KR20200087247A - Lock valve, vacuum chamber, and vacuum processing system for vacuum sealing - Google Patents

Abstract

A lock valve 100 for vacuum sealing is described. The lock valve 100 includes a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111, and a seal 160. The sealing portion includes a sealing base 161 connected to the base structure 110 and a sealing top portion 162 for providing a sealing contact with the shutter 140. The sealing base 161 has a higher strength than the sealing top 162.

Description

Lock valve, vacuum chamber, and vacuum processing system for vacuum sealing

[0001] Embodiments of the present disclosure relate to lock valves for vacuum sealing. In particular, the present disclosure relates to lock valves for vacuum sealing of a vacuum chamber of a vacuum processing system. Additionally, the present disclosure relates to vacuum chambers having a lock valve for transferring a substrate from atmospheric conditions to vacuum conditions. Additionally, the present disclosure relates to vacuum processing systems for processing substrates, particularly inline vacuum processing systems for processing large area substrates.

Substrates are often coated in vacuum processing systems or vacuum coating plants, under high-vacuum conditions, for example with a pressure in the range of 5*10 ^-4 hPa to 0.5 hPa. Load and unload locks (or inlet and outlet chambers) are used to increase plant productivity and to avoid situations in which the entire plant must be evacuated for each substrate and especially for the high-vacuum section. Used for

[0003] Separate load and unload lock chambers are used to increase productivity and improve material flux rate in modern in-line coating plants. A simple so-called three-chamber coating unit consists of a load lock and an unload lock, where the substrate is, for example, p=1*10 ^-3 hPa to p= of a vacuum coating section (one or more process chambers) sequentially from atmospheric pressure. Pumped to an appropriate transition pressure of 1.0 hPa, and in an unload lock, by venting, the substrate is again adjusted to the atmospheric pressure level. In some systems, the load lock and unload lock are provided by the same load lock chamber.

The task of load and unload lock chambers is to evacuate to a sufficient and sufficiently low transition pressure up to the process range, and again to vent as quickly as possible to atmospheric pressure. After the substrate is unloaded from the load lock chamber, the load lock chamber is evacuated again.

At the same time, the demand for less contamination during the vacuum process has increased over the years. For example, when producing displays, the tolerance for contamination due to particles has been reduced, and the quality standards, and also the quality expected by customers, have been increased. Contamination can occur, for example, due to mechanical stress acting on the lock valve components, caused by pressure changes during vacuum evacuation of the vacuum chambers.

Accordingly, there is a continuing need to provide improved lock valves, vacuum chambers, and vacuum processing systems for vacuum sealing, which allow at least some of the problems in the art to be overcome.

In view of the foregoing, according to the independent claims, a lock valve for vacuum sealing, a vacuum chamber with at least one lock valve for vacuum sealing, and a vacuum processing system for processing a substrate are provided.

According to aspects of the present disclosure, a lock valve for vacuum sealing is provided. The lock valve includes a base structure having a valve opening, a shutter for closing the valve opening, and a seal. The sealing portion includes a sealing base connected to the base structure. Additionally, the seal includes a seal top to provide a seal contact with the shutter. The sealing base has a higher strength than the sealing top.

According to a further aspect of the present disclosure, a lock valve for vacuum sealing is provided. The lock valve includes a housing having a first aperture and a second aperture, and a lock valve inlay. The lock valve inlay is arranged in the housing. Additionally, the lock valve inlay includes a base structure having a valve opening. The valve opening is configured to transport a large area substrate through the valve opening. Additionally, the lock valve inlay includes a shutter to close the valve opening. Additionally, the lock valve inlay includes a seal provided around the valve opening. The sealing portion includes a sealing base connected to the base structure. Additionally, the seal includes a seal top to provide a seal contact with the shutter. The sealing base has a higher strength than the sealing top.

According to a further aspect of the present disclosure, a vacuum chamber is provided having at least one lock valve for vacuum sealing. The at least one lock valve includes a base structure having a valve opening, a shutter for closing the valve opening, and a seal. The sealing portion includes a sealing base connected to the base structure. Additionally, the seal includes a seal top to provide a seal contact with the shutter. The sealing base has a higher strength than the sealing top.

According to a further aspect of the present disclosure, a vacuum processing system for processing a substrate is provided. The vacuum processing system includes a vacuum processing chamber adapted to process the substrate. Additionally, the vacuum processing system includes at least one load lock chamber configured to transfer the substrate from atmospheric conditions to vacuum conditions. The load lock chamber includes at least one lock valve for vacuum sealing. The at least one lock valve includes a base structure having a valve opening, a shutter for closing the valve opening, and a seal. The sealing portion includes a sealing base connected to the base structure. Additionally, the seal includes a seal top to provide a seal contact with the shutter. The sealing base has a higher strength than the sealing top.

Additional aspects, advantages, and features of the present disclosure are apparent from the detailed description and accompanying drawings.

