KR20200037278A - Cured film forming composition, alignment material and retardation material - Google Patents
Cured film forming composition, alignment material and retardation material Download PDFInfo
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- KR20200037278A KR20200037278A KR1020207004627A KR20207004627A KR20200037278A KR 20200037278 A KR20200037278 A KR 20200037278A KR 1020207004627 A KR1020207004627 A KR 1020207004627A KR 20207004627 A KR20207004627 A KR 20207004627A KR 20200037278 A KR20200037278 A KR 20200037278A
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- South Korea
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- component
- cured film
- forming composition
- film forming
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- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
- C08F265/06—Polymerisation of acrylate or methacrylate esters on to polymers thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
- C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
- C09K19/54—Additives having no specific mesophase characterised by their chemical composition
- C09K19/56—Aligning agents
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
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Abstract
[과제] 양호한 액정배향성을 나타내며, 또한 액정층과의 밀착성이 우수한 배향재를 제공하기 위한 경화막 형성 조성물을 제공한다.
[해결수단] (A)에폭시기를 갖는 폴리머와 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체와의 반응 생성물 및 (B)가교제를 함유하는 경화막 형성 조성물, 그리고 이로부터 얻어지는 경화막, 배향재, 및 위상차재.[Problem] A cured film forming composition for providing an alignment material exhibiting good liquid crystal orientation and excellent adhesion to a liquid crystal layer is provided.
[Solutions] (A) A reaction product of a polymer having an epoxy group and a cinnamic acid derivative having a group containing a polymerizable double bond, and (B) a cured film forming composition containing a crosslinking agent, and a cured film, alignment material obtained therefrom, And phase difference.
Description
본 발명은 액정분자를 배향시키는 경화막 형성 조성물, 배향재 및 위상차재에 관한 것이다. 특히 본 발명은, 원편광 안경방식의 3D디스플레이에 이용되는 패터닝된 위상차재나, 유기 EL디스플레이의 반사방지막으로서 사용되는 원편광판에 이용되는 위상차재를 제작하는데 유용한 경화막 형성 조성물, 배향재 및 위상차재에 관한 것이다.The present invention relates to a cured film forming composition for aligning liquid crystal molecules, an alignment material, and a retardation material. Particularly, the present invention is a cured film forming composition, alignment material, and retardation material useful for producing a patterned retardation material used in a circularly polarized glasses type 3D display or a retardation material used in a circular polarizing plate used as an anti-reflection film for an organic EL display. It is about.
원편광 안경방식의 3D디스플레이의 경우, 액정패널 등의 화상을 형성하는 표시소자의 위에 위상차재가 배치되는 것이 통상이다. 이 위상차재는, 위상차특성이 상이한 2종류의 위상차영역이 각각 복수, 규칙적으로 배치되어 있으며, 패터닝된 위상차재를 구성하고 있다. 한편, 이하, 본 명세서에 있어서는, 이러한 위상차특성이 상이한 복수의 위상차영역을 배치하도록 패턴화된 위상차재를 패턴화 위상차재라 칭한다.In the case of a 3D display of the circularly polarized spectacles method, it is common that a phase difference material is disposed on a display element forming an image such as a liquid crystal panel. In this phase difference material, two or more types of phase difference regions having different phase difference characteristics are arranged regularly and constitute a patterned phase difference material. Meanwhile, in the present specification, a retardation material patterned to arrange a plurality of retardation regions having different retardation characteristics is referred to as a patterned retardation material.
패턴화 위상차재는, 예를 들어, 특허문헌 1에 개시되어 있는 바와 같이, 중합성 액정으로 이루어지는 위상차재료를 광학패터닝함으로써 제작할 수 있다. 중합성 액정으로 이루어지는 위상차재료의 광학패터닝은, 액정패널의 배향재 형성에서 알려져 있는 광배향기술을 이용한다. 즉, 기판 상에 광배향성의 재료로 이루어지는 도막을 마련하고, 이것에 편광방향이 상이한 2종류의 편광을 조사한다. 그리고, 액정의 배향제어방향이 상이한 2종류의 액정배향영역이 형성된 배향재로서 광배향막을 얻는다. 이 광배향막의 위에 중합성 액정을 포함하는 용액상(狀)의 위상차재료를 도포하고, 중합성 액정의 배향을 실현한다. 그 후, 배향된 중합성 액정을 경화하여 패턴화 위상차재를 형성한다.The patterned retardation material can be produced, for example, by optically patterning a retardation material made of a polymerizable liquid crystal, as disclosed in Patent Document 1. The optical patterning of the retardation material made of a polymerizable liquid crystal uses a photo-alignment technique known in the formation of an alignment material for a liquid crystal panel. That is, a coating film made of a photo-alignment material is provided on a substrate, and two kinds of polarizations having different polarization directions are irradiated thereon. Then, a photo-alignment film is obtained as an alignment material in which two kinds of liquid crystal alignment regions having different alignment control directions of liquid crystals are formed. A phase difference material in a solution phase containing a polymerizable liquid crystal is coated on the photo-alignment film to realize the alignment of the polymerizable liquid crystal. Then, the oriented polymerizable liquid crystal is cured to form a patterned retardation material.
유기 EL디스플레이의 반사방지막은, 직선편광판, 1/4파장 위상차판에 의해 구성되며, 화상표시패널의 패널면을 향하는 외래광을 직선편광판에 의해 직선편광으로 변환하고, 이어지는 1/4파장 위상차판에 의해 원편광으로 변환한다. 여기서 이 원편광에 의한 외래광은, 화상표시패널의 표면 등에서 반사되는데, 이 반사시에 편광면의 회전방향이 역전된다. 그 결과, 이 반사광은, 도래시와는 반대로, 1/4파장 위상차판에 의해, 직선편광판에 의해 차광되는 방향의 직선편광으로 변환된 후, 이어지는 직선편광판에 의해 차광되고, 그 결과, 외부에의 출사가 현저하게 억제된다.The anti-reflection film of the organic EL display is composed of a linear polarizing plate and a quarter-wave retardation plate, and converts foreign light toward the panel surface of the image display panel into linear polarization by a linear polarizing plate, followed by a quarter-wave retardation plate. It converts into circularly polarized light. Here, the foreign light by the circularly polarized light is reflected from the surface of the image display panel, etc., and the direction of rotation of the polarizing surface is reversed during this reflection. As a result, the reflected light is converted into linearly polarized light in a direction shielded by the linearly polarized plate by a quarter-wave retardation plate, as opposed to when it arrives, and then shielded by the subsequent linearly polarized plate. The emission of is significantly suppressed.
이 1/4파장 위상차판에 관해, 특허문헌 2에는, 1/2파장판, 1/4파장판을 조합하여 1/4파장 위상차판을 구성함으로써, 이 광학필름을 역분산특성에 따라 구성하는 방법이 제안되어 있다. 이 방법의 경우, 컬러화상의 표시에 제공하는 넓은 파장대역에 있어서, 양의 분산특성에 따른 액정재료를 사용하여 역분산특성에 따라 광학필름을 구성할 수 있다.With respect to this quarter-wave retardation plate, in Patent Document 2, a quarter-wave retardation plate is formed by combining a half-wave plate and a quarter-wave plate, thereby constituting the optical film according to the reverse dispersion characteristics. A method has been proposed. In the case of this method, in the wide wavelength band provided for the display of a color image, an optical film may be constructed according to the reverse dispersion characteristic by using a liquid crystal material according to the positive dispersion characteristic.
또한 최근, 이 위상차층에 적용가능한 액정재료로서, 역분산특성을 구비하는 것이 제안되어 있다(특허문헌 3, 4). 이러한 역분산특성의 액정재료에 따르면, 1/2파장판, 1/4파장판을 조합하여 2층의 위상차층에 의해 1/4파장 위상차판을 구성하는 대신에, 위상차층을 단층에 의해 구성하여 역분산특성을 확보할 수 있고, 이에 따라 넓은 파장대역에 있어서 원하는 위상차를 확보하는 것이 가능한 광학필름을 간이한 구성에 의해 실현할 수 있다.In addition, recently, as a liquid crystal material applicable to the retardation layer, it has been proposed to have inverse dispersion characteristics (Patent Documents 3 and 4). According to the liquid crystal material having such a reverse dispersion characteristic, instead of forming a quarter-wave retardation plate by a two-layer retardation layer by combining a half-wave plate and a quarter-wave plate, a retardation layer is composed of a single layer. By doing so, it is possible to secure the inverse dispersion characteristic, and accordingly, an optical film capable of securing a desired phase difference in a wide wavelength band can be realized by a simple configuration.
액정을 배향시키기 위해서는 배향층이 이용된다. 배향층의 형성방법으로는, 예를 들어 러빙법이나 광배향법이 알려져 있으며, 광배향법은 러빙법의 문제점인 정전기나 티끌의 발생이 없고, 정량적인 배향처리의 제어가 가능한 점에서 유용하다.An alignment layer is used to align the liquid crystal. As a method for forming an alignment layer, for example, a rubbing method or a photo-alignment method is known, and the photo-alignment method is useful in that it does not generate static electricity or dust, which is a problem of the rubbing method, and can control quantitative alignment processing. .
광배향법을 이용한 배향재 형성에서는, 이용가능한 광배향성의 재료로서, 측쇄에 신나모일기 및 칼콘기 등의 광이량화부위를 갖는 아크릴 수지나 폴리이미드 수지 등이 알려져 있다. 이들 수지는, 편광UV조사함으로써, 액정의 배향을 제어하는 성능(이하, 액정배향성이라고도 한다.)을 나타내는 것이 보고되어 있다(특허문헌 5~특허문헌 7을 참조.).In the formation of the alignment material using the photo-alignment method, as an available photo-alignment material, there are known acrylic resins, polyimide resins, etc. having light dimerization sites such as cinnamoyl groups and chalcone groups on the side chains. It has been reported that these resins exhibit the ability to control the alignment of liquid crystals (hereinafter, also referred to as liquid crystal alignment properties) by irradiating polarized UV (see Patent Documents 5 to 7).
또한, 배향층에는, 액정배향능 외에, 액정층과의 밀착성이 요구된다. 예를 들어, 배향층과 이 위에 형성된 액정층과의 밀착력이 불충분한 경우, 위상차필름의 제조에 포함되는 권취공정 등에 있어서, 상기 액정층이 박리되는 경우가 있다.Further, in addition to the liquid crystal alignment ability, the alignment layer is required to have adhesiveness with the liquid crystal layer. For example, when the adhesion between the alignment layer and the liquid crystal layer formed thereon is insufficient, the liquid crystal layer may peel off in a winding step included in the production of the retardation film.
본 발명의 목적은, 이상의 지견이나 검토결과에 기초하여 이루어진 것이다. 즉, 본 발명의 목적은, 양호한 액정배향성을 나타내며, 또한 액정층과의 밀착성이 우수한 배향재를 제공하기 위한 경화막 형성 조성물을 제공하는 것이다.The object of the present invention was achieved based on the above findings and examination results. That is, an object of the present invention is to provide a cured film forming composition for providing an alignment material exhibiting good liquid crystal orientation and excellent adhesion to a liquid crystal layer.
본 발명의 다른 목적 및 이점은, 이하의 기재로부터 명백해질 것이다.Other objects and advantages of the present invention will become apparent from the following description.
본 발명자들은 상기 목적을 달성하기 위해, 예의검토를 거듭한 결과, (A)에폭시기를 갖는 폴리머와 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체와의 반응 생성물, (B)가교제를 베이스로 하는 경화막 형성 조성물을 선택함으로써, 양호한 액정배향성을 나타내며, 또한 액정층과의 밀착성이 우수한 경화막을 형성할 수 있는 것을 발견하여, 본 발명을 완성시켰다.In order to achieve the above object, the present inventors, after repeated polite reviews, (A) a reaction product of a polymer having an epoxy group and a cinnamic acid derivative having a group containing a polymerizable double bond, (B) curing based on a crosslinking agent By selecting the film-forming composition, it was found that a cured film exhibiting good liquid crystal orientation and excellent adhesion to the liquid crystal layer can be formed, thereby completing the present invention.
즉, 본 발명은 제1 관점으로서, (A)에폭시기를 갖는 폴리머와 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체와의 반응 생성물 및 (B)가교제를 함유하는 경화막 형성 조성물에 관한 것이다.That is, as the first aspect, the present invention relates to a cured film forming composition containing (A) a reaction product of a polymer having an epoxy group and a cinnamic acid derivative having a group containing a polymerizable double bond, and (B) a crosslinking agent.
제2 관점으로서, 상기 중합성 이중결합을 포함하는 기가, (메트)아크릴로일기인 제1 관점에 기재된 경화막 형성 조성물에 관한 것이다.As a 2nd viewpoint, the group containing the said polymerizable double bond is related with the cured film formation composition as described in 1st viewpoint which is a (meth) acryloyl group.
제3 관점으로서, 상기 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체가, 하기 식(1)로 표시되는 화합물인 제1 관점 또는 제2 관점에 기재된 경화막 형성 조성물에 관한 것이다.As a third aspect, the cinnamic acid derivative having a group containing a polymerizable double bond relates to the cured film forming composition according to the first aspect or the second aspect, which is a compound represented by the following formula (1).
[화학식 1][Formula 1]
식(1) 중, A1과 A2는 각각 독립적으로, 수소원자 또는 메틸기를 나타내고,In Formula (1), A 1 and A 2 each independently represent a hydrogen atom or a methyl group,
R1은 하기 식(c-2)R 1 is the following formula (c-2)
[화학식 2][Formula 2]
(식(c-2) 중, 파선은 결합손(手)을 나타내고, R101은 탄소수 1~30의 알킬렌기를 나타내고, 이 알킬렌기 중 1개 혹은 복수의 수소원자는, 불소원자 또는 유기기로 치환되어 있을 수도 있다. 또한, R101 중의 -CH2CH2-는 -CH=CH-로 치환되어 있을 수도 있고, 나아가, 다음에 드는 어느 하나의 기가 서로 이웃하지 않는 경우에 있어서, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH- 및 -CO-로 이루어지는 군으로부터 선택되는 기로 치환되어 있을 수도 있고, M1은 수소원자 또는 메틸기를 나타낸다.)로 표시되는 기를 나타내고,(In formula (c-2), the broken line represents a bonding hand, R 101 represents an alkylene group having 1 to 30 carbon atoms, and one or a plurality of hydrogen atoms in the alkylene group is a fluorine atom or an organic group. In addition, -CH 2 CH 2 -in R 101 may be substituted with -CH = CH-, and further, -O- in the case where any of the following groups are not adjacent to each other. , -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH- and -CO- may be substituted with a group selected from the group consisting of, M 1 represents a hydrogen atom or a methyl group .) Represents a group,
R2는 2가의 방향족기, 2가의 지환족기, 2가의 복소환식기 또는 2가의 축합환식기를 나타내고,R 2 represents a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent condensed cyclic group,
R3은 단결합, 산소원자, -COO-, -OCO-, -CH=CHCOO- 또는 -OCOCH=CH-를 나타내고,R 3 represents a single bond, an oxygen atom, -COO-, -OCO-, -CH = CHCOO- or -OCOCH = CH-,
R4~R7은 각각 독립적으로 수소원자, 할로겐원자, 탄소수 1~6의 알킬기, 탄소수 1~6의 할로알킬기, 탄소수 1~6의 알콕시기, 탄소수 1~6의 할로알콕시기, 시아노기, 및 니트로기로 이루어지는 군으로부터 선택되는 치환기를 나타내고,R 4 to R 7 are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, And a substituent selected from the group consisting of nitro groups,
또한, R2, R3 및 R4 또는 R2, R3 및 R6은 하나가 되어 방향족기를 형성할 수도 있고,Further, R 2 , R 3 and R 4 or R 2 , R 3 and R 6 may be united to form an aromatic group,
n은 0~3의 정수이다.)n is an integer from 0 to 3.)
제4 관점으로서, (B)성분의 가교제가 메틸올기 또는 알콕시메틸기를 갖는 가교제인, 제1 관점 내지 제3 관점 중 어느 하나에 기재된 경화막 형성 조성물에 관한 것이다.As a 4th viewpoint, it is related with the cured film formation composition in any one of 1st viewpoint-3rd viewpoint which the crosslinking agent of (B) component is a crosslinking agent which has a methylol group or an alkoxymethyl group.
제5 관점으로서, (C)하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기를 갖는 폴리머를 추가로 함유하는 제1 관점 내지 제4 관점 중 어느 하나에 기재된 경화막 형성 조성물에 관한 것이다.As a fifth aspect, any one of the first to fourth aspects further comprising a polymer having at least one group selected from the group consisting of (C) a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group. It relates to the cured film forming composition described.
제6 관점으로서, (D)가교촉매를 추가로 함유하는 제1 관점 내지 제5 관점 중 어느 하나에 기재된 경화막 형성 조성물에 관한 것이다.As a 6th viewpoint, it is related with the cured film formation composition in any one of 1st viewpoint-5th viewpoint which further contains (D) crosslinking catalyst.
제7 관점으로서, (E)1개 이상의 중합성기와, 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기A 또는 이 기A와 반응하는 적어도 1개의 기를 갖는 화합물을 함유하는 제1 관점 내지 제6 관점 중 어느 하나에 기재된 경화막 형성 조성물에 관한 것이다.In a seventh aspect, (E) at least one group A selected from the group consisting of at least one polymerizable group, a hydroxyl group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group or at least one group reacting with the group A It is related with the cured film formation composition in any one of 1st viewpoint-6th viewpoint containing the compound which has group.
제8 관점으로서, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분을 함유하는 제1 관점 내지 제7 관점 중 어느 하나에 기재된 경화막 형성 조성물에 관한 것이다.As 8th viewpoint, it is related with the cured film formation composition in any one of 1st viewpoint-7th viewpoint containing 1 mass part-500 mass parts (B) component based on 100 mass parts of (A) component.
제9 관점으로서, (A)성분 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1질량부~400질량부의 (C)성분을 함유하는 제5 관점 내지 제8 관점 중 어느 한 항에 기재된 경화막 형성 조성물에 관한 것이다.As a ninth aspect, according to any one of the fifth aspect to the eighth aspect containing 1 part by mass to 400 parts by mass of the component (C) relative to 100 parts by mass, which is the total amount of the crosslinking agent of the component (A) and the component (B). It relates to the cured film forming composition described.
