KR20230065264A - 마이크로리소그래피용 광학 시스템의 조립체 - Google Patents

마이크로리소그래피용 광학 시스템의 조립체 Download PDF

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Publication number
KR20230065264A
KR20230065264A KR1020237008000A KR20237008000A KR20230065264A KR 20230065264 A KR20230065264 A KR 20230065264A KR 1020237008000 A KR1020237008000 A KR 1020237008000A KR 20237008000 A KR20237008000 A KR 20237008000A KR 20230065264 A KR20230065264 A KR 20230065264A
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KR
South Korea
Prior art keywords
component
assembly
cooling fluid
optical system
channel system
Prior art date
Application number
KR1020237008000A
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English (en)
Korean (ko)
Inventor
파울 뷔트너
슈테판 크로네
토마스 볼프슈타이너
발데마어 랑게
토마스 슈튀블러
클라우스 기스차스
Original Assignee
칼 짜이스 에스엠테 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 칼 짜이스 에스엠테 게엠베하 filed Critical 칼 짜이스 에스엠테 게엠베하
Publication of KR20230065264A publication Critical patent/KR20230065264A/ko

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891Temperature
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70075Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020237008000A 2020-09-10 2021-08-09 마이크로리소그래피용 광학 시스템의 조립체 KR20230065264A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102020211359.9A DE102020211359A1 (de) 2020-09-10 2020-09-10 Baugruppe eines optischen Systems für die Mikrolithographie
DE102020211359.9 2020-09-10
PCT/EP2021/072125 WO2022053237A1 (fr) 2020-09-10 2021-08-09 Ensemble d'un système optique de microlithographie

Publications (1)

Publication Number Publication Date
KR20230065264A true KR20230065264A (ko) 2023-05-11

Family

ID=77431299

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237008000A KR20230065264A (ko) 2020-09-10 2021-08-09 마이크로리소그래피용 광학 시스템의 조립체

Country Status (3)

Country Link
KR (1) KR20230065264A (fr)
DE (1) DE102020211359A1 (fr)
WO (1) WO2022053237A1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE68922061T2 (de) 1988-10-03 1995-08-31 Canon Kk Vorrichtung zum Regeln der Temperatur.
EP1668421A2 (fr) 2003-09-12 2006-06-14 Carl Zeiss SMT AG Systeme d'eclairage pour une installation d'exposition de projection de microlithographie
US7362415B2 (en) 2004-12-07 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
DE102011006100A1 (de) * 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Spiegel-Array
DE102013111801A1 (de) 2012-11-29 2014-03-13 Asml Netherlands B.V. Kühlsystem für zumindest eine Systemkomponente eines optischen Systems für EUV-Anwendungen sowie derartige Systemkomponente und derartiges optisches System
DE102016216188A1 (de) * 2016-08-29 2018-03-01 Carl Zeiss Smt Gmbh Steuereinrichtung
DE102018216645A1 (de) 2018-09-27 2018-11-15 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Kühlanordnung

Also Published As

Publication number Publication date
WO2022053237A1 (fr) 2022-03-17
DE102020211359A1 (de) 2022-03-10

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