In a manner in which the above-listed features of the present disclosure can be understood in detail, a more specific description of the presently summarized present disclosure may be made with reference to embodiments. The accompanying drawings relate to embodiments of the present disclosure and are described below.
1 is a schematic cross-sectional view of a lock valve according to the embodiments described herein, the lock valve is shown in a closed state.
2 is a schematic cross-sectional view of a lock valve according to embodiments described herein, wherein the lock valve is shown in an open state.
3A-3F are schematic diagrams of various possible implementations of a seal for a lock valve, according to embodiments described herein.
4 is a schematic cross-sectional view of a lock valve according to additional embodiments described herein.
5 is a schematic cross-sectional view of a vacuum chamber having at least one lock valve for vacuum sealing, according to embodiments described herein.
6 is a schematic diagram of a vacuum processing system according to embodiments described herein.

[0020] Various embodiments will now be referenced in detail, and one or more examples of those various embodiments are illustrated in the drawings. Each example is provided as a description and is not intended to be limiting. For example, features illustrated or described as part of one embodiment can be used with or for any other embodiment to yield a further additional embodiment. It is intended that the present disclosure include such modifications and variations.

Within the following description of the drawings, the same reference numbers refer to the same or similar components. In the present disclosure, only differences for individual embodiments are described. Unless otherwise specified, descriptions of parts or aspects in one embodiment apply equally to corresponding parts or aspects in other embodiments.

[0022] Before various embodiments of the present disclosure are described in more detail, some aspects of some terms and expressions used herein are described.

In the present disclosure, "lock valve" can be understood as a valve configured to lock a valve opening. In particular, a lock valve can be understood as a valve configured to provide a vacuum seal, for example, between atmospheric and vacuum conditions. For example, a lock valve may be provided on the wall of the vacuum chamber to provide vacuum conditions provided inside the vacuum chamber and vacuum sealing from the atmospheric environment. In other words, the lock valve can be understood as a vacuum sealable valve that can be configured as a valve selected from the group consisting of a gate valve, a slit valve, and a slot valve.

In the present disclosure, a “base structure” of a lock valve can be understood as a structure configured to support components or parts of a lock valve. For example, the base structure may be a lock valve inlay provided in the housing of the lock valve. Alternatively, the base structure can be part of the housing of the lock valve. In particular, the base structure can be a substantially flat element, such as a plate-type lock valve inlay, the wall of the lock valve's housing, or the wall of the vacuum chamber. Typically, the base structure includes a valve opening that can be opened and closed by a lock valve.

In the present disclosure, a “valve opening” of a lock valve can be understood as an opening that can be opened and closed by a lock valve. Thus, the valve opening can be a lock aperture. In particular, the valve opening or lock aperture may be an elongated aperture or elongated aperture provided in the base structure of the lock valve. For example, the valve opening can be a rectangular opening. More specifically, the valve opening can have a length L1 that is at least twice the width W of the valve opening. Typically, the dimensions of the valve opening are selected such that the substrate as described herein can be transported through the valve opening.

In the present disclosure, “shutter” may be understood as an element of a lock valve, configured to close a valve opening. Therefore, the dimensions of the shutter are selected so that the valve opening can be completely closed by the shutter.

In the present disclosure, “sealing” can be understood as a sealing element configured to provide a sealed interface between two elements, eg, a shutter and a base structure as described herein. In particular, the seal as described herein can be configured to provide a vacuum seal. More specifically, a seal as described herein can be understood as a seal configured to provide an airtight seal of a valve aperture or valve opening as described herein. Typically, the seal as described herein includes a seal base and a seal top. “Sealed base” can be understood as part of a seal connected or attached to the base structure as described herein. In particular, the sealing base can be connected or attached to the base structure such that the sealing base is fixed to the base structure. More specifically, the sealing base can be connected or attached to the base structure such that the sealing base is not movable relative to the base structure. The “top seal” is configured to form a sealed contact with the shutter when the shutter closes the valve opening (eg, through the sealing contact element as exemplarily described with reference to FIG. 3A) as described herein. It can be understood as part of the seal. In particular, the sealing top can be connected to the sealing base.

Referring to FIG. 1 by way of example, a lock valve 100 for vacuum sealing according to the present disclosure is described. According to embodiments that can be combined with other embodiments described herein, the lock valve 100 includes a base structure 110 having a valve opening 111 and a shutter 140 for closing the valve opening 111. ), and the sealing part 160. The sealing portion includes a sealing base 161 connected to the base structure 110. Additionally, the seal includes a seal top 162 to provide a seal contact with the shutter 140. The sealing base 161 has a higher strength than the sealing top 162. In particular, the sealing base 161 can be configured to provide higher strength than the sealing top 162. In other words, the strength (k _base ) of the sealing _base 161 may be higher than the strength (k _top ) of the sealing top 162, that is, k _base > k _top .

