KR20220167205A - Black matrix pigment dispersion composition, black matrix resist composition, and black resist film - Google Patents

Abstract

A pigment dispersion composition for black matrix contains carbon black, a pigment dispersing agent containing a basic group, a pigment dispersing aid containing an acidic group, an epoxy resin, an alkali-soluble resin and a solvent, wherein the carbon black is surface-treated carbon black treated with inorganic aluminum salt. The pigment dispersion composition for the black matrix can obtain a resist composition excellent in thin wire adhesion.

Description

Black matrix pigment dispersion composition, black matrix resist composition, and black resist film

The present invention relates to a pigment dispersion composition for a black matrix, a resist composition for a black matrix, and a black resist film.

Conventionally, a resist composition using a pigment dispersing composition for a black matrix containing carbon black, a pigment dispersant containing a basic group, a pigment dispersing aid containing an acidic group, an epoxy resin, a polyfunctional thiol compound, and a solvent is known (Patent Document 1). In addition, it is known that the concealability of the black matrix can be improved by using a carbon black for a black matrix in which a dye is coated (fixed) on its surface via a metal salt or the like.

[Patent Document 1] Japanese Unexamined Patent Publication No. 2021-38289 [Patent Document 2] International Publication No. 2013/129554

Patent Document 1 discloses that a resist composition using a pigment dispersion composition for a black matrix has excellent thin wire adhesion, but since the composition contains a polyfunctional thiol compound as an essential component, there are problems such as odor. Accordingly, there has been a demand for a pigment dispersion composition for a black matrix capable of obtaining a resist composition excellent in thin wire adhesion by a method different from these compositions.

The present invention was made in view of the above situation, and an object of the present invention is to provide a pigment dispersion composition for a black matrix from which a resist composition excellent in thin wire adhesion can be obtained.

That is, the present invention contains carbon black, a pigment dispersant containing a basic group, a pigment dispersing aid containing an acidic group, an epoxy resin, an alkali-soluble resin, and a solvent, and the carbon black is a black matrix, which is a surface-treated carbon black treated with an inorganic aluminum salt. It relates to a pigment dispersion composition for use.

Further, the present invention relates to a resist composition for a black matrix containing the pigment dispersion composition for a black matrix, a photopolymerizable compound, and a photopolymerization initiator.

Furthermore, the present invention relates to a black resist film obtained by using a resist composition for a black matrix.

The pigment dispersion composition for a black matrix of the present invention contains carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersing aid, an epoxy resin, an alkali-soluble resin, and a solvent, and the carbon black is surface treated with an inorganic aluminum salt. It is carbon black. In particular, since the surface-treated carbon black moderately suppresses hydrophilicity compared to untreated carbon black and can suppress elution and peeling of pattern portions formed by alkali development and washing with water, the pigment dispersion composition for a black matrix of the present invention has fine wire adhesion. great.

The pigment dispersing composition for a black matrix of the present invention contains carbon black, a pigment dispersing agent containing a basic group, a pigment dispersing aid containing an acidic group, an epoxy resin, an alkali-soluble resin, and a solvent, wherein the surface of the carbon black is treated with an inorganic aluminum salt. It is treated carbon black.

<Surface treated carbon black>

The surface-treated carbon black is obtained by treating the surface of carbon black with an inorganic aluminum salt.