제10 관점으로서, (A)성분 및 (B)성분의 가교제의 합계량인 100질량부에 대해 0.01질량부~20질량부의 (D)성분을 함유하는 제6 관점 내지 제9 관점 중 어느 한 항에 기재된 경화막 형성 조성물에 관한 것이다.As a tenth aspect, according to any one of the sixth to ninth aspects, containing 0.01 parts by mass to 20 parts by mass of the (D) component relative to 100 parts by mass, which is the total amount of the crosslinking agent of the component (A) and the component (B). It relates to the cured film forming composition described.
제11 관점으로서, (A)성분 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1질량부~100질량부의 (E)성분을 함유하는 제7 관점 내지 제10 관점 중 어느 한 항에 기재된 경화막 형성 조성물에 관한 것이다.As an eleventh aspect, according to any one of the seventh to tenth aspects containing 1 part by mass to 100 parts by mass of the (E) component relative to 100 parts by mass, which is the total amount of the crosslinking agent of the component (A) and the component (B). It relates to the cured film forming composition described.
제12 관점으로서, 제1 관점 내지 제11 관점 중 어느 하나에 기재된 경화막 형성 조성물로부터 얻어지는 것을 특징으로 하는 경화막에 관한 것이다.As a 12th viewpoint, it is related with the cured film characterized by being obtained from the cured film formation composition in any one of 1st viewpoint-11th viewpoint.
제13 관점으로서, 제1 관점 내지 제11 관점 중 어느 하나에 기재된 경화막 형성 조성물로부터 얻어지는 것을 특징으로 하는 배향재에 관한 것이다.As a 13th viewpoint, it is related with the orientation material characterized by being obtained from the cured film formation composition in any one of 1st viewpoint-11th viewpoint.
제14 관점으로서, 제1 관점 내지 제11 관점 중 어느 하나에 기재된 경화막 형성 조성물로부터 얻어지는 경화막을 사용하여 형성되는 것을 특징으로 하는 위상차재에 관한 것이다.As a 14th viewpoint, it is related with the phase difference material characterized by being formed using the cured film obtained from the cured film formation composition in any one of 1st viewpoint-11th viewpoint.
본 발명에 따르면, 양호한 액정배향성을 나타내며, 또한 액정층과의 밀착성이 우수한 경화막과, 그 형성에 호적한 경화막 형성 조성물을 제공할 수 있다. 본 발명에 따르면, 액정배향성과 광투과성이 우수한 배향재를 제공할 수 있다. 또한, 본 발명에 따르면, 고정도의 광학패터닝이 가능한 위상차재를 제공할 수 있다.ADVANTAGE OF THE INVENTION According to this invention, the cured film which shows favorable liquid crystal orientation property and is excellent in adhesiveness with a liquid crystal layer, and the cured film formation composition suitable for the formation can be provided. According to the present invention, it is possible to provide an alignment material excellent in liquid crystal alignment and light transmittance. Further, according to the present invention, it is possible to provide a phase difference material capable of high-precision optical patterning.
<경화막 형성 조성물><Cure film forming composition>
본 발명의 경화막 형성 조성물은, (A)에폭시기를 갖는 폴리머와 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체와의 반응 생성물, 및 (B)가교제를 함유한다. 본 발명의 경화막 형성 조성물은, 상기 (A)성분 및 (B)성분에 더하여, 추가로, (C)성분으로서 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기를 갖는 폴리머를 함유할 수도 있다. 나아가, (D)성분으로서 가교촉매도 함유할 수 있다. 또한 (E)성분으로서 1개 이상의 중합성기와, 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기A 또는 이 기A와 반응하는 적어도 1개의 기를 갖는 화합물을 함유할 수 있다. 그리고, 본 발명의 효과를 손상시키지 않는 한, 기타 첨가제를 함유할 수 있다.The cured film forming composition of the present invention contains a reaction product of (A) a polymer having an epoxy group and a cinnamic acid derivative having a group containing a polymerizable double bond, and (B) a crosslinking agent. The composition for forming a cured film of the present invention is selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group in addition to the (A) component and the (B) component. It may also contain a polymer having at least one group. Furthermore, a crosslinking catalyst can also be included as (D) component. Further, as the component (E), at least one group A selected from the group consisting of at least one polymerizable group, a hydroxyl group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or at least one group reacting with the group A It may contain a compound. In addition, other additives may be contained as long as the effects of the present invention are not impaired.
이하, 각 성분의 상세를 설명한다.Hereinafter, details of each component will be described.
<(A)성분><(A) component>
본 발명의 경화막 형성 조성물에 함유되는 (A)성분은, 에폭시기를 갖는 폴리머와 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체와의 반응 생성물이다.The component (A) contained in the cured film forming composition of the present invention is a reaction product of a polymer having an epoxy group and a cinnamic acid derivative having a group containing a polymerizable double bond.
<에폭시기를 갖는 폴리머><Polymer having an epoxy group>
에폭시기를 갖는 폴리머는, 예를 들어 에폭시기를 갖는 중합성 불포화 화합물의 중합체 또는 에폭시기를 갖는 중합성 불포화 화합물과 그 밖의 중합성 불포화 화합물과의 공중합체일 수 있다.The polymer having an epoxy group may be, for example, a polymer of a polymerizable unsaturated compound having an epoxy group or a copolymer of a polymerizable unsaturated compound having an epoxy group and other polymerizable unsaturated compounds.
에폭시기를 갖는 중합성 불포화 화합물의 구체예로는, 예를 들어 아크릴산글리시딜, 메타크릴산글리시딜, α-에틸아크릴산글리시딜, α-n-프로필아크릴산글리시딜, α-n-부틸아크릴산글리시딜, 아크릴산-3,4-에폭시부틸, 메타크릴산-3,4-에폭시부틸, 아크릴산-6,7-에폭시헵틸, 메타크릴산-6,7-에폭시헵틸, α-에틸아크릴산-6,7-에폭시헵틸, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르 등을 들 수 있다.Specific examples of the polymerizable unsaturated compound having an epoxy group include, for example, glycidyl acrylate, glycidyl methacrylate, glycidyl acrylate-α-ethyl acrylate, glycidyl acrylate, α-n- Glycidyl butyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, 6,7-epoxyheptyl acrylate, 6,7-epoxyheptyl methacrylate, α-ethylacrylic acid And -6,7-epoxyheptyl, o-vinylbenzylglycidyl ether, m-vinylbenzylglycidyl ether, p-vinylbenzylglycidyl ether, and the like.
그 밖의 중합성 불포화 화합물로는, (메트)아크릴산알킬에스테르, (메트)아크릴산환상알킬에스테르, 메타크릴산아릴에스테르, 아크릴산아릴에스테르, 불포화디카르본산디에스테르, 비시클로불포화 화합물류, 말레이미드 화합물류, 불포화방향족 화합물, 공액(共役)디엔계 화합물, 불포화모노카르본산, 불포화디카르본산, 불포화디카르본산무수물, 이들 이외의 중합성 불포화 화합물을 들 수 있다.Other polymerizable unsaturated compounds include (meth) acrylic acid alkyl esters, (meth) acrylic acid cyclic alkyl esters, methacrylic acid aryl esters, acrylic acid aryl esters, unsaturated dicarboxylic acid diesters, bicyclounsaturated compounds, and maleimide compounds. , Unsaturated aromatic compounds, conjugated diene-based compounds, unsaturated monocarboxylic acids, unsaturated dicarboxylic acids, unsaturated dicarboxylic acid anhydrides, and polymerizable unsaturated compounds other than these.
이들의 구체예로는, 메타크릴산알킬에스테르로서, 예를 들어 하이드록시메틸메타크릴레이트, 2-하이드록시에틸메타크릴레이트, 3-하이드록시프로필메타크릴레이트, 4-하이드록시부틸메타크릴레이트, 디에틸렌글리콜모노메타크릴레이트, 2,3-디하이드록시프로필메타크릴레이트, 2-메타크릴옥시에틸글리코사이드, 4-하이드록시페닐메타크릴레이트, 메틸메타크릴레이트, 에틸메타크릴레이트, n-부틸메타크릴레이트, sec-부틸메타크릴레이트, 2-에틸헥실메타크릴레이트, 이소데실메타크릴레이트, n-라우릴메타크릴레이트, 트리데실메타크릴레이트, n-스테아릴메타크릴레이트 등; 아크릴산알킬에스테르로서, 예를 들어 메틸아크릴레이트, 이소프로필아크릴레이트 등; 메타크릴산환상알킬에스테르로서, 예를 들어 시클로헥실메타크릴레이트, 2-메틸시클로헥실메타크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일메타크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일옥시에틸메타크릴레이트, 이소보로닐메타크릴레이트, 콜레스타닐메타크릴레이트 등; 아크릴산환상알킬에스테르로서, 예를 들어 시클로헥실아크릴레이트, 2-메틸시클로헥실아크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일아크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일옥시에틸아크릴레이트, 이소보로닐아크릴레이트, 콜레스타닐아크릴레이트 등; 메타크릴산아릴에스테르로서, 페닐메타크릴레이트, 벤질메타크릴레이트 등; 아크릴산아릴에스테르로서, 예를 들어 페닐아크릴레이트, 벤질아크릴레이트 등; 불포화디카르본산디에스테르로서, 예를 들어 말레산디에틸, 푸마르산디에틸, 이타콘산디에틸 등; 비시클로불포화 화합물류로서, 예를 들어 비시클로[2.2.1]헵트-2-엔, 5-메틸비시클로[2.2.1]헵트-2-엔, 5-에틸비시클로[2.2.1]헵트-2-엔, 5-메톡시비시클로[2.2.1]헵트-2-엔, 5-에톡시비시클로[2.2.1]헵트-2-엔, 5,6-디메톡시비시클로[2.2.1]헵트-2-엔, 5,6-디에톡시비시클로[2.2.1]헵트-2-엔, 5-(2’-하이드록시에틸)비시클로[2.2.1]헵트-2-엔, 5,6-디하이드록시비시클로[2.2.1]헵트-2-엔, 5,6-디(하이드록시메틸)비시클로[2.2.1]헵트-2-엔, 5,6-디(2’-하이드록시에틸)비시클로[2.2.1]헵트-2-엔, 5-하이드록시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-하이드록시-5-에틸비시클로[2.2.1]헵트-2-엔, 5-하이드록시메틸-5-메틸비시클로[2.2.1]헵트-2-엔 등; 말레이미드 화합물류로서, 예를 들어 페닐말레이미드, 시클로헥실말레이미드, 벤질말레이미드, N-석신이미딜-3-말레이미드벤조에이트, N-석신이미딜-4-말레이미드부티레이트, N-석신이미딜-6-말레이미드카프로에이트, N-석신이미딜-3-말레이미드프로피오네이트, N-(9-아크리디닐)말레이미드 등; 불포화방향족 화합물로서, 예를 들어 스티렌, α-메틸스티렌, m-메틸스티렌, p-메틸스티렌, 비닐톨루엔, p-메톡시스티렌 등; 공액디엔계 화합물로서, 1,3-부타디엔, 이소프렌, 2,3-디메틸-1,3-부타디엔 등; 불포화모노카르본산으로서, 예를 들어 아크릴산, 메타크릴산, 크로톤산 등; 불포화디카르본산으로서, 말레산, 푸마르산, 시트라콘산, 메사콘산, 이타콘산 등; 불포화디카르본산무수물로서, 상기 불포화디카르본산의 각 무수물; 상기 이외의 중합성 불포화 화합물로서, 예를 들어 아크릴로니트릴, 메타크릴로니트릴, 염화비닐, 염화비닐리덴, 아크릴아미드, 메타크릴아미드, 아세트산비닐 등을 각각 들 수 있다.As specific examples of these, as the alkyl methacrylate ester, for example, hydroxymethyl methacrylate, 2-hydroxyethyl methacrylate, 3-hydroxypropyl methacrylate, and 4-hydroxybutyl methacrylate , Diethylene glycol monomethacrylate, 2,3-dihydroxypropylmethacrylate, 2-methacryloxyethylglycoside, 4-hydroxyphenylmethacrylate, methylmethacrylate, ethylmethacrylate, n -Butyl methacrylate, sec-butyl methacrylate, 2-ethylhexyl methacrylate, isodecyl methacrylate, n-lauryl methacrylate, tridecyl methacrylate, n-stearyl methacrylate, etc .; As an acrylic acid alkyl ester, For example, methyl acrylate, isopropyl acrylate, etc .; As a methacrylic acid cyclic alkyl ester, for example, cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, tricyclo [5.2.1.0 2,6 ] decane-8-ylmethacrylate, tricyclo [5.2. 1.0 2,6 ] decan-8- yloxyethyl methacrylate, isoboronil methacrylate, cholestanyl methacrylate, and the like; As the acrylic acid cyclic alkyl ester, for example, cyclohexyl acrylate, 2-methylcyclohexyl acrylate, tricyclo [5.2.1.0 2,6 ] decane-8-ylacrylate, tricyclo [5.2.1.0 2,6 ] Decane-8-yloxyethyl acrylate, isobornyl acrylate, cholestanyl acrylate, etc .; As a methacrylic acid aryl ester, phenyl methacrylate, benzyl methacrylate, etc .; As an acrylic acid aryl ester, For example, phenyl acrylate, benzyl acrylate, etc .; Examples of the unsaturated dicarboxylic acid diester include diethyl maleate, diethyl fumarate, diethyl itaconic acid, and the like; Bicyclounsaturated compounds, for example, bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1] hept -2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dimethoxybicyclo [2.2.1] Hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5- (2'-hydroxyethyl) bicyclo [2.2.1] hept-2-ene, 5, 6-dihydroxybicyclo [2.2.1] hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di (2'- Hydroxyethyl) bicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-ethylbicyclo [2.2 .1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] hept-2-ene, etc .; As maleimide compounds, for example, phenyl maleimide, cyclohexyl maleimide, benzyl maleimide, N-succinimidyl-3-maleimide benzoate, N-succinimidyl-4-maleimide butyrate, N-succinate Imidyl-6-maleimide caproate, N-succinimidyl-3-maleimide propionate, N- (9-acridinyl) maleimide, etc .; As unsaturated aromatic compounds, for example, styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, etc .; As the conjugated diene-based compound, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, etc .; As an unsaturated monocarboxylic acid, For example, acrylic acid, methacrylic acid, crotonic acid, etc .; As unsaturated dicarboxylic acid, maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, etc .; As an unsaturated dicarboxylic acid anhydride, each anhydride of the said unsaturated dicarboxylic acid; Examples of the polymerizable unsaturated compound other than the above include acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, and vinyl acetate, respectively.
에폭시기를 갖는 중합체에 있어서의 에폭시기를 갖는 중합성 불포화 화합물의 공중합비율은, 바람직하게는 30질량% 이상이고, 보다 바람직하게는 50질량% 이상이다.The copolymerization ratio of the polymerizable unsaturated compound having an epoxy group in the polymer having an epoxy group is preferably 30% by mass or more, and more preferably 50% by mass or more.
에폭시기를 갖는 중합체의 합성은, 바람직하게는 용매 중, 적당한 중합개시제의 존재하에 있어서의 공지의 라디칼중합법에 의해 행할 수 있다.Synthesis of the polymer having an epoxy group can be preferably performed by a known radical polymerization method in a solvent in the presence of a suitable polymerization initiator.
에폭시기를 갖는 중합체로는, 시판품을 사용할 수도 있다. 이러한 시판품으로는, 예를 들어 EHPE3150, EHPE3150CE(이상, (주)다이셀(구 다이셀화학공업(주))제), UG-4010, UG-4035, UG-4040, UG-4070(이상, 토아합성(주)제 ALUFON시리즈), ECN-1299(아사히화성(주)제), DEN431, DEN438(이상, 다우케미칼사제), jER-152(미쯔비시케미칼(주)(구 재팬에폭시레진(주))제), 에피클론N-660, N-665, N-670, N-673, N-695, N-740, N-770, N-775(이상, DIC(주)(구 다이닛폰잉키화학공업(주))제), EOCN-1020, EOCN-102S, EOCN-104S(이상, 일본화약(주)제) 등을 들 수 있다.A commercial item can also be used as a polymer which has an epoxy group. As such commercial products, for example, EHPE3150, EHPE3150CE (above, Daicel (former Daicel Chemical Industry Co., Ltd.)), UG-4010, UG-4035, UG-4040, UG-4070 (above, Toa Synthetic ALUFON series), ECN-1299 (Asahi Chemical Co., Ltd.), DEN431, DEN438 (above, manufactured by Dow Chemical), jER-152 (Mitsubishi Chemical Co., Ltd. (formerly Japan Epoxy Resin Co., Ltd.) )), Epiclon N-660, N-665, N-670, N-673, N-695, N-740, N-770, N-775 (above, DIC Corporation (formerly Dai Nippon Inki Chemicals) Industrial Co., Ltd.), EOCN-1020, EOCN-102S, EOCN-104S (above, manufactured by Nippon Chemical Co., Ltd.) and the like.
<중합성 이중결합을 포함하는 기를 갖는 계피산 유도체><Cinnamic acid derivative having a group containing a polymerizable double bond>
상기 중합성 이중결합으로는, 탄소-탄소간의 이중결합이 바람직하다. 이 탄소-탄소간의 이중결합을 포함하는 기로는, 예를 들어, 비닐기, (메트)아크릴로일기, 아크릴아미드기 등을 들 수 있는데, (메트)아크릴로일기가 바람직하다.As the polymerizable double bond, a double bond between carbon and carbon is preferable. Examples of the group containing the carbon-carbon double bond include a vinyl group, a (meth) acryloyl group, and an acrylamide group, and a (meth) acryloyl group is preferable.
상기 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체로는, 하기 식(1)로 표시되는 화합물이 바람직하다.As the cinnamic acid derivative having a group containing a polymerizable double bond, a compound represented by the following formula (1) is preferable.