Accordingly, embodiments of the present disclosure advantageously provide a lock valve, whereby the wear of the seal can be substantially reduced or even eliminated. Thus, embodiments of the present disclosure have the advantage that particle generation due to wear of the seal can be substantially reduced or even eliminated. In particular, providing a seal having a seal base having a higher strength than the seal top advantageously provides a seal that is supportive at the seal base and flexible at the seal top. Thus, the seal as described herein is advantageously at the same time friction at the interface between the seal top and the shutter can be substantially reduced or even eliminated, at the same time, for example a metal-to-shutter between the base structure and the shutter. It is configured to prevent metal contact. More specifically, it may be beneficial to provide a flexible seal top as described herein, which allows the seal top to adjacent parts, without changing the contact area between the sealing surface and the seal of the shutter, For example, it is possible to follow the relative movement of the contact shutter.

According to embodiments that can be combined with any other embodiments described herein, the geometry and/or material and/or structure of the sealing base 161 is such that the sealing base 161 has a sealing top ( 162). Accordingly, the geometry and/or material and/or structure of the seal top 162 may be selected such that the seal top 162 includes a strength (k _top ) less than the strength (k _base ) of the seal base 161. . For example, the sealing base 161 may have a higher modulus of elasticity than the sealing top 162. In other words, the elastic modulus (E _base ) of the sealing _base 161 may be higher than the elastic modulus (E _top ) of the sealing top 162, that is, E _base > E _top .

It should be noted that strength (k) should be understood as a measure of the resistance provided by the body against deformation. In particular, the intensity is defined as k = F/δ, where F is the force on the body and δ is the displacement produced by the force, especially in the direction of the force.

According to some embodiments that may be combined with any other embodiments described herein, the seal 160 includes a strength gradient. In particular, the material of the seal can be configured to provide a reduced strength from the seal base 161 to the seal top 162. For example, the geometry and/or material composition and/or structure of the seal 160 can be selected such that the strength gradually decreases from the seal base 161 to the seal top 162. For example, the seal 160 can be configured to have a modulus of elasticity that decreases from the seal base 161 to the seal top 162.

Additionally or alternatively, the structure of the seal 160, such as the porosity of the seal material, is such that the strength of the seal top (k _top ) is less than the strength of the seal base 161 (k _base ), It can be changed from the sealing base 161 to the sealing top 162. For example, the porosity of the sealing top 162 may be higher than the porosity of the sealing base 161. In particular, the porosity of the seal 160 can be gradually increased from the seal base 161 to the seal top. For example, porosity can be provided by a foam structure and/or a comb-like structure.

Providing a lock valve with a seal comprising a strength gradient has the advantage that particle generation due to wear of the seal can be substantially reduced or even eliminated. In particular, by providing a seal comprising a strength gradient as described herein, a seal having a supportable seal base and a flexible seal top can be obtained. Thus, the seal as described herein is advantageously at the same time friction at the interface between the seal top and the shutter can be substantially reduced or even eliminated, at the same time, for example a metal-to-shutter between the base structure and the shutter. It is configured to prevent metal contact.

Next, with reference to FIGS. 1 and 2 by way of example, additional details of the lock valve 100 according to embodiments of the present disclosure are described. 1 shows a schematic cross-sectional view of the lock valve in the closed state, and FIG. 2 shows a schematic cross-sectional view of the lock valve in the open state. In particular, according to embodiments that can be combined with any other embodiments described herein, as can be seen in FIGS. 1 and 2, the lock valve 100 typically opens the valve opening 111. And a mechanism 120 for opening and closing. The mechanism 120 for opening and closing the valve opening includes a flap mechanism 121 and a locking mechanism 122.

In particular, as illustrated exemplarily in FIG. 2, a flap mechanism 121 may be provided on the first side 111A of the valve opening 111, and the locking mechanism 122 may include a valve opening 111 ) May be provided on the second side 111B on the other side. 1 and 2, the flap mechanism 121 and the locking mechanism 122 are typically connected to the base structure 110. The flap mechanism 121 typically includes a shutter 140 for closing the valve opening 111. As illustratively shown in FIG. 1, the locking mechanism 122 includes a latch 150 for securing the shutter 140 to the closed position of the lock valve. In particular, the latch 150 may be provided with an engaging element 151, which engages at least partially complementary contours 143 formed on the shutter 140 to secure the shutter in a closed position. It is configured to interlock. 2, the shutter 140 may be mounted on the lever shaft 123. The lever shaft 123 may be rotatable about an axis of rotation. The latch 150 can be mounted to the locking shaft 124, and the locking shaft 124 is typically rotatable about an axis of rotation, as exemplarily shown in FIG.

In the present disclosure, "a mechanism for opening and closing a valve opening" may be understood as a mechanism configured to open and close a valve opening or valve aperture. In particular, a mechanism for opening and closing a valve opening can be understood as a mechanism configured to provide an airtight seal of the valve opening or valve aperture. “Mechanism for opening and closing the valve opening” can also be referred to herein as “open/close-mechanism”.

1 to 5, coordinate systems including a first direction 101, a second direction 102, and a third direction 103 are shown. For example, the first direction 101 may be an x-direction, the second direction 102 may be a y-direction, and the third direction 103 may be a z-direction. In particular, the first direction 101 may be a horizontal direction, and the second direction 102 may be a vertical direction. More specifically, the first direction 101 may be parallel to the main surface of the base structure 110 to which the seal 160 is connected. The third direction 103 may be perpendicular to the first direction, that is, perpendicular to the main surface of the base structure 110 to which the seal 160 is connected.

