TW202344628A - Pigment dispersion composition for black matrix, resist composition for black matrix and black matrix - Google Patents
Pigment dispersion composition for black matrix, resist composition for black matrix and black matrix Download PDFInfo
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- TW202344628A TW202344628A TW112104528A TW112104528A TW202344628A TW 202344628 A TW202344628 A TW 202344628A TW 112104528 A TW112104528 A TW 112104528A TW 112104528 A TW112104528 A TW 112104528A TW 202344628 A TW202344628 A TW 202344628A
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- Taiwan
- Prior art keywords
- black matrix
- pigment dispersion
- black
- mentioned
- dispersion composition
- Prior art date
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- 239000011159 matrix material Substances 0.000 title claims abstract description 138
- 239000000049 pigment Substances 0.000 title claims abstract description 130
- 239000000203 mixture Substances 0.000 title claims abstract description 105
- 239000006185 dispersion Substances 0.000 title claims abstract description 77
- 229920005989 resin Polymers 0.000 claims abstract description 56
- 239000011347 resin Substances 0.000 claims abstract description 56
- 239000002270 dispersing agent Substances 0.000 claims abstract description 50
- 239000003086 colorant Substances 0.000 claims abstract description 43
- 239000003960 organic solvent Substances 0.000 claims abstract description 36
- 239000011230 binding agent Substances 0.000 claims abstract description 23
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims abstract description 17
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical group O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229920002120 photoresistant polymer Polymers 0.000 claims description 37
- 150000001412 amines Chemical class 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 16
- 238000010521 absorption reaction Methods 0.000 claims description 13
- 239000011164 primary particle Substances 0.000 claims description 13
- 239000003999 initiator Substances 0.000 claims description 12
- 239000004593 Epoxy Substances 0.000 claims description 6
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 5
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 claims 1
- 238000011161 development Methods 0.000 abstract description 42
- 238000000034 method Methods 0.000 description 31
- 239000000758 substrate Substances 0.000 description 29
- 239000011521 glass Substances 0.000 description 26
- 239000007787 solid Substances 0.000 description 26
- 239000010408 film Substances 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 20
- 239000002253 acid Substances 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 239000000178 monomer Substances 0.000 description 15
- -1 polyoxyethylene Polymers 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 10
- 238000003860 storage Methods 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 9
- 239000007921 spray Substances 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 229920001400 block copolymer Polymers 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000006229 carbon black Substances 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 230000001186 cumulative effect Effects 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000004576 sand Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- QRIMLDXJAPZHJE-UHFFFAOYSA-N 2,3-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CO QRIMLDXJAPZHJE-UHFFFAOYSA-N 0.000 description 2
- OWPUOLBODXJOKH-UHFFFAOYSA-N 2,3-dihydroxypropyl prop-2-enoate Chemical compound OCC(O)COC(=O)C=C OWPUOLBODXJOKH-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- MXJDPWXQIVDAPH-UHFFFAOYSA-N 3-methoxybutanoic acid Chemical compound COC(C)CC(O)=O MXJDPWXQIVDAPH-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 241000557626 Corvus corax Species 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 2
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 2
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 2
- 229920001515 polyalkylene glycol Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical group O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 2
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- VDYWHVQKENANGY-UHFFFAOYSA-N 1,3-Butyleneglycol dimethacrylate Chemical compound CC(=C)C(=O)OC(C)CCOC(=O)C(C)=C VDYWHVQKENANGY-UHFFFAOYSA-N 0.000 description 1
- DVFAVJDEPNXAME-UHFFFAOYSA-N 1,4-dimethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(C)=CC=C2C DVFAVJDEPNXAME-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- KPYPNTLKDIYIKB-UHFFFAOYSA-N 2,3-dichloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(Cl)C(Cl)=C2 KPYPNTLKDIYIKB-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- LSRXVFLSSBNNJC-UHFFFAOYSA-N 2-[2-[2-[2-[2-(2-phenoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethanol Chemical compound OCCOCCOCCOCCOCCOCCOC1=CC=CC=C1 LSRXVFLSSBNNJC-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- MAKLMMYWGTWPQM-UHFFFAOYSA-N 2-butylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(CCCC)=CC=C3C(=O)C2=C1 MAKLMMYWGTWPQM-UHFFFAOYSA-N 0.000 description 1
- YQZHOBBQNFBTJE-UHFFFAOYSA-N 2-chloro-3-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(Cl)=C2 YQZHOBBQNFBTJE-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- NTZCFGZBDDCNHI-UHFFFAOYSA-N 2-phenylanthracene-9,10-dione Chemical compound C=1C=C2C(=O)C3=CC=CC=C3C(=O)C2=CC=1C1=CC=CC=C1 NTZCFGZBDDCNHI-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/006—Preparation of organic pigments
- C09B67/0066—Aqueous dispersions of pigments containing only dispersing agents
- C09B67/0067—Aqueous dispersions of phthalocyanine pigments containing only dispersing agents
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0084—Dispersions of dyes
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/002—Pigment pastes, e.g. for mixing in paints in organic medium
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/011—Nanostructured additives
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Abstract
Description
本發明係關於一種黑矩陣用顏料分散組成物、黑矩陣用光阻組成物、及黑矩陣。The present invention relates to a pigment dispersion composition for black matrices, a photoresist composition for black matrices, and a black matrix.
於使用有液晶或電漿等之圖像顯示裝置中,於畫面顯示區域內之著色圖案之間隙或顯示區域周邊部分之邊緣處設置有遮光膜(黑矩陣),又,於使用有TFT之液晶顯示器中,於TFT之外界光側等處設置有遮光膜(黑矩陣)。 而且,關於遮光膜(黑矩陣)之作用,於液晶顯示裝置中,主要防止來自背光源之漏光映入至畫面中,又,於電漿顯示裝置中,主要防止由各色光之混濁引起之滲色映入至畫面中,從而提昇顯示特性(對比度及色純度)。 In image display devices using liquid crystal or plasma, etc., a light-shielding film (black matrix) is provided in the gap between the colored patterns in the screen display area or at the edge of the peripheral part of the display area. In addition, in liquid crystal using TFT In the display, a light-shielding film (black matrix) is provided on the external light side of the TFT. Moreover, regarding the role of the light-shielding film (black matrix), in liquid crystal display devices, it mainly prevents light leakage from the backlight from entering the screen, and in plasma display devices, it mainly prevents light leakage caused by turbidity of various colors of light. The colors are projected into the screen, thereby improving display characteristics (contrast and color purity).
例如,關於用於將液晶顯示裝置之背光源之白色光轉換為著色光之彩色濾光片,通常藉由以下方法加以製造,即,於形成有黑矩陣之玻璃或塑膠片等透明基板表面,以條紋狀或馬賽克狀等圖案依次形成紅、綠、藍之不同色相之像素。For example, a color filter used to convert the white light of the backlight of a liquid crystal display device into colored light is usually manufactured by the following method, that is, on the surface of a transparent substrate such as glass or plastic sheet on which a black matrix is formed, Pixels of different hues of red, green, and blue are formed in striped or mosaic-like patterns.
又,於將圖像顯示裝置與位置輸入裝置組合而成之觸控面板中,亦同樣地利用形成有黑矩陣作為遮光膜之彩色濾光片,此前,一般隔著覆蓋玻璃而形成於與感測器基板相反之側。然而,隨著對觸控面板之輕量化之要求提高,正積極開發於覆蓋玻璃之同一側同時形成遮光膜與觸控感測器之技術,以實現進一步之輕量化。In addition, in a touch panel that combines an image display device and a position input device, a color filter formed with a black matrix as a light-shielding film is also used. Previously, it was generally formed on the sensor through a cover glass. The side opposite to the detector substrate. However, as the requirements for lightweight touch panels increase, technology is being actively developed to simultaneously form a light-shielding film and a touch sensor on the same side of the cover glass to achieve further lightweighting.
作為形成此種黑矩陣之方法,例如利用:使用有顏料之光微影法(顏料法)。As a method of forming such a black matrix, for example, photolithography using pigments (pigment method) is used.
例如,專利文獻1中公開了,作為利用顏料法形成遮光膜之組成物,包含無機顏料、黑色染料,進而包含分散劑,作為上述分散劑,使用高分子分散劑[例如,聚醯胺胺及其鹽、聚羧酸及其鹽、高分子量不飽和酸酯、改質聚胺酯(polyurethane)、改質聚酯、改質聚(甲基)丙烯酸酯、(甲基)丙烯酸系共聚物及萘磺酸福馬林縮合物等]、聚氧乙烯烷基磷酸酯、聚氧乙烯烷基胺及顏料衍生物等。For example, Patent Document 1 discloses that a composition for forming a light-shielding film using a pigment method includes an inorganic pigment, a black dye, and a dispersant. As the dispersant, a polymer dispersant [for example, polyamide amine and Its salts, polycarboxylic acids and their salts, high molecular weight unsaturated acid esters, modified polyurethane (polyurethane), modified polyester, modified poly(meth)acrylate, (meth)acrylic copolymers and naphthalene sulfonate formalin condensate, etc.], polyoxyethylene alkyl phosphates, polyoxyethylene alkyl amines and pigment derivatives, etc.
近年來,一直在尋求一種於形成黑矩陣時可將顯影時間及線寬維持在適當之範圍內,並且可形成細線密接性及表面電阻值優異之黑矩陣之黑矩陣用顏料分散組成物。 先前之形成黑矩陣之組成物無法獲得滿足上述全部要求之組合物,存在進一步改善之餘地。 [先前技術文獻] [專利文獻] In recent years, there has been a demand for a pigment dispersion composition for a black matrix that can maintain the development time and line width within an appropriate range when forming a black matrix, and can form a black matrix with excellent fine line adhesion and surface resistance. Previous black matrix-forming compositions have not been able to obtain compositions that meet all the above requirements, and there is room for further improvement. [Prior technical literature] [Patent Document]
[專利文獻1]日本特開2021-128345號公報[Patent Document 1] Japanese Patent Application Publication No. 2021-128345
[發明所欲解決之課題][Problem to be solved by the invention]
因此,本發明之目的在於提供一種於形成黑矩陣時可將顯影時間及線寬維持在適當之範圍內,並且可形成細線密接性及表面電阻值優異之黑矩陣之黑矩陣用顏料分散組成物。 [解決課題之技術手段] Therefore, an object of the present invention is to provide a pigment dispersion composition for a black matrix that can maintain the development time and line width within an appropriate range when forming a black matrix, and can form a black matrix with excellent fine line adhesion and surface resistance value. . [Technical means to solve the problem]
本發明人等發現,藉由於包含黑色著色劑、顏料分散劑、黏合劑樹脂之黑矩陣用顏料分散組成物中使用具有戊內酯骨架及異氰尿酸酯骨架之顏料分散劑,能夠解決所有上述課題,從而完成了本發明。The present inventors discovered that by using a pigment dispersant having a valerolactone skeleton and an isocyanurate skeleton in a black matrix pigment dispersion composition containing a black colorant, a pigment dispersant, and a binder resin, all problems can be solved. The present invention has been completed by solving the above-mentioned problems.