[화학식 3][Formula 3]
식(1) 중, A1와 A2는 각각 독립적으로, 수소원자 또는 메틸기를 나타내고,In Formula (1), A 1 and A 2 each independently represent a hydrogen atom or a methyl group,
R1은 하기 식(c-2)R 1 is the following formula (c-2)
[화학식 4][Formula 4]
(식(c-2) 중, 파선은 결합손을 나타내고, R101은 탄소수 1~30의 알킬렌기를 나타내고, 이 알킬렌기 중 1개 혹은 복수의 수소원자는, 불소원자 또는 유기기로 치환되어 있을 수도 있다. 또한, R101 중의 -CH2CH2-는 -CH=CH-로 치환되어 있을 수도 있고, 나아가, 다음에 드는 어느 하나의 기가 서로 이웃하지 않는 경우에 있어서, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH- 및 -CO-로 이루어지는 군으로부터 선택되는 기로 치환되어 있을 수도 있고, M1은 수소원자 또는 메틸기를 나타낸다.)로 표시되는 기를 나타내고,(In the formula (c-2), the broken line represents a bond, R 101 represents an alkylene group having 1 to 30 carbon atoms, and one or more hydrogen atoms in the alkylene group may be substituted with a fluorine atom or an organic group. Further, -CH 2 CH 2 -in R 101 may be substituted with -CH = CH-, and further, when any one of the following groups is not adjacent to each other, -O-, -NHCO It may be substituted with a group selected from the group consisting of-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH- and -CO-, and M 1 represents a hydrogen atom or a methyl group.) Represents the displayed group,
R2는 2가의 방향족기, 2가의 지환족기, 2가의 복소환식기 또는 2가의 축합환식기를 나타내고,R 2 represents a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent condensed cyclic group,
R3은 단결합, 산소원자, -COO-, -OCO-, -CH=CHCOO- 또는 -OCOCH=CH-를 나타내고,R 3 represents a single bond, an oxygen atom, -COO-, -OCO-, -CH = CHCOO- or -OCOCH = CH-,
R4~R7은 각각 독립적으로 수소원자, 할로겐원자, 탄소수 1~6의 알킬기, 탄소수 1~6의 할로알킬기, 탄소수 1~6의 알콕시기, 탄소수 1~6의 할로알콕시기, 시아노기, 및 니트로기로 이루어지는 군으로부터 선택되는 치환기를 나타내고,R 4 to R 7 are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, And a substituent selected from the group consisting of nitro groups,
또한, R2, R3 및 R4 또는 R2, R3 및 R6은 하나가 되어 방향족기를 형성할 수도 있고,Further, R 2 , R 3 and R 4 or R 2 , R 3 and R 6 may be united to form an aromatic group,
n은 0~3의 정수이다.)n is an integer from 0 to 3.)
R2의 2가의 방향족기로는, 예를 들어 1,4-페닐렌기, 2-플루오로-1,4-페닐렌기, 3-플루오로-1,4-페닐렌기, 2,3,5,6-테트라플루오로-1,4-페닐렌기 등을; R2의 2가의 지환족기로는, 1,2-시클로프로필렌기, 1,3-시클로부틸렌기, 1,4-시클로헥실렌기 등을; R2의 2가의 복소환식기로는, 예를 들어 1,4-피리딜렌기, 2,5-피리딜렌기, 1,4-푸라닐렌기 등을; R2의 2가의 축합환식기로는, 예를 들어 2,6-나프틸렌기 등을, 각각 들 수 있다. R2로는 1,4-페닐렌기가 바람직하다.As the divalent aromatic group of R 2 , for example, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 2,3,5,6 -Tetrafluoro-1,4-phenylene group and the like; Examples of the divalent alicyclic group of R 2 include 1,2-cyclopropylene group, 1,3-cyclobutylene group, and 1,4-cyclohexylene group; Examples of the divalent heterocyclic group of R 2 include 1,4-pyridylene group, 2,5-pyridylene group, and 1,4-furanylene group; Examples of the divalent condensed cyclic group of R 2 include a 2,6-naphthylene group and the like, respectively. R 2 is preferably a 1,4-phenylene group.
상기 식(1)로 표시되는 화합물의 바람직한 예로는, 예를 들어, 하기 식M1-1~M1-5를 들 수 있다.As a preferable example of the compound represented by said formula (1), the following formulas M1-1-M1-5 are mentioned, for example.
[화학식 5][Formula 5]
(식 중, M1은 수소원자 또는 메틸기이고, s1은 메틸렌기의 수를 나타내고, 2 내지 9의 자연수이다.)(In the formula, M 1 is a hydrogen atom or a methyl group, s1 represents the number of methylene groups, and is a natural number from 2 to 9.)
상기 식(1)로 표시되는 화합물은, 유기화학의 정법을 적당히 조합하여 합성할 수 있다.The compound represented by the formula (1) can be synthesized by appropriately combining organic chemical methods.
<에폭시기를 갖는 폴리머와 특정의 계피산 유도체의 반응><Reaction of a polymer having an epoxy group and a specific cinnamic acid derivative>
본 발명의 액정배향제에 함유되는, 에폭시기를 갖는 폴리머와 특정의 계피산 유도체와의 반응 생성물은, 상기와 같은 에폭시기를 갖는 폴리머와 특정의 계피산 유도체를, 바람직하게는 촉매의 존재하, 바람직하게는 적당한 유기용매 중에서 반응시킴으로써 합성할 수 있다.The reaction product of the polymer having an epoxy group and a specific cinnamic acid derivative contained in the liquid crystal aligning agent of the present invention is preferably a polymer having an epoxy group as described above and a specific cinnamic acid derivative, preferably in the presence of a catalyst, It can be synthesized by reacting in a suitable organic solvent.
반응시에 사용되는 계피산 유도체의 사용비율은, 에폭시기를 갖는 중합체에 포함되는 에폭시기 1몰에 대해, 바람직하게는 0.01~1.5몰이고, 보다 바람직하게는 0.05~1.3몰이고, 더욱 바람직하게는 0.1~1.1몰이다.The proportion of cinnamic acid derivative used in the reaction is preferably 0.01 to 1.5 mol, more preferably 0.05 to 1.3 mol, and even more preferably 0.1 to 1 mol of the epoxy group contained in the polymer having an epoxy group. 1.1 mole.
여기서 사용할 수 있는 유기촉매로는, 유기염기 또는 에폭시 화합물과 산무수물과의 반응을 촉진시키는 소위 경화촉진제로서 공지의 화합물을 이용할 수 있다.As the organic catalyst that can be used here, a known compound can be used as a so-called curing accelerator that accelerates the reaction between an organic base or an epoxy compound and an acid anhydride.
상기 유기염기로는, 예를 들어 에틸아민, 디에틸아민, 피페라진, 피페리딘, 피롤리딘, 피롤과 같은 1~2급유기아민; 트리에틸아민, 트리-n-프로필아민, 트리-n-부틸아민, 피리딘, 4-디메틸아미노피리딘, 디아자비시클로운데센과 같은 3급의 유기아민; 테트라메틸암모늄하이드록사이드와 같은 4급의 유기아민 등을 들 수 있다. 이들 유기염기 중, 트리에틸아민, 트리-n-프로필아민, 트리-n-부틸아민, 피리딘, 4-디메틸아미노피리딘과 같은 3급의 유기아민; 테트라메틸암모늄하이드록사이드와 같은 4급의 유기아민이 바람직하다.Examples of the organic base include primary or secondary organic amines such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine, and pyrrole; Tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 4-dimethylaminopyridine and diazabicycloundecene; And quaternary organic amines such as tetramethylammonium hydroxide. Among these organic bases, tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine; Preference is given to quaternary organic amines such as tetramethylammonium hydroxide.
상기 경화촉진제로는, 예를 들어 벤질디메틸아민, 2,4,6-트리스(디메틸아미노메틸)페놀, 시클로헥실디메틸아민, 트리에탄올아민과 같은 3급아민; 2-메틸이미다졸, 2-n-헵틸이미다졸, 2-n-운데실이미다졸, 2-페닐이미다졸, 2-페닐-4-메틸이미다졸, 1-벤질-2-메틸이미다졸, 1-벤질-2-페닐이미다졸, 1,2-디메틸이미다졸, 2-에틸-4-메틸이미다졸, 1-(2-시아노에틸)-2-메틸이미다졸, 1-(2-시아노에틸)-2-n-운데실이미다졸, 1-(2-시아노에틸)-2-페닐이미다졸, 1-(2-시아노에틸)-2-에틸-4-메틸이미다졸, 2-페닐-4-메틸-5-하이드록시메틸이미다졸, 2-페닐-4,5-디(하이드록시메틸)이미다졸, 1-(2-시아노에틸)-2-페닐-4,5-디〔(2’-시아노에톡시)메틸〕이미다졸, 1-(2-시아노에틸)-2-n-운데실이미다졸륨트리멜리테이트, 1-(2-시아노에틸)-2-페닐이미다졸륨트리멜리테이트, 1-(2-시아노에틸)-2-에틸-4-메틸이미다졸륨트리멜리테이트, 2,4-디아미노-6-〔2’-메틸이미다졸릴-(1’)〕에틸-s-트리아진, 2,4-디아미노-6-(2’-n-운데실이미다졸릴)에틸-s-트리아진, 2,4-디아미노-6-〔2’-에틸-4’-메틸이미다졸릴-(1’)〕에틸-s-트리아진, 2-메틸이미다졸의 이소시아눌산부가물, 2-페닐이미다졸의 이소시아눌산부가물, 2,4-디아미노-6-〔2’-메틸이미다졸릴-(1’)〕에틸-s-트리아진의 이소시아눌산부가물과 같은 이미다졸 화합물; 디페닐포스핀, 트리페닐포스핀, 아인산트리페닐과 같은 유기인 화합물; 벤질트리페닐포스포늄클로라이드, 테트라-n-부틸포스포늄브로마이드, 메틸트리페닐포스포늄브로마이드, 에틸트리페닐포스포늄브로마이드, n-부틸트리페닐포스포늄브로마이드, 테트라페닐포스포늄브로마이드, 에틸트리페닐포스포늄요오다이드, 에틸트리페닐포스포늄아세테이트, 테트라-n-부틸포스포늄o,o-디에틸포스포로디티오네이트, 테트라-n-부틸포스포늄벤조트리아졸레이트, 테트라-n-부틸포스포늄테트라플루오로보레이트, 테트라-n-부틸포스포늄테트라페닐보레이트, 테트라페닐포스포늄테트라페닐보레이트와 같은 4급포스포늄염; 1,8-디아자비시클로[5.4.0]운데센-7이나 그의 유기산염과 같은 디아자비시클로알켄; 옥틸산아연, 옥틸산주석, 알루미늄아세틸아세톤착체와 같은 유기금속 화합물; 테트라에틸암모늄브로마이드, 테트라-n-부틸암모늄브로마이드, 테트라에틸암모늄클로라이드, 테트라-n-부틸암모늄클로라이드와 같은 4급암모늄염; 삼불화붕소, 붕산트리페닐과 같은 붕소 화합물; 염화아연, 염화제이주석과 같은 금속할로겐 화합물; 디시안디아미드나 아민과 에폭시 수지와의 부가물 등의 아민부가형 촉진제 등의 고융점분산형 잠재성 경화촉진제; 상기 이미다졸 화합물, 유기인 화합물이나 4급포스포늄염 등의 경화촉진제의 표면을 폴리머로 피복한 마이크로캡슐형 잠재성 경화촉진제; 아민염형 잠재성 경화제촉진제; 루이스산염, 브뢴스테드산염 등의 고온해리형의 열양이온중합형 잠재성 경화촉진제 등의 잠재성 경화촉진제 등을 들 수 있다.Examples of the curing accelerator include tertiary amines such as benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, cyclohexyldimethylamine, and triethanolamine; 2-methylimidazole, 2-n-heptylimidazole, 2-n-undecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2- Methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 1- (2-cyanoethyl) -2-methylyi Midazole, 1- (2-cyanoethyl) -2-n-undecylimidazole, 1- (2-cyanoethyl) -2-phenylimidazole, 1- (2-cyanoethyl)- 2-ethyl-4-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenyl-4,5-di (hydroxymethyl) imidazole, 1- (2- Cyanoethyl) -2-phenyl-4,5-di [(2'-cyanoethoxy) methyl] imidazole, 1- (2-cyanoethyl) -2-n-undecylimidazolium trimelli Tate, 1- (2-cyanoethyl) -2-phenylimidazolium trimellitate, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazolium trimellitate, 2,4- Diamino-6- [2'-methylimidazolyl- (1 ')] ethyl-s-triazine, 2,4-diamino-6- (2'-n-undecylimidazolyl) ethyl-s -tree Gin, 2,4-diamino-6- [2'-ethyl-4'-methylimidazolyl- (1 ')] ethyl-s-triazine, isocyanurate adduct of 2-methylimidazole, Isocyanurate adduct of 2-phenylimidazole, isocyanurate adduct of 2,4-diamino-6- [2'-methylimidazolyl- (1 ')] ethyl-s-triazine Imidazole compounds; Organophosphorus compounds such as diphenylphosphine, triphenylphosphine, and triphenylphosphite; Benzyltriphenylphosphonium chloride, tetra-n-butylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide, ethyltriphenylphospho Onium iodide, ethyl triphenylphosphonium acetate, tetra-n-butylphosphonium o, o-diethylphosphorodithionate, tetra-n-butylphosphonium benzotriazolate, tetra-n-butylphosphonium tetra Quaternary phosphonium salts such as fluoroborate, tetra-n-butylphosphoniumtetraphenylborate, tetraphenylphosphoniumtetraphenylborate; Diazabicycloalkenes such as 1,8-diazabicyclo [5.4.0] undecene-7 or organic acid salts thereof; Organometallic compounds such as zinc octylate, tin octylate, and aluminum acetylacetone complexes; Quaternary ammonium salts such as tetraethylammonium bromide, tetra-n-butylammonium bromide, tetraethylammonium chloride, and tetra-n-butylammonium chloride; Boron compounds such as boron trifluoride and triphenyl borate; Metal halogen compounds such as zinc chloride and stannous chloride; High melting point dispersion type latent curing accelerators, such as amine addition accelerators such as dicyandiamide and adducts of amines and epoxy resins; A microcapsule type latent curing accelerator coating a surface of a curing accelerator such as the imidazole compound, an organophosphorus compound or a quaternary phosphonium salt with a polymer; Amine salt type latent curing agent accelerator; And latent curing accelerators such as a high temperature dissociation type thermal cation polymerization type latent curing accelerator such as Lewis acid salt and Bronsted acid salt.
이들 중, 바람직하게는 테트라에틸암모늄브로마이드, 테트라-n-부틸암모늄브로마이드, 테트라에틸암모늄클로라이드, 테트라-n-부틸암모늄클로라이드와 같은 4급암모늄염이다.Among them, preferably, quaternary ammonium salts such as tetraethylammonium bromide, tetra-n-butylammonium bromide, tetraethylammonium chloride, and tetra-n-butylammonium chloride.
촉매의 사용비율로는, 에폭시기를 갖는 중합체 100질량부에 대해, 바람직하게는 100질량부 이하이고, 보다 바람직하게는 0.01~100질량부, 더욱 바람직하게는 0.1~20질량부이다.The use ratio of the catalyst is preferably 100 parts by mass or less, more preferably 0.01 to 100 parts by mass, and even more preferably 0.1 to 20 parts by mass with respect to 100 parts by mass of the polymer having an epoxy group.
상기 유기용매로는, 예를 들어 탄화수소 화합물, 에테르 화합물, 에스테르 화합물, 케톤 화합물, 아미드 화합물, 알코올 화합물 등을 들 수 있다. 이들 중, 에테르 화합물, 에스테르 화합물, 케톤 화합물, 알코올 화합물이 원료 및 생성물의 용해성 그리고 생성물의 정제용이함의 관점으로부터 바람직하다. 용매는, 고형분농도(반응용액 중의 용매 이외의 성분의 질량이 용액의 전체질량에 차지하는 비율)가, 바람직하게는 0.1질량% 이상, 보다 바람직하게는 5~50질량%가 되는 양으로 사용된다.Examples of the organic solvent include hydrocarbon compounds, ether compounds, ester compounds, ketone compounds, amide compounds, and alcohol compounds. Of these, ether compounds, ester compounds, ketone compounds, and alcohol compounds are preferred from the viewpoints of solubility of raw materials and products and ease of purification of the products. The solvent is used in an amount such that the solid content concentration (the ratio of the mass of components other than the solvent in the reaction solution to the total mass of the solution) is preferably 0.1% by mass or more, and more preferably 5 to 50% by mass.
반응온도는, 바람직하게는 0~200℃이고, 보다 바람직하게는 50~150℃이다. 반응시간은, 바람직하게는 0.1~50시간이고, 보다 바람직하게는 0.5~20시간이다.The reaction temperature is preferably 0 to 200 ° C, and more preferably 50 to 150 ° C. The reaction time is preferably 0.1 to 50 hours, and more preferably 0.5 to 20 hours.
이렇게 하여, 에폭시기를 갖는 폴리머와 특정의 계피산 유도체와의 반응 생성물을 함유하는 용액이 얻어진다. 이 용액은 그대로 액정배향제의 조제에 제공할 수도 있고, 용액 중에 포함되는 중합체를 단리한 다음에 액정배향제의 조제에 제공할 수도 있고, 또는 단리한 중합체를 정제한 다음에 액정배향제의 조제에 제공할 수도 있다.In this way, a solution containing a reaction product of a polymer having an epoxy group and a specific cinnamic acid derivative is obtained. This solution may be provided as it is to the preparation of the liquid crystal aligning agent, or the polymer contained in the solution may be provided to the preparation of the liquid crystal aligning agent, or after the isolated polymer is purified, the liquid crystal aligning agent is prepared. It can also be provided.
<(B)성분><(B) component>
본 발명의 경화막 형성 조성물에 있어서의 (B)성분은, 가교제이다.(B) component in the cured film forming composition of this invention is a crosslinking agent.
(B)성분인 가교제는, 상기 (A)성분의 열가교가능한 관능기와 가교를 형성하는 기, 예를 들어 메틸올기 또는 알콕시메틸기를 갖는 가교제인 것이 바람직하다.(B) It is preferable that the crosslinking agent which is a component is a crosslinking agent which has the group which forms bridge | crosslinking with the heat-crosslinkable functional group of the said (A) component, for example, a methylol group or an alkoxymethyl group.