According to embodiments that may be combined with any other embodiments described herein, the valve opening 111 includes a length L1 extending in the second direction 102 and a first direction ( 101) is a longitudinal valve opening having a width W extending to it. For example, the length (L1) of the valve opening is L1 = a lower limit of 1.0 m, specifically a lower limit of L1 = 1.5 m, more specifically a lower limit of L1 = 2.0 m, and an upper limit of L1 = 2.5 m, specifically It may be selected from a range having an upper limit of L1 = 3.5 m, more specifically an upper limit of L1 = 4.0 m, and more specifically an upper limit of L1 = 4.5 m. The width W of the valve opening is W = a lower limit of 5 cm, specifically a lower limit of W = 7 cm, more specifically a lower limit of W = 9 cm, and an upper limit of W = 16 cm, specifically W = It can be selected from a range having an upper limit of 25 cm, more specifically W = 50 cm. Typically, the selected width of the valve opening extends over the selected length of the valve opening.

According to embodiments, which may be combined with any other embodiments described herein, the valve opening 111 may be through a valve opening 111 through a substrate, particularly a large area substrate, as described herein. It is configured to transport.

In the present disclosure, the term “substrate” or “large area substrate” as used herein will specifically encompass non-flexible substrates, such as glass plates and metal plates. However, the present disclosure is not limited to this, and the term “substrate” can also encompass flexible substrates such as webs or foils. According to some embodiments, the substrate can be made of any material suitable for material deposition. For example, the substrate can be coated by glass (eg, soda-lime glass, borosilicate glass, etc.), metal, polymer, ceramic, compound materials, carbon fiber materials, mica, or a deposition process. It can be made of a material selected from the group consisting of different materials or combinations of materials.

According to embodiments that may be combined with any other embodiments described herein, a “large area substrate” as described herein may be at least 0.01 m ² , specifically at least 0.1 m ² , And more specifically, it may have a size of at least 0.5 m ² . For example, a large-area substrate or carrier may be a GEN 4.5 corresponding to about 0.67 m ² substrates (0.73 x 0.92 m), a GEN 5 corresponding to about 1.4 m ² substrates (1.1 mx 1.3 m), a about 4.29 m ² substrate GEN 7.5 corresponding to fields (1.95 mx 2.2 m), GEN 8.5 corresponding to about 5.7 m ² substrates (2.2 mx 2.5 m), or even GEN corresponding to about 8.7 m ² substrates (2.85 mx 3.05 m) It can be 10. Greater generations such as GEN 11 and GEN 12 and corresponding substrate areas can be similarly implemented. Thus, the substrates are GEN 1, GEN 2, GEN 3, GEN 3.5, GEN 4, GEN 4.5, GEN 5, GEN 6, GEN 7, GEN 7.5, GEN 8, GEN 8.5, GEN 10, GEN 11, and GEN 12 It can be selected from the group consisting of. In particular, the substrate can be selected from the group consisting of GEN 4.5, GEN 5, GEN 7.5, GEN 8.5, GEN 10, GEN 11, and GEN 12, or larger generation substrates. Additionally, the substrate thickness may be 0.1 mm to 1.8 mm, specifically about 0.9 mm or less, such as 0.7 mm or 0.5 mm.

3A-3F by way of example, additional embodiments of the seal of the lock valve according to the present disclosure are described.

Referring to FIG. 3A by way of example, according to some embodiments that may be combined with any other embodiments described herein, the base structure 110 includes a receiving portion 113. In particular, the receiving portion is provided around the valve opening. 3A, typically, the sealing base 161 is arranged in the receiving portion 113. For example, the sealing base 161 may be press-fitted or jammed in the receiving portion.

According to some embodiments, which can be combined with any other embodiments described herein, the seal 160 can be an integral one-piece element. Alternatively, the seal top 162 can be a separate element connected to the seal base 161. For example, the seal top 162 may be made of a different material than the seal base 161. In particular, the seal top can include a material having a lower modulus of elasticity than the seal base. Thus, the top of the seal can be flexible and compressible. Typically, the top of the seal and/or the base of the seal is made of a polymer material.

The arrows F in FIGS. 3A to 3F exert a force acting on the seal when the lock valve is closed, that is, when the shutter is in the closed position as exemplarily shown in FIG. 1. Display. Thus, the arrow F indicates the compressive force of the shutter on the seal when the lock valve is closed.

Arrows A _{3 in} FIGS. 3A-3F indicate supportive features of the seal. In particular, the arrow A ₃ indicates the strength of the seal provided in the third direction 103. Typically, the strength of the seal provided in the third direction is provided by the seal base. In particular, the strength of the seal 160 provided in the third direction 103 is selected to prevent contact between the base structure 110 and the shutter 140. Thus, when the shutter and base structures are made of a metallic material, metal-to-metal contact is advantageously prevented so that particle production can be substantially reduced or even eliminated.