即,本發明係一種黑矩陣用顏料分散組成物,其含有黑色著色劑、顏料分散劑、黏合劑樹脂及有機溶劑,上述顏料分散劑具有戊內酯(valerolactone)骨架及異氰尿酸酯骨架。 於本發明之黑矩陣用顏料分散組成物中,上述黑色著色劑較佳為平均一次粒徑為20~50 nm。 又,上述黑色著色劑較佳為pH值為3.5以下。 又,上述黑色著色劑較佳為DBP吸油量為75 ml/100 g以下。 又,上述顏料分散劑較佳為胺值為5~35 mgKOH/g。 又,較佳為進而含有顏料分散助劑,且上述顏料分散助劑為銅酞青之磺化物。 又,上述黏合劑樹脂較佳為鹼可溶性卡多樹脂(cardo resin)及/或鹼可溶性環氧(甲基)丙烯酸酯樹脂。 又,本發明亦為含有上述黑矩陣用顏料分散組成物、光聚合性化合物及光聚合起始劑之黑矩陣用光阻組成物。 又,本發明亦為由上述黑矩陣用光阻組成物形成之黑矩陣。 [發明之效果] That is, the present invention is a pigment dispersion composition for black matrix, which contains a black colorant, a pigment dispersant, a binder resin and an organic solvent. The above pigment dispersant has a valerolactone skeleton and an isocyanurate skeleton. . In the pigment dispersion composition for black matrix of the present invention, the black colorant preferably has an average primary particle diameter of 20 to 50 nm. Moreover, it is preferable that the pH value of the said black coloring agent is 3.5 or less. In addition, the black colorant preferably has a DBP oil absorption of 75 ml/100 g or less. In addition, the above-mentioned pigment dispersant preferably has an amine value of 5 to 35 mgKOH/g. Moreover, it is preferable to further contain a pigment dispersion aid, and the pigment dispersion aid is a sulfonated product of copper phthalocyanine. In addition, the above-mentioned binder resin is preferably alkali-soluble cardo resin and/or alkali-soluble epoxy (meth)acrylate resin. Furthermore, the present invention is also a photoresist composition for black matrix containing the above-mentioned pigment dispersion composition for black matrix, a photopolymerizable compound and a photopolymerization initiator. Furthermore, the present invention is also a black matrix formed from the above photoresist composition for black matrix. [Effects of the invention]
根據本發明,可提供一種於形成黑矩陣時可將顯影時間及線寬維持在適當之範圍內,並且可形成細線密接性及表面電阻值優異之黑矩陣之黑矩陣用顏料分散組成物。According to the present invention, it is possible to provide a pigment dispersion composition for a black matrix that can maintain the development time and line width within an appropriate range when forming a black matrix, and can form a black matrix with excellent fine line adhesion and surface resistance value.
<黑矩陣用顏料分散組成物> 本發明之黑矩陣用顏料分散組成物含有黑色著色劑、顏料分散劑、黏合劑樹脂及有機溶劑,並且上述顏料分散劑具有戊內酯骨架及異氰尿酸酯骨架。 <Pigment dispersion composition for black matrix> The pigment dispersion composition for black matrix of the present invention contains a black colorant, a pigment dispersant, a binder resin and an organic solvent, and the above-mentioned pigment dispersant has a valerolactone skeleton and an isocyanurate skeleton.
本發明之黑矩陣用顏料分散組成物含有具有戊內酯骨架及異氰尿酸酯骨架之顏料分散劑。藉由使上述顏料分散劑具有至少上述2種骨架,可於不損害對黑色著色劑之吸附性之情況下,提昇對黏合劑樹脂之親和性。因此,於成膜後之黑矩陣中,黑色著色劑亦可保持良好之分散狀態。 藉由上述機制,可獲得一種於形成黑矩陣時可將顯影時間及線寬維持在適當之範圍內,並且可形成細線密接性及表面電阻值優異之黑矩陣之黑矩陣用顏料分散組成物。 但是,本發明亦可不限於上述機制來進行解釋。 The pigment dispersion composition for black matrices of the present invention contains a pigment dispersant having a valerolactone skeleton and an isocyanurate skeleton. By having the above-mentioned pigment dispersant have at least the above two kinds of skeletons, the affinity for the binder resin can be improved without impairing the adsorption property to the black colorant. Therefore, the black colorant can also maintain a good dispersion state in the black matrix after film formation. Through the above mechanism, it is possible to obtain a pigment dispersion composition for a black matrix that can maintain the development time and line width within an appropriate range when forming a black matrix, and can form a black matrix with excellent fine line adhesion and surface resistance value. However, the present invention may be interpreted without being limited to the above-mentioned mechanism.
(黑色著色劑) 本發明之黑矩陣用顏料分散組成物含有黑色著色劑。 上述黑色著色劑較佳為pH值為3.5以下。 藉由將上述黑色著色劑之pH值設為3.5以下,可適宜地維持所形成之黑矩陣之線寬,並更適宜地提高細線密接性及表面電阻值。 上述黑色著色劑更佳為pH值為3.0以下。 (black colorant) The pigment dispersion composition for black matrices of the present invention contains a black colorant. The above-mentioned black colorant preferably has a pH value of 3.5 or less. By setting the pH value of the above-mentioned black colorant to 3.5 or less, the line width of the formed black matrix can be appropriately maintained, and the fine wire adhesion and surface resistance can be improved more appropriately. The above-mentioned black colorant preferably has a pH value of 3.0 or less.
再者,上述pH值可如下測得,即,將碳黑1 g添加於已去除碳酸之蒸餾水(pH值7.0)20 ml中,用磁攪拌器進行混合來製備水性懸濁液,並使用玻璃電極於25℃進行測定(德國工業品標準規格DIN ISO 787/9)。Furthermore, the above pH value can be measured as follows: add 1 g of carbon black to 20 ml of distilled water (pH value 7.0) from which carbonic acid has been removed, mix with a magnetic stirrer to prepare an aqueous suspension, and use a glass The electrode is used for measurement at 25°C (German industrial product standard DIN ISO 787/9).
上述碳黑較佳為酸性碳黑,該酸性碳黑係天然或人工氧化而成之碳質物質,與蒸餾水混合煮沸時顯示酸性。The above-mentioned carbon black is preferably acidic carbon black. The acidic carbon black is a carbonaceous substance formed by natural or artificial oxidation. It shows acidity when mixed with distilled water and boiled.
作為上述黑色著色劑,較佳為平均一次粒徑為20~50 nm,更佳為平均一次粒徑為25~45 nm。 藉由將上述黑色著色劑之平均一次粒徑設為上述範圍,可適宜地維持所形成之黑矩陣之線寬,並更適宜地提高細線密接性及表面電阻值。又,亦可適宜地賦予保存穩定性。 再者,上述平均一次粒徑係藉由電子顯微鏡觀察所得之算術平均直徑之值。 As the above-mentioned black colorant, the average primary particle diameter is preferably 20 to 50 nm, and more preferably the average primary particle diameter is 25 to 45 nm. By setting the average primary particle size of the black colorant to the above range, the line width of the formed black matrix can be appropriately maintained, and the fine wire adhesion and surface resistance can be improved more appropriately. In addition, storage stability can also be imparted appropriately. In addition, the above-mentioned average primary particle diameter is the value of the arithmetic mean diameter obtained by electron microscope observation.
上述黑色著色劑較佳為DBP吸油量為75 ml/100 g以下。 藉由使上述黑色著色劑之DBP吸油量為75 ml/100 g以下,可適宜地維持所形成之黑矩陣之線寬,並更適宜地提高細線密接性及表面電阻值。 上述黑色著色劑之DBP吸油量更佳為60 ml/100 g以下,進而較佳為50 ml/100 g以下。 The above-mentioned black colorant preferably has a DBP oil absorption capacity of 75 ml/100 g or less. By setting the DBP oil absorption amount of the above-mentioned black colorant to 75 ml/100 g or less, the line width of the formed black matrix can be appropriately maintained, and the fine wire adhesion and surface resistance can be improved more appropriately. The DBP oil absorption capacity of the black colorant is preferably 60 ml/100 g or less, and further preferably 50 ml/100 g or less.
再者,DBP吸油量係藉由測定空隙容積來間接地對碳黑之結構進行定量化者,並且係依據JIS K 6217-4而測得之數值。再者,「DBP」係Dibutylphtalate之簡稱。Furthermore, DBP oil absorption is a value that indirectly quantifies the structure of carbon black by measuring void volume, and is measured in accordance with JIS K 6217-4. Furthermore, "DBP" is the abbreviation of Dibutylphtalate.
作為上述黑色著色劑,具體而言,可例舉:Columbia Chemical公司製造之Raven1080(pH值2.4,平均一次粒徑28 nm,DBP吸油量60 ml/100 g)、Raven1100U(pH值2.9,平均一次粒徑32 nm,DBP吸油量72 ml/100 g)、Orion Engineered Carbons公司製造之NEROX305(pH值2.8,平均一次粒徑28 nm,DBP吸油量58 ml/100 g)、NEROX3500(pH值3.0,平均一次粒徑31 nm,DBP吸油量43 ml/100 g)、Mitsubishi Chemical公司製造之MA14(pH值2.8,平均一次粒徑40 nm,DBP吸油量73 ml/100 g)、MA220(pH值2.9,平均一次粒徑55 nm,DBP吸油量93 ml/100 g)等。Specific examples of the black colorant include Raven 1080 manufactured by Columbia Chemical Company (pH value 2.4, average primary particle diameter 28 nm, DBP oil absorption capacity 60 ml/100 g), Raven 1100U (pH value 2.9, average primary particle diameter Particle size 32 nm, DBP oil absorption capacity 72 ml/100 g), NEROX305 manufactured by Orion Engineered Carbons (pH value 2.8, average primary particle size 28 nm, DBP oil absorption capacity 58 ml/100 g), NEROX3500 (pH value 3.0, Average primary particle size 31 nm, DBP oil absorption capacity 43 ml/100 g), MA14 manufactured by Mitsubishi Chemical Co., Ltd. (pH value 2.8, average primary particle size 40 nm, DBP oil absorption capacity 73 ml/100 g), MA220 (pH value 2.9 , the average primary particle size is 55 nm, DBP oil absorption is 93 ml/100 g), etc.
作為上述黑色著色劑之含量,以相對於本發明之黑矩陣用顏料分散組成物之總固形物成分之質量分率計,較佳為5~85質量%,更佳為10~80質量%。 若上述黑色著色劑之含量未達5質量%,則形成黑矩陣之情形時之遮光性有可能降低,若超過85質量%,則顏料分散有可能變得困難。 The content of the black colorant is preferably 5 to 85 mass %, more preferably 10 to 80 mass % based on the mass fraction of the total solid content of the pigment dispersion composition for black matrix of the present invention. If the content of the black colorant is less than 5% by mass, the light-shielding property when forming a black matrix may be reduced, and if it exceeds 85% by mass, dispersion of the pigment may become difficult.
(顏料分散劑) 本發明之黑矩陣用顏料分散組成物含有顏料分散劑。 上述顏料分散劑具有戊內酯骨架及異氰尿酸酯骨架。 藉由具有此種骨架,可於不損害對黑色著色劑之吸附性之情況下,提昇對黏合劑樹脂之親和性。因此,於成膜後之黑矩陣中,黑色著色劑亦可保持良好之分散狀態,並可提高表面電阻值。 (Pigment dispersant) The pigment dispersion composition for black matrices of the present invention contains a pigment dispersant. The above-mentioned pigment dispersant has a valerolactone skeleton and an isocyanurate skeleton. By having such a skeleton, the affinity for the binder resin can be improved without impairing the adsorption of black colorants. Therefore, in the black matrix after film formation, the black colorant can also maintain a good dispersion state and increase the surface resistance value.