이들 기를 갖는 화합물로는, 예를 들어, 알콕시메틸화글리콜우릴, 알콕시메틸화벤조구아나민 및 알콕시메틸화멜라민 등의 메틸올 화합물을 들 수 있다.As a compound which has these groups, methylol compounds, such as alkoxy methylation glycoluril, alkoxy methylation benzoguanamine, and alkoxy methylation melamine, are mentioned, for example.
알콕시메틸화글리콜우릴의 구체예로는, 예를 들어, 1,3,4,6-테트라키스(메톡시메틸)글리콜우릴, 1,3,4,6-테트라키스(부톡시메틸)글리콜우릴, 1,3,4,6-테트라키스(하이드록시메틸)글리콜우릴, 1,3-비스(하이드록시메틸)요소, 1,1,3,3-테트라키스(부톡시메틸)요소, 1,1,3,3-테트라키스(메톡시메틸)요소, 1,3-비스(하이드록시메틸)-4,5-디하이드록시-2-이미다졸리논, 및 1,3-비스(메톡시메틸)-4,5-디메톡시-2-이미다졸리논 등을 들 수 있다. 시판품으로서, 닛폰사이텍·인더스트리즈(주)(구 미쯔이사이텍(주))제 글리콜우릴 화합물(상품명: 사이멜(등록상표) 1170, 파우더링크(등록상표) 1174) 등의 화합물, 메틸화요소 수지(상품명: UFR(등록상표) 65), 부틸화요소 수지(상품명: UFR(등록상표) 300, U-VAN10S60, U-VAN10R, U-VAN11HV), DIC(주)(구 다이닛폰잉키화학공업(주))제 요소/포름알데히드계 수지(고축합형, 상품명: 베카민(등록상표) J-300S, 동(同) P-955, 동 N) 등을 들 수 있다.Specific examples of the alkoxy methylated glycoluril include, for example, 1,3,4,6-tetrakis (methoxymethyl) glycoluril, 1,3,4,6-tetrakis (butoxymethyl) glycoluril, 1,3,4,6-tetrakis (hydroxymethyl) glycoluril, 1,3-bis (hydroxymethyl) urea, 1,1,3,3-tetrakis (butoxymethyl) urea, 1,1 , 3,3-tetrakis (methoxymethyl) urea, 1,3-bis (hydroxymethyl) -4,5-dihydroxy-2-imidazolinone, and 1,3-bis (methoxymethyl) ) -4,5-dimethoxy-2-imidazolinone. As a commercial product, a compound such as Nippon Scitech Industries (formerly Mitsui Scitech Co., Ltd.) glycoluril compound (trade name: Cymel (registered trademark) 1170, PowderLink (registered trademark) 1174), methylated urea resin ( Product name: UFR (registered trademark) 65), butylated urea resin (brand name: UFR (registered trademark) 300, U-VAN10S60, U-VAN10R, U-VAN11HV), DIC Co., Ltd. (former Dai Nippon Inki Chemical Co., Ltd. )) Urea / formaldehyde-based resin (high-condensation type, brand name: Becamine (registered trademark) J-300S, copper P-955, copper N) and the like.
알콕시메틸화벤조구아나민의 구체예로는 테트라메톡시메틸벤조구아나민 등을 들 수 있다. 시판품으로서, 닛폰사이텍·인더스트리즈(주)(구 미쯔이사이텍(주))제(상품명: 사이멜(등록상표) 1123), (주)산와케미칼제(상품명: 니카락(등록상표) BX-4000, 동 BX-37, 동 BL-60, 동 BX-55H) 등을 들 수 있다.Tetramethoxymethylbenzoguanamine etc. are mentioned as a specific example of alkoxy methylation benzoguanamine. As a commercial product, manufactured by Nippon Scitech Industries (formerly Mitsui Scitech Co., Ltd.) (trade name: Cymel (registered trademark) 1123), Sanwa Chemical Co., Ltd. (trade name: Nikarak (registered trademark) BX-4000 , Copper BX-37, copper BL-60, copper BX-55H) and the like.
알콕시메틸화멜라민의 구체예로는, 예를 들어, 헥사메톡시메틸멜라민 등을 들 수 있다. 시판품으로서, 닛폰사이텍·인더스트리즈(주)(구 미쯔이사이텍(주))제 메톡시메틸타입 멜라민 화합물(상품명: 사이멜(등록상표) 300, 동 301, 동 303, 동 350), 부톡시메틸타입 멜라민 화합물(상품명: 마이코트(등록상표) 506, 동 508), (주)산와케미칼제 메톡시메틸타입 멜라민 화합물(상품명: 니카락(등록상표) MW-30, 동 MW-22, 동 MW-11, 동 MS-001, 동 MX-002, 동 MX-730, 동 MX-750, 동 MX-035), 부톡시메틸타입 멜라민 화합물(상품명: 니카락(등록상표) MX-45, 동 MX-410, 동 MX-302) 등을 들 수 있다.As a specific example of the alkoxy methylated melamine, hexamethoxy methyl melamine etc. are mentioned, for example. As a commercial product, a methoxymethyl type melamine compound (trade name: Cymel (registered trademark) 300, Copper 301, Copper 303, Copper 350), Butoxymethyl manufactured by Nippon Cytec Industries (formerly Mitsui Cytec Co., Ltd.) Type melamine compound (trade name: Mycoat (registered trademark) 506, copper 508), methoxymethyl type melamine compound made by Sanwa Chemical (trade name: Nikarac (registered trademark) MW-30, copper MW-22, copper MW) -11, copper MS-001, copper MX-002, copper MX-730, copper MX-750, copper MX-035), butoxymethyl type melamine compound (trade name: Nikarac (registered trademark) MX-45, copper MX -410, the same as MX-302).
또한, 이러한 아미노기의 수소원자가 메틸올기 또는 알콕시메틸기로 치환된 멜라민 화합물, 요소 화합물, 글리콜우릴 화합물 및 벤조구아나민 화합물을 축합시켜 얻어지는 화합물일 수도 있다. 예를 들어, 미국특허 제6323310호에 기재되어 있는 멜라민 화합물 및 벤조구아나민 화합물로 제조되는 고분자량의 화합물을 들 수 있다. 상기 멜라민 화합물의 시판품으로는, 상품명: 사이멜(등록상표) 303 등을 들 수 있고, 상기 벤조구아나민 화합물의 시판품으로는, 상품명: 사이멜(등록상표) 1123(이상, 닛폰사이텍·인더스트리즈(주)(구 미쯔이사이텍(주))제) 등을 들 수 있다.Further, the hydrogen atom of the amino group may be a compound obtained by condensation of a melamine compound, a urea compound, a glycoluril compound, and a benzoguanamine compound substituted with a methylol group or an alkoxymethyl group. For example, high molecular weight compounds prepared from melamine compounds and benzoguanamine compounds described in U.S. Pat. As a commercial item of the said melamine compound, a brand name: Cymel (trademark) 303 etc. are mentioned, As a commercial item of the said benzoguanamine compound, a brand name: Cymel (trademark) 1123 (above, Nippon Cytec Industries) Etc. (former Mitsui Cytec Co., Ltd. product) etc. are mentioned.
나아가, (B)성분의 가교제로서, N-하이드록시메틸아크릴아미드, N-메톡시메틸메타크릴아미드, N-에톡시메틸아크릴아미드, N-부톡시메틸메타크릴아미드 등의 하이드록시메틸기(즉 메틸올기) 또는 알콕시메틸기로 치환된 아크릴아미드 화합물 또는 메타크릴아미드 화합물을 사용하여 제조되는 폴리머도 이용할 수 있다.Furthermore, as the crosslinking agent of component (B), hydroxymethyl groups such as N-hydroxymethylacrylamide, N-methoxymethylmethacrylamide, N-ethoxymethylacrylamide, and N-butoxymethylmethacrylamide (i.e. Polymers prepared using acrylamide compounds or methacrylamide compounds substituted with methylol groups) or alkoxymethyl groups can also be used.
그러한 폴리머로는, 예를 들어, 폴리(N-부톡시메틸아크릴아미드), N-부톡시메틸아크릴아미드와 스티렌과의 공중합체, N-하이드록시메틸메타크릴아미드와 메틸메타크릴레이트와의 공중합체, N-에톡시메틸메타크릴아미드와 벤질메타크릴레이트와의 공중합체, 및 N-부톡시메틸아크릴아미드와 벤질메타크릴레이트와 2-하이드록시프로필메타크릴레이트와의 공중합체 등을 들 수 있다.Such polymers include, for example, poly (N-butoxymethylacrylamide), copolymers of N-butoxymethylacrylamide and styrene, and copolymers of N-hydroxymethylmethacrylamide and methylmethacrylate. Copolymers, copolymers of N-ethoxymethylmethacrylamide with benzyl methacrylate, and copolymers of N-butoxymethylacrylamide with benzylmethacrylate and 2-hydroxypropylmethacrylate. have.
또한, 그러한 폴리머로서, N-알콕시메틸기와 C=C이중결합을 포함하는 중합성기를 갖는 중합체를 이용할 수도 있다.Moreover, as such a polymer, a polymer having a polymerizable group containing an N-alkoxymethyl group and a C = C double bond can also be used.
C=C이중결합을 포함하는 중합성기로는, 아크릴기, 메타크릴기, 비닐기, 알릴기, 말레이미드기 등을 들 수 있다.As a polymerizable group containing a C = C double bond, an acryl group, a methacryl group, a vinyl group, an allyl group, a maleimide group, etc. are mentioned.
상기와 같은 폴리머를 얻는 방법은, 특별히 한정되지 않는다. 일 예를 들면, 미리 라디칼중합 등의 중합방법에 의해, 특정 관능기1을 갖는 아크릴 중합체를 생성한다. 이어서, 이 특정 관능기1과, 말단에 불포화결합을 갖는 화합물(이하, 특정 화합물이라 칭한다.)을 반응시킴으로써, (B)성분인 폴리머에 C=C이중결합을 포함하는 중합성기를 도입할 수 있다.The method for obtaining the polymer as described above is not particularly limited. For example, an acrylic polymer having a specific functional group 1 is produced by a polymerization method such as radical polymerization in advance. Subsequently, by reacting this specific functional group 1 with a compound having an unsaturated bond at the terminal (hereinafter referred to as a specific compound), a polymerizable group containing a C = C double bond can be introduced into the polymer (B) as a component. .
여기서, 특정 관능기1이란, 카르복실기, 글리시딜기, 하이드록시기, 활성수소를 갖는 아미노기, 페놀성 하이드록시기 혹은 이소시아네이트기 등의 관능기, 또는, 이들로부터 선택되는 복수종의 관능기를 말한다.Here, the specific functional group 1 refers to a functional group such as a carboxyl group, a glycidyl group, a hydroxyl group, an amino group having an active hydrogen, a phenolic hydroxyl group or an isocyanate group, or a plurality of functional groups selected from these.
상기 서술한 반응에 있어서, 특정 관능기1과, 특정 화합물이 갖는 관능기로서 반응에 관여하는 기의 바람직한 조합은, 카르복실기와 에폭시기, 하이드록시기와 이소시아네이트기, 페놀성 하이드록시기와 에폭시기, 카르복실기와 이소시아네이트기, 아미노기와 이소시아네이트기, 또는, 하이드록시기와 산클로라이드 등이다. 나아가, 보다 바람직한 조합은, 카르복실기와 글리시딜메타크릴레이트, 또는, 하이드록시기와 이소시아네이트에틸메타크릴레이트이다.In the above-mentioned reaction, a preferable combination of the specific functional group 1 and the group involved in the reaction as a functional group of the specific compound is a carboxyl group and an epoxy group, a hydroxyl group and an isocyanate group, a phenolic hydroxyl group and an epoxy group, a carboxyl group and an isocyanate group, Amino groups, isocyanate groups, hydroxy groups and acid chlorides. Furthermore, a more preferable combination is a carboxyl group and glycidyl methacrylate, or a hydroxy group and isocyanate ethyl methacrylate.
이러한 폴리머의 중량평균분자량(폴리스티렌환산값)은, 1,000~500,000이고, 바람직하게는, 2,000~200,000이고, 보다 바람직하게는 3,000~150,000이고, 더욱 바람직하게는 3,000~50,000이다.The weight average molecular weight of these polymers (polystyrene conversion value) is 1,000 to 500,000, preferably 2,000 to 200,000, more preferably 3,000 to 150,000, and even more preferably 3,000 to 50,000.
이들 가교제는, 단독으로 또는 2종 이상을 조합하여 사용할 수 있다.These crosslinking agents can be used alone or in combination of two or more.
본 발명의 경화막 형성 조성물에 있어서의 (B)성분의 가교제의 함유량은, (A)성분인 폴리머 100질량부에 기초하여 1질량부~500질량부인 것이 바람직하고, 보다 바람직하게는 5질량부~400질량부이다. 가교제의 함유량이 과소한 경우에는, 경화막 형성 조성물로부터 얻어지는 경화막의 용제내성이 저하되고, 액정배향성이 저하된다. 한편, 함유량이 과대한 경우에는 액정배향성 및 보존안정성이 저하되는 경우가 있다.The content of the crosslinking agent of the component (B) in the cured film-forming composition of the present invention is preferably 1 part by mass to 500 parts by mass, more preferably 5 parts by mass based on 100 parts by mass of the polymer as the component (A). It is ~ 400 parts by mass. When the content of the crosslinking agent is excessive, the solvent resistance of the cured film obtained from the cured film forming composition decreases, and the liquid crystal alignment property decreases. On the other hand, when the content is excessive, liquid crystal orientation and storage stability may be lowered.
<(C)성분><(C) component>
본 발명의 경화막 형성 조성물은, (C)성분으로서, 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기(이하, 특정 관능기2라고도 한다)를 갖는 폴리머를 함유할 수도 있다.The cured film forming composition of the present invention has, as component (C), at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group (hereinafter also referred to as a specific functional group 2). It may contain a polymer.
(C)성분인 폴리머로는, 예를 들어, 아크릴 중합체, 폴리아믹산, 폴리이미드, 폴리비닐알코올, 폴리에스테르, 폴리에스테르폴리카르본산, 폴리에테르폴리올, 폴리에스테르폴리올, 폴리카보네이트폴리올, 폴리카프로락톤폴리올, 폴리알킬렌이민, 폴리알릴아민, 셀룰로오스류(셀룰로오스 또는 그의 유도체), 페놀노볼락 수지, 멜라민포름알데히드 수지 등의 직쇄구조 또는 분지구조를 갖는 폴리머, 시클로덱스트린류 등의 환상폴리머 등을 들 수 있다.(C) As a component polymer, for example, acrylic polymer, polyamic acid, polyimide, polyvinyl alcohol, polyester, polyester polycarboxylic acid, polyether polyol, polyester polyol, polycarbonate polyol, polycaprolactone Polyols, polyalkyleneimines, polyallylamines, celluloses (cellulose or derivatives thereof), phenol novolac resins, melamine formaldehyde resins, etc., polymers having a straight-chain or branched structure, cyclic polymers such as cyclodextrins, etc. You can.
(C)성분인 폴리머로는, 바람직하게는, 아크릴 중합체, 하이드록시알킬시클로덱스트린류, 셀룰로오스류, 폴리에테르폴리올, 폴리에스테르폴리올, 폴리카보네이트폴리올그리고 폴리카프로락톤폴리올을 들 수 있다.(C) As a polymer which is a component, Preferably, acrylic polymer, hydroxyalkyl cyclodextrins, celluloses, polyether polyol, polyester polyol, polycarbonate polyol, and polycaprolactone polyol are mentioned.
(C)성분의 폴리머의 바람직한 일 예인 아크릴 중합체로는, 아크릴산, 메타크릴산, 스티렌, 비닐 화합물 등의 불포화이중결합을 갖는 모노머를 중합하여 얻어지는 중합체로서, 특정 관능기2를 갖는 모노머를 포함하는 모노머 또는 그의 혼합물을 중합시킴으로써 얻어지는 중합체이면 되며, 아크릴 중합체를 구성하는 고분자의 주쇄의 골격 및 측쇄의 종류 등에 대하여 특별히 한정되지 않는다.(C) The acrylic polymer which is a preferable example of the polymer of the component is a polymer obtained by polymerizing a monomer having an unsaturated double bond such as acrylic acid, methacrylic acid, styrene, or vinyl compound, and a monomer containing a monomer having a specific functional group 2 Or it may be a polymer obtained by polymerizing the mixture thereof, and the type of the backbone and side chains of the main chain of the polymer constituting the acrylic polymer is not particularly limited.
특정 관능기2를 갖는 모노머로는, 폴리에틸렌글리콜에스테르기를 갖는 모노머, 탄소원자수 2~5의 하이드록시알킬에스테르기를 갖는 모노머, 페놀성 하이드록시기를 갖는 모노머, 카르복실기를 갖는 모노머, 아미노기를 갖는 모노머, 알콕시실릴기 및 상기 식 2로 표시되는 기를 갖는 모노머를 들 수 있다.As a monomer having a specific functional group 2, a monomer having a polyethylene glycol ester group, a monomer having a hydroxyalkyl ester group having 2 to 5 carbon atoms, a monomer having a phenolic hydroxyl group, a monomer having a carboxyl group, a monomer having an amino group, alkoxysilyl And a monomer having a group and a group represented by Formula 2 above.
상기 서술한 폴리에틸렌글리콜에스테르기를 갖는 모노머로는, H-(OCH2CH2)n-OH의 모노아크릴레이트 또는 모노메타크릴레이트를 들 수 있다. 그 n의 값은 2~50이고, 바람직하게는 2~10이다.As a monomer which has the above-mentioned polyethylene glycol ester group, H- (OCH 2 CH 2 ) n-OH monoacrylate or monomethacrylate is mentioned. The value of n is 2 to 50, preferably 2 to 10.