As said carbon black, the well-known carbon black used for the pigment dispersion composition for black matrices can be used, For example, acetylene black, channel black, furnace black, Ketjen black, etc. are mentioned. Specific examples of the carbon black include MA7, MA8, MA11, MA14, #1000, and #2350 manufactured by Mitsubishi Chemical Corporation, SpecialBlack350, SpecialBlack250, SpecialBlack550, NEROX2500, NEROX3500, NEROX305 manufactured by Orion Engineered Carbons, etc., manufactured by Cabot Corporation. MOGULL, REGAL400R, TPK1101R, TPK1104R, TPK1227R, RAVEN1200, RAVEN1250, RAVEN1255, RAVEN1190U, RAVEN1170, RAVEN1035, RAVEN1080U, RAVEN1060U, RAVEN1100U, etc. manufactured by Colombian Carbon. The carbon black has a pH of 5 or less, is preferably an acidic carbon black having an acidic group such as a carboxyl group, and preferably has a particle size of 20 to 60 nm. As said acidic carbon black, NEROX2500, NEROX3500, TPK1101R, TPK1104R, TPK1227R etc. are mentioned, for example. In addition, the said particle diameter means the average primary particle diameter measured or computed by microscopic observation, but reference is made to the catalog value in the case of a commercial item. These carbon blacks may be used alone or in combination of two or more.

Any known inorganic aluminum salt can be used as the inorganic aluminum salt, and examples thereof include aluminum sulfate, (poly) aluminum chloride, and aluminum nitrate.

In the surface-treated carbon black, the amount of inorganic aluminum used is preferably 0.5 parts by mass or more, more preferably 8 parts by mass or more, from the viewpoint of fine wire adhesion, and 200 parts by mass from the viewpoint of blackness, relative to 100 parts by mass of the carbon black. It is preferable that it is 1 part or less, and it is more preferable that it is 150 parts by mass or less.

The surface-treated carbon black is preferably 3% by mass or more, more preferably 10% by mass or more, and 70% by mass from the viewpoint of pigment dispersion, from the viewpoint of increasing the light-shielding property when a black matrix film is formed in the pigment dispersion composition for black matrix. It is preferable that it is below, and it is more preferable that it is 50 mass % or less.

The surface treatment method for the surface-treated carbon black is not particularly limited. For example, while stirring (flowing) the carbon black in a mixer or blender, 1) the inorganic aluminum salt or an aqueous solution containing the inorganic aluminum salt is prepared. 2) a method of spraying an aqueous solution containing the inorganic aluminum salt using an atomizer such as a sprayer, and 3) adding the inorganic aluminum salt to the water used in the carbon black granulation step. A method of treating by adding an aluminum salt, and the like are exemplified.

<Basic group-containing pigment dispersant>

The basic group-containing pigment dispersant only needs to be capable of dispersing the carbon black, and known basic group-containing pigment dispersants used in pigment dispersion compositions for black matrices can be used, and examples thereof include anionic surfactants and basic group-containing polycarbonates. Ester-type pigment dispersants, basic group-containing acrylic pigment dispersants, basic group-containing urethane-type pigment dispersants, basic group-containing carbodiimide-type pigment dispersants, and the like are exemplified. As the basic group, a primary, secondary or tertiary amino group is particularly preferred from the standpoint of excellent dispersibility. The said basic group containing pigment dispersant can be used individually or in combination of 2 or more types.

The pigment dispersant containing a basic group is preferably a polymeric type pigment dispersant containing a basic group from the viewpoint of obtaining good pigment dispersibility. Examples of the polymer type pigment dispersant containing a basic group include a basic group-containing urethane polymer pigment dispersant, a basic group-containing polyester polymer pigment dispersant, and a basic group-containing acrylic polymer pigment dispersant. Among these, a basic group-containing urethane-based polymer pigment dispersant and a basic group-containing acrylic polymer pigment dispersant are preferable. The basic group-containing urethane-based polymer pigment dispersant is more preferably a basic group-containing urethane-based polymer pigment dispersant having at least one selected from the group consisting of a polyester chain, a polyether chain, and a polycarbonate chain.

The basic group-containing pigment dispersant is preferably 1 to 100 parts by mass, more preferably 2 to 50 parts by mass, based on 100 parts by mass of the surface-treated carbon black.