上述顏料分散劑之胺值較佳為5~35 mgKOH/g。 藉由使上述顏料分散劑之胺值處於上述範圍內,可使黑矩陣用顏料分散組成物低黏度化,從而可適宜地維持所形成之黑矩陣之線寬,並可更適宜地提昇細線密接性。 另一方面,於上述顏料分散劑之胺值未達5 mgKOH/g之情形時,黑矩陣用顏料分散組成物會發生分散不良而高黏度化,若上述顏料分散劑之胺值超過35 mgKOH/g,則會因與後述之黏合劑樹脂發生中和反應而高黏度化。 上述顏料分散劑更佳為胺值為10~30 mgKOH/g。 再者,胺值係表示自由鹼及鹼基之總量者,並且係相對於中和試樣1 g所需之鹽酸,以當量之氫氧化鉀之mg數來表示者。 The amine value of the above-mentioned pigment dispersant is preferably 5 to 35 mgKOH/g. By setting the amine value of the above-mentioned pigment dispersant within the above-mentioned range, the viscosity of the pigment-dispersed composition for the black matrix can be reduced, so that the line width of the formed black matrix can be suitably maintained, and fine line adhesion can be more suitably improved. sex. On the other hand, when the amine value of the above-mentioned pigment dispersant is less than 5 mgKOH/g, the pigment dispersion composition for black matrix will be poorly dispersed and become highly viscous. If the amine value of the above-mentioned pigment dispersant exceeds 35 mgKOH/g, g, the viscosity will increase due to the neutralization reaction with the binder resin described below. The above-mentioned pigment dispersant preferably has an amine value of 10 to 30 mgKOH/g. Furthermore, the amine value represents the total amount of free bases and bases, and is expressed in mg of equivalent potassium hydroxide relative to the hydrochloric acid required to neutralize 1 g of the sample.
上述顏料分散劑係含鹼性基之顏料分散劑,可使用陰離子性界面活性劑、含鹼性基之聚酯系顏料分散劑、含鹼性基之丙烯酸系顏料分散劑、含鹼性基之胺基甲酸酯系顏料分散劑、含鹼性基之碳二亞胺系顏料分散劑、含酸性基之高分子顏料分散劑等。 該等含鹼性基顏料分散劑可單獨使用,亦可使用2種以上之組合。其中,就可獲得良好之顏料分散性之方面而言,較佳為含鹼性基之高分子顏料分散劑。 The above-mentioned pigment dispersant is a pigment dispersant containing an alkaline group. Anionic surfactant, a polyester pigment dispersant containing an alkaline group, an acrylic pigment dispersant containing an alkaline group, anionic surfactant containing an alkaline group, Urethane pigment dispersants, carbodiimide pigment dispersants containing basic groups, polymer pigment dispersants containing acidic groups, etc. These alkaline group-containing pigment dispersants can be used alone or in combination of two or more. Among them, in terms of obtaining good pigment dispersion, a polymer pigment dispersant containing a basic group is preferred.
作為上述顏料分散劑之具體例,可例舉日本路博潤(Lubrizol)公司製造之Solsperse83500(固形物成分之胺值25 mgKOH/g,固形物成分40質量%)、Solsperse82500(固形物成分之胺值26 mgKOH/g,固形物成分50質量%)等。Specific examples of the above-mentioned pigment dispersants include Solsperse 83500 (amine value of solid content: 25 mgKOH/g, solid content: 40% by mass) manufactured by Lubrizol Corporation of Japan, and Solsperse 82500 (amine value of solid content: 40% by mass). Value 26 mgKOH/g, solid content 50 mass%), etc.
作為上述顏料分散劑之含量,相對於上述黑色著色劑100質量份,較佳為1~200質量份,更佳為5~100質量份。The content of the pigment dispersant is preferably 1 to 200 parts by mass, and more preferably 5 to 100 parts by mass relative to 100 parts by mass of the black colorant.
上述顏料分散劑亦可含有除具有戊內酯骨架及異氰尿酸酯骨架者以外之顏料分散劑(以下亦稱為其他顏料分散劑)。The above-mentioned pigment dispersant may also contain pigment dispersants other than those having a valerolactone skeleton and an isocyanurate skeleton (hereinafter also referred to as other pigment dispersants).
就對上述黑色著色劑之吸附性之觀點而言,上述其他顏料分散劑較佳為含有胺基甲酸酯或異氰尿酸酯骨架。From the viewpoint of adsorbability to the black colorant, the other pigment dispersant preferably contains a urethane or isocyanurate skeleton.
就使黑矩陣用顏料分散組成物低黏度化之觀點而言,上述其他顏料分散劑之胺值較佳為5~35 mgKOH/g。From the viewpoint of reducing the viscosity of the pigment dispersion composition for black matrices, the amine value of the above-mentioned other pigment dispersants is preferably 5 to 35 mgKOH/g.
上述其他顏料分散劑之含量相對於具有戊內酯骨架及異氰尿酸酯骨架之顏料分散劑100質量份,較佳為0~150質量份。The content of the above-mentioned other pigment dispersants is preferably 0 to 150 parts by mass relative to 100 parts by mass of the pigment dispersant having a valerolactone skeleton and an isocyanurate skeleton.
(顏料分散助劑) 本發明之黑矩陣用顏料分散組成物較佳為含有顏料分散助劑。 藉由含有上述顏料分散助劑,可適宜地賦予後述之保存穩定性及黑矩陣之再溶解性。 (Pigment dispersion aid) The pigment dispersion composition for black matrix of the present invention preferably contains a pigment dispersion assistant. By containing the above-mentioned pigment dispersion auxiliary, the storage stability and the re-solubility of the black matrix described below can be appropriately imparted.
作為上述顏料分散助劑,可例舉選自由含酸基之顏料衍生物、含酸基之色素衍生物所組成之群之至少1種。Examples of the pigment dispersion aid include at least one selected from the group consisting of acid group-containing pigment derivatives and acid group-containing dye derivatives.
作為上述含酸基之顏料衍生物、含酸基之色素衍生物,可例示作為銅酞青之磺化物之酞青系顏料衍生物、具有酸基之蒽醌系顏料衍生物、具有酸基之萘系顏料衍生物等。 其中,就上述黑色著色劑之分散性之觀點而言,較佳為銅酞青之磺化物。 Examples of the acid group-containing pigment derivatives and acid group-containing dye derivatives include phthalocyanine-based pigment derivatives that are sulfonated compounds of copper phthalocyanine, anthraquinone-based pigment derivatives having an acid group, and acid group-containing pigment derivatives. Naphthalene pigment derivatives, etc. Among them, from the viewpoint of the dispersibility of the black colorant, a sulfonated compound of copper phthalocyanine is preferred.
作為上述銅酞青之磺化物之具體例,可例舉路博潤公司製造之Solsperse5000S、Solsperse12000S、BYK-Chemie公司製造之BYK-SYNERGIST2100等。Specific examples of the sulfonated compound of copper phthalocyanine include Solsperse 5000S and Solsperse 12000S manufactured by Lubrizol Corporation, BYK-SYNERGIST 2100 manufactured by BYK-Chemie Corporation, and the like.
上述顏料分散助劑之含量相對於上述黑色著色劑100質量份,較佳為0~20質量份,更佳為0.5~10質量份。The content of the above-mentioned pigment dispersion aid is preferably 0 to 20 parts by mass, and more preferably 0.5 to 10 parts by mass relative to 100 parts by mass of the black colorant.
(黏合劑樹脂) 本發明之黑矩陣用顏料分散組成物含有黏合劑樹脂。 (Binder resin) The pigment dispersion composition for black matrix of the present invention contains a binder resin.
作為上述黏合劑樹脂,可例舉熱固性樹脂、熱塑性樹脂、光聚合性化合物、鹼可溶性樹脂等。該等可單獨使用或將2種以上混合使用。Examples of the binder resin include thermosetting resins, thermoplastic resins, photopolymerizable compounds, alkali-soluble resins, and the like. These can be used individually or in mixture of 2 or more types.
作為上述熱固性樹脂或熱塑性樹脂,例如,可例舉:丁醛樹脂、苯乙烯-順丁烯二酸共聚物、氯化聚乙烯、氯化聚丙烯、聚氯乙烯、氯乙烯-乙酸乙烯酯共聚物、聚乙酸乙烯酯、聚胺酯系樹脂、酚樹脂、聚酯樹脂、丙烯酸系樹脂、醇酸樹脂、苯乙烯樹脂、聚醯胺樹脂、橡膠系樹脂、環化橡膠、環氧樹脂、纖維素類、聚丁二烯、聚醯亞胺樹脂、苯并胍胺樹脂、三聚氰胺樹脂、尿素樹脂、卡多樹脂等。Examples of the thermosetting resin or thermoplastic resin include butyral resin, styrene-maleic acid copolymer, chlorinated polyethylene, chlorinated polypropylene, polyvinyl chloride, and vinyl chloride-vinyl acetate copolymer. Materials, polyvinyl acetate, polyurethane resin, phenol resin, polyester resin, acrylic resin, alkyd resin, styrene resin, polyamide resin, rubber resin, cyclized rubber, epoxy resin, cellulose , polybutadiene, polyimide resin, benzoguanamine resin, melamine resin, urea resin, cardo resin, etc.
作為上述光聚合性化合物,可例舉於分子內具有1個或2個以上光聚合性不飽和鍵之單體、具有光聚合性不飽和鍵之低聚物等。Examples of the photopolymerizable compound include monomers having one or more photopolymerizable unsaturated bonds in the molecule, oligomers having a photopolymerizable unsaturated bond, and the like.
作為上述之於分子內具有1個光聚合性不飽和鍵之單體,例如,可使用:甲基丙烯酸甲酯、甲基丙烯酸丁酯、甲基丙烯酸2-乙基己酯、丙烯酸甲酯、丙烯酸丁酯、丙烯酸2-乙基己酯等甲基丙烯酸烷基酯或丙烯酸烷基酯;甲基丙烯酸苄酯、丙烯酸苄酯等甲基丙烯酸芳烷基酯或丙烯酸芳烷基酯;甲基丙烯酸丁氧基乙酯、丙烯酸丁氧基乙酯等甲基丙烯酸烷氧基烷基酯或丙烯酸烷氧基烷基酯;甲基丙烯酸N,N-二甲基胺基乙酯、丙烯酸N,N-二甲基胺基乙酯等甲基丙烯酸胺基烷基酯或丙烯酸胺基烷基酯;二乙二醇單乙醚、三乙二醇單丁醚、二丙二醇單甲醚等聚伸烷基二醇單烷基醚之甲基丙烯酸酯或丙烯酸酯;六乙二醇單苯醚等聚伸烷基二醇單芳基醚之甲基丙烯酸酯或丙烯酸酯;甲基丙烯酸異冰片酯或丙烯酸異冰片酯、甘油甲基丙烯酸酯或甘油丙烯酸酯、甲基丙烯酸-2-羥基乙酯或丙烯酸-2-羥基乙酯等。As the above-mentioned monomer having one photopolymerizable unsaturated bond in the molecule, for example, methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methyl acrylate, Butyl acrylate, 2-ethylhexyl acrylate and other alkyl methacrylates or alkyl acrylates; benzyl methacrylate, benzyl acrylate and other aralkyl methacrylates or aralkyl acrylates; methyl Butoxyethyl acrylate, butoxyethyl acrylate and other alkoxyalkyl methacrylates or alkoxyalkyl acrylates; N,N-dimethylaminoethyl methacrylate, N, acrylate, Methacrylic acid aminoalkyl esters or acrylic acid aminoalkyl esters such as N-dimethylaminoethyl ester; diethylene glycol monoethyl ether, triethylene glycol monobutyl ether, dipropylene glycol monomethyl ether and other polyextensions Methacrylate or acrylate of polyalkylene glycol monoalkyl ether; methacrylate or acrylate of polyalkylene glycol monoaryl ether such as hexaethylene glycol monophenyl ether; isobornyl methacrylate or Isobornyl acrylate, glyceryl methacrylate or glyceryl acrylate, 2-hydroxyethyl methacrylate or 2-hydroxyethyl acrylate, etc.