Arrows A _{1 in} FIGS. 3A-3F indicate the flexible features of the seal. In particular, the arrow A ₁ indicates the flexibility of the seal provided in the first direction 101. Typically, the flexibility of the seal provided in the first direction is provided by the seal top with lower strength than the seal base. Thus, the friction between the seal and the shutter can be substantially reduced or even eliminated, since the flexible nature of the seal enables lateral movement of the seal. In other words, the seal is configured such that the sealing contact with the shutter follows the movement of the shutter relative to the base structure, whereby friction in the sealing contact with the shutter can be substantially reduced or even eliminated. Therefore, instead of friction, deformation of the bulk material mainly occurs in the seal.

According to some embodiments that may be combined with any other embodiments described herein, as illustrated exemplarily in FIG. 3A, the sealing top 162 includes a sealing contact element 164 can do. In particular, the sealing contact element 164 may have a lower strength than the strength of the sealing top 162. For example, compared to the sealing top 162, the sealing contact element 164 may be soft. Typically, the sealing contact element 164 is flexible and compressible. More specifically, the elastic modulus of the sealing contact element 164 may be lower than the elastic modulus of the seal top 162. Typically, the sealing contact element 164 of the sealing top 162 provides a sealing contact with the shutter when the lock valve is closed. In particular, the sealing contact element 164 can be configured to provide a line contact with the shutter when the lock valve is closed. Providing a sealing contact element 164 as described herein compensates for or equalizes vacuum chamber tolerances (eg, manufacturing tolerances, incomplete flatness, etc.), and/or with relatively low compression forces. It can be beneficial to provide a hermetic seal.

Referring to FIG. 3B by way of example, according to some embodiments that may be combined with any other embodiments described herein, the seal 160 is a seal 160 to the base structure 110 ), a fixture 163 for fixing. For example, the fixture 163 may be configured to secure the sealing base 161 to the base structure 110. For example, the fixture 163 can be secured to the base structure by fixing elements, such as screws, clamps, pins, or other fixing elements.

Thus, compared to conventional seals, such as O-rings, a separate seal fixture is provided. In particular, providing a separate sealing fixture for securing the sealing base to the base structure can be beneficial to reduce or even eliminate friction at the interface between the seal and the base structure. Thus, movement of the sealing base relative to the base structure can be prevented. 3B, the seal 160 can be secured to the top surface of the base structure 110. Alternatively, as illustrated exemplarily in FIG. 3C, the seal 160 can be secured to the base structure 110 by securing the seal to the receiving portion 113 through the fixture 163.

Referring to FIG. 3D by way of example, according to some embodiments that may be combined with any other embodiments described herein, the seal top 162 has a third cross-section of the seal top 162. It can be configured to decrease in direction 103, ie in the direction towards the sealing contact or sealing interface. As an example, FIG. 3D shows an embodiment where the seal top 162 has a drop-like shape. The drip-like sealing top 162 has a base connected to the sealing base 161, and a tip for providing a sealing contact with the shutter.

In FIG. 3E, an exemplary embodiment is shown, wherein the sealing base 161 and the sealing top 162 are provided as an integral single element. Additionally, according to some embodiments that can be combined with any other embodiments described herein, a sealing contact element 164 can be connected to the sealing top 162. Additionally, as exemplarily shown in FIG. 3E, a gap 166 may be provided between the fixture 163 and the seal top 162 in an uncompressed state, that is, when the lock valve is opened. . In particular, the dimensions of the gap 166 are compressed, that is, when the compressive force is applied by the shutter as exemplarily indicated by the arrow F, the top of the seal is laterally (eg, in the first direction 101 )), in particular, upon compression, may be chosen such that the sealing top 162 does not press the fixture 163 in the first direction 101.

According to some embodiments that may be combined with any other embodiments described herein, an additional gap 167 may be provided between the fixture 163 and the sealing base 161. In particular, the dimensions of the additional gap 167 are compressed, that is, when the compressive force is applied by the shutter as exemplarily indicated by the arrow F, the sealing base is laterally (eg, in the first direction ( 101)), in particular during compression, the sealing base 161 may be selected so as not to press the fixture 163 in the first direction 101.

According to some embodiments that may be combined with any other embodiments described herein, as illustrated exemplarily in FIG. 3F, the seal 160 is embedded in the seal 160 Functional elements 165 may be included. In particular, the functional element 165 can be embedded in the sealing base 161. Additionally, typically, the functional element 165 is configured to improve the strength of the sealing base 161. For example, the functional element 165 can be selected from the group consisting of springs, U-shaped sheet metal, S-shaped sheet metal, V-shaped sheet metal, or any combination thereof.

According to some embodiments that may be combined with any other embodiments described herein (not explicitly shown in the figures), the sealing base includes a different material structure than the sealing top. For example, the porosity of the top of the seal can be higher than the porosity of the seal base. Thus, by providing a seal top having a higher porosity than the seal base, a seal top that is more flexible and compressible than the seal base can be provided.

