KR20220091266A - 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 표시장치 - Google Patents

감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 표시장치 Download PDF

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Publication number
KR20220091266A
KR20220091266A KR1020200182595A KR20200182595A KR20220091266A KR 20220091266 A KR20220091266 A KR 20220091266A KR 1020200182595 A KR1020200182595 A KR 1020200182595A KR 20200182595 A KR20200182595 A KR 20200182595A KR 20220091266 A KR20220091266 A KR 20220091266A
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KR
South Korea
Prior art keywords
pattern
resin composition
photosensitive resin
formula
alkali
Prior art date
Application number
KR1020200182595A
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English (en)
Korean (ko)
Inventor
김정식
유진형
이현보
조승현
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020200182595A priority Critical patent/KR20220091266A/ko
Priority to CN202111177474.XA priority patent/CN114660894A/zh
Publication of KR20220091266A publication Critical patent/KR20220091266A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts
    • G03F7/063—Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
    • G03F7/066—Organic derivatives of bivalent sulfur, e.g. onium derivatives
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Materials For Photolithography (AREA)
KR1020200182595A 2020-12-23 2020-12-23 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 표시장치 KR20220091266A (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020200182595A KR20220091266A (ko) 2020-12-23 2020-12-23 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 표시장치
CN202111177474.XA CN114660894A (zh) 2020-12-23 2021-10-09 感光性树脂组合物、利用其来形成的光固化图案及显示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020200182595A KR20220091266A (ko) 2020-12-23 2020-12-23 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 표시장치

Publications (1)

Publication Number Publication Date
KR20220091266A true KR20220091266A (ko) 2022-06-30

Family

ID=82026428

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020200182595A KR20220091266A (ko) 2020-12-23 2020-12-23 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 표시장치

Country Status (2)

Country Link
KR (1) KR20220091266A (zh)
CN (1) CN114660894A (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101464312B1 (ko) 2008-03-03 2014-11-21 주식회사 동진쎄미켐 저온 경화 가능한 감광성 수지 조성물

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101464312B1 (ko) 2008-03-03 2014-11-21 주식회사 동진쎄미켐 저온 경화 가능한 감광성 수지 조성물

Also Published As

Publication number Publication date
CN114660894A (zh) 2022-06-24

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