作為上述之於分子內具有2個以上光聚合性不飽和鍵之單體,例如,可使用:雙酚A二甲基丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、1,3-丁二醇二甲基丙烯酸酯、二乙二醇二甲基丙烯酸酯、甘油二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、聚乙二醇二甲基丙烯酸酯、聚丙二醇二甲基丙烯酸酯、四乙二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、新戊四醇三甲基丙烯酸酯、新戊四醇四甲基丙烯酸酯、二新戊四醇四甲基丙烯酸酯、二新戊四醇六甲基丙烯酸酯、二新戊四醇五甲基丙烯酸酯、環氧甲基丙烯酸酯、雙酚A二丙烯酸酯、1,4-丁二醇二丙烯酸酯、1,3-丁二醇二丙烯酸酯、二乙二醇二丙烯酸酯、甘油二丙烯酸酯、新戊二醇二丙烯酸酯、聚乙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、四乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、新戊四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇四丙烯酸酯、二新戊四醇六丙烯酸酯、二新戊四醇五丙烯酸酯、環氧丙烯酸酯等。As the above-mentioned monomer having two or more photopolymerizable unsaturated bonds in the molecule, for example, bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, 1,3 -Butanediol dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, neopentyl glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate Methacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, neopentylerythritol trimethacrylate, neopenterythritol tetramethacrylate, dineopenterythritol Alcohol tetramethacrylate, dipenterythritol hexamethacrylate, dipenterythritol pentamethacrylate, epoxy methacrylate, bisphenol A diacrylate, 1,4-butanediol Diacrylate, 1,3-butanediol diacrylate, diethylene glycol diacrylate, glycerol diacrylate, neopentyl glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, Tetraethylene glycol diacrylate, trimethylolpropane triacrylate, neopentylerythritol triacrylate, neopentylerythritol tetraacrylate, dineopenterythritol tetraacrylate, dineopenterythritol hexaacrylate , dipenterythritol pentaacrylate, epoxy acrylate, etc.
作為上述之具有光聚合性不飽和鍵之低聚物,可使用使上述單體適當地聚合而獲得者。 上述黏合劑樹脂可單獨使用或組合2種以上使用。 As the above-mentioned oligomer having a photopolymerizable unsaturated bond, those obtained by suitably polymerizing the above-mentioned monomers can be used. The above-mentioned binder resins can be used alone or in combination of two or more types.
關於上述鹼可溶性樹脂,於下文進行敍述。The above-mentioned alkali-soluble resin will be described below.
就於形成黑矩陣時可適宜地維持顯影時間之觀點而言,上述黏合劑樹脂較佳為鹼可溶性卡多樹脂及/或鹼可溶性環氧(甲基)丙烯酸酯樹脂。 再者,上述卡多樹脂意指具有於環內碳原子上鍵結有兩個芳香環之骨架結構之樹脂。 From the viewpoint of appropriately maintaining the development time when forming the black matrix, the binder resin is preferably alkali-soluble cardo resin and/or alkali-soluble epoxy (meth)acrylate resin. Furthermore, the above-mentioned cardo resin means a resin having a skeleton structure in which two aromatic rings are bonded to carbon atoms in the ring.
就顏料分散性及鹼顯影性之觀點而言,上述黏合劑樹脂較佳為酸值為10~200 mgKOH/g,更佳為50~150 mgKOH/g。From the viewpoint of pigment dispersibility and alkali developability, the above-mentioned binder resin preferably has an acid value of 10 to 200 mgKOH/g, more preferably 50 to 150 mgKOH/g.
再者,黏合劑樹脂之酸值意指藉由JIS K5601-2-1:1999測得之酸值。In addition, the acid value of the binder resin means the acid value measured by JIS K5601-2-1:1999.
上述黏合劑樹脂之含量以相對於本發明之黑矩陣用顏料分散組成物之總固形物成分之質量分率計,較佳為3~50質量%。The content of the above-mentioned binder resin is preferably 3 to 50 mass % in terms of mass fraction relative to the total solid content of the pigment dispersion composition for black matrix of the present invention.
(有機溶劑) 本發明之黑矩陣用顏料分散組成物較佳為含有有機溶劑。 作為上述有機溶劑,可適宜地使用以往於液晶黑矩陣用光阻之領域中所使用之有機溶劑。 (organic solvent) The pigment dispersion composition for black matrix of the present invention preferably contains an organic solvent. As the above-mentioned organic solvent, organic solvents conventionally used in the field of photoresists for liquid crystal black matrices can be suitably used.
作為上述有機溶劑,具體而言係於常壓(1.013×10 2kPa)之沸點為100~250℃之酯系有機溶劑、醚系有機溶劑、醚酯系有機溶劑、酮系有機溶劑、芳香族烴系有機溶劑、含氮系有機溶劑等。 若大量含有上述沸點超過250℃之有機溶劑,則於對塗佈由本發明之黑矩陣用顏料分散組成物獲得之黑矩陣用光阻組成物而形成之塗膜進行預烘烤時,有機溶劑有可能未充分地蒸發而殘存於乾燥塗膜內,從而降低乾燥塗膜之耐熱性。 又,若大量含有上述沸點未達100℃之有機溶劑,則有可能難以無斑點地均勻塗佈,從而無法獲得表面平滑性優異之塗膜。 The above-mentioned organic solvent is specifically an ester-based organic solvent, an ether-based organic solvent, an ether-ester-based organic solvent, a ketone-based organic solvent, and an aromatic solvent having a boiling point of 100 to 250°C at normal pressure (1.013×10 2 kPa). Hydrocarbon-based organic solvents, nitrogen-containing organic solvents, etc. If a large amount of the above-mentioned organic solvent with a boiling point exceeding 250° C. is contained, the organic solvent may It may not be fully evaporated and remain in the dry coating film, thereby reducing the heat resistance of the dry coating film. In addition, if a large amount of the above-mentioned organic solvent having a boiling point of less than 100° C. is contained, it may be difficult to apply uniformly without spots, and a coating film with excellent surface smoothness may not be obtained.
作為上述有機溶劑,具體而言,可例示:乙二醇單甲醚、乙二醇單乙醚、乙二醇單異丙醚、乙二醇單丁醚、二乙二醇單甲醚、二乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單丁醚、二乙二醇二乙醚、二乙二醇二甲醚、二乙二醇甲基乙基醚等醚系有機溶劑;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等醚酯系有機溶劑;甲基異丁基酮、環己酮、2-庚酮、δ-丁內酯等酮系有機溶劑;2-羥基丙酸甲酯、2-羥基丙酸乙酯、2-羥基-2-甲基丙酸酯、3-甲基-3-甲氧基丙酸酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、甲酸正戊酯等酯系有機溶劑;甲醇、乙醇、異丙醇、丁醇等醇系溶劑;N-甲基吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等含氮系有機溶劑等。該等可單獨使用或將2種以上混合使用。Specific examples of the organic solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, and diethyl glycol. Ether-based organic solvents such as glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether; Ether ester organic solvents such as glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate; Ketone-based organic solvents such as isobutyl ketone, cyclohexanone, 2-heptanone, and δ-butyrolactone; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, 2-hydroxy-2-methyl Propionate, 3-methyl-3-methoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3- Ester-based organic solvents such as ethoxypropionate, ethoxyethyl acetate, ethyl glycolate, n-amyl formate, etc.; alcohol-based solvents such as methanol, ethanol, isopropanol, butanol, etc.; N-methylpyrrole Nitrogen-containing organic solvents such as ridinone, N,N-dimethylformamide, N,N-dimethylacetamide, etc. These can be used individually or in mixture of 2 or more types.
上述有機溶劑之中,就溶解性、分散性、塗佈性等方面而言,較佳為二乙二醇二甲醚、二乙二醇甲基乙基醚、乙二醇單甲醚乙酸酯、丙二醇單甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、環己酮、2-庚酮、2-羥基丙酸乙酯、3-甲基-3-甲氧基丙酸酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、甲酸正戊酯等,更佳為丙二醇單甲醚、丙二醇單甲醚乙酸酯。Among the above-mentioned organic solvents, in terms of solubility, dispersibility, coating properties, etc., diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, and ethylene glycol monomethyl ether acetic acid are preferred. Esters, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptanone, ethyl 2-hydroxypropionate, 3-methyl-3-methoxypropanate acid ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, n-amyl formate, etc., and more preferably propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate.
(黑矩陣用顏料分散組成物之製造方法) 本發明之黑矩陣用顏料分散組成物之製造方法並無特別限定,例如可藉由對黑色著色劑、顏料分散劑、顏料分散助劑及黏合劑樹脂進行混合及碾磨來製造。 (Method for manufacturing pigment dispersion composition for black matrix) The method of producing the pigment dispersion composition for black matrix of the present invention is not particularly limited. For example, it can be produced by mixing and grinding a black colorant, a pigment dispersant, a pigment dispersion auxiliary and a binder resin.
上述黑色著色劑、顏料分散劑、顏料分散助劑及黏合劑樹脂可使用上述之材料。The above-mentioned black colorant, pigment dispersant, pigment dispersion assistant and binder resin can use the above-mentioned materials.
作為進行上述混合及碾磨之方法,只要添加上述之各種成分並進行混合及碾磨即可,進行上述碾磨之方法並無特別限定,只要使用例如珠磨機(bead mill)、預磨機(Ready Mill)、超音波均質機、高壓均質機、塗料振盪機、球磨機、輥磨機、混砂機(sand mill)、砂磨機(sand grinder)、動力磨機(DYNO-MILL)、分散器(Dispermat)、SC磨機、奈米化機(Nanomizer)等,並藉由公知之方法進行混合及碾磨即可。As a method of performing the above-mentioned mixing and grinding, it is sufficient to add the above-mentioned various ingredients and mix and grind them. The method of performing the above-mentioned grinding is not particularly limited as long as, for example, a bead mill or a pre-mill is used. (Ready Mill), ultrasonic homogenizer, high-pressure homogenizer, coating oscillator, ball mill, roller mill, sand mixer (sand mill), sand grinder (sand grinder), power mill (DYNO-MILL), dispersion Dispermat, SC mill, Nanomizer, etc., and mix and grind by known methods.