<Acidic group-containing pigment dispersing aid>

The acidic group-containing pigment dispersing aid is used for the purpose of further improving the dispersibility of the pigment, for example, lactam black, perylene-based compound, diketopyrrolopyrrole-based compound, azonaphthol-based compound, dioxazine-based compound, quinacridone-based compound , phthalocyanine-based compounds and their metal complexes, compounds in which an acidic group such as a carboxyl group or a sulfonic acid group is introduced into a pigment such as anthraquinone, naphthalene, acridone, or triazine (pigment derivative having an acidic group), these as organic amines, etc. A neutralized compound is mentioned. As the pigment derivative having an acidic group, a phthalocyanine-based (having a phthalocyanine skeleton) pigment derivative having a sulfonic acid group is preferable from the viewpoint of good dispersibility of carbon black. The above acidic group-containing pigment dispersing aids may be used alone or in combination of two or more.

It is preferable that it is 0.1-20 mass parts, and it is more preferable that it is 1-10 mass parts with respect to 100 mass parts of the said surface-treated carbon blacks of the said acidic group containing pigment dispersing aid.

<Epoxy resin>

The epoxy resin is a multifunctional epoxy resin having two or more epoxy groups. Examples of the epoxy resins include bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, biphenol type epoxy resins, alicyclic epoxy resins, aliphatic chain type epoxy resins, and glycidyl ester type epoxy resins. , glycidyl etherized products of condensates of phenolic compounds (phenol, cresol, alkylphenol, catechol, bisphenol F, bisphenol A, bisphenol S, etc.) and aldehyde compounds (formaldehyde, salicylaldehyde, etc.), difunctional phenols glycidyl ether compounds, glycidyl ether compounds of bifunctional alcohols, glycidyl ether compounds of trifunctional or higher functional polyphenols, and hydrogenated products or halides thereof. The epoxy resin may be a multifunctional epoxy resin having an alicyclic ring or an aromatic ring, or a multifunctional epoxy resin having an alicyclic dicyclopentadiene backbone. Resin is preferred. Specific examples of the epoxy resin include Epolite 40E, Epolite 100E, Epolite 200E, Epolite 400E, Epolite 70P, Epolite 200P, Epolite 400P, Epolite 1500NP, Epolite 80MF, Epolite 4000, and Epolite 3002 ( above, manufactured by Kyoeisha Chemical Co., Ltd.), Denacol EX-212L, Denacol EX-214L, Denacol EX-216L, Denacol EX-850L, Denacol EX-321L (above, manufactured by Nagase ChemteX), GAN, GOT, NC3000, NC6000, HPPN502H (above, manufactured by Nippon Kayaku Co., Ltd.), Epicoat 828, Epicoat 1002, Epicoat 1750, Epicoat 1007, YX8100-BH30, E1256, E4250, E4275 (above, manufactured by Japan Epoxy Resin Co., Ltd.) , Epicron EXA-9583, Epicron N695, HP7200, HP4032 (above, manufactured by Dainippon Inkki Chemical Industries, Ltd.), VG3101 (manufactured by Mitsui Chemicals, Inc.), Tepic S, Tepic G, Tepic P (above, manufactured by Nissan Chemical Industries, Ltd.), Photo Etc. YH-434L (manufactured by Todokasei Co., Ltd.); and the like. Moreover, it is preferable from points, such as reactivity, that the said epoxy resin does not have an indan structure or a biphenyl structure.

As said epoxy resin, the polyfunctional epoxy resin which has an aromatic ring represented by the following formulas 1-7 is mentioned preferably, for example.

The epoxy resin is preferably 1 part by mass or more, and more preferably 2 parts by mass or more, from the viewpoint of resistance value as a black matrix with respect to 100 parts by mass of carbon black contained in the pigment dispersion composition for a black matrix or a resist composition for a black matrix described later. It is preferably 5 parts by mass or more, more preferably 30 parts by mass or less, more preferably 20 parts by mass or less, and even more preferably 15 parts by mass or less from the viewpoint of blackness by pigment concentration.

