CN111279107A - Locking valve for vacuum sealing, vacuum chamber and vacuum processing system - Google Patents

Locking valve for vacuum sealing, vacuum chamber and vacuum processing system Download PDF

Info

Publication number
CN111279107A
CN111279107A CN201780096319.0A CN201780096319A CN111279107A CN 111279107 A CN111279107 A CN 111279107A CN 201780096319 A CN201780096319 A CN 201780096319A CN 111279107 A CN111279107 A CN 111279107A
Authority
CN
China
Prior art keywords
seal
sealing
valve
base
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201780096319.0A
Other languages
Chinese (zh)
Inventor
拉尔夫·林登贝格
马丁·凯梅尔
布里希·拉贾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN111279107A publication Critical patent/CN111279107A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/32—Details
    • F16K1/34—Cutting-off parts, e.g. valve members, seats
    • F16K1/46—Attachment of sealing rings
    • F16K1/465—Attachment of sealing rings to the valve seats
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J13/00—Covers or similar closure members for pressure vessels in general
    • F16J13/16—Pivoted closures
    • F16J13/18—Pivoted closures pivoted directly on the frame
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/02—Sealings between relatively-stationary surfaces
    • F16J15/06—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
    • F16J15/10—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing
    • F16J15/104—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing characterised by structure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/02—Sealings between relatively-stationary surfaces
    • F16J15/06—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
    • F16J15/10—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing
    • F16J15/12—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing with metal reinforcement or covering
    • F16J15/121—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing with metal reinforcement or covering with metal reinforcement
    • F16J15/122—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing with metal reinforcement or covering with metal reinforcement generally parallel to the surfaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations

Abstract

A latching valve (100) for vacuum sealing is described. The lockout valve (100) comprises: a base structure (110) having a valve opening (111); a shutter (140) for closing the valve opening (111); and a seal (160). The seal includes: a sealing base (161) connected to the base structure (110); and a sealing top (162) for providing sealing contact with the shutter (140). The seal base (161) has a higher stiffness than the seal top (162).