상기 서술한 탄소원자수 2~5의 하이드록시알킬에스테르기를 갖는 모노머로는, 예를 들어, 2-하이드록시에틸메타크릴레이트, 2-하이드록시에틸아크릴레이트, 2-하이드록시프로필메타크릴레이트, 2-하이드록시프로필아크릴레이트, 4-하이드록시부틸아크릴레이트, 4-하이드록시부틸메타크릴레이트를 들 수 있다.As the monomer having a hydroxyalkyl ester group having 2 to 5 carbon atoms as described above, for example, 2-hydroxyethyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl methacrylate, 2 -Hydroxypropyl acrylate, 4-hydroxybutyl acrylate, and 4-hydroxybutyl methacrylate.
상기 서술한 페놀성 하이드록시기를 갖는 모노머로는, 예를 들어, p-하이드록시스티렌, m-하이드록시스티렌, o-하이드록시스티렌을 들 수 있다.As a monomer which has the phenolic hydroxyl group mentioned above, p-hydroxystyrene, m-hydroxystyrene, and o-hydroxystyrene are mentioned, for example.
상기 서술한 카르복실기를 갖는 모노머로는, 예를 들어, 아크릴산, 메타크릴산, 비닐안식향산을 들 수 있다.As a monomer which has the carboxyl group mentioned above, acrylic acid, methacrylic acid, and vinyl benzoic acid are mentioned, for example.
상기 서술한 아미노기를 측쇄에 갖는 모노머로는, 예를 들어, 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 아미노프로필아크릴레이트 및 아미노프로필메타크릴레이트를 들 수 있다.As a monomer which has the above-mentioned amino group in a side chain, 2-aminoethyl acrylate, 2-aminoethyl methacrylate, aminopropyl acrylate, and aminopropyl methacrylate are mentioned, for example.
상기 서술한 알콕시실릴기를 측쇄에 갖는 모노머로는, 예를 들어, 3-아크릴옥시프로필트리메톡시실란, 3-아크릴옥시프로필트리에톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 비닐트리메톡시실란, 비닐트리에톡시실란, 알릴트리메톡시실란 및 알릴트리에톡시실란 등을 들 수 있다.As a monomer which has the above-mentioned alkoxysilyl group in a side chain, 3-acryloxypropyl trimethoxysilane, 3-acryloxypropyl triethoxysilane, 3-methacryloxypropyl trimethoxysilane, 3- And methacryloxypropyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, and allyltriethoxysilane.
또한, 본 실시형태에 있어서는, (C)성분의 예인 아크릴 중합체를 합성할 때에, 본 발명의 효과를 손상시키지 않는 한, 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 표시되는 기 중 어느 것도 갖지 않는 모노머를 병용할 수 있다.Moreover, in this embodiment, when synthesize | combining the acrylic polymer which is an example of (C) component, among the groups represented by a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, unless the effect of this invention is impaired Monomers which do not have any can be used in combination.
그러한 모노머의 구체예로는, 아크릴산에스테르 화합물, 메타크릴산에스테르 화합물, 말레이미드 화합물, 아크릴로니트릴, 말레산무수물, 스티렌 화합물 및 비닐 화합물 등을 들 수 있다.Specific examples of such monomers include acrylic acid ester compounds, methacrylic acid ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, and vinyl compounds.
아크릴산에스테르 화합물로는, 예를 들어, 메틸아크릴레이트, 에틸아크릴레이트, 이소프로필아크릴레이트, 벤질아크릴레이트, 나프틸아크릴레이트, 안트릴아크릴레이트, 안트릴메틸아크릴레이트, 페닐아크릴레이트, 2,2,2-트리플루오로에틸아크릴레이트, tert-부틸아크릴레이트, 시클로헥실아크릴레이트, 이소보닐아크릴레이트, 2-메톡시에틸아크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 2-에톡시에틸아크릴레이트, 테트라하이드로푸르푸릴아크릴레이트, 3-메톡시부틸아크릴레이트, 2-메틸-2-아다만틸아크릴레이트, 2-프로필-2-아다만틸아크릴레이트, 8-메틸-8-트리시클로데실아크릴레이트, 및, 8-에틸-8-트리시클로데실아크릴레이트 등을 들 수 있다.Examples of the acrylic acid ester compound include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, and 2,2. , 2-trifluoroethyl acrylate, tert-butyl acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, Tetrahydrofurfurylacrylate, 3-methoxybutylacrylate, 2-methyl-2-adamantylacrylate, 2-propyl-2-adamantylacrylate, 8-methyl-8-tricyclodecylacrylate And, and 8-ethyl-8-tricyclodecylacrylate.
메타크릴산에스테르 화합물로는, 예를 들어, 메틸메타크릴레이트, 에틸메타크릴레이트, 이소프로필메타크릴레이트, 벤질메타크릴레이트, 나프틸메타크릴레이트, 안트릴메타크릴레이트, 안트릴메틸메타크릴레이트, 페닐메타크릴레이트, 2,2,2-트리플루오로에틸메타크릴레이트, tert-부틸메타크릴레이트, 시클로헥실메타크릴레이트, 이소보닐메타크릴레이트, 2-메톡시에틸메타크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 2-에톡시에틸메타크릴레이트, 테트라하이드로푸르푸릴메타크릴레이트, 3-메톡시부틸메타크릴레이트, 2-메틸-2-아다만틸메타크릴레이트, 2-프로필-2-아다만틸메타크릴레이트, 8-메틸-8-트리시클로데실메타크릴레이트, 및, 8-에틸-8-트리시클로데실메타크릴레이트 등을 들 수 있다.As a methacrylic acid ester compound, for example, methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate Rate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tert-butyl methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, 2-methoxyethyl methacrylate, meth Methoxytriethylene glycol methacrylate, 2-ethoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxybutyl methacrylate, 2-methyl-2-adamantyl methacrylate, 2-propyl -2-adamantyl methacrylate, 8-methyl-8-tricyclodecyl methacrylate, and 8-ethyl-8-tricyclodecyl methacrylate.
말레이미드 화합물로는, 예를 들어, 말레이미드, N-메틸말레이미드, N-페닐말레이미드, 및 N-시클로헥실말레이미드 등을 들 수 있다.Examples of maleimide compounds include maleimide, N-methylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide.
스티렌 화합물로는, 예를 들어, 스티렌, 메틸스티렌, 클로로스티렌, 브로모스티렌 등을 들 수 있다.As a styrene compound, styrene, methylstyrene, chlorostyrene, bromostyrene, etc. are mentioned, for example.
비닐 화합물로는, 예를 들어, 비닐에테르, 메틸비닐에테르, 벤질비닐에테르, 2-하이드록시에틸비닐에테르, 페닐비닐에테르, 및, 프로필비닐에테르 등을 들 수 있다.As a vinyl compound, vinyl ether, methyl vinyl ether, benzyl vinyl ether, 2-hydroxyethyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether etc. are mentioned, for example.
(C)성분의 예인 아크릴 중합체를 얻기 위해 이용하는 특정 관능기2를 갖는 모노머의 사용량은, (C)성분인 아크릴 중합체를 얻기 위해 이용하는 전체모노머의 합계량에 기초하여, 2몰% 이상인 것이 바람직하다. 특정 관능기2를 갖는 모노머가 2몰%보다 과소한 경우는, 얻어지는 경화막의 내용제성이 불충분해지기 쉽다.The amount of the monomer having a specific functional group 2 used to obtain the acrylic polymer as an example of the component (C) is preferably 2 mol% or more based on the total amount of the total monomers used to obtain the acrylic polymer as the component (C). When the monomer having the specific functional group 2 is less than 2 mol%, the solvent resistance of the resulting cured film tends to be insufficient.
(C)성분의 예인 아크릴 중합체를 얻는 방법은 특별히 한정되지 않으나, 예를 들어, 특정 관능기2를 갖는 모노머를 포함하는 모노머와, 필요에 따라 특정 관능기2를 갖지 않는 모노머와, 중합개시제 등을 공존시킨 용제 중에 있어서, 50℃~110℃의 온도하에서 중합반응에 의해 얻어진다. 그때, 이용되는 용제는, 특정 관능기2를 갖는 모노머와, 필요에 따라 이용되는 특정 관능기2를 갖지 않는 모노머 및 중합개시제 등을 용해하는 것이면 특별히 한정되지 않는다. 구체예로는, 후술하는 [용제]의 항에 기재한다.(C) The method of obtaining an acrylic polymer which is an example of a component is not particularly limited, but, for example, a monomer containing a monomer having a specific functional group 2, a monomer having no specific functional group 2, a polymerization initiator, and the like coexist, if necessary. In the solvent, the obtained solution is obtained by polymerization at a temperature of 50 ° C to 110 ° C. In that case, the solvent used is not particularly limited as long as it dissolves the monomer having a specific functional group 2, the monomer having no specific functional group 2 used as necessary, a polymerization initiator, or the like. As a specific example, it describes in the term of [solvent] mentioned later.
이상의 방법에 의해 얻어지는 (C)성분의 예인 아크릴 중합체는, 통상, 용제에 용해한 용액의 상태이다.The acrylic polymer which is an example of the component (C) obtained by the above method is usually in a state of a solution dissolved in a solvent.
또한, 상기 방법으로 얻어진 (C)성분의 예인 아크릴 중합체의 용액을, 교반하의 디에틸에테르나 물 등에 투입하여 재침전시키고, 생성된 침전물을 여과·세정한 후에, 상압 또는 감압하에서, 상온건조 또는 가열건조하고, (C)성분의 예인 아크릴 중합체의 분체로 할 수 있다. 상기 서술한 조작에 의해, (C)성분의 예인 아크릴 중합체와 공존하는 중합개시제 및 미반응의 모노머를 제거할 수 있고, 그 결과, 정제한 (C)성분의 예인 아크릴 중합체의 분체가 얻어진다. 한번의 조작으로 충분히 정제할 수 없는 경우는, 얻어진 분체를 용제에 재용해시키고, 상기 서술한 조작을 반복 행하면 된다.In addition, a solution of the acrylic polymer, which is an example of the component (C) obtained by the above method, is added to diethyl ether or water under stirring to reprecipitate, and the resulting precipitate is filtered and washed, then dried at room temperature under normal pressure or reduced pressure, or It is heat-dried and can be made into a powder of an acrylic polymer that is an example of the component (C). By the above-described operation, the polymerization initiator and unreacted monomer coexisting with the acrylic polymer as an example of the component (C) can be removed, and as a result, a powder of the acrylic polymer as the example of the purified component (C) is obtained. If it is not possible to sufficiently purify in one operation, the obtained powder may be redissolved in a solvent, and the above-described operation may be repeated.
(C)성분의 바람직한 예인 아크릴 중합체는, 중량평균분자량이 3000~200000인 것이 바람직하고, 4000~150000인 것이 보다 바람직하고, 5000~100000인 것이 더욱 바람직하다. 중량평균분자량이 200000을 초과하여 과대한 것이면, 용제에 대한 용해성이 저하되어 핸들링성이 저하되는 경우가 있고, 중량평균분자량이 3000 미만으로 과소한 것이면, 열경화시에 경화부족이 되어 용제내성이 저하되는 경우가 있다. 한편, 중량평균분자량은, 겔퍼미에이션크로마토그래피(GPC)에 의해, 표준자료로서 폴리스티렌을 이용하여 얻어지는 값이다. 이하, 본 명세서에 있어서도 동일하다.The acrylic polymer which is a preferable example of the component (C), preferably has a weight average molecular weight of 3000 to 200000, more preferably 4000 to 150000, and even more preferably 5000 to 100,000. If the weight average molecular weight is more than 200000, the solubility in the solvent may be lowered and the handling property may be deteriorated. If the weight average molecular weight is less than 3000, the solvent resistance becomes insufficient due to curing during thermal curing. It may fall. On the other hand, the weight average molecular weight is a value obtained by using polystyrene as standard data by gel permeation chromatography (GPC). Hereinafter, it is the same also in this specification.
다음에, (C)성분의 바람직한 일 예인 폴리에테르폴리올로는, 폴리에틸렌글리콜, 폴리프로필렌글리콜, 프로필렌글리콜이나 비스페놀A, 트리에틸렌글리콜, 소르비톨 등의 다가알코올에 프로필렌옥사이드나 폴리에틸렌글리콜, 폴리프로필렌글리콜 등을 부가한 것을 들 수 있다. 폴리에테르폴리올의 구체예로는 ADEKA제 아데카폴리에테르 P시리즈, G시리즈, EDP시리즈, BPX시리즈, FC시리즈, CM시리즈, 니찌유제 유니옥스(등록상표) HC-40, HC-60, ST-30E, ST-40E, G-450, G-750, 유니올 (등록상표) TG-330, TG-1000, TG-3000, TG-4000, HS-1600D, DA-400, DA-700, DB-400, 노니온(등록상표) LT-221, ST-221, OT-221 등을 들 수 있다.Next, polyether polyols, which are preferable examples of the component (C), include polypropylene glycol, polypropylene glycol, propylene glycol, bisphenol A, triethylene glycol, polyhydric alcohols such as sorbitol, propylene oxide, polyethylene glycol, and polypropylene glycol. And those added. As a specific example of the polyether polyol, Adeka polyether P series, G series, EDP series, BPX series, FC series, CM series made by ADEKA, Uniox (registered trademark) HC-40, HC-60, ST- manufactured by Nichiyu Co., Ltd. 30E, ST-40E, G-450, G-750, Uniol (registered trademark) TG-330, TG-1000, TG-3000, TG-4000, HS-1600D, DA-400, DA-700, DB- 400, Nonion (registered trademark) LT-221, ST-221, OT-221 and the like.
(C)성분의 바람직한 일 예인 폴리에스테르폴리올로는, 아디프산, 세바스산, 이소프탈산 등의 다가카르본산에 에틸렌글리콜, 프로필렌글리콜, 부틸렌글리콜, 폴리에틸렌글리콜, 폴리프로필렌글리콜 등의 디올을 반응시킨 것을 들 수 있다. 폴리에스테르폴리올의 구체예로는 DIC제 폴리라이트(등록상표) OD-X-286, OD-X-102, OD-X-355, OD-X-2330, OD-X-240, OD-X-668, OD-X-2108, OD-X-2376, OD-X-2044, OD-X-688, OD-X-2068, OD-X-2547, OD-X-2420, OD-X-2523, OD-X-2555, OD-X-2560, 쿠라레이제 폴리올P-510, P-1010, P-2010, P-3010, P-4010, P-5010, P-6010, F-510, F-1010, F-2010, F-3010, P-1011, P-2011, P-2013, P-2030, N-2010, PNNA-2016 등을 들 수 있다.As a preferred example of the component (C), polyols of ethylene glycol, propylene glycol, butylene glycol, polyethylene glycol, polypropylene glycol, etc. are reacted with polycarboxylic acids such as adipic acid, sebacic acid, and isophthalic acid. And what you ordered. As a specific example of the polyester polyol, DIC polylite (trademark) OD-X-286, OD-X-102, OD-X-355, OD-X-2330, OD-X-240, OD-X- 668, OD-X-2108, OD-X-2376, OD-X-2044, OD-X-688, OD-X-2068, OD-X-2547, OD-X-2420, OD-X-2523, OD-X-2555, OD-X-2560, Curaray polyol P-510, P-1010, P-2010, P-3010, P-4010, P-5010, P-6010, F-510, F- 1010, F-2010, F-3010, P-1011, P-2011, P-2013, P-2030, N-2010, PNNA-2016 and the like.
(C)성분의 바람직한 일 예인 폴리카프로락톤폴리올로는, 트리메틸올프로판이나 에틸렌글리콜 등의 다가알코올을 개시제로서 ε-카프로락톤을 개환중합시킨 것을 들 수 있다. 폴리카프로락톤폴리올의 구체예로는 DIC제 폴리라이트(등록상표) OD-X-2155, OD-X-640, OD-X-2568, 다이셀제 프락셀(등록상표) 205, L205AL, 205U, 208, 210, 212, L212AL, 220, 230, 240, 303, 305, 308, 312, 320 등을 들 수 있다.The polycaprolactone polyol which is a preferable example of the component (C) includes those obtained by ring-opening polymerization of ε-caprolactone as a polyhydric alcohol such as trimethylolpropane or ethylene glycol as an initiator. As specific examples of the polycaprolactone polyol, DIC-made polylite (trademark) OD-X-2155, OD-X-640, OD-X-2568, Daicel-proxel (trademark) 205, L205AL, 205U, 208, 210, 212, L212AL, 220, 230, 240, 303, 305, 308, 312, 320, and the like.
(C)성분의 바람직한 일 예인 폴리카보네이트폴리올로는, 트리메틸올프로판이나 에틸렌글리콜 등의 다가알코올과 탄산디에틸, 탄산디페닐, 에틸렌카보네이트 등을 반응시킨 것을 들 수 있다. 폴리카보네이트폴리올의 구체예로는 다이셀제 프락셀(등록상표) CD205, CD205PL, CD210, CD220, 쿠라레이제의 C-590, C-1050, C-2050, C-2090, C-3090 등을 들 수 있다.As a polycarbonate polyol which is a preferable example of the component (C), those obtained by reacting polyhydric alcohols such as trimethylolpropane and ethylene glycol with diethyl carbonate, diphenyl carbonate, and ethylene carbonate. Specific examples of the polycarbonate polyol include Proxel (trademark) CD205, CD205PL, CD210, CD220 manufactured by Daicel, C-590, C-1050, C-2050, C-2090, C-3090, etc. have.
(C)성분의 바람직한 일 예인 셀룰로오스류로는, 하이드록시에틸셀룰로오스, 하이드록시프로필셀룰로오스 등의 하이드록시알킬셀룰로오스류, 하이드록시에틸메틸셀룰로오스, 하이드록시프로필메틸셀룰로오스, 하이드록시에틸에틸셀룰로오스 등의 하이드록시알킬알킬셀룰로오스류 및 셀룰로오스 등을 들 수 있고, 예를 들어, 하이드록시에틸셀룰로오스, 하이드록시프로필셀룰로오스 등의 하이드록시알킬셀룰로오스류가 바람직하다.(C) As a preferable example of a component, celluloses, such as hydroxyethyl cellulose, hydroxypropyl cellulose, hydroxyalkyl celluloses, hydroxyethyl methyl cellulose, hydroxypropyl methyl cellulose, hydroxyethyl ethyl cellulose, etc. Hydroxyalkyl alkylcelluloses and celluloses, and the like, and for example, hydroxyalkylcelluloses such as hydroxyethylcellulose and hydroxypropylcellulose are preferred.
