, while moving the CCD camera 41 in the sub-scanning direction, the pulsed light PL is irradiated from each optical head 33 and the irradiated pulsed light PL is photographed by the CCD camera 41. The image data acquired by the CCD camera 41 is transmitted from the CCD camera 41 to the control unit 50.

  In step S1, the control unit 50 turns on both switch circuits 85 and 87. Accordingly, the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f of each optical head 33 are set in an operating state by supplying drive current (including standby current). . The control unit 50 controls the mask unit 61 of each optical head 33 based on the image data received from the CCD camera 41, and motors 71 a, 72 a, 73 a of each optical head 33 via the position control unit 84. The limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f are controlled in operation. In this way, the pattern drawing apparatus 1 adjusts the position, light amount, focus, magnification, and the like of the pulsed light PL emitted from each optical head 33.

  When the calibration process is completed, the operator or a predetermined transport mechanism then carries the substrate 9 and places the substrate 9 on the upper surface of the stage 10 (step S2). A color resist layer is formed on the upper surface of the substrate 9 in advance. After the substrate 9 is placed on the stage 10, the pattern drawing apparatus 1 performs an alignment process for adjusting the relative position between the substrate 9 placed on the stage 10 and the head unit 30 as necessary. Execute.

  Subsequently, the control unit 50 of the pattern drawing apparatus 1 turns off both the switch circuits 85 and 87 (step S3). As a result, the supply of drive current (including standby current) to the motors 71a, 72a, 73a, limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f of each optical head 33 is cut off.

  Thereafter, the pattern drawing apparatus 1 performs a drawing process on the substrate 9 (step S4). That is, the pattern writing apparatus 1 intermittently irradiates the pulsed light PL from the plurality of optical heads 33 toward the upper surface of the substrate 9 while moving the stage 10 in the main scanning direction and the sub-scanning direction. A regularity pattern is drawn on the upper surface of.

  During the drawing process in step S4, a drive current (including a standby current) is supplied to the motors 71a, 72a, 73a, limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f of each optical head 33. Has not been. Therefore, the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f do not generate heat during the drawing process, and on the optical path of the projection optical system 62 inside the housing 32. It is possible to prevent air fluctuations from occurring. Therefore, the pattern drawing apparatus 1 can execute the drawing process in step S4 with high accuracy, and can prevent the pattern formed on the main surface of the substrate 9 from being uneven.

  Note that the focus and magnification of the pulsed light PL are not adjusted during the drawing process in step S4. For this reason, even if the drive current is not supplied to the motors 71a, 72a, 73a and the encoder encoder 73f, there is no problem in the progress of the drawing process. Further, since the first zoom lens 621, the second zoom lens 622, and the focus lens 623 are not moved during the drawing process in step S4, a drive current is supplied to the limit sensors 71d, 71e, 72d, 72e, 73d, and 73e. There is no problem even if it is not.

  When the drawing process is completed, the pattern drawing apparatus 1 operates the stage moving mechanism 20 to move the stage 10 and the substrate 9 to the carry-out position. Then, an operator or a predetermined transport mechanism unloads the substrate 9 from the upper surface of the stage 10 (step S5). Thus, the process of the pattern drawing apparatus 1 for one substrate 9 is completed.

<3. Modification>
Although one embodiment of the present invention has been described above, the present invention is not limited to the above embodiment.

  In the above embodiment, the switch circuits 85 and 87 are provided on the power line, and the current supply is shut off by turning off the switch circuits 85 and 87 during the drawing process. However, the current supply is not necessarily cut off completely. Good. For example, as shown in FIG. 9, current regulators 88 and 89 are provided on the power supply line in place of the switch circuits 85 and 87, and motors 71a, 72a, 73a, limit sensors 71d, 71e, 72d, The current supplied to 72e, 73d, 73e and encoder 73f may be suppressed. That is, the current supplied to the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f at the time of the drawing process is set to the operating state (including the standby state). It may be suppressed to a value lower than the operating current value. Thereby, it is possible to suppress the occurrence of air fluctuation on the optical path of the projection optical system 62 inside the housing 32.

  In the above embodiment, the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f are listed as targets for controlling the current values. However, the current values are controlled. The target elements are not limited to these elements. The “heat generation source” in the present invention may be another element that is disposed inside the housing 32 together with the projection optical system 62 and operates while generating heat when energized.

  In the above embodiment, the projection optical system 62 is composed of three lenses. However, the projection optical system 62 may include other optical elements such as a mirror. Further, in order to adjust the focus and magnification of the pulsed light PL, a drive element for changing the position of another optical element such as a mirror may be further provided as a “heat source”. In addition, another measuring element such as a temperature sensor or a position sensor may be further provided as a “heat generation source” inside the housing 32.

  In the case where a plurality of “heat generation sources” are arranged inside the housing 32, current may be suppressed or cut off for some of the “heat generation sources”. However, when the height positions of a plurality of “heat generation sources” are different, it is desirable to suppress or cut off the current at least with respect to the “heat generation source” disposed relatively below. In this way, it is possible to effectively suppress the generation of ascending air current inside the housing 32.

  In the above embodiment, the drive currents to the motors 71a, 72a, 73a, the limit sensors 71d, 71e, 72d, 72e, 73d, 73e, and the encoder 73f are cut off in steps S3 to S5. In the invention, at least when the light irradiation unit irradiates light onto the main surface of the substrate placed on the stage, the supply of current to the “heat generation source” may be suppressed or cut off. Therefore, for example, current may be supplied to the “heat source” only during the calibration process (step S1 above), and current supply to the “heat source” may be suppressed or cut off during other processes. .