(黏度) 本發明之黑矩陣用顏料分散組成物較佳為黏度為12 mPa・s以下,更佳為11.5 mPa・s以下,進而較佳為10.5 mPa・s以下。 作為上述黏度之下限,較佳為2.5 mPa・s。 藉由使黏度處於上述範圍內,可適宜地維持所形成之黑矩陣之線寬,並可更適宜地提昇細線密接性。 (viscosity) The pigment dispersion composition for black matrix of the present invention preferably has a viscosity of 12 mPa·s or less, more preferably 11.5 mPa·s or less, further preferably 10.5 mPa·s or less. The lower limit of the above viscosity is preferably 2.5 mPa·s. By keeping the viscosity within the above range, the line width of the formed black matrix can be appropriately maintained, and the fine line adhesion can be more appropriately improved.
本發明之黑矩陣用顏料分散組成物較佳為採取至玻璃瓶中栓緊並於60℃保存1週後之黏度變化率[(保存1週後之黏度-保存前之黏度)/(保存前之黏度)]為10%以下,更佳為5%以下。 若上述黏度變化率為10%以下,則保存穩定性優異,即使長期保存亦難以發生劣化。 The pigment dispersion composition for black matrix of the present invention is preferably collected into a glass bottle, tightly sealed and stored at 60°C for 1 week. The viscosity change rate [(viscosity after 1 week of storage - viscosity before storage)/(before storage) viscosity)] is less than 10%, preferably less than 5%. If the above-mentioned viscosity change rate is 10% or less, storage stability is excellent and deterioration is unlikely to occur even if stored for a long period of time.
再者,於本說明書中,黏度意指使用E型黏度計(東機產業股份有限公司製造,R100型黏度計,型式RE100L)測得之於25℃之黏度。Furthermore, in this specification, viscosity means the viscosity measured at 25°C using an E-type viscometer (R100 viscometer, model RE100L, manufactured by Toki Industrial Co., Ltd.).
<黑矩陣用光阻組成物> 本發明亦為由本發明之黑矩陣用顏料分散組成物所獲得之黑矩陣用光阻組成物。 <Photoresist composition for black matrix> The present invention also provides a photoresist composition for black matrices obtained from the pigment dispersion composition for black matrices of the present invention.
(黑矩陣用顏料分散組成物) 本發明之黑矩陣用光阻組成物含有上述之本發明之黑矩陣用顏料分散組成物。 作為上述黑矩陣用顏料分散組成物之含量,以本發明之黑矩陣用光阻組成物之總質量為基準,較佳為30~80質量%,更佳為40~75質量%。 (Pigment dispersion composition for black matrix) The photoresist composition for black matrices of the present invention contains the above-mentioned pigment dispersion composition for black matrices of the present invention. The content of the pigment dispersion composition for black matrix is preferably 30 to 80 mass %, more preferably 40 to 75 mass % based on the total mass of the photoresist composition for black matrix of the present invention.
(光聚合起始劑) 本發明之黑矩陣用光阻組成物較佳為含有光聚合起始劑。 作為上述光聚合起始劑,並無特別限定,只要可藉由照射紫外線或電子束等活性能量線而產生自由基或陽離子即可,例如,可例舉:1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯肟)乙酮、二苯甲酮、N,N'-四乙基-4,4'-二胺基二苯甲酮、4-甲氧基-4'-二甲胺基二苯甲酮、2,2-二乙氧基苯乙酮、安息香、安息香甲醚、安息香異丁醚、苯偶醯二甲基縮酮、α-羥基異丁基苯酮、9-氧硫、2-氯9-氧硫、1-羥基環己基苯基酮、第三丁基蒽醌、1-氯蒽醌、2,3-二氯蒽醌、3-氯-2-甲基蒽醌、2-乙基蒽醌、1,4-萘醌、1,2-苯并蒽醌、1,4-二甲基蒽醌、2-苯基蒽醌、2-甲基-1[4-(甲硫基)苯基]-2-嗎啉代丙-1-酮(2-methyl-1-(4-methylthie phonyl)-2-morpholinopropane-1-on)等二苯甲酮系、9-氧硫𠮿系、蒽醌系、三系等之光聚合起始劑等。 上述光聚合起始劑可單獨使用或組合2種以上使用。 (Photopolymerization Initiator) The photoresist composition for black matrix of the present invention preferably contains a photopolymerization initiator. The above-mentioned photopolymerization initiator is not particularly limited as long as it can generate radicals or cations by irradiating active energy rays such as ultraviolet rays or electron beams. For example, 1-[9-ethyl-6 -(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyl oxime)ethanone, benzophenone, N,N'-tetraethyl-4, 4'-Diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl Ether, benzildimethyl ketal, α-hydroxyisobutylphenone, 9-oxosulfide , 2-Chloro-9-oxysulfide , 1-hydroxycyclohexylphenyl ketone, 3-butylanthraquinone, 1-chloroanthraquinone, 2,3-dichloroanthraquinone, 3-chloro-2-methylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 1,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, 2-methyl-1[4-(methylthio)phenyl] -2-Morpholinopropane-1-one (2-methyl-1-(4-methylthie phonyl)-2-morpholinopropane-1-on) and other benzophenones, 9-oxysulfide𠮿 series, anthraquinone series, three It is a photopolymerization initiator etc. The above-mentioned photopolymerization initiator can be used alone or in combination of two or more kinds.
上述光聚合起始劑之含量以相對於本發明之黑矩陣用光阻組成物之總固形物成分之質量分率計,較佳為1~20質量%。The content of the above-mentioned photopolymerization initiator is preferably 1 to 20 mass % in terms of mass fraction relative to the total solid content of the photoresist composition for black matrix of the present invention.
(光聚合性化合物) 本發明之黑矩陣用光阻組成物較佳為含有光聚合性化合物。 作為上述光聚合性化合物,可適當選擇上述之黑矩陣用顏料分散組成物中所記載者來使用。 (Photopolymerizable compound) The photoresist composition for black matrix of the present invention preferably contains a photopolymerizable compound. As the above-mentioned photopolymerizable compound, those described in the above-mentioned pigment dispersion composition for black matrix can be appropriately selected and used.
上述光聚合性化合物之含量以相對於本發明之黑矩陣用光阻組成物之總固形物成分之質量分率計,較佳為0.1~50質量%。The content of the above-mentioned photopolymerizable compound is preferably 0.1 to 50 mass % in terms of mass fraction relative to the total solid content of the photoresist composition for black matrix of the present invention.
(鹼可溶性樹脂) 本發明之黑矩陣用光阻組成物較佳為含有鹼可溶性樹脂。 作為上述鹼可溶性樹脂,較佳為對上述黑色著色劑發揮作為黏合劑之作用,並且對於製造黑矩陣時之顯影處理中所使用之顯影液、尤其是對鹼顯影液具有可溶性者。 (Alkali-soluble resin) The photoresist composition for black matrix of the present invention preferably contains an alkali-soluble resin. The alkali-soluble resin preferably functions as a binder for the black colorant and is soluble in the developer used in the development process when producing the black matrix, especially in the alkali developer.
作為上述鹼可溶性樹脂,可設為嵌段共聚物。藉由採用嵌段共聚物,相較於其他共聚物,可提高顏料分散能,並可賦予於PGMEA或鹼顯影液中之溶解性。 該嵌段共聚物之中,較佳為具有下述嵌段之共聚物:由具有1個以上之羧基之乙烯性不飽和單體所構成之嵌段、及由其他可共聚之乙烯性不飽和單體所構成之嵌段。 The alkali-soluble resin may be a block copolymer. By using block copolymers, the pigment dispersion ability can be improved compared to other copolymers, and solubility in PGMEA or alkali developers can be imparted. Among the block copolymers, a copolymer having a block composed of an ethylenically unsaturated monomer having one or more carboxyl groups and other copolymerizable ethylenically unsaturated monomers is preferred. A block composed of monomers.
作為上述嵌段共聚物,並無特別限定,可使用以往所使用者。其中,具體而言,可例舉:丙烯酸、甲基丙烯酸等具有羧基之乙烯性不飽和單體和可與具有羧基之乙烯性不飽和單體共聚之至少1種乙烯性不飽和單體的共聚物,上述可與具有羧基之乙烯性不飽和單體共聚之至少1種乙烯性不飽和單體係選自苯乙烯、丙烯酸2-羥基乙酯、甲基丙烯酸-2-羥基乙酯、丙烯酸烯丙酯、甲基丙烯酸烯丙酯、丙烯酸苄酯、甲基丙烯酸苄酯、丙烯酸環己酯、甲基丙烯酸環己酯、甘油單丙烯酸酯、甘油甲基丙烯酸酯、N-苯基馬來醯亞胺、聚苯乙烯巨單體、聚甲基丙烯酸甲酯巨單體、二丙烯酸碳醯環氧酯等單體、低聚物類之群。 但是,較理想為不使用N-乙烯基吡咯啶酮、含硫元素之單體。 作為上述嵌段共聚物,可採用藉由活性自由基聚合、陰離子聚合而合成之嵌段樹脂。 上述嵌段共聚物之一部分之嵌段部分亦可由無規共聚物構成。 The block copolymer is not particularly limited, and those conventionally used can be used. Among them, specific examples include copolymerization of an ethylenically unsaturated monomer having a carboxyl group such as acrylic acid and methacrylic acid and at least one ethylenically unsaturated monomer copolymerizable with an ethylenically unsaturated monomer having a carboxyl group. The above-mentioned at least one ethylenically unsaturated monomer that can be copolymerized with an ethylenically unsaturated monomer having a carboxyl group is selected from the group consisting of styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, and vinyl acrylate. Propyl ester, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, glyceryl monoacrylate, glyceryl methacrylate, N-phenylmaleyl A group of monomers and oligomers such as imine, polystyrene macromonomer, polymethylmethacrylate macromonomer, carbonyl epoxy diacrylate, etc. However, it is preferable not to use N-vinylpyrrolidone or a sulfur element-containing monomer. As the above-mentioned block copolymer, a block resin synthesized by living radical polymerization or anionic polymerization can be used. A part of the block part of the above-mentioned block copolymer may also be composed of a random copolymer.
作為上述鹼可溶性樹脂,亦可採用鹼可溶性卡多樹脂。 作為上述鹼可溶性卡多樹脂,可例舉作為茀環氧(甲基)丙烯酸衍生物與二羧酸酐及/或四羧酸二酐之加成產物的具有茀骨架之環氧(甲基)丙烯酸酯酸加成物等。 又,本鹼可溶性樹脂亦可具有光聚合性之官能基。 As the above-mentioned alkali-soluble resin, alkali-soluble cardo resin can also be used. Examples of the alkali-soluble cardo resin include epoxy (meth)acrylic acid having a fluorine skeleton which is an addition product of a fluorine epoxy (meth)acrylic acid derivative and a dicarboxylic anhydride and/or a tetracarboxylic dianhydride. Ester acid adducts, etc. Furthermore, the present alkali-soluble resin may have a photopolymerizable functional group.
作為上述鹼可溶性樹脂之酸值,就顯影特性之觀點而言,較佳為5~300 mgKOH/g,更佳為5~250 mgKOH/g,進而較佳為10~200 mgKOH/g,尤佳為60~150 mgKOH/g。 再者,於本說明書中,上述酸值為理論酸值,係基於具有羧基之乙烯性不飽和單體及其含量算術地求出之值。 The acid value of the above-mentioned alkali-soluble resin is preferably 5 to 300 mgKOH/g, more preferably 5 to 250 mgKOH/g, and still more preferably 10 to 200 mgKOH/g, from the viewpoint of development characteristics. It is 60~150 mgKOH/g. In addition, in this specification, the above-mentioned acid value is a theoretical acid value, which is a value calculated arithmetically based on the ethylenically unsaturated monomer having a carboxyl group and its content.