Description

Locking valve for vacuum sealing, vacuum chamber and vacuum processing system
Technical Field
Embodiments of the present disclosure relate to a latching valve for vacuum sealing. In particular, the present disclosure relates to a locking valve for vacuum sealing of a vacuum chamber of a vacuum processing system. Further, the present disclosure relates to a vacuum chamber with a lock valve for transferring a substrate from atmospheric conditions to vacuum conditions. Additionally, the present disclosure relates to vacuum processing systems for processing substrates, and in particular, inline vacuum processing systems for processing large area substrates.
Background
Typically e.g. at 5 x 10-4Coating a substrate in a vacuum processing system or vacuum coating apparatus under high vacuum conditions at a pressure in the range of hPa to 0.5 hPa. To increase equipment throughput and avoid the necessity of evacuating the entire facility and especially the high vacuum sections for each substrate, load and unload locks (or entrance and exit chambers) are used for the substrates.
To increase material throughput rates and increase productivity in modern in-line coating plants, separate load lock and unload lock chambers are used. A simple so-called 3-chamber coating unit consists of a load lock, in which the substrate is pumped from atmospheric pressure to, for example, p ═ l 10, a sequential vacuum coating section (one or more process chambers), and an unload lock-3An appropriate transition pressure between hPa and p 1.0hPa, in which the substrate is again brought to atmospheric pressure level by venting. In some systems, the load lock and unload lock are provided by the same load lock chamber.
The task of the load lock chamber and unload lock chamber is to evacuate a sufficient and sufficiently low transition pressure to the process range and to vent to atmospheric pressure again as quickly as possible. After unloading the substrate from the load lock chamber, the load lock chamber is evacuated again.
At the same time, in the last few years, less contamination during the vacuum process has become more and more desirable. For example, when producing displays, the acceptance of particulate contamination has decreased and the quality standards, which are also desired by customers, have increased. For example, contamination may occur due to mechanical stress on the locking valve components caused by pressure changes during evacuation of the vacuum chamber.
Accordingly, there is a continuing need to provide improved locking valves for vacuum sealing, vacuum chambers, and vacuum processing systems that can be used to overcome at least some of the problems in the art.
Disclosure of Invention
In view of the above, a lock valve for vacuum sealing, a vacuum chamber having at least one lock valve for vacuum sealing, and a vacuum processing system for processing a substrate according to the independent claims are provided.
According to an aspect of the present disclosure, a latching valve for vacuum sealing is provided. The lockout valve includes: a base structure having a valve opening; a shutter for closing the valve opening; and a seal. The seal includes a seal base connected to the base structure. Further, the seal includes a sealing top for providing sealing contact with the gate. The seal base has a higher stiffness than the seal top.
According to another aspect of the present disclosure, a latching valve for vacuum sealing is provided. The lockout valve includes: a housing having a first aperture and a second aperture; and locking the valve inlay. The locking valve inlay is disposed in the housing. Further, the locking valve inlay includes a base structure having a valve opening. The valve opening is configured for transporting a large area substrate therethrough. Additionally, the locking valve inlay includes a gate for closing the valve opening. Further, the locking valve inlay includes a seal disposed about the valve opening. The seal includes a seal base connected to the base structure. Further, the seal includes a sealing top for providing sealing contact with the gate. The seal base has a higher stiffness than the seal top.
According to another aspect of the present disclosure, a vacuum chamber is provided having at least one locking valve for vacuum sealing. The at least one latching valve comprises: a base structure having a valve opening; a shutter for closing the valve opening; and a seal. The seal includes a seal base connected to the base structure. Further, the seal includes a sealing top for providing sealing contact with the gate. The seal base has a higher stiffness than the seal top.
According to another aspect of the present disclosure, a vacuum processing system for processing a substrate is provided. The vacuum processing system includes a vacuum processing chamber adapted to process the substrate. Further, the vacuum processing system includes at least one load lock chamber configured for transferring the substrate from atmospheric conditions to vacuum conditions. The load lock chamber includes at least one lock valve for vacuum sealing. The at least one latching valve comprises: a base structure having a valve opening; a shutter for closing the valve opening; and a seal. The seal includes a seal base connected to the base structure. Further, the seal includes a sealing top for providing sealing contact with the gate. The seal base has a higher stiffness than the seal top.
Additional aspects, advantages, and features of the present disclosure will be apparent from the description and drawings.
Drawings
So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments. The drawings relate to embodiments of the disclosure and are described below:
FIG. 1 is a schematic cross-sectional view of a lockout valve shown in a closed state according to embodiments described herein;
FIG. 2 is a schematic cross-sectional view of a lockout valve shown in an open state according to embodiments described herein;
3A-3F are schematic diagrams of various possible implementations of a seal for a lockout valve according to embodiments described herein;
FIG. 4 is a schematic cross-sectional view of a lockout valve according to further embodiments described herein;
FIG. 5 is a schematic cross-sectional view of a vacuum chamber having at least one locking valve for vacuum sealing according to embodiments described herein; and
fig. 6 is a schematic view of a vacuum processing system according to embodiments described herein.
Detailed Description
Reference will now be made in detail to the various embodiments, one or more examples of which are illustrated in the figures. Each example is provided by way of explanation and is not intended as a limitation. For example, features illustrated or described as part of one embodiment can be used on or in conjunction with any other embodiment to yield yet a further embodiment. The present disclosure is intended to encompass such modifications and variations.
In the following description of the drawings, the same reference numerals denote the same or similar components. In the present disclosure, only the differences with respect to the respective embodiments are described. Unless otherwise indicated, descriptions of parts or aspects in one embodiment also apply to corresponding parts or aspects in another embodiment.
Before describing various embodiments of the present disclosure in more detail, some aspects are explained regarding some terms and expressions used herein.
In the present disclosure, a "locking valve" may be understood as a valve configured for locking a valve opening. In particular, a latching valve may be understood as a valve configured for providing a vacuum seal (e.g., between atmospheric and vacuum conditions). For example, a lock valve may be provided in a wall of the vacuum chamber to provide a vacuum seal of the atmospheric environment and the vacuum conditions provided inside the vacuum chamber. In other words, a locking valve may be understood as a vacuum sealable valve, which may be configured as a valve selected from the group consisting of: gate valves, slit valves and slit valves.
In the present disclosure, a "base structure" of a locking valve may be understood as a structure configured to support a component or part of the locking valve. For example, the base structure may be a locking valve inlay provided in a housing of the locking valve. Alternatively, the base structure may be part of a housing of the locking valve. In particular, the base structure may be a substantially flat element, such as a plate-like locking valve inlay, a wall of a locking valve housing or a wall of a vacuum chamber. Typically, the base structure comprises a valve opening, which can be opened and closed by a locking valve.