It should be understood that the features of the seals as described for the individual embodiments shown in FIGS. 3A-3F can be combined with each other. In other words, features described with respect to the exemplary embodiment shown in one of FIGS. 3A-3F are not limited to that particular exemplary embodiment, but are described with reference to other embodiments of the seal described herein. It can be combined with the above features.

Referring to Figure 4 by way of example, according to embodiments that can be combined with any other embodiments described herein, the lock valve 100 for vacuum sealing, the first aperture (171 ) And a housing 170 having a second aperture 172. For example, the first aperture 171 may be provided on the first wall of the housing, and the second aperture 172 may be provided on the second wall of the housing opposite the first wall of the housing. For example, as exemplarily illustrated in FIG. 4, dimensions of the second aperture 172 may be larger than dimensions of the first aperture 171. Additionally, the lock valve 100 may include a lock valve inlay 175 arranged in the housing 170. For example, the lock valve inlay 175 can be attached to the inner surface 173 of the wall of the housing. The lock valve inlay 175 may include a base structure 110 having a longitudinal valve opening having a length L1 in the second direction 102. Typically, the valve opening 111 is constructed and arranged to be congruent with the first aperture 171 provided in the housing 170. Alternatively, the dimensions of the first aperture 171 may be larger than those of the valve opening 111, and smaller than those of the base structure 110 attached to the inner surface of the wall of the housing. have. Thus, as illustratively shown in FIG. 4, the first aperture 171 can be closed by the shutter 140 to provide an airtight seal.

Additionally, the lock valve inlay can include a mechanism 120 for opening and closing the valve opening 111. 1 and 2, the mechanism 120 for opening and closing the valve opening includes a flap mechanism 121 and a locking mechanism 122. The flap mechanism 121 may be provided on one side of the valve opening 111, and the locking mechanism 122 may be provided on the opposite side of the valve opening 111. The flap mechanism 121 and the locking mechanism 122 are typically connected to the base structure 110.

In addition, as exemplarily illustrated in FIG. 4, the lock valve includes a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111, and a sealing portion 160. As described in more detail with reference to FIGS. 1 to 3F, the seal includes a seal base connected to the base structure. Additionally, the seal includes a seal top to provide a seal contact with the shutter. The sealing base has a higher strength than the sealing top.

Referring to FIG. 5 by way of example, a vacuum chamber 200 according to embodiments of the present disclosure is described. The vacuum chamber 200 includes at least one lock valve 100. For example, the vacuum chamber may include a first lock valve 100A and a second lock valve 100B. More specifically, as exemplarily illustrated in FIG. 5, the first lock valve 100A may be provided on the wall of the vacuum chamber, and the second lock valve 100B may be provided on the opposite wall of the vacuum chamber. have. For example, the at least one lock valve 100 may be, for example, a lock valve according to embodiments described herein with reference to FIGS. 1 to 4. In particular, at least one lock valve 100 of the vacuum chamber 200 includes a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111, and a seal 160 It includes. The sealing part 160 includes a sealing base 161 connected to the base structure 110. Additionally, the seal 160 includes a seal top 162 to provide a seal contact with the shutter 140. The sealing base 161 has a higher strength than the sealing top 162. 3A-3F by way of example, various embodiments of a seal 160 that can be used in a lock valve for a vacuum chamber 200 as described herein are described.

In the present disclosure, “vacuum chamber” can be understood as a chamber provided with a technical vacuum, such as a technical vacuum having a vacuum pressure of less than 10 mbar, for example. Typically, the pressure in the vacuum chamber as described herein is 10 ^-5 mbar to about 10 ^-8 mbar, more typically 10 ^-5 mbar to 10 ^-7 mbar, and even more typically about 10 ^-6 mbar To about 10 ^-7 mbar. According to some embodiments, the pressure in the vacuum chamber is the partial pressure of the evaporated material in the vacuum chamber, or the total pressure (which may be approximately the same if only the evaporated material is present as a component to be deposited in the vacuum chamber). Can be considered as In some embodiments, the total pressure in the vacuum chamber is between about 10 ^-4 mbar and about 10 ^-7 mbar, especially when a second component (such as gas, etc.) other than evaporated material is present in the vacuum chamber. Range.

Thus, a vacuum chamber as described herein can be evacuated to a vacuum, and respective equipment, such as vacuum ports, vacuum pumping outlets, or vacuum suction outlets, which may be connectable to vacuum pumps. It should be understood that it may include. Additionally, a vacuum chamber according to embodiments described herein may have a substrate transport system for transporting substrates within and/or into additional vacuum chambers (eg, vacuum processing chambers). In some embodiments, the vacuum chamber can include a carrier for transporting the substrate within and/or through the vacuum chamber.

For example, the vacuum chamber 200 may be a load lock chamber. A “load lock chamber” can be understood as a chamber for a vacuum processing system, for example as described with reference to FIG. 6. For example, the load lock chamber can provide a transition chamber from atmospheric conditions to a low pressure or vacuum. For example, a load lock chamber according to embodiments described herein can have a substrate inlet for receiving a substrate delivered at atmospheric conditions, and a substrate outlet adapted to be connected to a vacuum chamber, such as a processing chamber or an intermediate chamber. . Typically, the load lock chamber may have a vacuum sealable valve at the substrate inlet and substrate outlet. In particular, the vacuum sealable valve at the substrate inlet and the substrate outlet may be a lock valve according to embodiments described herein.

