KR20210007973A - 플라즈마에 의해 반사된 전력을 결정하기 위한 장치 및 방법 - Google Patents
플라즈마에 의해 반사된 전력을 결정하기 위한 장치 및 방법 Download PDFInfo
- Publication number
- KR20210007973A KR20210007973A KR1020207031938A KR20207031938A KR20210007973A KR 20210007973 A KR20210007973 A KR 20210007973A KR 1020207031938 A KR1020207031938 A KR 1020207031938A KR 20207031938 A KR20207031938 A KR 20207031938A KR 20210007973 A KR20210007973 A KR 20210007973A
- Authority
- KR
- South Korea
- Prior art keywords
- frequency
- variable
- plasma
- signal
- high frequency
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
- H01J37/32165—Plural frequencies
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102018111562.8 | 2018-05-15 | ||
DE102018111562.8A DE102018111562A1 (de) | 2018-05-15 | 2018-05-15 | Vorrichtung und Verfahren zur Ermittlung einer von einem Plasma reflektierten elektrischen Leistung |
PCT/EP2019/062065 WO2019219537A1 (de) | 2018-05-15 | 2019-05-10 | Vorrichtung und verfahren zur ermittlung einer von einem plasma reflektierten elektrischen leistung |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20210007973A true KR20210007973A (ko) | 2021-01-20 |
Family
ID=66690297
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020207031938A KR20210007973A (ko) | 2018-05-15 | 2019-05-10 | 플라즈마에 의해 반사된 전력을 결정하기 위한 장치 및 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7443347B2 (ja) |
KR (1) | KR20210007973A (ja) |
DE (1) | DE102018111562A1 (ja) |
WO (1) | WO2019219537A1 (ja) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5748204B2 (ja) | 2011-03-03 | 2015-07-15 | 株式会社ダイヘン | 高周波電源装置 |
DE102011080035A1 (de) * | 2011-07-28 | 2013-01-31 | Hüttinger Elektronik Gmbh + Co. Kg | Verfahren und Vorrichtung zum Schutz von an einen Hochfrequenzgenerator angeschlossenen passiven Komponenten |
JP5935116B2 (ja) | 2011-12-16 | 2016-06-15 | 東京エレクトロン株式会社 | プラズマ処理装置 |
EP3029711B1 (en) * | 2014-12-03 | 2019-10-16 | Comet AG | Frequency tuning of a RF-generator within a plasma process |
-
2018
- 2018-05-15 DE DE102018111562.8A patent/DE102018111562A1/de active Pending
-
2019
- 2019-05-10 WO PCT/EP2019/062065 patent/WO2019219537A1/de active Application Filing
- 2019-05-10 KR KR1020207031938A patent/KR20210007973A/ko active Search and Examination
- 2019-05-10 JP JP2021514475A patent/JP7443347B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2021524147A (ja) | 2021-09-09 |
WO2019219537A1 (de) | 2019-11-21 |
JP7443347B2 (ja) | 2024-03-05 |
DE102018111562A1 (de) | 2019-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10629413B2 (en) | Adjustment of power and frequency based on three or more states | |
KR100842243B1 (ko) | Rf 플라즈마 공급 장치의 전력 출력 제어 또는 조정 방법 및 rf 플라즈마 공급 장치 | |
US8643279B2 (en) | Determining high frequency operating parameters in a plasma system | |
JP2018088323A (ja) | プラズマ処理装置 | |
WO2016093269A1 (ja) | 高周波電源 | |
US20070076344A1 (en) | High frequency power device | |
US10432248B1 (en) | RF metrology system for a substrate processing apparatus incorporating RF sensors with corresponding lock-in amplifiers | |
KR20230127362A (ko) | 부하의 임피던스를 전력 발생기의 출력 임피던스에조정시키는 방법 및 임피던스 조정 어셈블리 | |
JP2007053088A (ja) | Hfエネルギジェネレータに対する駆動信号の形成方法、hfジェネレータ駆動装置およびhfプラズマ励起装置 | |
KR20140035860A (ko) | 세 개 이상의 상태에 기초한 전력 및 주파수의 조절 | |
US10896810B2 (en) | RF generating apparatus and plasma treatment apparatus | |
KR20210053354A (ko) | 플라즈마 챔버의 전극으로 전력 전달 최적화를 위한 방법들 및 시스템들 | |
JP4682335B2 (ja) | 自己較正ミキサ | |
US11600467B2 (en) | Power supply devices for plasma systems and method of use | |
JP6084418B2 (ja) | インピーダンス調整装置 | |
KR20210007973A (ko) | 플라즈마에 의해 반사된 전력을 결정하기 위한 장치 및 방법 | |
JP2012185922A (ja) | 高周波電源装置 | |
JP2007093606A (ja) | 被検装置の分析を行う方法及び計測システム | |
JP2021180070A (ja) | プラズマ処理装置及びマイクロ波制御方法 | |
KR101257003B1 (ko) | 마이크로파 플라즈마 전력 공급 장치 및 그의 자동 주파수 선택 방법 | |
JP2010118222A (ja) | 高周波電源装置 | |
KR20210036810A (ko) | 고주파 전원 장치 및 고주파 전력의 출력 방법 | |
JP2011176667A (ja) | 信号生成装置 | |
JP6148090B2 (ja) | 高周波電源装置 | |
US20230118000A1 (en) | Rf generating device and semiconductor manufacturing apparatus including the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination |