KR20230065264A - 마이크로리소그래피용 광학 시스템의 조립체 - Google Patents
마이크로리소그래피용 광학 시스템의 조립체 Download PDFInfo
- Publication number
- KR20230065264A KR20230065264A KR1020237008000A KR20237008000A KR20230065264A KR 20230065264 A KR20230065264 A KR 20230065264A KR 1020237008000 A KR1020237008000 A KR 1020237008000A KR 20237008000 A KR20237008000 A KR 20237008000A KR 20230065264 A KR20230065264 A KR 20230065264A
- Authority
- KR
- South Korea
- Prior art keywords
- component
- assembly
- cooling fluid
- optical system
- channel system
- Prior art date
Links
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102020211359.9A DE102020211359A1 (de) | 2020-09-10 | 2020-09-10 | Baugruppe eines optischen Systems für die Mikrolithographie |
DE102020211359.9 | 2020-09-10 | ||
PCT/EP2021/072125 WO2022053237A1 (fr) | 2020-09-10 | 2021-08-09 | Ensemble d'un système optique de microlithographie |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20230065264A true KR20230065264A (ko) | 2023-05-11 |
Family
ID=77431299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020237008000A KR20230065264A (ko) | 2020-09-10 | 2021-08-09 | 마이크로리소그래피용 광학 시스템의 조립체 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20230065264A (fr) |
DE (1) | DE102020211359A1 (fr) |
WO (1) | WO2022053237A1 (fr) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE68922061T2 (de) | 1988-10-03 | 1995-08-31 | Canon Kk | Vorrichtung zum Regeln der Temperatur. |
EP1668421A2 (fr) | 2003-09-12 | 2006-06-14 | Carl Zeiss SMT AG | Systeme d'eclairage pour une installation d'exposition de projection de microlithographie |
US7362415B2 (en) | 2004-12-07 | 2008-04-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
DE102011006100A1 (de) * | 2011-03-25 | 2012-09-27 | Carl Zeiss Smt Gmbh | Spiegel-Array |
DE102013111801A1 (de) | 2012-11-29 | 2014-03-13 | Asml Netherlands B.V. | Kühlsystem für zumindest eine Systemkomponente eines optischen Systems für EUV-Anwendungen sowie derartige Systemkomponente und derartiges optisches System |
DE102016216188A1 (de) * | 2016-08-29 | 2018-03-01 | Carl Zeiss Smt Gmbh | Steuereinrichtung |
DE102018216645A1 (de) | 2018-09-27 | 2018-11-15 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit einer Kühlanordnung |
-
2020
- 2020-09-10 DE DE102020211359.9A patent/DE102020211359A1/de not_active Ceased
-
2021
- 2021-08-09 WO PCT/EP2021/072125 patent/WO2022053237A1/fr active Application Filing
- 2021-08-09 KR KR1020237008000A patent/KR20230065264A/ko unknown
Also Published As
Publication number | Publication date |
---|---|
WO2022053237A1 (fr) | 2022-03-17 |
DE102020211359A1 (de) | 2022-03-10 |
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