(C)성분의 바람직한 일 예인 시클로덱스트린류로는, α-시클로덱스트린, β-시클로덱스트린 및 γ-시클로덱스트린 등의 시클로덱스트린, 메틸-α-시클로덱스트린, 메틸-β-시클로덱스트린 그리고 메틸-γ-시클로덱스트린 등의 메틸화시클로덱스트린, 하이드록시메틸-α-시클로덱스트린, 하이드록시메틸-β-시클로덱스트린, 하이드록시메틸-γ-시클로덱스트린, 2-하이드록시에틸-α-시클로덱스트린, 2-하이드록시에틸-β-시클로덱스트린, 2-하이드록시에틸-γ-시클로덱스트린, 2-하이드록시프로필-α-시클로덱스트린, 2-하이드록시프로필-β-시클로덱스트린, 2-하이드록시프로필-γ-시클로덱스트린, 3-하이드록시프로필-α-시클로덱스트린, 3-하이드록시프로필-β-시클로덱스트린, 3-하이드록시프로필-γ-시클로덱스트린, 2,3-디하이드록시프로필-α-시클로덱스트린, 2,3-디하이드록시프로필-β-시클로덱스트린, 2,3-디하이드록시프로필-γ-시클로덱스트린 등의 하이드록시알킬시클로덱스트린 등을 들 수 있다.(C) Cyclodextrins, which are preferable examples of the components, include cyclodextrins such as α-cyclodextrin, β-cyclodextrin and γ-cyclodextrin, methyl-α-cyclodextrin, methyl-β-cyclodextrin and methyl-γ -Methylated cyclodextrins such as cyclodextrin, hydroxymethyl-α-cyclodextrin, hydroxymethyl-β-cyclodextrin, hydroxymethyl-γ-cyclodextrin, 2-hydroxyethyl-α-cyclodextrin, 2-hydroxy Hydroxyethyl-β-cyclodextrin, 2-hydroxyethyl-γ-cyclodextrin, 2-hydroxypropyl-α-cyclodextrin, 2-hydroxypropyl-β-cyclodextrin, 2-hydroxypropyl-γ-cyclo Dextrin, 3-hydroxypropyl-α-cyclodextrin, 3-hydroxypropyl-β-cyclodextrin, 3-hydroxypropyl-γ-cyclodextrin, 2,3-dihydroxypropyl-α-cyclodextrin, 2 , 3- Hydroxypropyl, and the like -β- cyclodextrin, 2,3-di-hydroxypropyl -γ- cycloalkyl hydroxyalkyl cyclodextrin, such as cyclodextrin.
(C)성분의 바람직한 일 예인 멜라민포름알데히드 수지로는, 멜라민과 포름알데히드를 중축합하여 얻어지는 수지를 들 수 있다.(C) As a preferable example of a component, a melamine formaldehyde resin is a resin obtained by polycondensing melamine and formaldehyde.
(C)성분의 멜라민포름알데히드 수지는, 보존안정성의 관점으로부터 멜라민과 포름알데히드의 중축합시에 생성된 메틸올기가 알킬화되어 있는 것이 바람직하다. (C)성분의 멜라민포름알데히드 수지로는, 예를 들어 하기 식으로 표시되는 단위구조를 갖는 수지를 들 수 있다.From the viewpoint of storage stability, it is preferable that the methylol group produced during polycondensation of melamine and formaldehyde is alkylated in the melamine formaldehyde resin of the component (C). (C) As a melamine formaldehyde resin of a component, the resin which has a unit structure represented by the following formula, for example is mentioned.
[화학식 6][Formula 6]
상기 식 중, R21은 수소원자 또는 탄소원자수 1~4의 알킬기를 나타내고, n은 반복단위의 수를 나타내는 자연수이다.In the above formula, R 21 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n is a natural number representing the number of repeating units.
(C)성분의 멜라민포름알데히드 수지를 얻는 방법은 특별히 한정되지는 않으나, 일반적으로 멜라민과 포름알데히드를 혼합하고, 탄산나트륨이나 암모니아 등을 이용하여 약알칼리성으로 한 후 60℃~100℃에서 가열함으로써 합성된다. 다시 알코올과 반응시킴으로서 메틸올기를 알콕시화할 수 있다.The method for obtaining the melamine formaldehyde resin of the component (C) is not particularly limited, but is generally synthesized by mixing melamine and formaldehyde, making it slightly alkaline using sodium carbonate or ammonia, and then heating at 60 ° C to 100 ° C. do. The methylol group can be alkoxylated by reacting with alcohol again.
(C)성분의 멜라민포름알데히드 수지는, 중량평균분자량이 250~5000인 것이 바람직하고, 300~4000인 것이 보다 바람직하고, 350~3500인 것이 더욱 바람직하다. 중량평균분자량이 5000을 초과하여 과대한 것이면, 용제에 대한 용해성이 저하되어 핸들링성이 저하되는 경우가 있고, 중량평균분자량이 250 미만으로 과소한 것이면, 열경화시에 경화부족이 되어 용제내성의 향상효과가 충분히 나타나지 않는 경우가 있다.The melamine formaldehyde resin of the component (C) preferably has a weight average molecular weight of 250 to 5000, more preferably 300 to 4000, and even more preferably 350 to 3500. If the weight average molecular weight is more than 5000, the solubility in the solvent may be lowered and the handling property may be lowered. If the weight average molecular weight is less than 250, the curing resistance is insufficient due to heat curing and solvent resistance In some cases, the improvement effect may not be sufficiently exhibited.
본 발명의 실시형태에 있어서는, (C)성분의 멜라민포름알데히드 수지는 액체형태로, 혹은 정제한 액체를 후술하는 용제에 재용해된 용액형태로 이용할 수도 있다.In the embodiment of the present invention, the melamine formaldehyde resin of the component (C) may be used in a liquid form or in a solution form in which the purified liquid is redissolved in a solvent described later.
(C)성분의 바람직한 일 예인 페놀노볼락 수지로는, 예를 들어, 페놀-포름알데히드 중축합물 등을 들 수 있다.(C) As a preferable example of a component, a phenol novolak resin, For example, a phenol-formaldehyde polycondensate etc. are mentioned.
본 실시형태의 경화막 형성 조성물에 있어서, (C)성분의 폴리머는, 분체형태로, 또는 정제한 분말을 후술하는 용제에 재용해된 용액형태로 이용할 수도 있다.In the cured film forming composition of the present embodiment, the polymer of the component (C) may be used in the form of a powder or in the form of a solution in which the purified powder is redissolved in a solvent described later.
또한, 본 실시의 형태의 경화막 형성 조성물에 있어서, (C)성분은, (C)성분으로서 예시된 폴리머의 복수종의 혼합물일 수도 있다.Moreover, in the cured film formation composition of this embodiment, (C) component may be a mixture of multiple types of polymers illustrated as (C) component.
본 발명의 경화막 형성 조성물에 있어서의 (C)성분을 함유시키는 경우의 함유량은, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해, 바람직하게는 400질량부 이하, 보다 바람직하게는 10질량부~380질량부, 더욱 바람직하게는 40질량부~360질량부이다. (C)성분의 함유량이 과대한 경우는 액정배향성이 저하되기 쉽다.The content in the case where the component (C) in the cured film-forming composition of the present invention is contained is preferably 400 parts by mass with respect to 100 parts by mass, which is the total amount of the crosslinking agent of the polymer (A) and the component (B). Hereinafter, it is more preferably 10 parts by mass to 380 parts by mass, and even more preferably 40 parts by mass to 360 parts by mass. When the content of the component (C) is excessive, the liquid crystal orientation tends to deteriorate.
<(D)성분><(D) Ingredient>
본 발명의 경화막 형성 조성물은, 상기 (A)성분 및 (B)성분에 더하여, 추가로 (D)성분으로서 가교촉매를 함유할 수 있다.The cured film forming composition of the present invention may further contain a crosslinking catalyst as the component (D) in addition to the components (A) and (B).
(D)성분인 가교촉매로는, 예를 들어, 산 또는 열산발생제를 호적하게 사용할 수 있다. 이 (D)성분은, 본 발명의 경화막 형성 조성물의 열경화반응을 촉진시키는 점에 있어서 유효하다.(D) As a crosslinking catalyst which is a component, an acid or a thermal acid generator can be used conveniently, for example. This (D) component is effective in accelerating the thermosetting reaction of the cured film forming composition of the present invention.
(D)성분은, 구체적으로는, 상기 산으로서 설폰산기함유 화합물, 염산 또는 그의 염을 들 수 있다. 그리고 상기 열산발생제로는, 가열처리시에 열분해하여 산을 발생하는 화합물, 즉 온도 80℃ 내지 250℃에서 열분해하여 산을 발생하는 화합물이면, 특별히 한정되는 것은 아니다.(D) As a component, the sulfonic acid group containing compound, hydrochloric acid, or its salt is specifically, mentioned as said acid. The thermal acid generator is not particularly limited as long as it is a compound that thermally decomposes during heat treatment to generate an acid, that is, a compound that thermally decomposes at a temperature of 80 ° C to 250 ° C to generate an acid.
상기 산의 구체예로는, 예를 들어, 염산 또는 그의 염; 메탄설폰산, 에탄설폰산, 프로판설폰산, 부탄설폰산, 펜탄설폰산, 옥탄설폰산, 벤젠설폰산, p-톨루엔설폰산, 캠퍼설폰산, 트리플루오로메탄설폰산, p-페놀설폰산, 2-나프탈렌설폰산, 메시틸렌설폰산, p-자일렌-2-설폰산, m-자일렌-2-설폰산, 4-에틸벤젠설폰산, 1H,1H,2H,2H-퍼플루오로옥탄설폰산, 퍼플루오로(2-에톡시에탄)설폰산, 펜타플루오로에탄설폰산, 노나플루오로부탄-1-설폰산, 도데실벤젠설폰산 등의 설폰산기함유 화합물 또는 그의 수화물이나 염 등을 들 수 있다.Specific examples of the acid include, for example, hydrochloric acid or a salt thereof; Methanesulfonic acid, ethanesulfonic acid, propanesulfonic acid, butanesulfonic acid, pentanesulfonic acid, octanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, camphorsulfonic acid, trifluoromethanesulfonic acid, p-phenolsulfonic acid , 2-naphthalenesulfonic acid, mesitylenesulfonic acid, p-xylene-2-sulfonic acid, m-xylene-2-sulfonic acid, 4-ethylbenzenesulfonic acid, 1H, 1H, 2H, 2H-perfluoro Sulfonic acid group-containing compounds such as octasulfonic acid, perfluoro (2-ethoxyethane) sulfonic acid, pentafluoroethanesulfonic acid, nonafluorobutane-1-sulfonic acid, dodecylbenzenesulfonic acid, or hydrates or salts thereof And the like.
또한 열에 의해 산을 발생하는 화합물로는, 예를 들어, 비스(토실옥시)에탄, 비스(토실옥시)프로판, 비스(토실옥시)부탄, p-니트로벤질토실레이트, o-니트로벤질토실레이트, 1,2,3-페닐렌트리스(메틸설포네이트), p-톨루엔설폰산피리디늄염, p-톨루엔설폰산몰포늄염, p-톨루엔설폰산에틸에스테르, p-톨루엔설폰산프로필에스테르, p-톨루엔설폰산부틸에스테르, p-톨루엔설폰산이소부틸에스테르, p-톨루엔설폰산메틸에스테르, p-톨루엔설폰산페네틸에스테르, 시아노메틸p-톨루엔설포네이트, 2,2,2-트리플루오로에틸p-톨루엔설포네이트, 2-하이드록시부틸p-톨루엔설포네이트, N-에틸-p-톨루엔설폰아미드, 나아가 하기 식으로 표시되는 화합물: Moreover, as a compound which generates an acid by heat, for example, bis (tosyloxy) ethane, bis (tosyloxy) propane, bis (tosyloxy) butane, p-nitrobenzyltosylate, o-nitrobenzyltosylate, 1,2,3-phenylenetris (methylsulfonate), p-toluenesulfonic acid pyridinium salt, p-toluenesulfonic acid morphonium salt, p-toluenesulfonic acid ethyl ester, p-toluenesulfonic acid propyl ester, p-toluene Butyl sulfonate ester, p-toluene sulfonate isobutyl ester, p-toluene sulfonate methyl ester, p-toluene sulfonate phenethyl ester, cyanomethyl p-toluene sulfonate, 2,2,2-trifluoroethyl p -Toluenesulfonate, 2-hydroxybutyl p-toluenesulfonate, N-ethyl-p-toluenesulfonamide, and further compounds represented by the following formula:
[화학식 7][Formula 7]
[화학식 8][Formula 8]
[화학식 9][Formula 9]
[화학식 10][Formula 10]
[화학식 11][Formula 11]
[화학식 12][Formula 12]
등을 들 수 있다.And the like.
본 발명의 경화막 형성 조성물에 있어서의 (D)성분의 함유량은, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해, 바람직하게는 0.01질량부~20질량부, 보다 바람직하게는 0.1질량부~15질량부, 더욱 바람직하게는 0.5질량부~10질량부이다. (D)성분의 함유량을 0.01질량부 이상으로 함으로써, 충분한 열경화성 및 용제내성을 부여할 수 있다. 그러나, 20질량부보다 많은 경우, 조성물의 보존안정성이 저하되는 경우가 있다.The content of the component (D) in the cured film-forming composition of the present invention is preferably 0.01 parts by mass to 20 parts by mass with respect to 100 parts by mass, which is the total amount of the crosslinking agent of the polymer (A) and the component (B). , More preferably, it is 0.1 to 15 parts by mass, and more preferably 0.5 to 10 parts by mass. (D) When content of a component is 0.01 mass part or more, sufficient thermosetting property and solvent resistance can be provided. However, when more than 20 parts by mass, the storage stability of the composition may be lowered.
<(E)성분><(E) component>
본 발명은 (E)성분으로서, 1개 이상의 중합성기와, 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기A 또는 이 기A와 반응하는 적어도 1개의 기를 갖는 화합물을 함유할 수도 있다. 이는, 형성되는 경화막의 접착성을 향상시키는 성분(이하, 밀착향상성분이라고도 한다.)으로서 작용한다.The present invention is a component (E), at least one group A selected from the group consisting of at least one polymerizable group, a hydroxyl group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or at least 1 that reacts with the group A It may also contain compounds having dog groups. This acts as a component that improves the adhesion of the cured film to be formed (hereinafter also referred to as an adhesion improving component).
(E)성분을 함유하는 본 실시형태의 경화막 형성 조성물로 형성되는 경화막을 배향재로서 이용하는 경우, 배향재와 중합성 액정의 층과의 밀착성이 향상되도록, 중합성 액정의 중합성 관능기와 배향재의 가교반응부위를 공유결합에 의해 링크시킬 수 있다. 그 결과, 본 실시형태의 배향재 상에 경화된 중합성 액정을 적층하여 이루어지는 본 실시형태의 위상차재는, 고온고질의 조건하에서도, 강한 밀착성을 유지할 수 있어, 박리 등에 대한 높은 내구성을 나타낼 수 있다.When using the cured film formed from the cured film forming composition of this embodiment containing the component (E) as an alignment material, the polymerizable functional group and alignment of the polymerizable liquid crystal are aligned so that the adhesion between the alignment material and the layer of the polymerizable liquid crystal is improved. The crosslinking site of the ash can be linked by covalent bonding. As a result, the retardation material of the present embodiment obtained by laminating the cured polymerizable liquid crystal on the alignment material of the present embodiment can maintain strong adhesion even under conditions of high temperature and high quality, and can exhibit high durability against peeling and the like. .
(E)성분으로는, 하이드록시기 및 N-알콕시메틸기로부터 선택되는 기와, 중합성기를 갖는 모노머 및 폴리머가 바람직하다.As the component (E), monomers and polymers having groups selected from hydroxy groups and N-alkoxymethyl groups and polymerizable groups are preferred.
이러한 (E)성분으로는, 하이드록시기와 (메트)아크릴기를 갖는 화합물, N-알콕시메틸기와 (메트)아크릴기를 갖는 화합물, N-알콕시메틸기와 (메트)아크릴기를 갖는 폴리머 등을 들 수 있다. 이하, 각각 구체예를 나타낸다.Examples of the component (E) include a compound having a hydroxy group and a (meth) acrylic group, a compound having an N-alkoxymethyl group and a (meth) acrylic group, a polymer having an N-alkoxymethyl group and a (meth) acrylic group, and the like. Hereinafter, specific examples are shown.
(E)성분의 일 예로서, 하이드록시기를 함유한 다관능아크릴레이트(이하, 하이드록시기함유 다관능아크릴레이트라고도 한다.)를 들 수 있다.(E) As an example of a component, the polyfunctional acrylate containing a hydroxyl group (Hereinafter, it is also called a hydroxy group containing polyfunctional acrylate.) Is mentioned.
(E)성분의 예인 하이드록시기함유 다관능아크릴레이트로는, 예를 들어, 펜타에리스리톨트리아크릴레이트 및 디펜타에리스리톨펜타아크릴레이트 등을 들 수 있다.(E) As a polyfunctional acrylate containing a hydroxyl group which is an example of a component, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, etc. are mentioned, for example.
(E)성분의 일 예로서, 1개의 아크릴기와, 1개 이상의 하이드록시기를 갖는 화합물도 들 수 있다. 이러한, 1개의 아크릴기와, 1개 이상의 하이드록시기를 갖는 화합물의 바람직한 예를 든다. 한편, (E)성분의 화합물은, 이하의 화합물 예로 한정되는 것은 아니다.(E) As an example of a component, the compound which has 1 acrylic group and 1 or more hydroxyl group is also mentioned. Preferred examples of such a compound having one acrylic group and one or more hydroxy groups are given. In addition, the compound of (E) component is not limited to the following compound example.
[화학식 13][Formula 13]
(상기 식 중, R11은 수소원자 또는 메틸기를 나타내고, m은 1~10의 정수를 나타낸다.)(In the formula, R 11 represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 10.)