  Moreover, although the said pattern drawing apparatus 1 moves the stage 10 with respect to the head part 33 fixedly installed, the pattern drawing apparatus of this invention is fixed to the stage 10 fixedly installed. Alternatively, the head unit 33 may be moved. Further, the number of optical heads 33 arranged in the head unit 30 is not limited to the above seven.

  Further, the pattern drawing apparatus 1 described above uses the mask M to form the pulsed light PL into a shape corresponding to a predetermined pattern. However, the pattern drawing apparatus of the present invention uses a GLV (Grating Light Valve). ) Or DMD (digital micromirror device) or the like, light may be modulated by a light modulation element to draw a pattern on the upper surface of the substrate 9.

  In the above embodiment, the pattern drawing apparatus 1 for drawing a pattern on a color filter substrate has been described. However, the pattern drawing apparatus of the present invention is a flat panel display (liquid crystal display device, plasma display device, organic display device). It may be a device for drawing a pattern on another substrate such as a glass substrate for an EL display device, a semiconductor substrate, a printed substrate, a recording disk substrate or the like.

It is a side view of a pattern drawing apparatus. It is a top view of a pattern drawing apparatus. It is the figure which showed a mode that the drawing process advanced on the upper surface of a board | substrate. It is the figure which showed a mode that the drawing process advanced on the upper surface of a board | substrate. It is the figure which showed schematically the structure of the optical head arrange | positioned inside the housing | casing. It is the block diagram which showed the structure of the control system which supplies electric power and electrical control with respect to a motor, a limit sensor, and an encoder. It is the block diagram which showed the connection structure of a control part and each part in an apparatus. It is the flowchart which showed the flow of operation | movement of the pattern drawing apparatus. It is the block diagram which showed the structure of the control system which concerns on a modification.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Pattern drawing apparatus 9 Board | substrate 10 Stage 20 Stage moving mechanism 30 Head part 32 Case 33 Optical head 34 Illumination optical system 35 Laser oscillator 36 Laser drive part 40 Irradiation light imaging | photography part 50 Control part 61 Mask unit 62 Projection optical system 71,72 , 73 Drive mechanism 71a, 72a, 73a Motor 71d, 71e, 72d, 72e, 73d, 73e Limit sensor 73f Encoder 85, 87 Switch circuit 88, 89 Current regulator 621 First zoom lens 622 Second zoom lens 623 Focus lens PL Pulsed light

Claims (9)

In a pattern drawing apparatus that draws a pattern on a main surface of a substrate by irradiating light on the main surface of the substrate on which the layer of the photosensitive material is formed,
A stage on which a substrate is placed;
A light irradiator for irradiating light on the main surface of the substrate placed on the stage;
A control unit for controlling the light irradiation unit;
With
The light irradiator is
Optical system,
A heat source that is disposed in the vicinity of the optical path of the optical system and operates while generating heat by energization;
A housing for housing the optical system and the heat source;
Have
When the light irradiation unit irradiates light to the main surface of the substrate placed on the stage, the control unit is configured to change the current supplied to the heat generation source into an operation state. A pattern drawing apparatus that performs control processing to suppress a value lower than a current value. The pattern drawing apparatus according to claim 1,
The said control part performs the control process which interrupts | blocks the electric current supplied to the said heat generation source, when the said light irradiation part irradiates light to the main surface of the board | substrate mounted on the said stage. Drawing device. The pattern drawing apparatus according to claim 1 or 2,
The light irradiation unit has at least two of the heat sources arranged up and down inside the housing,
The pattern drawing apparatus, wherein the control unit performs the control process on at least the heat source disposed on the lower side of the two heat sources. In the pattern drawing apparatus in any one of Claim 1- Claim 3,
The pattern drawing apparatus, wherein the heat generation source is a drive element that varies a position of an optical element constituting the optical system. The pattern drawing apparatus according to claim 4,
The optical element is a lens or a mirror;
The pattern drawing apparatus, wherein the drive element performs focus adjustment or magnification adjustment of light irradiated by the optical system by changing a position of the optical element. The pattern drawing apparatus according to any one of claims 1 to 5,
The pattern drawing apparatus, wherein the heat generation source is a measurement unit that performs a predetermined measurement process inside the casing. In the pattern drawing apparatus in any one of Claim 1- Claim 6,
The light irradiator is
A plurality of optical systems that simultaneously irradiate a plurality of lights onto the main surface of the substrate placed on the stage;
A plurality of heat sources arranged in the vicinity of each optical path of the plurality of optical systems;
A housing that houses the plurality of optical systems and the plurality of heat sources;
A pattern drawing apparatus comprising: In the pattern drawing apparatus in any one of Claim 1- Claim 7,
A pattern drawing apparatus, further comprising a moving means for relatively moving the stage and the light irradiation unit. In the pattern drawing method for drawing a pattern on the main surface of the substrate by irradiating light from the light irradiation unit to the main surface of the substrate placed on the stage,
In the light irradiation unit, an adjustment process for adjusting an optical system housed together with the heat generation source inside one housing by operating a heat generation source that operates while generating heat by energization;
A drawing step of irradiating light from the light irradiation unit while suppressing a current supplied to the heat generation source to a value lower than an operation current value for setting the heat generation source in an operating state;
A pattern drawing method comprising:

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