In the present disclosure, the "valve opening" of the lockout valve may be understood as an opening that may be opened and closed by the lockout valve. Thus, the valve opening may be a locking hole. In particular, the valve opening or locking bore may be an elongated opening or bore provided in the base structure of the locking valve. For example, the valve opening may be a rectangular opening. More specifically, the valve opening may have a length L1 that is at least twice the width W of the valve opening. Typically, the size of the valve opening is selected such that a substrate described herein can be conveyed through the valve opening.
In the present disclosure, a "shutter" may be understood as an element of a locking valve configured for closing a valve opening. Thus, the size of the shutter is selected such that the valve opening can be completely closed by the shutter.
In the present disclosure, a "seal" may be understood as a sealing element configured for providing a sealing interface between two elements (e.g., between a base structure and a ram, as described herein). In particular, the seals described herein may be configured to provide a vacuum seal. More specifically, the seal described herein may be understood as a seal configured to provide a hermetic seal of the valve opening or valve bore described herein. Typically, the seal described herein comprises a seal base and a seal top. "seal base" may be understood as the portion of the seal that is connected or attached to the base structure described herein. In particular, the sealing base may be connected or attached to the base structure such that the sealing base is fixed to the base structure. More specifically, the seal base may be connected or attached to the base structure such that the seal base cannot move relative to the base structure. "seal top" may be understood as the portion of the seal configured to make sealing contact with the gate (e.g., via a seal contact element as exemplarily described with reference to fig. 3A) when the gate closes the valve opening described herein. In particular, the sealing top may be connected to the sealing base.
Referring exemplarily to fig. 1, a latching valve 100 for vacuum sealing according to the present disclosure is depicted. According to embodiments, which can be combined with other embodiments described herein, the locking valve 100 comprises a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111, and a seal 160. The seal comprises a seal base 161 which is connected to the base structure 110. Further, the seal includes a sealing top 162 for providing sealing contact with the gate 140. The seal base 161 has a higher rigidity than the seal top 162. In particular, the seal base 161 may be configured to provide a higher stiffness than the seal top 162. In other words, the rigidity k of the seal base 161baseMay be more rigid than the seal top 162topHigh, i.e. kbase＞ktop。
Accordingly, embodiments of the present disclosure advantageously provide a lockout valve with which wear of the seals can be substantially reduced or even eliminated. Accordingly, embodiments of the present disclosure have the following advantages: particle generation due to wear of the seal can be substantially reduced or even eliminated. In particular, providing the seal with a seal base having a higher stiffness than the seal top beneficially provides a seal that is supportive at the seal base and flexible at the seal top. Thus, the seals described herein are advantageously configured such that metal-to-metal contact (e.g., between the base structure and the ram) may be avoided while at the same time friction at the interface between the seal top and the ram may be substantially reduced or even eliminated. More specifically, it may be beneficial to provide a flexible seal top as described herein, in that the seal top may follow relative movement of adjacent portions (e.g., contacting the ram) without changing the contact area between the seal and the sealing surface of the ram.
According to embodiments that may be combined with any other embodiments described herein, the structure and/or material and/or geometry of the seal base 161 may be selected such that the seal base 161 comprises a higher stiffness than the seal top 162. Accordingly, the structure and/or material and/or geometry of the seal tip 162 may be selected such that the seal tip 162 includes a stiffness ktopThe stiffness ktopRigidity k of the seal base 161baseIs small. For example, the seal base 161 may have a higher modulus of elasticity than the seal top 162. In other words, the elastic modulus E of the seal base 161baseMay be greater than the elastic modulus E of the seal top 162topHigh, i.e. Ebase＞Etop。
It should be noted that the stiffness k is understood to be a measure of the resistance to deformation provided by the body. In particular, stiffness is defined as k ═ F/δ, where F is the force acting on the body and δ is the displacement resulting from the force, in particular in the direction of the force.
According to some embodiments, which can be combined with any other embodiment described herein, the seal 160 comprises a stiffness gradient. In particular, the material of the seal may be configured to provide a reduced stiffness from the seal base 161 to the seal top 162. For example, the structure and/or material composition and/or geometry of the seal 160 may be selected such that the stiffness gradually decreases from the seal base 161 to the seal top 162. For example, the seal 160 may be configured to have a decreasing modulus of elasticity from the seal base 161 to the seal top 162.
Additionally or alternatively, the structure of the seal 160 (e.g., the porosity of the seal material) may vary from the seal base 161 to the seal top 162 such that the stiffness k of the seal top istopRigidity k of the seal base 161baseIs small. For example, the porosity of the seal top 162 may be higher than the porosity of the seal base 161. In particular, the porosity of the seal 160 may gradually increase from the seal base 161 to the seal top. For example, porosity may be provided by a foam structure and/or a honeycomb structure.
Providing a latching valve with a seal comprising a stiffness gradient has the following advantages: particle generation due to wear of the seal can be substantially reduced or even eliminated. In particular, by providing a seal described herein that includes a stiffness gradient, a seal having a supportive seal base and a flexible seal top can be obtained. Thus, the seals described herein are advantageously configured such that metal-to-metal contact (e.g., between the base structure and the ram) may be avoided while at the same time friction at the interface between the seal top and the ram may be substantially reduced or even eliminated.
In the following, with exemplary reference to fig. 1 and 2, further details of the latching valve 100 according to embodiments of the present disclosure are described. Fig. 1 shows a schematic cross-sectional view of the latching valve in the closed state, while fig. 2 shows a schematic cross-sectional view of the latching valve in the open state. In particular, as can be seen from fig. 1 and 2, the locking valve 100 generally comprises a mechanism 120 for opening and closing the valve opening 111 according to embodiments that can be combined with any other embodiments described herein. The mechanism 120 for opening and closing the valve opening includes a flap mechanism 121 and a lock mechanism 122.
In particular, as exemplarily shown in fig. 2, the flap mechanism 121 may be provided on a first side 111A of the valve opening 111, while the locking mechanism 122 may be provided on an opposite second side 111B of the valve opening 111. As exemplarily shown in fig. 1 and 2, the flap mechanism 121 and the locking mechanism 122 are generally connected to the base structure 110. The flap mechanism 121 generally includes a shutter 140 for closing the valve opening 111. The locking mechanism 122 includes a latch 150 for securing the gate 140 in the closed position of the locking valve, as exemplarily shown in fig. 1. In particular, the latch 150 may be provided with an engagement element 151 configured to engage with an at least partially complementary profile 143 formed on the shutter 140, so as to secure the shutter in the closed position. As exemplarily shown in fig. 2, the shutter 140 may be mounted to the stem shaft 123. The spindle shaft 123 is rotatable about an axis of rotation. The latch 150 may be mounted to a locking shaft 124 that is generally rotatable about an axis of rotation, as exemplarily shown in fig. 2.
In the present disclosure, "a mechanism for opening and closing a valve opening" may be understood as a mechanism configured for opening and closing a valve opening or valve bore. In particular, a mechanism for opening and closing a valve opening may be understood as a mechanism configured for providing a gas-tight sealing of a valve opening or valve bore. The "mechanism for opening and closing the valve opening" may also be referred to herein as an "opening/closing mechanism".