<Alkali-soluble resin>

The alkali-soluble resin is not particularly limited as long as it is soluble in an alkaline developer, but one or more of anionic groups such as a carboxyl group, a sulfonic acid group, and a phosphonic acid group (-P(=O)(OH ₂ )) are used. Resin containing is preferable. The alkali-soluble resins may be used alone or in combination of two or more.

The acid value of the alkali-soluble resin is preferably 10 mgKOH/g or more and 300 mgKOH/g or less, and more preferably 20 mgKOH/g or more and 200 mgKOH/g or less, from the viewpoint of alkali developability.

It is preferable that it is 5,000 or more, and, as for the weight average molecular weight of the said alkali-soluble resin, it is more preferable that it is 10,000 or more from a viewpoint of formation property of a resist film. It is preferable that it is 100,000 or less, and, as for the weight average molecular weight of the said alkali-soluble resin, it is more preferable that it is 50,000 or less from a viewpoint of improving solubility to alkali developing solution.

The weight average molecular weight can be measured by a gel permeation chromatography (GPC) method. As an example, using Water2690 (manufactured by Waters) as a GPC device, PLgel, 5 μm, MIXED-D (manufactured by Polymer Laboratories) as a column, tetrahydrofuran as a developing solvent, column temperature 25 ° C., flow rate 1 milliliter / min, detector , It can be obtained as a weight average molecular weight in terms of polystyrene by performing chromatography under conditions of a sample injection concentration of 10 milligrams/milliliter and an injection amount of 100 microliters.

Examples of the alkali-soluble resin include alkali-soluble polyimide resin, alkali-soluble polyimide precursor, alkali-soluble polybenzoxazole resin, alkali-soluble polybenzoxazole precursor, alkali-soluble cardo resin, and alkali-soluble epoxy (meth)acrylic acid. rate resins, alkali-soluble polysiloxane resins, alkali-soluble novolak resins, alkali-soluble (meth)acrylic resins, alkali-soluble polyurethane resins, alkali-soluble polyester resins, and the like. Among these, alkali-soluble cardo resin and alkali-soluble epoxy (meth)acrylate resin are preferable from the viewpoint of heat resistance of the coating film.

The alkali-soluble cardo resin refers to an alkali-soluble resin having a cardo skeleton, and the cardo skeleton refers to a skeleton in which two aromatic groups are connected by a single bond to a quaternary carbon atom, which is a ring carbon atom constituting a cyclic structure. As specific examples of the alkali-soluble cardo resin, for example, ADEKA ARKLS WR-301 (manufactured by ADEKA), Ogsol CR-TR1, CR-TR2, CR-TR3, CR-TR4, CR-TR5, CR-TR6 (above, manufactured by Osaka Gas Chemical).

The alkali-soluble epoxy (meth) acrylate resin is an ethylenically unsaturated group introduced by ring-opening addition of a carboxyl group of an ethylenically unsaturated monocarboxylic acid to an epoxy group of an epoxy resin, and further adding to at least a part of the hydroxyl groups generated by ring-opening of the epoxy group. Among the acid-modified epoxy resins obtained by introducing a carboxyl group by adding a basic carboxylic acid (or its anhydride), it refers to a resin corresponding to the alkali-soluble resin without the cardo skeleton. Examples of the epoxy resin serving as a base material in the alkali-soluble epoxy (meth)acrylate resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, an epoxy resin having a biphenyl structure, a phenol novolak type epoxy resin, A cresol novolac type epoxy resin is preferably used. Preferred examples of the ethylenically unsaturated monocarboxylic acid used for modifying the epoxy resin include acrylic acid and methacrylic acid. Examples of the polybasic carboxylic acid (or its anhydride) include maleic anhydride, succinic anhydride, and tetrahydrophthalic anhydride. Among these, alkali-soluble epoxy (meth)acrylate resins having a biphenyl skeleton are preferable from the viewpoint of improving the thin wire adhesion. Specific examples of the alkali-soluble epoxy (meth)acrylate resin include ZAR-1494H, ZAR-2001H, ZFR-1491H, ZCR-1797H, ZCR-1569H, and ZCR-1798H (manufactured by Nippon Kayaku). can Moreover, as a preferable specific example, the alkali-soluble epoxy (meth)acrylate resin which has a partial structure represented by any one of the following structural formulas is mentioned.