Referring to FIG. 6 by way of example, a vacuum processing system 300 for processing a substrate, according to embodiments of the present disclosure, is described. In particular, FIG. 6 shows a schematic top view of a vacuum processing system. As illustratively illustrated in FIG. 6, vacuum processing system 300 includes a vacuum processing chamber 310 adapted to process a substrate. Additionally, the vacuum processing system 300 includes at least one load lock chamber 320 configured to transfer the substrate from atmospheric conditions to vacuum conditions. The load lock chamber includes at least one lock valve 100 for vacuum sealing. As illustratively described with reference to FIGS. 1 to 4, at least one lock valve 100 includes a base structure 110 having a valve opening 111, and a shutter 140 for closing the valve opening 111. ), and the sealing part 160. The sealing part 160 includes a sealing base 161 connected to the base structure 110. Additionally, the seal 160 includes a seal top 162 to provide a seal contact with the shutter 140. The sealing base 161 has a higher strength than the sealing top 162. 3A-3F illustratively, various embodiments of a seal 160 that can be used in a lock valve for a vacuum processing system 300 as described herein are described. Accordingly, at least one lock valve 100 used in the vacuum processing system may be a lock valve 100 as described with reference to FIGS. 1 to 4.

Thus, a vacuum processing system in which particle production due to wear of the seal can be substantially reduced or even removed can be advantageously provided. Thus, embodiments of the vacuum processing system have the advantage that improved high quality processing results can be achieved.

As illustratively shown in FIG. 6, the vacuum processing system 300 can include a first vacuum processing arrangement 301 and a second vacuum processing arrangement 302. The first vacuum processing arrangement 301 includes a first load lock chamber 320A and a first vacuum processing chamber 310A. Accordingly, the second vacuum processing arrangement 302 may include a second load lock chamber 320B and a second vacuum processing chamber 310B. Additionally, as exemplarily illustrated in FIG. 6, the first load lock chamber 320A and the second load lock chamber 320B may include lock valves 100 according to the described embodiments. . For example, lock valves 100 may be provided for connection to an adjacent substrate loading module 350 for loading a substrate in a processing vacuum processing system.

According to embodiments that may be combined with any other embodiments described herein, the first vacuum processing chamber 310A and the second vacuum processing chamber 310B are reference numerals 333 and 334. It is possible to provide deposition zones having one or more deposition sources or deposition source arrays indicated by. Additionally, as exemplarily illustrated in FIG. 6, each vacuum processing chamber 310A, 310B of each of the first vacuum processing arrangement 301 and the second vacuum processing arrangement 302 and each load lock chamber 320A , 320B), additional vacuum chambers 321 and 322 may be provided. Such a configuration creates a first vacuum with a first vacuum pressure in each of the load lock chambers 320A, 320B, and a second vacuum with a second vacuum pressure in additional vacuum chambers 321, 322. It can be beneficial. Thus, the vacuum pressure can be reduced in two separate steps. 6, additional vacuum chambers 321 and 322 are locked according to embodiments described herein, for connecting additional vacuum chambers to load lock chambers and vacuum processing chambers. Valves 100 may be included.

According to some embodiments, which can be combined with other embodiments described herein, the vacuum processing system can be configured for deposition of a stationary layer on a substrate. Alternatively, as exemplarily shown in FIG. 6, the processing device can be configured for dynamic layer deposition on a substrate. A dynamic deposition process, such as a sputter deposition process, can be understood as a deposition process in which the substrate is moved through the deposition region along the transport direction while the sputter deposition process is being performed. In other words, the substrate is not stationary during the sputter deposition process.

Thus, the vacuum processing system can be configured for dynamic processing with in-line processing arrangement, particularly for dynamic deposition. “In-line processing arrangement” can be understood as an arrangement of two or more vacuum chambers arranged in a row. More specifically, “in-line processing arrangement” as described herein can be configured for deposition of one or more layers on a vertical substrate. For example, one or more layers can be deposited in a static deposition process or a dynamic deposition process. The deposition process can be a PVD-process, such as a sputter process, or a CVD process. An in-line processing arrangement specifically configured for dynamic layer deposition provides uniform processing of substrates, such as large area substrates, such as rectangular glass plates. Processing tools, such as one or more deposition sources, mainly extend in one direction (eg, a vertical direction), and the substrate can be in a second different direction (eg, horizontal directions as exemplarily shown in FIG. 6) It is moved in the transport direction 1 or the second transport direction 1'. Thus, adjacent additional vacuum chambers 321, 325 and 322, 326 may be provided on both sides of each vacuum processing chamber 310A, 310B.