In fig. 1 to 5, a coordinate system comprising a first direction 101, a second direction 102 and a third direction 103 is shown. For example, the first direction 101 may be an x-direction, the second direction 102 may be a y-direction, and the third direction 103 may be a z-direction. In particular, the first direction 101 may be a horizontal direction, while the second direction 102 may be a vertical direction. More specifically, the first direction 101 may be parallel to the main surface of the base structure 110 to which the seal 160 is connected. The third direction 103 may be perpendicular to the first direction, i.e. perpendicular to the main surface of the base structure 110 to which the seal 160 is connected.
According to an embodiment, which can be combined with any other embodiment described herein, the valve opening 111 is a longitudinal valve opening having a length L1 extending in the second direction 102 and a width W extending in the first direction 101. For example, the length L1 of the valve opening may be selected from a range having a lower limit of L1 ═ 1.0m, in particular a lower limit of L1 ═ 1.5m, more in particular a lower limit of L1 ═ 2.0m, and an upper limit of L1 ═ 2.5m, in particular an upper limit of L1 ═ 3.5m, more in particular an upper limit of L1 ═ 4.0m, more in particular an upper limit of L1 ═ 4.5 m. The width W of the valve opening may be selected from a range having a lower limit of W ═ 5cm, particularly a lower limit of W ═ 7cm, more particularly a lower limit of W ═ 9cm, and an upper limit of W ═ 16cm, particularly an upper limit of W ═ 25cm, more particularly an upper limit of W ═ 50 cm. Typically, the selected width of the valve opening extends over a selected length of the valve opening.
According to embodiments, which can be combined with any other embodiments described herein, the valve opening 111 is configured for transporting a substrate described herein, in particular a large area substrate, through the valve opening 111.
In the present disclosure, the term "substrate" or "large area substrate" as used herein shall specifically cover non-flexible substrates, such as glass plates and metal plates. However, the present disclosure is not so limited, and the term "substrate" may also encompass flexible substrates, such as webs or foils. According to some embodiments, the substrate may be made of any material suitable for material deposition. For example, the substrate may be made of a material selected from the group consisting of: glass (e.g., soda lime glass, borosilicate glass, etc.), metal, polymer, ceramic, compound material, carbon fiber material, mica, or any other material or combination of materials that can be coated by a deposition process.
According to embodiments, which can be combined with any other embodiment described herein, a "large area substrate" as described herein can have at least 0.01m2In particular at least 0.1m2And more particularly at least 0.5m2The size of (c). For example, the large area substrate or carrier may be generation 4.5 (which corresponds to about 0.67 m)2Substrate (0.73m × 0.92m)), generation 5 (which corresponds to about 1.4 m)2Substrate (1.1m × 1.3m)), generation 7.5 (which corresponds to about 4.29 m)2Substrate (1.95m × 2.2m)), generation 8.5 (which corresponds to about 5.7 m)2Substrate (2.2m × 2.5m)), or evenGeneration 10 (which corresponds to about 8.7 m)2Substrate (2.85m × 3.05 m)). Even higher generations, such as 11 th and 12 th generations, and corresponding substrate areas may be similarly achieved. Thus, the substrate may be selected from the group consisting of: generation 1, generation 2, generation 3, generation 3.5, generation 4, generation 4.5, generation 5, generation 6, generation 7, generation 7.5, generation 8, generation 8.5, generation 10, generation 11, and generation 12. In particular, the substrate may be selected from the group consisting of: generation 4.5, generation 5, generation 7.5, generation 8.5, generation 10, generation 11, and generation 12 or greater. Furthermore, the substrate thickness may be from 0.1 to 1.8mm, in particular about 0.9mm or less, such as 0.7mm or 0.5 mm.
Referring exemplarily to fig. 3A-3F, further embodiments of a seal of a latching valve according to the present disclosure are described.
Referring exemplarily to fig. 3A, according to some embodiments, which can be combined with any other embodiments described herein, the base structure 110 comprises a receiving portion 113. In particular, the receiving portion is provided around the valve opening. As exemplarily shown in fig. 3A, typically, the seal base 161 is arranged in the receiving portion 113. For example, the seal base 161 may be press fit or snapped into the receiving portion.
According to some embodiments, which can be combined with any other embodiments described herein, the seal 160 can be an integral, unitary element. Alternatively, the seal top 162 may be a separate element connected to the seal base 161. For example, the seal top 162 may be made of a different material than the seal base 161. In particular, the seal top may comprise a material having a lower modulus of elasticity than the seal base. Thus, the sealing top may be flexible and compressible. Typically, the seal top and/or the seal base are made of a polymeric material.
Arrows F in fig. 3A to 3F indicate the force acting on the seal when the locking valve is closed (i.e. when the shutter is in the closed position as exemplarily shown in fig. 1). Thus, arrow F indicates the compressive force of the ram against the seal when the lockout valve is closed.
Arrows a in fig. 3A to 3F3Indicating the sealing memberA supportive feature. In particular, arrow A3Indicating the stiffness of the seal provided in the third direction 103. Typically, the stiffness of the seal provided in the third direction is provided by the seal base. In particular, the stiffness of the seal 160 provided in the third direction 103 is selected such that contact of the shutter 140 with the base structure 110 is avoided. Thus, in case the shutter and the base structure are made of metallic material, metal-to-metal contact is advantageously avoided, so that particle generation can be substantially reduced or even eliminated.
Arrows a in fig. 3A to 3F1Indicating the flexible nature of the seal. In particular, arrow A1Indicating the flexibility of the seal provided in the first direction 101. Typically, the flexibility of the seal provided in the first direction is provided by the seal top having a lower stiffness than the seal base. Thus, friction between the seal and the gate may be substantially reduced or even eliminated as the flexible nature of the seal allows for lateral movement of the seal. In other words, the seal is configured such that the sealing contact with the ram follows the movement of the ram relative to the base structure, such that friction at the sealing contact with the ram may be substantially reduced or even eliminated. Thus, mainly bulk material deformation of the seal occurs, rather than friction.
According to some embodiments, which may be combined with any other embodiments described herein, the seal top 162 may include a seal contact element 164, as exemplarily shown in fig. 3A. In particular, the seal contact element 164 may have a lower stiffness than the seal top 162. For example, the seal contact member 164 may be flexible as compared to the seal top 162. Typically, the seal contact element 164 is flexible and compressible. More specifically, the modulus of elasticity of the seal contact member 164 may be lower than the modulus of elasticity of the seal tip 162. Typically, the seal contact element 164 of the seal top 162 provides sealing contact with the ram when the lockout valve is closed. In particular, the sealing contact element 164 may be configured to provide line contact with the ram when the locking valve is closed. Providing the sealing contact element 164 described herein may be beneficial to compensate or equalize vacuum chamber tolerances (e.g., manufacturing tolerances, imperfect flatness, etc.) and/or provide a hermetic seal with relatively low compressive forces.
Referring exemplarily to fig. 3B, according to some embodiments, which can be combined with any other embodiments described herein, the seal 160 comprises a fixation 163 for fixing the seal 160 to the base structure 110. For example, the fixture 163 may be configured for securing the sealing base 161 to the base structure 110. For example, the fixture 163 may be secured to the base structure by a securing element (e.g., a screw, clamp, pin, or other securing element).