The alkali-soluble resin is preferably 1 to 70 parts by mass, more preferably 5 to 30 parts by mass, based on 100 parts by mass of the surface-treated carbon black.

<Solvent>

As the solvent, a known solvent used in a pigment dispersion composition for a black matrix may be used. The solvent stably disperses the pigment and is an ester-based solvent, an ether-based solvent, an ether ester-based solvent, a ketone-based solvent, or an aromatic hydrocarbon-based solvent from the viewpoint of sufficiently dissolving the basic group-containing pigment dispersant or the alkali-soluble resin. , nitrogen-containing solvents, etc. are preferable. These solvents can be used alone or in combination of two or more.

Examples of the ester solvent include methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, 3-methyl-3-methoxybutylpropionate, methyl 3-methoxypropionate, Ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, hydroxyacetic acid ester, n-amyl formate, etc. are mentioned. Examples of the ether-based solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and propylene glycol. monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether and the like. Examples of the ether ester solvent include ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate. Examples of the ketone solvent include methyl isobutyl ketone, cyclohexanone, 2-heptanone, and δ-butyrolactone. Examples of the aromatic hydrocarbon-based solvent include toluene, xylene, and alkyl naphthalene. Examples of the nitrogen-containing solvent include N-methylpyrrolidone, N,N-dimethylformamide, and N,N-dimethylacetamide.

The ratio of the solvent is preferably 40% by mass or more, more preferably 50% by mass or more, from the viewpoint of processability in the pigment dispersion composition for a black matrix, and preferably 90% by mass or less and 80% by mass or less from the viewpoint of dispersion stability. more preferable

You may further add additives, such as a leveling agent, resin other than the said epoxy resin and the said alkali-soluble resin, antioxidant, and an antifoamer, to the said pigment dispersion composition for black matrices as needed. However, it is preferable not to contain a thiol compound (for example, a thiol compound having a molecular weight of 1000 or less) from the viewpoint of odor.

In the pigment dispersion composition for a black matrix, the ratio of the total of the carbon black, the basic group-containing pigment dispersant, the acidic group-containing pigment dispersing aid, the epoxy resin, the alkali-soluble resin, and the solvent is preferably 75% by mass or more. And it is more preferably 85% by mass or more, and more preferably 95% by mass or more.

The pigment dispersion composition for the black matrix may be prepared by dispersing the above components using a roll mill, a kneader, a high-speed stirrer, a bead mill, a ball mill, a sand mill, an ultrasonic disperser, a high-pressure dispersion device, or the like.

<Resist composition for black matrix>

The resist composition for a black matrix of the present invention includes the pigment dispersion composition for a black matrix, a photopolymerizable compound, and a photopolymerization initiator. In addition, it is preferable that the proportion of the surface-treated carbon black is 30% by mass or more and 80% by mass or less of the solid content of the resist composition for a black matrix.

<Photopolymerizable compound>

As the photopolymerizable compound, known photopolymerizable compounds used in resist compositions for black matrices may be used, and examples thereof include monomers and oligomers having photopolymerizable unsaturated bonds. The photopolymerizable compound may be used alone or in combination of two or more.

