KR20230065264A - 마이크로리소그래피용 광학 시스템의 조립체 - Google Patents

마이크로리소그래피용 광학 시스템의 조립체 Download PDF

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Publication number
KR20230065264A
KR20230065264A KR1020237008000A KR20237008000A KR20230065264A KR 20230065264 A KR20230065264 A KR 20230065264A KR 1020237008000 A KR1020237008000 A KR 1020237008000A KR 20237008000 A KR20237008000 A KR 20237008000A KR 20230065264 A KR20230065264 A KR 20230065264A
Authority
KR
South Korea
Prior art keywords
component
assembly
cooling fluid
optical system
channel system
Prior art date
Application number
KR1020237008000A
Other languages
English (en)
Korean (ko)
Inventor
파울 뷔트너
슈테판 크로네
토마스 볼프슈타이너
발데마어 랑게
토마스 슈튀블러
클라우스 기스차스
Original Assignee
칼 짜이스 에스엠테 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 칼 짜이스 에스엠테 게엠베하 filed Critical 칼 짜이스 에스엠테 게엠베하
Publication of KR20230065264A publication Critical patent/KR20230065264A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020237008000A 2020-09-10 2021-08-09 마이크로리소그래피용 광학 시스템의 조립체 KR20230065264A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102020211359.9A DE102020211359A1 (de) 2020-09-10 2020-09-10 Baugruppe eines optischen Systems für die Mikrolithographie
DE102020211359.9 2020-09-10
PCT/EP2021/072125 WO2022053237A1 (fr) 2020-09-10 2021-08-09 Ensemble d'un système optique de microlithographie

Publications (1)

Publication Number Publication Date
KR20230065264A true KR20230065264A (ko) 2023-05-11

Family

ID=77431299

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237008000A KR20230065264A (ko) 2020-09-10 2021-08-09 마이크로리소그래피용 광학 시스템의 조립체

Country Status (3)

Country Link
KR (1) KR20230065264A (fr)
DE (1) DE102020211359A1 (fr)
WO (1) WO2022053237A1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0363098B1 (fr) 1988-10-03 1995-04-05 Canon Kabushiki Kaisha Dispositif de régulation de température
EP1668421A2 (fr) 2003-09-12 2006-06-14 Carl Zeiss SMT AG Systeme d'eclairage pour une installation d'exposition de projection de microlithographie
US7362415B2 (en) 2004-12-07 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102011006100A1 (de) * 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102013111801A1 (de) 2012-11-29 2014-03-13 Asml Netherlands B.V. Kühlsystem für zumindest eine Systemkomponente eines optischen Systems für EUV-Anwendungen sowie derartige Systemkomponente und derartiges optisches System
DE102016216188A1 (de) * 2016-08-29 2018-03-01 Carl Zeiss Smt Gmbh Steuereinrichtung
DE102018216645A1 (de) 2018-09-27 2018-11-15 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Kühlanordnung

Also Published As

Publication number Publication date
DE102020211359A1 (de) 2022-03-10
WO2022053237A1 (fr) 2022-03-17

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