Thus, a separate seal retainer is provided as compared to conventional seals (e.g., O-rings). In particular, providing a separate seal fixture for securing the seal base to the base structure may be beneficial for reducing or even eliminating friction at the interface between the seal and the base structure. Thus, movement of the sealing base relative to the base structure may be avoided. As exemplarily shown in fig. 3B, the seal 160 may be fixed to the top surface of the base structure 110. Alternatively, the seal 160 may be secured to the base structure 110 by securing the seal in the receptacle 113 via a fastener 163, as exemplarily shown in fig. 3C.
Referring exemplarily to fig. 3D, according to some embodiments, which may be combined with any other embodiments described herein, the sealing top 162 may be configured such that the cross-section of the sealing top 162 decreases in the third direction 103 (i.e. in a direction towards the sealing contact or sealing interface). For example, fig. 3D shows an embodiment in which the seal top 162 has a drop-like shape. The drop seal top 162 has a base connected to the seal base 161 and a tip for providing sealing contact with the ram.
In fig. 3E, an exemplary embodiment is shown in which the seal base 161 and the seal top 162 are provided as an integral, unitary element. Further, according to some embodiments, which may be combined with any other embodiments described herein, a seal contact element 164 may be connected to the seal top 162. Furthermore, as exemplarily shown in fig. 3E, in an uncompressed state, i.e., when the lockout valve is open, a gap 166 may be provided between the fixture 163 and the sealing top 162. In particular, the size of the gap 166 may be selected such that upon compression, i.e., upon application of a compressive force by the ram (as exemplarily shown by arrow F), the seal top may expand laterally (e.g., in the first direction 101), particularly such that upon compression, the seal top 162 does not press against the fixture 163 in the first direction 101.
According to some embodiments, which can be combined with any other embodiments described herein, a further gap 167 can be provided between the fixture 163 and the sealing base 161. In particular, the size of the further gap 167 may be selected such that upon compression, i.e. upon application of a compressive force by the shutter (as exemplarily shown by arrow F), the seal base may expand laterally (e.g. in the first direction 101), in particular such that upon compression, the seal base 161 does not press against the fixture 163 in the first direction 101.
According to some embodiments, which can be combined with any other embodiments described herein, the seal 160 may comprise a functional element 165 embedded in the seal 160, as exemplarily shown in fig. 3F. In particular, the functional element 165 may be embedded in the sealing base 161. Further, typically, the functional element 165 is configured to enhance the rigidity of the seal base 161. For example, functional element 165 may be selected from the group consisting of: a spring, a U-shaped metal sheet, an S-shaped metal sheet, a V-shaped metal sheet, or any combination thereof.
According to some embodiments, which can be combined with any other embodiments described herein (not explicitly shown in the figures), the sealing base comprises a different material structure than the sealing top. For example, the porosity of the seal top may be higher than the porosity of the seal base. Thus, by providing the sealing top with a higher porosity than the sealing base, the sealing top may be provided more flexible and more compressible than the sealing base.
It should be understood that the features of the seal described in relation to the respective embodiments shown in fig. 3A to 3F may be combined with each other. In other words, the features described with respect to the exemplary embodiment shown in one of fig. 3A-3F are not limited to this particular exemplary embodiment, but may be combined with one or more features described with reference to other embodiments of the seal described herein.
Referring exemplarily to fig. 4, a latching valve 100 for vacuum sealing includes a housing 170 having a first aperture 171 and a second aperture 172 according to embodiments that may be combined with any other embodiments described herein. For example, the first hole 171 may be provided in a first wall of the housing, and the second hole 172 may be provided in a second wall of the housing opposite to the first wall of the housing. For example, as exemplarily shown in fig. 5, the second hole 172 may have a size larger than that of the first hole 171. Additionally, the locking valve 100 may include a locking valve inlay 175 disposed in the housing 170. For example, the locking valve inlay 175 may be attached to the inner surface 173 of the wall of the housing. Locking valve inlay 175 may include a base structure 110 having a longitudinal valve opening having a length L1 in second direction 102. Typically, the valve opening 111 is configured and arranged to coincide with a first aperture 171 provided in the housing 170. Alternatively, the first aperture 171 may be larger in size than the valve opening 111 and smaller in size than the base structure 110 attached to the inner surface of the wall of the housing. Thus, as exemplarily shown in fig. 4, the first bore 171 may be closed by the shutter 140 to provide an airtight seal.
Additionally, the locking valve inlay may include a mechanism 120 for opening and closing the valve opening 111. As exemplarily described with reference to fig. 1 and 2, the mechanism 120 for opening and closing the valve opening includes a flap mechanism 121 and a lock mechanism 122. The flap mechanism 121 may be provided on one side of the valve opening 111, and the locking mechanism 122 may be provided on the opposite side of the valve opening 111. The flap mechanism 121 and the locking mechanism 122 are generally connected to the base structure 110.
Furthermore, as exemplarily shown in fig. 4, the locking valve comprises a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111 and a seal 160. As described in more detail with reference to fig. 1-3F, the seal includes a seal base connected to a base structure. Further, the seal includes a sealing top for providing sealing contact with the gate. The seal base has a higher stiffness than the seal top.
Referring exemplarily to fig. 5, a vacuum chamber 200 is described according to an embodiment of the present disclosure. The vacuum chamber 200 includes at least one locking valve 100. For example, the vacuum chamber may include a first locking valve 100A and a second locking valve 100B. More specifically, the first locking valve 100A may be provided in a wall of the vacuum chamber, while the second locking valve 100B may be provided in an opposite wall of the vacuum chamber, as exemplarily shown in fig. 5. For example, the at least one latching valve 100 may be a latching valve according to embodiments described herein (e.g., with reference to fig. 1-4). In particular, the at least one locking valve 100 of the vacuum chamber 200 comprises a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111, and a seal 160. The seal 160 includes a seal base 161 connected to the base structure 110. Further, the seal 160 includes a seal top 162 for providing sealing contact with the gate 140. The seal base 161 has a higher rigidity than the seal top 162. Referring exemplarily to fig. 3A-3F, various embodiments of seals 160 that may be employed in the locking valves for the vacuum chamber 200 described herein are described.
In the present disclosure, a "vacuum chamber" may be understood as a chamber in which a technical vacuum is provided, for example a technical vacuum having a vacuum pressure of less than, for example, 10 mbar. Typically, the pressure in the vacuum chamber described herein may be at 10-5Mbar and about 10-8Between mbar, more typically 10-5Mbar and 10-7Between millibars, and even more typically about 10-6Mbar and about 10-7Between mbar. According to some embodiments, the pressure in the vacuum chamber may be considered to be the partial pressure, or the total pressure, of the evaporated material within the vacuum chamber (both may be approximately the same when only evaporated material is present as the component to be deposited in the vacuum chamber). In some embodiments, the total pressure in the vacuum chamber may be at about 10-4Mbar to about 10-7In millibar, especially in case a second component (such as a gas or the like) other than the evaporation material is present in the vacuum chamber.
Thus, it should be understood that the vacuum chambers described herein may be evacuable to vacuum and may include corresponding equipment, such as a vacuum suction outlet, a vacuum pump suction outlet, or a vacuum port connectable to a vacuum pump. In addition, a vacuum chamber according to embodiments described herein may have a substrate transport system for transporting substrates within the vacuum chamber and/or to another vacuum chamber (e.g., a vacuum processing chamber). In some embodiments, the vacuum chamber may include a carrier for carrying the substrate within and/or through the vacuum chamber.