就顯影特性及於有機溶劑中之溶解性之觀點而言,上述鹼可溶性樹脂之重量平均分子量較佳為1,000~100,000,更佳為3,000~50,000,進而較佳為5,000~30,000。 再者,於本發明中,上述重量平均分子量係基於GPC而獲得之聚苯乙烯換算之重量平均分子量。 於本說明書中,使用Water2690(Waters公司製造)作為測定上述重量平均分子量之裝置,使用PLgel 5 μm MIXED-D(Agilent Technologies公司製造)作為管柱。 From the viewpoint of developing characteristics and solubility in organic solvents, the weight average molecular weight of the alkali-soluble resin is preferably 1,000 to 100,000, more preferably 3,000 to 50,000, and still more preferably 5,000 to 30,000. In addition, in the present invention, the above-mentioned weight average molecular weight is a weight average molecular weight in terms of polystyrene obtained based on GPC. In this specification, Water2690 (manufactured by Waters Co., Ltd.) is used as a device for measuring the weight average molecular weight, and PLgel 5 μm MIXED-D (manufactured by Agilent Technologies Co., Ltd.) is used as a column.
上述鹼可溶性樹脂之含量相對於上述黑色著色劑100質量份較佳為1~200質量份,進而較佳為10~150質量份。 於該情形時,若上述鹼可溶性樹脂之含量未達1質量份,則顯影特性有可能降低,若上述鹼可溶性樹脂之含量超過200質量份,則上述黑色著色劑之濃度相對下降,有可能難以達成作為薄膜時之目標色濃度。 The content of the alkali-soluble resin is preferably 1 to 200 parts by mass, and more preferably 10 to 150 parts by mass relative to 100 parts by mass of the black colorant. In this case, if the content of the above-mentioned alkali-soluble resin is less than 1 part by mass, the development characteristics may be reduced. If the content of the above-mentioned alkali-soluble resin exceeds 200 parts by mass, the concentration of the above-mentioned black colorant will be relatively reduced, and it may be difficult to Achieve the target color density as a thin film.
作為上述鹼可溶性樹脂,較佳為不含一級、二級及三級胺基中之任一者,進而亦不含有四級銨基。進而更佳為不具有鹼性基。 再者,於不損害本發明所產生之效果之範圍內,亦可摻合具有除嵌段共聚物以外之結構之鹼可溶性樹脂。 The alkali-soluble resin preferably does not contain any of primary, secondary and tertiary amine groups, and furthermore does not contain quaternary ammonium groups. Still more preferably, it does not have a basic group. Furthermore, alkali-soluble resins having structures other than block copolymers may be blended within the scope that does not impair the effects of the present invention.
(有機溶劑) 作為上述有機溶劑,可適當選擇上述黑矩陣用顏料分散組成物中所記載之有機溶劑來使用。 (organic solvent) As the above-mentioned organic solvent, the organic solvent described in the above-mentioned pigment dispersion composition for black matrix can be appropriately selected and used.
作為上述有機溶劑之含量,以本發明之黑矩陣用光阻組成物之總質量為基準,較佳為1~40質量%,更佳為5~35質量%。As for the content of the above-mentioned organic solvent, based on the total mass of the photoresist composition for black matrix of the present invention, it is preferably 1 to 40 mass %, and more preferably 5 to 35 mass %.
(其他添加劑) 本發明之黑矩陣用光阻組成物視需要可適當地使用熱聚合抑制劑、紫外線吸收劑、抗氧化劑等各種添加劑。 (Other additives) The photoresist composition for black matrix of the present invention may appropriately use various additives such as thermal polymerization inhibitors, ultraviolet absorbers, and antioxidants as necessary.
(黑矩陣用光阻組成物之製造方法) 作為本發明之黑矩陣用光阻組成物之製造方法,例如可藉由製作本發明之黑矩陣用顏料分散組成物,其後添加其餘之材料並使用攪拌裝置等進行攪拌混合來製作。 作為進行上述攪拌、混合之方法,並無特別限定,可使用超音波分散機、高壓乳化機、珠磨機、三輥研磨機、混砂機、捏合機等公知之方法。 又,亦可於上述攪拌、混合後藉由過濾器進行過濾。 再者,於製作本發明之黑矩陣用光阻組成物時,視需要亦可添加本發明之黑矩陣用顏料分散組成物中所記載之上述黑色著色劑、上述環氧樹脂、上述 化合物等。 (Method for manufacturing the photoresist composition for black matrix) As a method for manufacturing the photoresist composition for black matrix of the present invention, for example, the pigment dispersion composition for black matrix of the present invention can be prepared, and then the remaining materials can be added and Stir and mix using a stirring device etc. to prepare. The method of stirring and mixing is not particularly limited, and known methods such as ultrasonic dispersers, high-pressure emulsifiers, bead mills, three-roller mills, sand mixers, and kneaders can be used. Moreover, you may filter with a filter after the said stirring and mixing. Furthermore, when preparing the photoresist composition for black matrix of the present invention, the above-mentioned black colorant, the above-mentioned epoxy resin, and the above-mentioned epoxy resin described in the pigment dispersion composition for black matrix of the present invention may also be added if necessary. Compounds etc.
<黑矩陣> 本發明之黑矩陣由本發明之黑矩陣用光阻組成物形成。 <Black Matrix> The black matrix of the present invention is formed from the photoresist composition for black matrix of the present invention.
作為本發明之黑矩陣之形成方法,並無特別限定,例如可藉由下述等方法來形成黑矩陣,即,於透明基板上塗佈本發明之黑矩陣用光阻組成物並進行乾燥,形成塗膜後,於上述塗膜上放置光罩,介隔該光罩進行影像曝光、顯影,並視需要進行光硬化。The method for forming the black matrix of the present invention is not particularly limited. For example, the black matrix can be formed by the following methods: that is, coating the photoresist composition for black matrix of the present invention on a transparent substrate and drying it, After the coating film is formed, a photomask is placed on the coating film, and image exposure and development are performed through the photomask, and if necessary, photohardening is performed.
對本發明之黑矩陣用光阻組成物進行塗佈、乾燥、曝光及顯影之方法等可適當地選擇公知之方法。 又,作為上述透明基板,可適當地選擇玻璃基板、塑膠基板等公知之透明基板來使用。 The methods of applying, drying, exposing and developing the photoresist composition for black matrix of the present invention can be appropriately selected from known methods. In addition, as the transparent substrate, a known transparent substrate such as a glass substrate or a plastic substrate can be appropriately selected and used.
作為上述塗膜之厚度,以乾燥後之膜厚計,較佳為0.2~10 μm,更佳為0.5~6 μm,進而較佳為1~4 μm。 藉由設為上述厚度之範圍,可適宜地顯影出規定之圖案,並可適宜地賦予規定之光學濃度。 The thickness of the coating film is preferably 0.2 to 10 μm, more preferably 0.5 to 6 μm, and even more preferably 1 to 4 μm in terms of film thickness after drying. By setting the thickness within the above range, a predetermined pattern can be developed appropriately and a predetermined optical density can be appropriately imparted.
關於本發明之黑矩陣,於形成黑矩陣時可將顯影時間維持在適當之範圍內。 具體而言,關於本發明之黑矩陣,藉由下述方法進行顯影時之顯影時間處於20秒~45秒之範圍內。 若顯影時間未達20秒,則有可能使硬化部被顯影液過度侵入,從而導致發生細線之密接不良,若超過45秒,則有可能使未硬化部之溶解變得不充分,從而導致玻璃基板上產生顯影殘渣。 因此,可判斷若顯影時間處於20秒~45秒之範圍內,則可維持適當之顯影時間。 上述顯影時間較佳為30秒~40秒之範圍。 Regarding the black matrix of the present invention, the development time can be maintained within an appropriate range when forming the black matrix. Specifically, regarding the black matrix of the present invention, the development time when developing by the following method is in the range of 20 seconds to 45 seconds. If the development time is less than 20 seconds, the hardened part may be excessively invaded by the developer, resulting in poor adhesion of thin lines. If the development time exceeds 45 seconds, the unhardened part may become insufficiently dissolved, resulting in glass Development residue is generated on the substrate. Therefore, it can be judged that if the development time is in the range of 20 seconds to 45 seconds, the appropriate development time can be maintained. The above-mentioned development time is preferably in the range of 30 seconds to 40 seconds.
測定上述顯影時間之方法如下所示。 藉由旋轉塗佈機將黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,使用具有間隔為1 μm之線圖案之光罩(1~20 μm,以1 μm為單位之20種;30~100 μm,以10 μm為單位之線寬8種),於高壓水銀燈進行曝光(UV累計光量80 mJ/cm 2)。 其後,於23℃、0.05%氫氧化鉀水溶液、0.5 kgf/cm 2壓力之條件對曝光後之玻璃基板進行噴淋顯影,並於3.0 kgf/cm 2壓力進行噴霧水洗。 測定自噴淋顯影開始起至玻璃基板之中心部之黑矩陣組成物完全溶解為止之時間。 The method for measuring the above development time is as follows. The black matrix photoresist composition was coated on the glass substrate (product name: EAGLE XG, manufactured by Corning Company) with a film thickness of 1 μm using a spin coater and pre-baked at 100°C for 3 minutes. Then, a photomask with a line pattern with an interval of 1 μm (1 to 20 μm, 20 types in 1 μm units; 30 to 100 μm, 8 types of line widths in 10 μm units) was used, and the process was performed under a high-pressure mercury lamp. Exposure (UV cumulative light amount 80 mJ/cm 2 ). Thereafter, the exposed glass substrate was spray developed at 23°C, 0.05% potassium hydroxide aqueous solution, and 0.5 kgf/cm 2 pressure, and spray-washed at 3.0 kgf/cm 2 pressure. The time from the start of spray development until the black matrix composition in the center of the glass substrate is completely dissolved is measured.
關於本發明之黑矩陣,於形成黑矩陣時可將線寬維持在適當之範圍內。 具體而言,藉由下述方法所測得之線寬為16.5 μm~21.0 μm。 若為此種線寬,則可判斷維持在適當之範圍內。 藉由上述方法測得之線寬較佳為18.5 μm以上,更佳為19.0 μm以上,進而較佳為19.5 μm以上。 又,較佳為21 μm以下,更佳為20.5 μm以下,進而較佳為20.3 μm以下。 Regarding the black matrix of the present invention, the line width can be maintained within an appropriate range when forming the black matrix. Specifically, the line width measured by the following method is 16.5 μm ~ 21.0 μm. If the line width is such, it can be judged to be maintained within an appropriate range. The line width measured by the above method is preferably 18.5 μm or more, more preferably 19.0 μm or more, and further preferably 19.5 μm or more. Furthermore, the thickness is preferably 21 μm or less, more preferably 20.5 μm or less, and still more preferably 20.3 μm or less.
上述線寬係藉由以下方法而測得者。 將測定了上述顯影時間之玻璃基板於230℃進行30分鐘後烘烤後,藉由數位顯微鏡(製品名稱:VHX-500,基恩士公司製造)對上述玻璃基板上之20 μm圖案線寬進行測定。 The above line width is measured by the following method. After the glass substrate for which the above development time was measured was post-baked at 230°C for 30 minutes, the 20 μm pattern line width on the above glass substrate was measured using a digital microscope (product name: VHX-500, manufactured by Keyence Corporation). Determination.