Thus, in view of the foregoing, embodiments as described herein provide an improved lock valve, an improved vacuum chamber, and an improved vacuum processing system for vacuum sealing, by which, the present technology It will be understood that at least some of the problems in the field can be overcome. In particular, embodiments as described herein provide a lock valve, whereby the wear of the seal can be substantially reduced or even eliminated, whereby particle production is substantially reduced. Or it may even be removed. More specifically, as described above, the seal of the lock valve is advantageously, for example, a first seal optimized for fixation, a second seal optimized for supportability characteristics, a third optimized for flexibility And a functional defragmentation having a sealing portion, and a fourth sealing portion optimized for compressibility to provide a sealing contact.

Thus, by using a lock valve according to embodiments described herein in a vacuum chamber or vacuum processing system, an improved vacuum chamber and an improved vacuum processing system can be provided, thereby improving the high Quality processing results can be achieved.

[0073] Although the foregoing is directed to embodiments of the present disclosure, other and additional embodiments of the present disclosure can be devised without departing from the basic scope of the present disclosure, and the scope of the present disclosure is as follows. It is determined by the claims.

In particular, this described description is intended to disclose the present disclosure, including best mode, and also, to any skilled person, to manufacture and use any devices or systems, and any included methods. Examples are used to enable implementation of the described subject matter, including performing. While various specific embodiments have been disclosed above, mutual non-exclusive features of the embodiments described above can be combined with each other. The patentable scope is defined by the claims, and in other examples, where the claims have structural elements that are not different from the written language of the claims, or if the claims include equivalent structural elements having substantial differences from the written language of the claims. , It is intended to be within the scope of the claims.

Claims (15)

-A base structure 110 having a valve opening 111;
-A shutter 140 for closing the valve opening 111; And
-A sealing portion 160 comprising a sealing base 161 connected to the base structure 110 and a sealing top portion 162 for providing a sealing contact with the shutter 140
It includes,
The sealing base 161 has a higher strength than the sealing top 162,
Lock valve (100) for vacuum sealing. According to claim 1,
The sealing portion 160 includes a stiffness gradient, and the strength is reduced from the sealing base 161 to the sealing top portion 162,
Lock valve 100 for vacuum sealing. The method according to claim 1 or 2,
The sealing part 160 includes a fixture 163 for fixing the sealing part 160 to the base structure 110,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 3,
The base structure 110 includes a receiving portion 113, the sealing base 161 is arranged in the receiving portion 113,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 4,
The seal 160 is an integral one-piece element,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 4,
The seal top 162 is a separate element connected to the seal base 161,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 6,
The sealing top 162 is made of a material different from the sealing base 161,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 7,
The sealing portion 160 includes a functional element 165 embedded in the sealing portion 160,
Lock valve 100 for vacuum sealing. The method of claim 8,
The functional element 165 is embedded in the sealing base 161, and is configured to improve the strength of the sealing base 161,
Lock valve 100 for vacuum sealing. The method of claim 8 or 9,
The functional element 165 is selected from the group consisting of springs, U-shaped sheet metal, S-shaped sheet metal, V-shaped sheet metal, or any combination thereof,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 10,
The sealing base 161 has a different material structure from the sealing top 162,
Lock valve 100 for vacuum sealing. The method according to any one of claims 1 to 11,
The sealing top portion 162 is flexible and compressible,
Lock valve 100 for vacuum sealing. -A housing 170 having a first aperture 171 and a second aperture 172; And
-A lock valve inlay (175) arranged in the housing
It includes,
The lock valve inlay,
-A base structure 110 having a valve opening 111-the valve opening 111 is configured to transport a large area substrate through the valve opening 111 -;
-A shutter 140 for closing the valve opening 111; And
-A seal 160 provided around the valve opening
Including,
The sealing portion 160 includes a sealing base 161 connected to the base structure 110, and a sealing top portion 162 for providing a sealing contact with the shutter 140,
The sealing base 161 has a higher strength than the sealing top 162,
Lock valve 100 for vacuum sealing. A vacuum chamber (200) having at least one lock valve (100) for vacuum sealing,
The at least one lock valve,
A base structure 110 having a valve opening 111;
A shutter 140 for closing the valve opening 111; And
Seal (160)
It includes,
The sealing portion includes a sealing base 161 connected to the base structure 110, and a sealing top portion 162 for providing a sealing contact with the shutter 140,
The sealing base 161 has a higher strength than the sealing top 162,
Vacuum chamber 200 with at least one lock valve 100 for vacuum sealing. A vacuum processing system (300) for processing a substrate,
A vacuum processing chamber 310 adapted to process the substrate; And
At least one load lock chamber 320 configured to transfer the substrate from atmospheric conditions to vacuum conditions
It includes,
The load lock chamber includes at least one lock valve 100 for vacuum sealing,
The at least one lock valve 100,
A base structure 110 having a valve opening 111;
A shutter 140 for closing the valve opening 111; And
Seal (160)
Including,
The sealing portion includes a sealing base 161 connected to the base structure 110, and a sealing top portion 162 for providing a sealing contact with the shutter 140,
The sealing base 161 has a higher strength than the sealing top 162,
Vacuum processing system 300 for processing a substrate.

Images