For example, the vacuum chamber 200 may be a load lock chamber. A "load lock chamber" may be understood as a chamber for a vacuum processing system, for example, as described with reference to fig. 6. For example, the load lock chamber may provide a transition chamber from atmospheric conditions to low pressure or vacuum. For example, a load lock chamber according to embodiments described herein may have a substrate inlet for receiving a substrate delivered under atmospheric conditions and a substrate outlet adapted to be connected to a vacuum chamber (such as a process chamber or an intermediate chamber). Typically, the load lock chamber may have vacuum sealable valves at the substrate entrance and at the substrate exit. In particular, the vacuum sealable valves at the substrate inlet and the substrate outlet may be locking valves according to embodiments described herein.
Referring exemplarily to fig. 6, a vacuum processing system 300 for processing a substrate according to an embodiment of the present disclosure is described. In particular, fig. 6 shows a schematic top view of a vacuum processing system. As exemplarily shown in fig. 6, the vacuum processing system 300 includes a vacuum processing chamber 310 adapted to process a substrate. In addition, the vacuum processing system 300 includes at least one load lock chamber 320 configured for transferring substrates from atmospheric conditions to vacuum conditions. The load lock chamber includes at least one lock valve 100 for vacuum sealing. As exemplarily described with reference to fig. 1 to 4, the at least one locking valve 100 comprises a base structure 110 having a valve opening 111, a shutter 140 for closing the valve opening 111, and a seal 160. The seal 160 includes a seal base 161 connected to the base structure 110. Further, the seal 160 includes a seal top 162 for providing sealing contact with the gate 140. The seal base 161 has a higher rigidity than the seal top 162. Referring exemplarily to fig. 3A-3F, various embodiments of a seal 160 that may be employed in the lock valve for a vacuum processing system 300 described herein are described. Accordingly, the at least one latching valve 100 employed in the vacuum processing system may be the latching valve 100 described with reference to fig. 1-4.
Thus, advantageously, a vacuum processing system may be provided in which particle generation due to wear of the seals may be substantially reduced or even eliminated. Thus, embodiments of the vacuum processing system have the advantage that improved and high quality processing results can be achieved.
As exemplarily shown in fig. 6, the vacuum processing system 300 may comprise a first vacuum processing arrangement 301 and a second vacuum processing arrangement 302. The first vacuum processing arrangement 301 includes a first load lock chamber 320A and a first vacuum processing chamber 310A. Accordingly, the second vacuum processing arrangement 302 may include a second load lock chamber 320B and a second vacuum processing chamber 310B. Further, as exemplarily shown in fig. 6, the first load lock chamber 320A and the second load lock chamber 320B may include the lock valve 100 according to the described embodiments. For example, a lock valve 100 may be provided to connect to an adjacent substrate loading module 350 for loading a substrate into a processing vacuum processing system.
According to embodiments, which can be combined with any of the other embodiments described herein, the first vacuum processing chamber 310A and the second vacuum processing chamber 310B can provide a deposition area having one or more deposition sources or arrays of deposition sources, indicated by reference numerals 333 and 334. Furthermore, as exemplarily shown in fig. 6, a further vacuum chamber (321, 322) may be provided between the respective load lock chamber (320A, 320B) and the respective vacuum processing chamber (310A, 310B) of the first vacuum processing arrangement 301 and the second vacuum processing arrangement 302. Such a configuration may be beneficial for generating a first vacuum having a first vacuum pressure in the respective load lock chamber (320A, 320B) and a second vacuum having a second vacuum pressure in the further vacuum chamber (321, 322). Thus, the vacuum pressure can be reduced in two separate steps. As exemplarily shown in fig. 6, the further vacuum chamber (321, 322) may comprise a lock valve 100 according to embodiments described herein for connecting the further vacuum chamber to the load lock chamber and the vacuum processing chamber.
According to some embodiments, which can be combined with other embodiments described herein, the vacuum processing system can be configured for static layer deposition on a substrate. Alternatively, the processing apparatus may be configured for dynamic layer deposition on a substrate, as exemplarily shown in fig. 6. A dynamic deposition process, such as a sputter deposition process, may be understood as a deposition process in which the substrate is moved in a transport direction through the deposition area while the build-up deposition process is performed. In other words, the substrate is not stationary during the sputter deposition process.
Thus, the vacuum processing system may be configured for dynamic processing, in particular dynamic deposition, with an in-line processing arrangement. An "in-line processing arrangement" may be understood as an arrangement in which two or more vacuum chambers are arranged in a line. More particularly, an "in-line processing arrangement" described herein may be configured for depositing one or more layers on a vertical substrate. For example, one or more layers may be deposited in a static deposition process or a dynamic deposition process. The deposition process may be a PVD process, such as a sputtering process or a CVD process. An in-line processing arrangement, particularly one configured for dynamic layer deposition, provides uniform processing of a substrate (e.g., a large area substrate, such as a rectangular glass plate). The processing tool (such as one or more deposition sources) extends mainly in one direction (e.g., vertical direction) and the substrate is moved in a different second direction (e.g., first transport direction 1 or second transport direction 1', which may be horizontal, as exemplarily shown in fig. 6). Thus, on both sides of the respective vacuum processing chamber (310A, 310B), adjacent further vacuum chambers (321, 325 and 322, 326) may be provided.
Accordingly, in view of the foregoing, it will be appreciated that the embodiments described herein provide an improved locking valve for vacuum sealing, an improved vacuum chamber, and an improved vacuum processing system that may be used to overcome at least some of the problems in the art. In particular, embodiments described herein provide a lockout valve that may be used to substantially reduce or even eliminate wear of seals such that particle generation may be substantially reduced or even eliminated. More particularly, as mentioned above, the seal of the locking valve is advantageously configured to comprise a functional reforming for providing a sealing contact, for example with a first sealing portion optimized with respect to fixation, a second sealing portion optimized with respect to supportive properties, a third sealing portion optimized with respect to flexibility, and a fourth sealing portion optimized with respect to compressibility.
Accordingly, by employing a locking valve according to embodiments described herein in a vacuum chamber or vacuum processing system, an improved vacuum chamber and an improved vacuum processing system may be provided that may be used to achieve improved high quality processing results.
While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.
In particular, this written description uses examples to disclose the disclosure, including the best mode, and also to enable any person skilled in the art to practice the described subject matter, including making and using any devices or systems and performing any incorporated methods. While the foregoing has disclosed various specific embodiments, mutually non-exclusive features of the embodiments described above may be combined with each other. The scope of patent protection is defined by the claims, and other examples are intended to be within the scope of the claims if the claims have structural elements that do not differ from the literal language of the claims, or if the claims include equivalent structural elements with insubstantial differences from the literal language of the claims.