本發明之黑矩陣之細線密接性優異。 具體而言,藉由下述方法測得之細線密接性為15 μm以下。 若為具有此種細線密接性者,則可判斷細線密接性優異。 上述細線密接性較佳為14 μm以下,更佳為12 μm以下,進而較佳為10 μm以下。 The black matrix of the present invention has excellent fine wire adhesion. Specifically, the fine wire adhesion measured by the following method is 15 μm or less. If it has such thin wire adhesion, it can be judged that the thin wire adhesion is excellent. The fine wire adhesion is preferably 14 μm or less, more preferably 12 μm or less, further preferably 10 μm or less.
上述細線密接性係藉由以下方法而測得者。 藉由旋轉塗佈機將上述黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,使用具有間隔為1 μm之線圖案之光罩(1~20 μm,以1 μm為單位之20種;30~100 μm,以10 μm為單位之線寬8種),於高壓水銀燈進行曝光(UV累計光量80 mJ/cm 2)。 藉由23℃、0.05%氫氧化鉀水溶液中、1 kgf/cm 2之噴淋顯影,自顯影圖案開始顯現之時間(出像時間)起開始顯影,於顯影時間成為30秒後結束顯影。 顯影結束後,進行1 kgf/cm 2壓力之噴霧水洗。對上述玻璃基板上殘存之最小之線圖案之寬度(μm)進行評價。 The above-mentioned thin wire adhesion is measured by the following method. The above-mentioned photoresist composition for black matrix is coated on the glass substrate (product name: EAGLE . Then, a photomask with a line pattern with an interval of 1 μm (1 to 20 μm, 20 types in 1 μm units; 30 to 100 μm, 8 types of line widths in 10 μm units) was used, and the process was performed under a high-pressure mercury lamp. Exposure (UV cumulative light amount 80 mJ/cm 2 ). Through spray development at 23°C, 0.05% potassium hydroxide aqueous solution, and 1 kgf/cm 2 , development starts from the time when the development pattern begins to appear (image development time) and ends when the development time reaches 30 seconds. After development, perform spray water washing at a pressure of 1 kgf/ cm2 . The width (μm) of the smallest remaining line pattern on the above-mentioned glass substrate was evaluated.
本發明之黑矩陣之表面電阻值優異。 具體而言,若藉由下述方法測得之表面電阻值為5.0E+11 Ω以上,則可評價為表面電阻值優異。 上述表面電阻值較佳為1.0E+12 Ω以上,更佳為3.0E+12 Ω以上,進而較佳為5.0E+12 Ω以上。 The black matrix of the present invention has excellent surface resistance value. Specifically, if the surface resistance value measured by the following method is 5.0E+11Ω or more, it can be evaluated that the surface resistance value is excellent. The above-mentioned surface resistance value is preferably 1.0E+12 Ω or more, more preferably 3.0E+12 Ω or more, and further preferably 5.0E+12 Ω or more.
上述表面電阻值係藉由以下方法而測得者。 藉由旋轉塗佈機將黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,用高壓水銀燈進行曝光(UV累計光量80 mJ/cm 2),進而於230℃進行180分鐘後烘烤,製作僅由固體部形成之黑色光阻圖案(黑矩陣)。 其後,藉由本體為微安培計R8340、可選項為屏蔽箱R12702A(均由Advance公司製造),測定所製作之黑矩陣之表面電阻值。 The above surface resistance value is measured by the following method. The black matrix photoresist composition was coated on the glass substrate (product name: EAGLE XG, manufactured by Corning Company) with a film thickness of 1 μm using a spin coater and pre-baked at 100°C for 3 minutes. Then, it was exposed with a high-pressure mercury lamp (UV cumulative light intensity 80 mJ/cm 2 ), and then baked at 230°C for 180 minutes to produce a black photoresist pattern (black matrix) formed only of solid parts. Thereafter, the surface resistance value of the produced black matrix was measured using a microampere meter R8340 as a main body and a shielding box R12702A as an option (both manufactured by Advance Company).
本發明之黑矩陣較佳為再溶解性優異。 上述再溶解性係藉由下述之OD值之測定來進行評價,若OD值為0.5以下,則可判斷為再溶解性優異。 藉由旋轉塗佈機將黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,使於玻璃基板上進行製膜而成之未曝光之塗膜浸漬於PGMEA中2分鐘。將浸漬之部分乾燥後,用Macbeth濃度計(TD-931,Macbeth公司製造)測定OD值。 上述OD值更佳為0.3以下。 The black matrix of the present invention is preferably excellent in re-solubility. The re-solubility is evaluated by measuring the OD value described below. If the OD value is 0.5 or less, the re-solubility is judged to be excellent. The black matrix photoresist composition was coated on the glass substrate (product name: EAGLE XG, manufactured by Corning Company) with a film thickness of 1 μm using a spin coater and pre-baked at 100°C for 3 minutes. Next, the unexposed coating film formed on the glass substrate was immersed in PGMEA for 2 minutes. After drying the immersed part, the OD value was measured using a Macbeth concentration meter (TD-931, manufactured by Macbeth Corporation). The above-mentioned OD value is more preferably 0.3 or less.
本發明之黑矩陣用顏料分散組成物、黑矩陣用光阻組成物、及黑矩陣由於具有上述之特性,因此可適合用作圖像顯示裝置及觸控面板等之黑矩陣。 [實施例] Since the pigment dispersion composition for black matrices, the photoresist composition for black matrices, and the black matrix of the present invention have the above characteristics, they can be suitably used as black matrices for image display devices, touch panels, and the like. [Example]
以下,使用實施例對本發明具體地進行說明,但本發明並不限於該等,只要不脫離其主旨及應用範圍即可。再者,除非另有特別說明,否則於本實施例中,「份」及「%」分別表示「質量份」及「質量%」。Hereinafter, the present invention will be specifically described using examples, but the present invention is not limited to these as long as it does not deviate from the gist and scope of application. Furthermore, unless otherwise specified, in this embodiment, "parts" and "%" represent "mass parts" and "mass %" respectively.
以下之實施例、比較例中使用之各種材料如下所示。 <黑色著色劑> NEROX3500(碳黑,平均一次粒徑31 nm,pH值3.0,DBP吸油量43 ml/100 g,Orion Engineered Carbons公司製造) <顏料分散劑> Solsperse83500(固形物成分之胺值25 mgKOH/g,固形物成分40質量%,含有戊內酯骨架及異氰尿酸酯骨架,日本路博潤公司製造) Solsperse82500(固形物成分之胺值26 mgKOH/g,固形物成分50質量%,含有戊內酯骨架及異氰尿酸酯骨架,日本路博潤公司製造) DISPERBYK-167(固形物成分之胺值24 mgKOH/g,固形物成分52質量%,不含有戊內酯骨架,含有己內酯骨架及異氰尿酸酯骨架,BYK-Chemie公司製造) DISPERBYK-2163(固形物成分之胺值23 mgKOH/g,固形物成分45質量%,不含有戊內酯骨架,含有異氰尿酸酯骨架,BYK-Chemie公司製造) DISPERBYK-161(固形物成分之胺值36.7 mgKOH/g,固形物成分30質量%,不含有戊內酯骨架,含有己內酯骨架及異氰尿酸酯骨架,BYK-Chemie公司製造) AFCONA-4067(固形物成分之胺值27 mgKOH/g,不含有戊內酯骨架或異氰尿酸酯骨架,含有胺基甲酸酯骨架,固形物成分45質量%,BASF公司製造) LPN21324(固形物成分之胺值0 mgKOH/g,固形物成分40質量%,不含有戊內酯骨架或異氰尿酸酯骨架,含有丙烯酸骨架,BYK-Chemie公司製造) <顏料分散助劑> Solsperse5000S(銅酞青之磺化物之四級銨鹽,路博潤公司製造) <黏合劑樹脂> ZCR-1569H(環氧丙烯酸酯樹脂,酸值100 mgKOH/g,固形物成分70質量%,日本化藥公司製造) <有機溶劑> PGMEA(丙二醇單甲醚乙酸酯) <光聚合起始劑> OXE02(製品名稱「Irgacure OXE02」,1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-1-(O-乙醯肟)乙酮,BASF公司製造) <光聚合性化合物> DPHA(二新戊四醇六丙烯酸酯) <鹼可溶性樹脂> WR-301(製品名稱「WR-301」,卡多樹脂,酸值100 mgKOH/g,固形物成分45質量%,ADEKA公司製造) Various materials used in the following examples and comparative examples are as follows. <Black colorant> NEROX3500 (carbon black, average primary particle size 31 nm, pH value 3.0, DBP oil absorption 43 ml/100 g, manufactured by Orion Engineered Carbons) <Pigment dispersant> Solsperse83500 (amine value of solid content 25 mgKOH/g, solid content 40% by mass, containing valerolactone skeleton and isocyanurate skeleton, manufactured by Lubrizol Corporation of Japan) Solsperse82500 (amine value of solid content 26 mgKOH/g, solid content 50% by mass, containing valerolactone skeleton and isocyanurate skeleton, manufactured by Lubrizol Corporation of Japan) DISPERBYK-167 (amine value of solid content 24 mgKOH/g, solid content 52% by mass, no valerolactone skeleton, containing caprolactone skeleton and isocyanurate skeleton, manufactured by BYK-Chemie) DISPERBYK-2163 (amine value of solid content 23 mgKOH/g, solid content 45% by mass, no valerolactone skeleton, containing isocyanurate skeleton, manufactured by BYK-Chemie) DISPERBYK-161 (amine value of solid content 36.7 mgKOH/g, solid content 30% by mass, no valerolactone skeleton, containing caprolactone skeleton and isocyanurate skeleton, manufactured by BYK-Chemie) AFCONA-4067 (Amine value of solid content 27 mgKOH/g, does not contain valerolactone skeleton or isocyanurate skeleton, contains urethane skeleton, solid content 45 mass%, manufactured by BASF) LPN21324 (Amine value of solid content 0 mgKOH/g, solid content 40% by mass, does not contain valerolactone skeleton or isocyanurate skeleton, contains acrylic skeleton, manufactured by BYK-Chemie) <Pigment dispersion aid> Solsperse5000S (quaternary ammonium salt of copper phthalocyanine sulfonate, manufactured by Lubrizol Company) <Binder resin> ZCR-1569H (epoxy acrylate resin, acid value 100 mgKOH/g, solid content 70 mass%, manufactured by Nippon Chemical Co., Ltd.) <Organic solvent> PGMEA (propylene glycol monomethyl ether acetate) <Photopolymerization initiator> OXE02 (Product name "Irgacure OXE02", 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyl oxime) B Ketone, manufactured by BASF Corporation) <Photopolymerizable compound> DPHA (dineopenterythritol hexaacrylate) <Alkali-soluble resin> WR-301 (Product name "WR-301", cardo resin, acid value 100 mgKOH/g, solid content 45% by mass, manufactured by ADEKA)
<黑矩陣用顏料分散組成物> 將各材料以成為表1之組成之方式進行混合,並用珠磨機混練一晝夜來製作黑矩陣用顏料分散組成物。 <Pigment dispersion composition for black matrix> Each material was mixed so as to have the composition shown in Table 1, and kneaded with a bead mill for a day and night to prepare a pigment dispersion composition for a black matrix.