또한, (E)성분의 화합물로는, 1분자 중에 C=C이중결합을 포함하는 중합성기를 적어도 1개와, N-알콕시메틸기를 적어도 1개 갖는 화합물을 들 수 있다.Moreover, as a compound of (E) component, the compound which has at least 1 polymerizable group containing a C = C double bond, and at least 1 N-alkoxymethyl group in 1 molecule is mentioned.
C=C이중결합을 포함하는 중합성기로는, 아크릴기, 메타크릴기, 비닐기, 알릴기, 말레이미드기 등을 들 수 있다.As a polymerizable group containing a C = C double bond, an acryl group, a methacryl group, a vinyl group, an allyl group, a maleimide group, etc. are mentioned.
N-알콕시메틸기의 N, 즉 질소원자로는, 아미드의 질소원자, 티오아미드의 질소원자, 우레아의 질소원자, 티오우레아의 질소원자, 우레탄의 질소원자, 함질소헤테로환의 질소원자의 인접위치에 결합된 질소원자 등을 들 수 있다. 따라서, N-알콕시메틸기로는, 아미드의 질소원자, 티오아미드의 질소원자, 우레아의 질소원자, 티오우레아의 질소원자, 우레탄의 질소원자, 함질소헤테로환의 질소원자의 인접위치에 결합된 질소원자 등으로부터 선택되는 질소원자에 알콕시메틸기가 결합된 구조를 들 수 있다.N, the nitrogen atom of the N-alkoxy methyl group, is bonded to the adjacent position of the nitrogen atom of the amide, the nitrogen atom of the thioamide, the nitrogen atom of the urea, the nitrogen atom of the thiourea, the nitrogen atom of the urethane, the nitrogen atom of the nitrogen-containing heterocycle Nitrogen atoms, and the like. Therefore, as the N-alkoxy methyl group, the nitrogen atom of the amide, the nitrogen atom of the thioamide, the nitrogen atom of the urea, the nitrogen atom of the thiourea, the nitrogen atom of the urethane, and the nitrogen atom bound to the nitrogen atom of the nitrogen-containing heterocyclic ring The structure which the alkoxy methyl group couple | bonded with the nitrogen atom selected from etc. is mentioned.
(E)성분으로는, 상기의 기를 갖는 것이면 되는데, 바람직하게는, 예를 들어 하기의 식(X1)로 표시되는 화합물을 들 수 있다.(E) As long as it has what has the said group as a component, Preferably, the compound represented by following formula (X1) is mentioned, for example.
[화학식 14][Formula 14]
(식 중, R31은 수소원자 또는 메틸기를 나타내고, R32는 수소원자, 혹은 직쇄 또는 분지의 탄소원자수 1 내지 10의 알킬기를 나타낸다)(Wherein, R 31 represents a hydrogen atom or a methyl group, R 32 represents a hydrogen atom, or a straight-chain or branched alkyl group having 1 to 10 carbon atoms)
상기 알킬기로는, 예를 들어, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, 이소부틸기, sec-부틸기, tert-부틸기, n-펜틸기, 1-메틸-n-부틸기, 2-메틸-n-부틸기, 3-메틸-n-부틸기, 1,1-디메틸-n-프로필기, 1,2-디메틸-n-프로필기, 2,2-디메틸-n-프로필기, 1-에틸-n-프로필기, n-헥실기, 1-메틸-n-펜틸기, 2-메틸-n-펜틸기, 3-메틸-n-펜틸기, 4-메틸-n-펜틸기, 1,1-디메틸-n-부틸기, 1,2-디메틸-n-부틸기, 1,3-디메틸-n-부틸기, 2,2-디메틸-n-부틸기, 2,3-디메틸-n-부틸기, 3,3-디메틸-n-부틸기, 1-에틸-n-부틸기, 2-에틸-n-부틸기, 1,1,2-트리메틸-n-프로필기, 1,2,2-트리메틸-n-프로필기, 1-에틸-1-메틸-n-프로필기, 1-에틸-2-메틸-n-프로필기, n-헵틸기, 1-메틸-n-헥실기, 2-메틸-n-헥실기, 3-메틸-n-헥실기, 1,1-디메틸-n-펜틸기, 1,2-디메틸-n-펜틸기, 1,3-디메틸-n-펜틸기, 2,2-디메틸-n-펜틸기, 2,3-디메틸-n-펜틸기, 3,3-디메틸-n-펜틸기, 1-에틸-n-펜틸기, 2-에틸-n-펜틸기, 3-에틸-n-펜틸기, 1-메틸-1-에틸-n-부틸기, 1-메틸-2-에틸-n-부틸기, 1-에틸-2-메틸-n-부틸기, 2-메틸-2-에틸-n-부틸기, 2-에틸-3-메틸-n-부틸기, n-옥틸기, 1-메틸-n-헵틸기, 2-메틸-n-헵틸기, 3-메틸-n-헵틸기, 1,1-디메틸-n-헥실기, 1,2-디메틸-n-헥실기, 1,3-디메틸-n-헥실기, 2,2-디메틸-n-헥실기, 2,3-디메틸-n-헥실기, 3,3-디메틸-n-헥실기, 1-에틸-n-헥실기, 2-에틸-n-헥실기, 3-에틸-n-헥실기, 1-메틸-1-에틸-n-펜틸기, 1-메틸-2-에틸-n-펜틸기, 1-메틸-3-에틸-n-펜틸기, 2-메틸-2-에틸-n-펜틸기, 2-메틸-3-에틸-n-펜틸기, 3-메틸-3-에틸-n-펜틸기, n-노닐기, n-데실기 등을 들 수 있다.As said alkyl group, For example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, 1-methyl- n-butyl group, 2-methyl-n-butyl group, 3-methyl-n-butyl group, 1,1-dimethyl-n-propyl group, 1,2-dimethyl-n-propyl group, 2,2-dimethyl -n-propyl group, 1-ethyl-n-propyl group, n-hexyl group, 1-methyl-n-pentyl group, 2-methyl-n-pentyl group, 3-methyl-n-pentyl group, 4-methyl -n-pentyl group, 1,1-dimethyl-n-butyl group, 1,2-dimethyl-n-butyl group, 1,3-dimethyl-n-butyl group, 2,2-dimethyl-n-butyl group, 2,3-dimethyl-n-butyl group, 3,3-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 2-ethyl-n-butyl group, 1,1,2-trimethyl-n- Propyl group, 1,2,2-trimethyl-n-propyl group, 1-ethyl-1-methyl-n-propyl group, 1-ethyl-2-methyl-n-propyl group, n-heptyl group, 1-methyl -n-hexyl group, 2-methyl-n-hexyl group, 3-methyl-n-hexyl group, 1,1-dimethyl-n-pentyl group, 1,2-dimethyl-n-pentyl group, 1,3- Dimethyl-n-pentyl group, 2,2-dimethyl-n-pentyl group, 2,3-dimethyl-n- Pentyl group, 3,3-dimethyl-n-pentyl group, 1-ethyl-n-pentyl group, 2-ethyl-n-pentyl group, 3-ethyl-n-pentyl group, 1-methyl-1-ethyl-n -Butyl group, 1-methyl-2-ethyl-n-butyl group, 1-ethyl-2-methyl-n-butyl group, 2-methyl-2-ethyl-n-butyl group, 2-ethyl-3-methyl -n-butyl group, n-octyl group, 1-methyl-n-heptyl group, 2-methyl-n-heptyl group, 3-methyl-n-heptyl group, 1,1-dimethyl-n-hexyl group, 1 , 2-dimethyl-n-hexyl group, 1,3-dimethyl-n-hexyl group, 2,2-dimethyl-n-hexyl group, 2,3-dimethyl-n-hexyl group, 3,3-dimethyl-n -Hexyl group, 1-ethyl-n-hexyl group, 2-ethyl-n-hexyl group, 3-ethyl-n-hexyl group, 1-methyl-1-ethyl-n-pentyl group, 1-methyl-2- Ethyl-n-pentyl group, 1-methyl-3-ethyl-n-pentyl group, 2-methyl-2-ethyl-n-pentyl group, 2-methyl-3-ethyl-n-pentyl group, 3-methyl- 3-ethyl-n-pentyl group, n-nonyl group, n-decyl group, etc. are mentioned.
상기 식(X1)로 표시되는 화합물의 구체예로는, N-하이드록시메틸(메트)아크릴아미드, N-메톡시메틸(메트)아크릴아미드, N-에톡시메틸(메트)아크릴아미드, N-부톡시메틸(메트)아크릴아미드 등의 하이드록시메틸기 또는 알콕시메틸기로 치환된 아크릴아미드 화합물 또는 메타크릴아미드 화합물을 들 수 있다. 한편 (메트)아크릴아미드란 메타크릴아미드와 아크릴아미드의 쌍방을 의미한다.Specific examples of the compound represented by the formula (X1) include N-hydroxymethyl (meth) acrylamide, N-methoxymethyl (meth) acrylamide, N-ethoxymethyl (meth) acrylamide, and N- And acrylamide compounds or methacrylamide compounds substituted with hydroxymethyl groups or alkoxymethyl groups such as butoxymethyl (meth) acrylamide. On the other hand, (meth) acrylamide means both methacrylamide and acrylamide.
(E)성분의 C=C이중결합을 포함하는 중합성기와 N-알콕시메틸기를 갖는 화합물의 다른 태양으로는, 바람직하게는, 예를 들어 하기의 식(X2)로 표시되는 화합물을 들 수 있다.(E) As another aspect of the compound which has a polymerizable group containing a C = C double bond of a component and an N-alkoxy methyl group, Preferably, the compound represented by following formula (X2) is mentioned. .
[화학식 15][Formula 15]
식 중, R51은 수소원자 또는 메틸기를 나타낸다.In the formula, R 51 represents a hydrogen atom or a methyl group.
R52는 탄소원자수 2 내지 20의 알킬기, 탄소원자수 5 내지 6의 1가의 지방족환기, 혹은 탄소원자수 5 내지 6의 지방족환을 포함하는 1가의 지방족기를 나타내고, 구조 중에 에테르결합을 포함하고 있을 수도 있다.R 52 represents an alkyl group having 2 to 20 carbon atoms, a monovalent aliphatic ring group having 5 to 6 carbon atoms, or a monovalent aliphatic group containing an aliphatic ring having 5 to 6 carbon atoms, and may contain an ether bond in the structure. .
R53은 직쇄 또는 분지쇄의 탄소원자수 2 내지 20의 알킬렌기, 탄소원자수 5 내지 6의 2가의 지방족환기, 혹은 탄소원자수 5 내지 6의 지방족환을 포함하는 2가의 지방족기를 나타내고, 구조 중에 에테르결합을 포함하고 있을 수도 있다.R 53 represents a linear or branched alkylene group having 2 to 20 carbon atoms, a divalent aliphatic ring group having 5 to 6 carbon atoms, or a divalent aliphatic group containing an aliphatic ring having 5 to 6 carbon atoms, and is an ether bond in the structure. It may contain.
R54는 직쇄 또는 분지쇄의 탄소원자수 1 내지 20의 2가 내지 9가의 지방족기, 탄소원자수 5 내지 6의 2가 내지 9가의 지방족환기, 혹은 탄소원자수 5 내지 6의 지방족환을 포함하는 2가 내지 9가의 지방족기를 나타내고, 이들 기 중 하나의 메틸렌기 또는 이웃하지 않는 복수의 메틸렌기가 에테르결합으로 치환되어 있을 수도 있다.R 54 is a straight or branched chain divalent to divalent to hexavalent aliphatic group having 1 to 20 carbon atoms, divalent to hexavalent aliphatic group having 5 to 6 carbon atoms, or divalent containing an aliphatic ring having 5 to 6 carbon atoms. It represents a 9-valent aliphatic group, and a methylene group of one of these groups or a plurality of non-adjacent methylene groups may be substituted with ether bonds.
Z는 >NCOO-, 또는 -OCON<(여기서 「-」는 결합손이 1개인 것을 나타낸다. 또한, 「>」「<」는 결합손이 2개인 것을 나타내고, 또한, 어느 1개의 결합손에 알콕시메틸기(즉 -OR52기)가 결합되어 있는 것을 나타낸다.)를 나타낸다.Z is> NCOO-, or -OCON <(where "-" indicates that there is one bonding hand. In addition, ">" and "<" indicates that there are two bonding hands, and alkoxy is added to any one bonding hand. Methyl group (that is, -OR52 group).
r은 2 이상 9 이하의 자연수이다.r is a natural number of 2 or more and 9 or less.
R53의 정의에 있어서의 탄소원자수 2 내지 20의 알킬렌기의 구체예로는, 탄소원자수 2 내지 20의 알킬기로부터, 추가로 1개의 수소원자를 제거한 2가의 기를 들 수 있다.As a specific example of the alkylene group having 2 to 20 carbon atoms in the definition of R 53 , a divalent group in which one hydrogen atom is further removed from an alkyl group having 2 to 20 carbon atoms is mentioned.
또한 R54의 정의에 있어서의 탄소원자수 1 내지 20의 2가 내지 9가의 지방족기의 구체예로는, 탄소원자수 1 내지 20의 알킬기로부터, 추가로 1 내지 8개의 수소원자를 제거한 2가 내지 9가의 기를 들 수 있다.Moreover, as a specific example of the divalent to 9-valent aliphatic group of 1 to 20 carbon atoms in the definition of R 54 , divalent to 9 of 1 to 8 hydrogen atoms further removed from an alkyl group of 1 to 20 carbon atoms. There is a false flag.
탄소원자수 1의 알킬기는 메틸기이고, 또한 탄소원자수 2 내지 20의 알킬기의 구체예로는, 에틸기, n-프로필기, i-프로필기, n-부틸기, i-부틸기, s-부틸기, t-부틸기, n-펜틸기, 1-메틸-n-부틸기, 2-메틸-n-부틸기, 3-메틸-n-부틸기, 1,1-디메틸-n-프로필기, n-헥실기, 1-메틸-n-펜틸기, 2-메틸-n-펜틸기, 1,1-디메틸-n-부틸기, 1-에틸-n-부틸기, 1,1,2-트리메틸-n-프로필기, n-헵틸기, n-옥틸기, n-노닐기, n-데실기, n-운데실기, n-도데실기, n-트리데실기, n-테트라데실기, n-펜타데실기, n-헥사데실기, n-헵타데실기, n-옥타데실기, n-노나데실기, n-에이코실기, 시클로펜틸기, 시클로헥실기, 그들 중 일종 또는 복수종이 탄소원자수 20까지의 범위에서 결합된 기와, 이들 기 중 하나의 메틸렌 또는 이웃하지 않는 복수의 메틸렌기가 에테르결합으로 치환된 기 등을 일 예로서 들 수 있다.The alkyl group having 1 carbon atom is a methyl group, and specific examples of the alkyl group having 2 to 20 carbon atoms include ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, and s-butyl group. t-butyl group, n-pentyl group, 1-methyl-n-butyl group, 2-methyl-n-butyl group, 3-methyl-n-butyl group, 1,1-dimethyl-n-propyl group, n- Hexyl group, 1-methyl-n-pentyl group, 2-methyl-n-pentyl group, 1,1-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 1,1,2-trimethyl-n -Propyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, n-tridecyl group, n-tetradecyl group, n-pentade Real group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecyl group, n-ecosyl group, cyclopentyl group, cyclohexyl group, one of them or up to 20 carbon atoms Examples include a group bonded in the range, a group in which methylene of one of these groups or a plurality of non-adjacent methylene groups are substituted with ether bonds.
이들 중, 탄소원자수 2 내지 10의 알킬렌기가 바람직하고, R53이 에틸렌기이고, R54가 헥실렌기인 것이 원료의 입수성 등의 점으로부터 특히 바람직하다.Of these, an alkylene group having 2 to 10 carbon atoms is preferable, R 53 is an ethylene group, and R 54 is a hexylene group, particularly preferably from the viewpoint of availability of raw materials.
R52의 정의에 있어서의 탄소원자수 1 내지 20의 알킬기의 구체예로는, R53의 정의에 있어서의 탄소원자수 2 내지 20의 알킬기의 구체예 및 메틸기를 들 수 있다. 이들 중, 탄소원자수 1 내지 6의 알킬기가 바람직하고, 메틸기, 에틸기, n-프로필기 또는 n-부틸기가 특히 바람직하다.Specific examples of the alkyl group having 1 to 20 carbon atoms in the definition of R 52 include specific examples of the alkyl group having 2 to 20 carbon atoms and the methyl group in the definition of R 53 . Among them, an alkyl group having 1 to 6 carbon atoms is preferable, and a methyl group, ethyl group, n-propyl group or n-butyl group is particularly preferable.
r로는, 2 이상 9 이하의 자연수를 들 수 있는데, 이 중에서도, 2 내지 6이 바람직하다.As r, a natural number of 2 or more and 9 or less may be mentioned, and 2 to 6 is preferable.
본 발명의 실시형태의 경화막 형성 조성물에 있어서의 (E)성분의 함유량은, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해, 바람직하게는 1질량부~100질량부이고, 더욱 바람직하게는 5질량부~70질량부이다. (E)성분의 함유량을 1질량부 이상으로 함으로써, 형성되는 경화막에 충분한 밀착성을 부여할 수 있다. 그러나, 100질량부보다 많은 경우, 액정배향성이 저하되기 쉽다.The content of the component (E) in the cured film forming composition of the embodiment of the present invention is preferably 1 part by mass to 100 parts by mass, which is the total amount of the crosslinking agent of the polymer (A) and the component (B) It is 100 parts by mass, and more preferably 5 parts by mass to 70 parts by mass. (E) When content of a component is 1 mass part or more, sufficient adhesiveness can be provided to the cured film formed. However, when it is more than 100 parts by mass, the liquid crystal orientation tends to deteriorate.
또한, 본 실시형태의 경화막 형성 조성물에 있어서, (E)성분은, (E)성분의 화합물의 복수종의 혼합물일 수도 있다.Moreover, in the cured film forming composition of this embodiment, (E) component may be a mixture of multiple types of the compound of (E) component.