Examples of the monomer having one photopolymerizable unsaturated bond include alkyl methacrylates such as methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, butyl acrylate, and 2-ethylhexyl acrylate. acrylates or acrylates; aralkyl methacrylates or acrylates such as benzyl methacrylate and benzyl acrylate; alkoxyalkyl methacrylates or acrylates such as butoxyethyl methacrylate and butoxyethyl acrylate; aminoalkyl methacrylates or acrylates such as N,N'-dimethylaminoethyl methacrylate and N,N'-dimethylaminoethyl acrylate; methacrylic acid esters or acrylic acid esters of polyalkylene glycol monoalkyl ethers such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, and dipropylene glycol monomethyl ether; methacrylic acid esters or acrylic acid esters of polyalkylene glycol monoaryl ethers such as hexaethylene glycol monophenyl ether; isobornyl methacrylate or acrylate; glycerol methacrylate or acrylate; 2-hydroxyethyl methacrylate or acrylate; and the like.

Examples of the monomer having two or more photopolymerizable unsaturated bonds include bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, 1,3-butylene glycol dimethacrylate, and diethylene glycol dimethacrylate. Latex, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol tri Methacrylate, pentaerythritol tetramethacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol pentamethacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, Trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, etc. are mentioned.

As an oligomer which has a photopolymerizable unsaturated bond, what was obtained by suitably polymerizing the said monomer is mentioned, for example.

The photopolymerizable compound is preferably 2 to 20% by mass, and more preferably 4 to 15% by mass, based on the solid content of the resist composition for a black matrix.

As the photopolymerization initiator, known photopolymerization initiators used in resist compositions for black matrices may be used, and examples thereof include benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, and 4-methoxy- 4'-dimethylaminobenzophenone, benzyl, 2,2-diethoxyacetophenone, benzoin, benzoinmethyl ether, benzoin isobutyl ether, benzyldimethylketal, α-hydroxyisobutylphenone, thioxanthone, 2 -Chlorothioxanthone, 1-hydroxycyclohexylphenylketone, t-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone , 1,4-naphthoquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, triazine-based photopolymerization initiators, and oxime ester-based photopolymerization initiators. The photopolymerization initiator may be used alone or in combination of two or more.

The photopolymerization initiator is preferably 0.1 to 15% by mass, and more preferably 1 to 10% by mass, based on the solid content of the resist composition for a black matrix.

The alkali-soluble resin may be further added to the resist composition for a black matrix from the viewpoint of developability with an alkali developer. In addition, it is preferable that the total amount of the alkali-soluble resin is 10 mass% or more and 50 mass% or less of the solid content of the black matrix resist composition. In addition, the said solvent may be further added to the said resist composition for black matrices from a viewpoint of improving paintability. The ratio of the total amount of the solvent is preferably 50% by mass or more, and more preferably 70% by mass or more, in the resist composition for a black matrix.

You may further add additives, such as a leveling agent, antioxidant, and an antifoamer, to the said resist composition for black matrices as needed.

The resist composition for a black matrix may be prepared by stirring and mixing each component such as the pigment dispersion composition for a black matrix, a photopolymerizable compound, and a photopolymerization initiator using a stirrer or the like.

[Example]

The present invention will be described below by examples and the like, but the present invention is not limited to these.

<Preparation Examples A to E>

<Preparation of surface-treated carbon black>

After mixing various raw materials shown in Table 1 so as to have the compounding composition (parts by mass) shown in Table 1, the mixture was stirred at room temperature for 12 hours. Thereafter, after performing suction filtration, washing was repeated with purified water and dried to obtain surface-treated carbon blacks A to E.

TPK1104R in Table 1 is acidic carbon black (oil absorption: 38 ml/100 g, pH about 3.0, manufactured by Cabot Co.);

SS12000S is a phthalocyanine-based pigment derivative having a sulfonic acid group (manufactured by Lubrizol);

Alpine 83 is an aqueous solution of polyaluminum chloride (23% in terms of aluminum oxide, manufactured by Daemyung Chemical Industry Co., Ltd.);

The liquid sulfuric acid band indicates an aqueous solution of aluminum sulfate (8% in terms of aluminum oxide, manufactured by Daemyung Chemical Industry Co., Ltd.).