[表1]
<黑矩陣用光阻組成物> 使用高速攪拌機,將上述黑矩陣用顏料分散組成物與其他材料(光聚合起始劑、光聚合性化合物、鹼可溶性樹脂及有機溶劑)以成為表2之組成之方式均勻地混合。 其後,用孔徑為3 μm之過濾器過濾,製作實施例及比較例之黑矩陣用光阻組成物。 再者,於表2中,光聚合起始劑、光聚合性化合物、鹼可溶性樹脂及有機溶劑之各材料之右欄之數值表示摻合量。 <Photoresist composition for black matrix> Using a high-speed mixer, the above-described pigment dispersion composition for black matrix and other materials (photopolymerization initiator, photopolymerizable compound, alkali-soluble resin, and organic solvent) were uniformly mixed so as to have a composition shown in Table 2. Thereafter, it was filtered with a filter with a pore size of 3 μm to prepare black matrix photoresist compositions of Examples and Comparative Examples. In addition, in Table 2, the numerical value in the right column of each material of a photopolymerization initiator, a photopolymerizable compound, an alkali-soluble resin, and an organic solvent shows the blending amount.
<評價試驗> (黏度) 使用E型黏度計(東機產業股份有限公司製造,R100型黏度計,型式RE100L)對所製作之黑矩陣用顏料分散組成物測定25℃之黏度。將其結果示於表2中。 <Evaluation test> (viscosity) The viscosity of the prepared pigment dispersion composition for black matrix was measured at 25°C using an E-type viscometer (R100 viscometer, model RE100L manufactured by Toki Industrial Co., Ltd.). The results are shown in Table 2.
(黏度穩定性) 將所製作之黑矩陣用顏料分散組成物採取至玻璃瓶中並栓緊,於60℃保存1週。 於上述保存之前後,使用E型黏度計(東機產業股份有限公司製造,R100型黏度計,型式RE100L)測定25℃之黏度,求出黏度變化率[(保存1週後之黏度-保存前之黏度)/(保存前之黏度)],並按照下述評價基準進行評價。將其結果示於表2中。 (評價基準) ○:黏度變化率為5%以下。 △:黏度變化率超過5%,但為10%以下。 ×:黏度變化率超過10%。 (viscosity stability) The prepared pigment dispersion composition for black matrix was collected into a glass bottle, tightly tied, and stored at 60° C. for 1 week. Before and after the above storage, use an E-type viscometer (R100 viscometer, model RE100L manufactured by Toki Industrial Co., Ltd.) to measure the viscosity at 25°C, and calculate the viscosity change rate [(viscosity after 1 week of storage - before storage) (viscosity)/(viscosity before storage)], and evaluate according to the following evaluation criteria. The results are shown in Table 2. (Evaluation criteria) ○: The viscosity change rate is 5% or less. △: The viscosity change rate exceeds 5% but is less than 10%. ×: The viscosity change rate exceeds 10%.
(顯影時間) 藉由旋轉塗佈機將所製作之黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,使用具有間隔為1 μm之線圖案之光罩(1~20 μm,以1 μm為單位之20種;30~100 μm,以10 μm為單位之線寬8種),於高壓水銀燈進行曝光(UV累計光量80 mJ/cm 2)。 其後,於23℃、0.05%氫氧化鉀水溶液、0.5 kgf/cm 2壓力之條件對曝光後之玻璃基板進行噴淋顯影,並於3.0 kgf/cm 2壓力進行噴霧水洗。 測定自噴淋顯影開始起至玻璃基板之中心部之黑矩陣組成物完全溶解為止之時間,並將其作為顯影時間。將其結果示於表2中。 (Development time) The produced photoresist composition for black matrix is coated on a glass substrate (product name: EAGLE Pre-bake at ℃ for 3 minutes. Then, a photomask with a line pattern with an interval of 1 μm (1 to 20 μm, 20 types in 1 μm units; 30 to 100 μm, 8 types of line widths in 10 μm units) was used, and the process was performed under a high-pressure mercury lamp. Exposure (UV cumulative light amount 80 mJ/cm 2 ). Thereafter, the exposed glass substrate was spray developed at 23°C, 0.05% potassium hydroxide aqueous solution, and 0.5 kgf/cm 2 pressure, and spray-washed at 3.0 kgf/cm 2 pressure. The time from the start of spray development until the black matrix composition in the center of the glass substrate is completely dissolved is measured, and this is regarded as the development time. The results are shown in Table 2.
(線寬) 將測定了上述顯影時間之玻璃基板於230℃進行30分鐘後烘烤後,藉由數位顯微鏡(製品名稱:VHX-500,基恩士公司製造)對上述玻璃基板上之20 μm圖案線寬進行測定。將其結果示於表2中。 (line width) After the glass substrate for which the above development time was measured was post-baked at 230°C for 30 minutes, the 20 μm pattern line width on the above glass substrate was measured using a digital microscope (product name: VHX-500, manufactured by Keyence Corporation). Determination. The results are shown in Table 2.
(細線密接性) 藉由旋轉塗佈機將所製作之黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,使用具有間隔為1 μm之線圖案之光罩(1~20 μm,以1 μm為單位之20種;30~100 μm,以10 μm為單位之線寬8種),於高壓水銀燈進行曝光(UV累計光量80 mJ/cm 2)。 其後,藉由23℃、0.05%氫氧化鉀水溶液、1 kgf/cm 2壓力之條件之噴淋顯影,自顯影圖案開始顯現之時間(出像時間)起開始顯影,於顯影時間成為30秒後結束顯影。 顯影結束後,進行1 kgf/cm 2壓力之噴霧水洗,對上述玻璃基板上殘存之最小之線圖案之寬度(μm)進行評價。將其結果示於表2中。 (Fine line adhesion) The produced black matrix photoresist composition was coated on a glass substrate (product name: EAGLE XG, manufactured by Corning Corporation) with a film thickness of 1 μm using a spin coater, and then Pre-bake at 100℃ for 3 minutes. Then, a photomask with a line pattern with an interval of 1 μm (1 to 20 μm, 20 types in 1 μm units; 30 to 100 μm, 8 types of line widths in 10 μm units) was used, and the process was performed under a high-pressure mercury lamp. Exposure (UV cumulative light amount 80 mJ/cm 2 ). Thereafter, through spray development under the conditions of 23°C, 0.05% potassium hydroxide aqueous solution, and 1 kgf/ cm2 pressure, development starts from the time when the development pattern begins to appear (image development time), and the development time becomes 30 seconds. Then end the development. After development, spray water washing at a pressure of 1 kgf/ cm2 was performed, and the width (μm) of the smallest remaining line pattern on the above-mentioned glass substrate was evaluated. The results are shown in Table 2.
(表面電阻值) 藉由旋轉塗佈機將所製作之黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,用高壓水銀燈進行曝光(UV累計光量80 mJ/cm 2),進而於230℃進行180分鐘後烘烤,製作僅由固體部形成之黑色光阻圖案(黑矩陣)。 其後,藉由本體為微安培計R8340、可選項為屏蔽箱R12702A(均為Advance公司製造),測定所製作之黑矩陣之表面電阻值。將其結果示於表2中。 (Surface resistance value) The produced photoresist composition for black matrix was coated on a glass substrate (product name: EAGLE XG, manufactured by Corning Company) with a film thickness of 1 μm using a spin coater, and then Pre-bake at 100℃ for 3 minutes. Then, it was exposed with a high-pressure mercury lamp (UV cumulative light intensity 80 mJ/cm 2 ), and then baked at 230°C for 180 minutes to produce a black photoresist pattern (black matrix) formed only of solid parts. Thereafter, the surface resistance value of the produced black matrix was measured using a microampere meter R8340 as a main body and a shielding box R12702A as an option (both manufactured by Advance Company). The results are shown in Table 2.
(再溶解性) 藉由旋轉塗佈機將所製作之黑矩陣用光阻組成物以膜厚為1 μm之方式塗佈於玻璃基板(製品名稱:EAGLE XG,Corning公司製造)上,並於100℃預烘烤3分鐘。 繼而,使於玻璃基板上進行製膜而成之未曝光之塗膜浸漬於PGMEA中2分鐘。將浸漬之部分乾燥後,用Macbeth濃度計(TD-931,Macbeth公司製造)測定OD值,並按照以下評價基準進行評價。將其結果示於表2中。 (評價基準) ◎:為0.3以下。 ○:超過0.3但為0.5以下。 △:超過0.5但為1.0以下。 ×:大於1.0。 (resolubility) The produced photoresist composition for black matrix was coated on the glass substrate (product name: EAGLE 3 minutes. Next, the unexposed coating film formed on the glass substrate was immersed in PGMEA for 2 minutes. After drying the immersed part, the OD value was measured with a Macbeth concentration meter (TD-931, manufactured by Macbeth Co., Ltd.), and the evaluation was performed according to the following evaluation standards. The results are shown in Table 2. (Evaluation criteria) ◎: 0.3 or less. ○: More than 0.3 but less than 0.5. Δ: More than 0.5 but less than 1.0. ×: greater than 1.0.
[表2]
關於在含有黑色著色劑、顏料分散劑、黏合劑樹脂及有機溶劑之黑矩陣用顏料分散組成物中,上述顏料分散劑具有特定之骨架之實施例,確認到於形成黑矩陣時可將顯影時間及線寬維持在適當之範圍內,並且可形成細線密接性及表面電阻值優異之黑矩陣。 另一方面,關於未使用有具有特定之骨架之顏料分散劑之比較例,形成黑矩陣時之顯影時間及線寬、或黑矩陣之細線密接性及表面電阻值之任一者之評價均較差。 再者,比較例3之黑矩陣用顏料分散組成物由於未分散,故而記載為「分散不良」,未進行黑矩陣中之評價試驗。 又,關於比較例7、9,由於用於線寬評價之20 μm之細線未殘存於基板上,故而未能進行線寬之評價。 [產業上之可利用性] Regarding the example in which the pigment dispersant has a specific skeleton in a pigment dispersion composition for a black matrix containing a black colorant, a pigment dispersant, a binder resin and an organic solvent, it was confirmed that the development time can be reduced when forming the black matrix. And the line width is maintained within an appropriate range, and a black matrix with excellent fine line adhesion and surface resistance can be formed. On the other hand, for comparative examples that did not use a pigment dispersant with a specific skeleton, evaluations were poor in either the development time and line width when forming a black matrix, or the fine line adhesion and surface resistance value of the black matrix. . In addition, since the pigment dispersion composition for black matrix of Comparative Example 3 was not dispersed, it was described as "poor dispersion", and the evaluation test in the black matrix was not performed. In addition, regarding Comparative Examples 7 and 9, since the 20 μm thin wire used for line width evaluation did not remain on the substrate, the line width could not be evaluated. [Industrial availability]
根據本發明,可提供一種於形成黑矩陣時可將顯影時間及線寬維持在適當之範圍內,並且可形成細線密接性及表面電阻值優異之黑矩陣之黑矩陣用顏料分散組成物。According to the present invention, it is possible to provide a pigment dispersion composition for a black matrix that can maintain the development time and line width within an appropriate range when forming a black matrix, and can form a black matrix with excellent fine line adhesion and surface resistance value.
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