Claims (15)

1. A latching valve (100) for vacuum sealing, comprising:
a base structure (110) having a valve opening (111),
-a shutter (140) for closing the valve opening (111), an
-a seal (160) comprising: a sealing base (161) connected to the base structure (110); and a sealing top (162) for providing sealing contact with the shutter (140), the sealing base (161) having a higher stiffness than the sealing top (162).
2. The lockout valve (100) of claim 1, the seal (160) comprising a stiffness gradient, the stiffness decreasing from the seal base (161) to the seal top (162).
3. The locking valve (100) according to claim 1 or 2, the seal (160) comprising a fixation (163) for fixing the seal (160) to the base structure (110).
4. The locking valve (100) according to any one of claims 1 to 3, the base structure (110) comprising a receiving portion (113), the sealing base (161) being arranged in the receiving portion (113).
5. The latching valve (100) of any of claims 1-4, the seal (160) being a unitary, one-piece element.
6. The locking valve (100) of any of claims 1 to 4, the sealing top (162) being a separate element connected to the sealing base (161).
7. The locking valve (100) of any of claims 1 to 6, the sealing top (162) being made of a different material than the sealing base (161).
8. The locking valve (100) according to any of claims 1 to 7, the seal (160) comprising a functional element (165) embedded in the seal (160).
9. The locking valve (100) of claim 8, the functional element (165) being embedded in the sealing base (161) and configured for enhancing the stiffness of the sealing base (161).
10. The latching valve (100) according to claim 8 or 9, the functional element (165) being selected from the group consisting of: a spring, a U-shaped metal sheet, an S-shaped metal sheet, a V-shaped metal sheet, or any combination thereof.
11. The locking valve (100) of any of claims 1 to 10, the sealing base (161) having a different material structure than the sealing top (162).
12. The latching valve (100) of any of claims 1-11, the sealing top (162) being flexible and compressible.
13. A latching valve (100) for vacuum sealing, comprising:
-a housing (170) having a first aperture (171) and a second aperture (172), and
-a locking valve inlay (175) disposed in the housing, the locking valve inlay comprising:
-a base structure (110) having a valve opening (111), the valve opening (111) being configured for transporting a large area substrate through the valve opening (111);
-a shutter (140) for closing the valve opening (111); and
-a seal (160) provided around the valve opening, the seal (160) comprising: a sealing base (161) connected to the base structure (110); and a sealing top (162) for providing sealing contact with the shutter (140), the sealing base (161) having a higher stiffness than the sealing top (162).
14. A vacuum chamber (200) having at least one locking valve (100) for vacuum sealing, the at least one locking valve comprising: a base structure (110) having a valve opening (111); a shutter (140) for closing the valve opening (111); and a seal (160) comprising: a sealing base (161) connected to the base structure (110); and a sealing top (162) for providing sealing contact with the shutter (140), the sealing base (161) having a higher stiffness than the sealing top (162).
15. A vacuum processing system (300) for processing a substrate, comprising: a vacuum processing chamber (310) adapted to process the substrate; and at least one load lock chamber (320) configured for transferring the substrate from atmospheric conditions to vacuum conditions, the load lock chamber comprising at least one lock valve (100) for vacuum sealing, the at least one lock valve comprising: a base structure (110) having a valve opening (111); a shutter (140) for closing the valve opening (111); and a seal (160) comprising: a sealing base (161) connected to the base structure (110); and a sealing top (162) for providing sealing contact with the shutter (140), the sealing base (161) having a higher stiffness than the sealing top (162).
CN201780096319.0A 2017-11-23 2017-11-23 Locking valve for vacuum sealing, vacuum chamber and vacuum processing system Pending CN111279107A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2017/080234 WO2019101318A1 (en) 2017-11-23 2017-11-23 Lock valve for vacuum sealing, vacuum chamber and vacuum processing system