<Examples 1-1 to 4-1, Comparative Examples 1-1 to 2-1>

<Preparation of Pigment Dispersion Composition for Black Matrix>

After mixing the various raw materials shown in Table 2 so as to have the compounding composition (mass %) shown in Table 2, it was kneaded with a bead mill to prepare a black matrix pigment dispersion composition of each preparation example and comparative preparation example.

In Table 2, DB167 is an amino group-containing polyurethane-based polymer dispersing agent having a polyester chain (manufactured by Big Chemie Co., Ltd., solid content: 52% by mass);

SS12000S is a phthalocyanine-based pigment derivative having a sulfonic acid group (manufactured by Lubrizol);

VG3101L is an epoxy resin (100% solid content, manufactured by Printec);

ZCR-1569H is an alkali-soluble epoxy (meth)acrylate resin having a biphenyl skeleton (69% solid content, manufactured by Nippon Kayaku Co., Ltd.);

PGMEA is propylene glycol monomethyl ether acetate;

<Examples 1-2 to 4-2, Comparative Examples 1-2 to 2-2>

<Preparation of resist composition for black matrix>

The various raw materials shown in Table 3 were mixed using a high-speed stirrer so as to have the compounding composition (% by mass) shown in Table 3, and then filtered through a filter having a pore diameter of 0.5 µm to obtain a black matrix resist composition of each Example and Comparative Example. manufactured.

<Evaluation of fine wire adhesion of black resist film>

Each resist composition for a black matrix prepared in Examples and Comparative Examples was coated on a glass substrate (EAGL XG) with a spin coater to a film thickness of 1 μm, and prebaked at 100° C. for 3 minutes. Subsequently, exposure was performed at a cumulative UV light amount of 100 mJ/cm 2 using a high-pressure mercury lamp using a photomask having a line pattern at intervals of 1 μm for a line width of 1 μm to 20 μm. After that, development was started from the time at which the developing pattern began to appear (breakpoint) at 23°C, 0.05% potassium hydroxide aqueous solution at a shower developing pressure of 1kgf/cm2, and development was terminated at the point of twice the breakpoint time. Then, spray washing at a pressure of 1 kgf/cm 2 was performed. The size (μm) of the minimum line pattern remaining on the glass substrate was evaluated. The results are shown in Table 3.

In Table 3, DPHA is dipentaerythritol hexaacrylate;

OXE02 is an oxime ester photopolymerization initiator (manufactured by BASF Japan);

WR-301 is an alkali-soluble cardo resin (44% solid content, manufactured by ADEKA);

PGMEA stands for propylene glycol monomethyl ether acetate;

Claims (8)

containing carbon black, a basic group-containing pigment dispersant, an acidic group-containing pigment dispersing aid, an epoxy resin, an alkali-soluble resin, and a solvent;
The carbon black is a pigment dispersion composition for a black matrix, characterized in that the surface-treated carbon black treated with an inorganic aluminum salt. The pigment dispersion composition for a black matrix according to claim 1, wherein the inorganic aluminum salt is at least one selected from the group consisting of aluminum chloride and aluminum sulfate. The pigment dispersion composition for a black matrix according to claim 1 or 2, wherein the carbon black is acidic carbon black. The pigment dispersion composition for a black matrix according to claim 1 or 2, wherein the epoxy resin is a multifunctional epoxy resin having an aromatic ring. The pigment dispersion composition for a black matrix according to claim 1 or 2, wherein the alkali-soluble resin is an alkali-soluble epoxy (meth)acrylate resin having a biphenyl backbone. The pigment dispersion composition for a black matrix according to claim 1 or 2, wherein the acidic group-containing pigment dispersion aid has a phthalocyanine backbone. A resist composition for a black matrix characterized by containing the pigment dispersion composition for a black matrix according to claim 1 or 2, a photopolymerizable compound and a photopolymerization initiator. A black resist film obtained by using the resist composition for a black matrix according to claim 7.