KR20200139800A - Cd-sem을 사용한 프로세스 시뮬레이션 모델 캘리브레이션 - Google Patents
Cd-sem을 사용한 프로세스 시뮬레이션 모델 캘리브레이션 Download PDFInfo
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- KR20200139800A KR20200139800A KR1020207032077A KR20207032077A KR20200139800A KR 20200139800 A KR20200139800 A KR 20200139800A KR 1020207032077 A KR1020207032077 A KR 1020207032077A KR 20207032077 A KR20207032077 A KR 20207032077A KR 20200139800 A KR20200139800 A KR 20200139800A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/946,940 | 2018-04-06 | ||
| US15/946,940 US10572697B2 (en) | 2018-04-06 | 2018-04-06 | Method of etch model calibration using optical scatterometry |
| US201862656299P | 2018-04-11 | 2018-04-11 | |
| US62/656,299 | 2018-04-11 | ||
| PCT/US2019/025668 WO2019195481A1 (en) | 2018-04-06 | 2019-04-03 | Process simulation model calibration using cd-sem |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20200139800A true KR20200139800A (ko) | 2020-12-14 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020207032077A KR20200139800A (ko) | 2018-04-06 | 2019-04-03 | Cd-sem을 사용한 프로세스 시뮬레이션 모델 캘리브레이션 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR20200139800A (zh) |
| CN (1) | CN112136135A (zh) |
| WO (1) | WO2019195481A1 (zh) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022231837A1 (en) * | 2021-04-30 | 2022-11-03 | Kla Corporation | High resolution profile measurement based on a trained parameter conditioned measurement model |
| WO2023039186A1 (en) * | 2021-09-10 | 2023-03-16 | Fractilia, Llc | Detection of probabilistic process windows |
| WO2023204344A1 (ko) * | 2022-04-19 | 2023-10-26 | 한국핵융합에너지연구원 | 플라즈마 시뮬레이션 방법 및 시스템 |
| US11996265B2 (en) | 2017-04-13 | 2024-05-28 | Fractilla, LLC | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202240734A (zh) * | 2020-12-15 | 2022-10-16 | 美商蘭姆研究公司 | 多步驟半導體製造程序中的機器學習 |
| CN113051863B (zh) * | 2021-03-12 | 2023-02-24 | 广东省大湾区集成电路与系统应用研究院 | 半导体建模方法、装置、存储介质及计算机设备 |
| CN113471093B (zh) * | 2021-06-08 | 2024-06-04 | 广东省大湾区集成电路与系统应用研究院 | 一种用于半导体器件的薄膜形貌预测方法及装置 |
| CN114036649B (zh) * | 2021-12-15 | 2024-08-09 | 成都飞机工业（集团）有限责任公司 | 一种无人机数学模型校对方法、装置、设备及存储介质 |
| US20230367302A1 (en) * | 2022-05-11 | 2023-11-16 | Applied Materials, Inc. | Holistic analysis of multidimensional sensor data for substrate processing equipment |
| CN116129427A (zh) * | 2022-12-22 | 2023-05-16 | 东方晶源微电子科技（北京）有限公司 | 基于设计版图的扫描电子显微镜图像轮廓提取方法、装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7171284B2 (en) * | 2004-09-21 | 2007-01-30 | Timbre Technologies, Inc. | Optical metrology model optimization based on goals |
| US7525673B2 (en) * | 2006-07-10 | 2009-04-28 | Tokyo Electron Limited | Optimizing selected variables of an optical metrology system |
| CN101840451B (zh) * | 2010-04-21 | 2014-05-28 | 云南大学 | 一种集成电路工艺参数模型的优化方法 |
| WO2011158239A1 (en) * | 2010-06-17 | 2011-12-22 | Nova Measuring Instruments Ltd. | Method and system for optimizing optical inspection of patterned structures |
| US8666703B2 (en) * | 2010-07-22 | 2014-03-04 | Tokyo Electron Limited | Method for automated determination of an optimally parameterized scatterometry model |
| US9412673B2 (en) * | 2013-08-23 | 2016-08-09 | Kla-Tencor Corporation | Multi-model metrology |
| US9792393B2 (en) * | 2016-02-08 | 2017-10-17 | Lam Research Corporation | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization |
| CN107633103A (zh) * | 2016-07-15 | 2018-01-26 | 中国科学院微电子研究所 | 一种cmp模型参数优化方法和装置 |
| CN106874616B (zh) * | 2017-03-06 | 2021-04-20 | 北京经纬恒润科技股份有限公司 | 一种参数优化调整方法及系统 |
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2019
- 2019-04-03 WO PCT/US2019/025668 patent/WO2019195481A1/en active Application Filing
- 2019-04-03 KR KR1020207032077A patent/KR20200139800A/ko not_active Application Discontinuation
- 2019-04-03 CN CN201980033624.4A patent/CN112136135A/zh active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11996265B2 (en) | 2017-04-13 | 2024-05-28 | Fractilla, LLC | System and method for generating and analyzing roughness measurements and their use for process monitoring and control |
| WO2022231837A1 (en) * | 2021-04-30 | 2022-11-03 | Kla Corporation | High resolution profile measurement based on a trained parameter conditioned measurement model |
| WO2023039186A1 (en) * | 2021-09-10 | 2023-03-16 | Fractilia, Llc | Detection of probabilistic process windows |
| WO2023204344A1 (ko) * | 2022-04-19 | 2023-10-26 | 한국핵융합에너지연구원 | 플라즈마 시뮬레이션 방법 및 시스템 |
| KR20230149059A (ko) * | 2022-04-19 | 2023-10-26 | 한국핵융합에너지연구원 | 플라즈마 시뮬레이션 방법 및 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201945967A (zh) | 2019-12-01 |
| CN112136135A (zh) | 2020-12-25 |
| WO2019195481A1 (en) | 2019-10-10 |
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