Publications (1)

Publication Number Publication Date
CN111279107A true CN111279107A (en) 2020-06-12

Family

ID=60582567

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780096319.0A Pending CN111279107A (en) 2017-11-23 2017-11-23 Locking valve for vacuum sealing, vacuum chamber and vacuum processing system

Country Status (3)

Country Link
KR (1) KR20200087247A (en)
CN (1) CN111279107A (en)
WO (1) WO2019101318A1 (en)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1745192A (en) * 2003-12-22 2006-03-08 应用薄膜有限责任与两合公司 Coating plant with a charging lock and device therefor
CN1790617A (en) * 2004-12-17 2006-06-21 东京毅力科创株式会社 Replacing method of valv device, processing system and sealing components
CN1885491A (en) * 2005-06-20 2006-12-27 日新意旺机械股份公司 Vacuum processing apparatus and method operation thereof
CN101994837A (en) * 2010-11-15 2011-03-30 徐州工程学院 Anti-friction sealing ring
CN201795043U (en) * 2010-09-26 2011-04-13 山西泰宝密封有限公司 Piston seal of trapezoidal sealing surface of L-shaped supporting ring
US20110233438A1 (en) * 2010-03-23 2011-09-29 Velan Inc. Ball valve sealing ring
CN102213316A (en) * 2011-05-24 2011-10-12 山西浩业通用设备有限公司 Combined drum-type seal ring and preparation method thereof
CN104112636A (en) * 2013-04-15 2014-10-22 东京毅力科创株式会社 Vacuum device and valve control method
CN105264111A (en) * 2013-04-05 2016-01-20 布勒阿尔策瑙股份有限公司 Apparatus for the vacuum treatment of substrates

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4345739A (en) * 1980-08-07 1982-08-24 Barton Valve Company Flanged sealing ring
US4418889A (en) * 1981-03-16 1983-12-06 Xomox Corporation Fire safe seat for a valve
DE9413091U1 (en) * 1994-08-13 1995-12-14 Pfeiffer Chemie Armaturen Sealing element, in particular for use in actuators for liquid or gaseous media
JP3051050B2 (en) * 1995-10-23 2000-06-12 株式会社巴技術研究所 Butterfly valve seat ring
US6202983B1 (en) * 1999-10-13 2001-03-20 Thomas A. Hartman Valve seal structured to prevent circumferential slippage
US7282097B2 (en) * 2004-06-14 2007-10-16 Applied Materials, Inc. Slit valve door seal
DE102006033966A1 (en) * 2005-10-21 2007-04-26 S + S Armaturen Gmbh Butterfly valve has flap which is offset from its shaft, its edges forming seal with edges of sealing ring when closed, sealing edges being at angle of 3 degrees to longitudinal axis of valve
JP6243868B2 (en) * 2015-03-25 2017-12-06 Ckd株式会社 Vacuum valve

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1745192A (en) * 2003-12-22 2006-03-08 应用薄膜有限责任与两合公司 Coating plant with a charging lock and device therefor
CN1790617A (en) * 2004-12-17 2006-06-21 东京毅力科创株式会社 Replacing method of valv device, processing system and sealing components
CN1885491A (en) * 2005-06-20 2006-12-27 日新意旺机械股份公司 Vacuum processing apparatus and method operation thereof
US20110233438A1 (en) * 2010-03-23 2011-09-29 Velan Inc. Ball valve sealing ring
CN201795043U (en) * 2010-09-26 2011-04-13 山西泰宝密封有限公司 Piston seal of trapezoidal sealing surface of L-shaped supporting ring
CN101994837A (en) * 2010-11-15 2011-03-30 徐州工程学院 Anti-friction sealing ring
CN102213316A (en) * 2011-05-24 2011-10-12 山西浩业通用设备有限公司 Combined drum-type seal ring and preparation method thereof
CN105264111A (en) * 2013-04-05 2016-01-20 布勒阿尔策瑙股份有限公司 Apparatus for the vacuum treatment of substrates
CN104112636A (en) * 2013-04-15 2014-10-22 东京毅力科创株式会社 Vacuum device and valve control method

Also Published As

Publication number Publication date
KR20200087247A (en) 2020-07-20
WO2019101318A1 (en) 2019-05-31

Similar Documents

Publication Publication Date Title
US9383036B2 (en) Bonded slit valve door seal with thin non-metallic film gap control bumper
CN109906502B (en) Load port apparatus, system and method of manufacturing electronic devices
TWI524447B (en) Method and apparatus for sealing an opening of a processing chamber
US20160377183A1 (en) Slit valve assembly having a spacer for maintaining a gap
US8104770B2 (en) Semiconductor process chamber
EP1806525A2 (en) Curved slit valve door with flexible couplings
CN109750277B (en) Apparatus and method for isolating a reaction chamber from a loading chamber with reduced contamination
US20140111074A1 (en) Methods and apparatus for providing a floating seal for chamber doors
JP5519099B2 (en) Valve door with ball joint
TWI476338B (en) Slotted tssl door to couple o-ring with moving mating part
US20080101893A1 (en) Vacuum processing apparatus and a method for venting to atmosphere
CN111279107A (en) Locking valve for vacuum sealing, vacuum chamber and vacuum processing system
CN109844383B (en) Locking valve for vacuum sealing, vacuum chamber and vacuum processing system
CN101794709B (en) Vacuum device and substrate processing device
EP1028278A2 (en) Valve seal
JP2007277667A (en) Vacuum chamber, and substrate treatment apparatus having the same
US8061686B2 (en) Pinch valve
CN1789485B (en) Methods and apparatus for providing a floating seal for chamber doors
US20120298033A1 (en) Continuous processing system with pinch valve
KR101458167B1 (en) Seal structure for gate valve
DE102014106457A1 (en) Vacuum arrangement and lip seal
KR102179394B1 (en) Door configured to seal an opening in a vacuum processing system, a vacuum processing system, and a method for operating the door
US20190309418A1 (en) Multizone rotatable diffuser apparatus
JP2009068599A (en) Gate valve and processing device
KR20070006325A (en) Bearing seal assembly structure in semiconductor device fabrication equipment

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20200612