<용제><Solvent>
본 발명의 경화막 형성 조성물은, 주로 용제에 용해한 용액상태로 이용된다. 그때에 사용하는 용제는, (A)성분, (B)성분 및 필요에 따라 (C)성분, (D)성분, (E)성분 및/또는 후술하는 기타 첨가제를 용해할 수 있으면 되고, 그 종류 및 구조 등은 특별히 한정되는 것이 아니다.The cured film forming composition of the present invention is mainly used in a solution state dissolved in a solvent. The solvent to be used at that time should be able to dissolve (A) component, (B) component and (C) component, (D) component, (E) component and / or other additives described later, if necessary. And the structure and the like are not particularly limited.
용제의 구체예로는, 예를 들어, 메탄올, 에탄올, n-프로판올, 이소프로판올, n-부탄올, 이소부탄올, 2-메틸-1-부탄올, n-펜탄올, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 디에틸렌글리콜, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 프로필렌글리콜, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜프로필에테르, 프로필렌글리콜프로필에테르아세테이트, 톨루엔, 자일렌, 메틸에틸케톤, 이소부틸메틸케톤, 시클로펜탄온, 시클로헥사논, 2-부탄온, 3-메틸-2-펜탄온, 2-펜탄온, 2-헵탄온, γ-부티로락톤, 2-하이드록시프로피온산에틸, 2-하이드록시-2-메틸프로피온산에틸, 에톡시아세트산에틸, 하이드록시아세트산에틸, 2-하이드록시-3-메틸부탄산메틸, 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 피루브산메틸, 피루브산에틸, 아세트산에틸, 아세트산부틸, 유산에틸, 유산부틸, 시클로펜틸메틸에테르, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, 및 N-메틸-2-피롤리돈 등을 들 수 있다.As a specific example of a solvent, for example, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, 2-methyl-1-butanol, n-pentanol, ethylene glycol monomethyl ether, ethylene glycol mono Ethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene Glycol monoethyl ether, propylene glycol propyl ether, propylene glycol propyl ether acetate, toluene, xylene, methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, 2-butanone, 3-methyl-2-pentane On, 2-pentanone, 2-heptanone, γ-butyrolactone, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl ethoxyacetate , Ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl pyruvate, pyruvate Ethyl, ethyl acetate, butyl acetate, ethyl lactate, butyl lactate, cyclopentyl methyl ether, N, N-dimethylformamide, N, N-dimethylacetamide, and N-methyl-2-pyrrolidone. .
본 발명의 경화막 형성 조성물을 이용하고, 수지필름 상에 경화막을 형성하여 배향재를 제조하는 경우는, 메탄올, 에탄올, n-프로판올, 이소프로판올, n-부탄올, 2-메틸-1-부탄올, 2-헵탄온, 이소부틸메틸케톤, 디에틸렌글리콜, 프로필렌글리콜, 프로필렌글리콜모노메틸에테르, 시클로펜틸메틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, 아세트산에틸, 아세트산부틸 등이, 수지필름이 내성을 나타내는 용제라는 점으로부터 바람직하다.In the case of using the cured film forming composition of the present invention and forming a cured film on a resin film to prepare an alignment material, methanol, ethanol, n-propanol, isopropanol, n-butanol, 2-methyl-1-butanol, 2 -Heptanone, isobutyl methyl ketone, diethylene glycol, propylene glycol, propylene glycol monomethyl ether, cyclopentyl methyl ether, propylene glycol monomethyl ether acetate, ethyl acetate, butyl acetate, etc. It is preferable from a point.
이들 용제는, 1종 단독으로 또는 2종 이상의 조합으로 사용할 수 있다.These solvents can be used alone or in combination of two or more.
<기타 첨가제><Other additives>
추가로, 본 발명의 경화막 형성 조성물은, 본 발명의 효과를 손상시키지 않는 한, 필요에 따라, 밀착향상제, 실란커플링제, 계면활성제, 레올로지조정제, 안료, 염료, 보존안정제, 소포제, 산화방지제 등을 함유할 수 있다.In addition, the cured film forming composition of the present invention, as long as the effects of the present invention are not impaired, adhesion enhancers, silane coupling agents, surfactants, rheology modifiers, pigments, dyes, preservative stabilizers, antifoaming agents, oxidation Antioxidants and the like.
<경화막 형성 조성물의 조제><Preparation of cured film forming composition>
본 발명의 경화막 형성 조성물은, (A)성분의 폴리머 및 (B)성분의 가교제를 함유하고, 필요에 따라 (C)성분의 폴리머, (D)성분의 가교촉매 및 (E)성분밀착촉진제, 그리고 추가로 본 발명의 효과를 손상시키지 않는 한 기타 첨가제를 함유할 수 있는 조성물이다. 그리고 통상은, 그들이 용제에 용해된 용액의 형태로서 이용된다.The cured film-forming composition of the present invention contains a polymer of component (A) and a crosslinking agent of component (B), a polymer of component (C), a crosslinking catalyst of component (D), and a component (E) adhesion promoter as necessary. And, it is a composition that may further contain other additives as long as the effects of the present invention are not impaired. And usually, they are used in the form of a solution dissolved in a solvent.
본 발명의 경화막 형성 조성물의 바람직한 예는, 이하와 같다.Preferred examples of the cured film forming composition of the present invention are as follows.
[1]: (A)성분, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분을 함유하는 경화막 형성 조성물.[1]: A cured film forming composition containing 1 part by mass to 500 parts by mass of the component (B) based on 100 parts by mass of the component (A) and (A).
[2]: (A)성분, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분, 그리고, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1~400질량부의 (C)성분을 함유하는 경화막 형성 조성물.[2]: The total amount of the crosslinking agent of the (B) component and the (A) component polymer and (B) component, based on 100 parts by mass of the (A) component and (A) component, Cured film forming composition containing 1-400 mass parts (C) component with respect to 100 mass parts.
[3]: (A)성분, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분, 그리고, 용제를 함유하는 경화막 형성 조성물.[3]: A cured film forming composition containing 1 part by mass to 500 parts by mass of (B) component and a solvent based on 100 parts by mass of component (A) and component (A).
[4]: (A)성분, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1~400질량부의 (C)성분, 그리고, 용제를 함유하는 경화막 형성 조성물.[4]: 100 parts by mass based on 100 parts by mass of (A) component and (A) component, and 1 part by mass to 500 parts by mass of (B) component, (A) component polymer, and (B) component total amount of crosslinking agent. Cured film forming composition containing 1-400 mass parts (C) component with respect to part, and a solvent.
[5]: (A)성분, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1~400질량부의 (C)성분, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 0.01질량부~20질량부의 (D)성분, 용제를 함유하는 경화막 형성 조성물.[5]: 100 parts by mass based on 100 parts by mass of (A) component and (A) component, and 1 part by mass to 500 parts by mass of (B) component, (A) component polymer, and (B) component total amount of crosslinking agent. 1 part to 400 parts by mass of (C) component, (A) component and (B) component containing 100 parts by mass of the total amount of the crosslinking agent, 0.01 parts by mass to 20 parts by mass of (D) component, containing a solvent Cured film forming composition.
[6]: (A)성분, (A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1~400질량부의 (C)성분, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 0.01질량부~20질량부의 (D)성분, (A)성분인 폴리머 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1질량부~100질량부의 (E)성분, 그리고, 용제를 함유하는 경화막 형성 조성물.[6]: 100 parts by mass based on 100 parts by mass of (A) component and (A) component, and 1 part by mass to 500 parts by mass of (B) component, (A) component polymer, and (B) component total amount of crosslinking agent. 1 part to 400 parts by mass of (C) component, (A) component, and (B) component to 100 parts by mass of the total amount of the crosslinking agent, 0.01 parts by mass to 20 parts by mass (D) component, (A) component The cured film forming composition containing 1 mass part-100 mass parts (E) component, and a solvent with respect to 100 mass parts which is the total amount of the crosslinking agent of a phosphorus polymer and (B) component.
본 발명의 경화막 형성 조성물을 용액으로서 이용하는 경우의 배합비율, 조제방법 등을 이하에 상세히 설명한다.When using the cured film forming composition of the present invention as a solution, the mixing ratio, preparation method, and the like will be described in detail below.
본 발명의 경화막 형성 조성물에 있어서의 고형분의 비율은, 각 성분이 균일하게 용제에 용해되어 있는 한, 특별히 한정되는 것은 아니나, 1질량%~60질량%이고, 바람직하게는 2질량%~50질량%이고, 보다 바람직하게는 2질량%~20질량%이다. 여기서, 고형분이란, 경화막 형성 조성물의 전체성분에서 용제를 제외한 것을 말한다.The ratio of the solid content in the cured film-forming composition of the present invention is not particularly limited as long as each component is uniformly dissolved in a solvent, but is 1% by mass to 60% by mass, preferably 2% by mass to 50% It is mass%, More preferably, it is 2 mass%-20 mass%. Here, solid content means the thing remove | excluding the solvent from the whole component of the cured film formation composition.
본 발명의 경화막 형성 조성물의 조제방법은, 특별히 한정되지 않는다. 조제법으로는, 예를 들어, 용제에 용해한 (A)성분의 용액에 (B)성분, 더 나아가서는 (C)성분, (D)성분, (E)성분 등을 소정의 비율로 혼합하고, 균일한 용액으로 하는 방법, 혹은, 이 조제법의 적당한 단계에 있어서, 필요에 따라 기타 첨가제를 추가로 첨가하여 혼합하는 방법을 들 수 있다.The method for preparing the cured film-forming composition of the present invention is not particularly limited. As a preparation method, for example, (B) component, furthermore (C) component, (D) component, (E) component, etc. are mixed in the solution of (A) component melt | dissolved in the solvent at a predetermined ratio, and uniform The method of making it into one solution, or in the appropriate step of this preparation method, the method of adding and mixing other additives as needed is mentioned.
본 발명의 경화막 형성 조성물의 조제에 있어서는, 용제 중의 중합반응에 의해 얻어지는 특정 공중합체(폴리머)의 용액을 그대로 사용할 수 있다. 이 경우, 예를 들어, (A)성분의 용액에 상기와 동일하게 (B)성분, 더 나아가서는 (C)성분, (D)성분, (E)성분 등을 넣어 균일한 용액으로 한다. 이때에, 농도 조정을 목적으로 더 용제를 추가투입할 수도 있다. 이때, (A)성분의 생성과정에서 이용되는 용제와, 경화막 형성 조성물의 농도 조정에 이용되는 용제는 동일할 수도 있고, 또한 상이할 수도 있다.In the preparation of the cured film forming composition of the present invention, a solution of a specific copolymer (polymer) obtained by polymerization in a solvent can be used as it is. In this case, for example, (B) component, furthermore (C) component, (D) component, (E) component, etc. are added to the solution of component (A) as described above to obtain a uniform solution. At this time, further solvent may be added for the purpose of adjusting the concentration. At this time, the solvent used in the process of producing the component (A) and the solvent used for adjusting the concentration of the cured film forming composition may be the same or may be different.
또한, 조제된 경화막 형성 조성물의 용액은, 구멍직경이 0.2μm 정도의 필터 등을 이용하여 여과한 후, 사용하는 것이 바람직하다.Moreover, it is preferable to use the solution of the prepared cured film forming composition after filtering using a filter or the like having a pore diameter of about 0.2 µm.
<경화막, 배향재 및 위상차재><Cured film, alignment material and retardation material>
본 발명의 경화막 형성 조성물의 용액을 기판(예를 들어, 실리콘/이산화실리콘 피복기판, 실리콘나이트라이드기판, 금속, 예를 들어, 알루미늄, 몰리브덴, 크롬 등이 피복된 기판, 유리기판, 석영기판, ITO기판 등)이나 필름기판(예를 들어, 트리아세틸셀룰로오스(TAC)필름, 폴리카보네이트(PC)필름, 시클로올레핀폴리머(COP)필름, 시클로올레핀코폴리머(COC)필름, 폴리에틸렌테레프탈레이트(PET)필름, 아크릴필름, 폴리에틸렌필름 등의 수지필름) 등의 상에, 바코트, 회전도포, 흘림도포, 롤도포, 슬릿도포, 슬릿에 이은 회전도포, 잉크젯도포, 인쇄 등에 의해 도포하여 도막을 형성하고, 그 후, 핫플레이트 또는 오븐 등에서 가열건조함으로써, 경화막을 형성할 수 있다. 이 경화막은 그대로 배향재로서 적용할 수 있다.The solution of the cured film forming composition of the present invention is a substrate (for example, a silicon / silicon dioxide coated substrate, a silicon nitride substrate, a metal, for example, a substrate coated with aluminum, molybdenum, chromium, glass substrate, quartz substrate) , ITO substrate, etc.) or film substrate (for example, triacetyl cellulose (TAC) film, polycarbonate (PC) film, cycloolefin polymer (COP) film, cycloolefin copolymer (COC) film, polyethylene terephthalate (PET) ) Film, acrylic film, resin film such as polyethylene film), etc., coated with bar coat, rotating coating, spill coating, roll coating, slit coating, slit rotating coating, inkjet coating, printing, etc. to form a coating film Then, by heating and drying in a hot plate or an oven, a cured film can be formed. This cured film can be applied as an alignment material as it is.
가열건조의 조건으로는, 경화막(배향재)의 성분이, 그 위에 도포되는 중합성 액정용액에 용출되지 않을 정도로, 가교제에 의한 가교반응이 진행되면 되고, 예를 들어, 온도 60℃~200℃, 시간 0.4분간~60분간의 범위 중에서 적당히 선택된 가열온도 및 가열시간이 채용된다. 가열온도 및 가열시간은, 바람직하게는 70℃~160℃, 0.5분간~10분간이다.Under the conditions of heating and drying, the crosslinking reaction by a crosslinking agent may be carried out so that the components of the cured film (orientation material) do not elute in the polymerizable liquid crystal solution applied thereon, for example, the temperature is 60 ° C to 200 A heating temperature and a heating time suitably selected from the range of ℃ and time from 0.4 minutes to 60 minutes are employed. The heating temperature and the heating time are preferably 70 ° C to 160 ° C and 0.5 minutes to 10 minutes.
본 발명의 경화성 조성물을 이용하여 형성되는 경화막(배향재)의 막두께는, 예를 들어, 0.05μm~5μm이고, 사용하는 기판의 단차나 광학적, 전기적 성질을 고려하여 적당히 선택할 수 있다.The film thickness of the cured film (orientation material) formed using the curable composition of the present invention is, for example, 0.05 μm to 5 μm, and can be appropriately selected in consideration of the step difference, optical, and electrical properties of the substrate to be used.
본 발명의 경화막 조성물로 형성된 배향재는 내용제성 및 내열성을 갖고 있으므로, 이 배향재 상에, 수직배향성을 갖는 중합성 액정용액 등의 위상차재료를 도포하고, 배향재 상에서 배향시킬 수 있다. 그리고, 배향상태가 된 위상차재료를 그대로 경화시킴으로써, 광학이방성을 갖는 층으로서 위상차재를 형성할 수 있다. 그리고, 배향재를 형성하는 기판이 필름인 경우에는, 위상차필름으로서 유용해진다.Since the alignment material formed from the cured film composition of the present invention has solvent resistance and heat resistance, a retardation material such as a polymerizable liquid crystal solution having vertical orientation can be coated on the alignment material and aligned on the alignment material. Then, the retardation material in the aligned state can be cured as it is to form a retardation material as a layer having optical anisotropy. In addition, when the substrate forming the alignment material is a film, it is useful as a retardation film.
또한, 상기와 같이 하여 형성된, 본 발명의 배향재를 갖는 2매의 기판을 이용하고, 스페이서를 개재하여 양 기판 상의 배향재가 서로 마주하도록 맞붙인 후, 이들 기판 사이에 액정을 주입하여, 액정이 배향된 액정표시소자로 할 수도 있다.Further, using two substrates having the alignment material of the present invention formed as described above, and interposing spacers to align the alignment materials on both substrates via spacers, and then injecting liquid crystal between these substrates, thereby liquid crystal It can also be set as an oriented liquid crystal display element.
이렇게 본 발명의 경화막 형성 조성물은, 각종 위상차재(위상차필름)나 액정표시소자 등의 제조에 호적하게 이용할 수 있다.In this way, the cured film forming composition of the present invention can be suitably used for the production of various phase difference materials (phase difference films), liquid crystal display devices, and the like.
실시예Example
이하, 본 발명의 실시예를 들어, 본 발명을 구체적으로 설명하나, 본 발명은 이것들로 한정하여 해석되는 것은 아니다.Hereinafter, the present invention will be specifically described with reference to examples of the present invention, but the present invention is not limited to these.
[실시예에서 이용하는 약 기호][Medicine symbol used in Examples]
이하의 실시예에서 이용하는 약 기호의 의미는, 다음과 같다.The meaning of the weak symbol used in the following examples is as follows.
<원료><Raw material>
GMA: 글리시딜메타크릴레이트GMA: glycidyl methacrylate
AIBN: α,α’-아조비스이소부티로니트릴AIBN: α, α’-azobisisobutyronitrile
BMAA: N-부톡시메틸아크릴아미드BMAA: N-butoxymethylacrylamide
MMA: 메타크릴산메틸MMA: methyl methacrylate
HEMA: 2-하이드록시에틸메타크릴레이트HEMA: 2-hydroxyethyl methacrylate
<중합성기를 갖는 계피산 화합물><Cinnamic acid compound having a polymerizable group>
CIN1: 4-(6-메타크릴옥시헥실-1-옥시)계피산CIN1: 4- (6-methacryloxyhexyl-1-oxy) cinnamic acid
[화학식 16][Formula 16]
CIN2: 4-(3-메타크릴옥시프로필-1-옥시)계피산CIN2: 4- (3-methacryloxypropyl-1-oxy) cinnamic acid
[화학식 17][Formula 17]
CIN3: 4-(6-아크릴옥시헥실-1-옥시)계피산CIN3: 4- (6-acryloxyhexyl-1-oxy) cinnamic acid
[화학식 18][Formula 18]
<중합성기를 갖지 않는 계피산 화합물><Cinnamic acid compound not having a polymerizable group>
CIN4: 4-메톡시계피산CIN4: 4-methoxy cinnamic acid
[화학식 19][Formula 19]
<B성분><Component B>
HMM: 하기의 구조식으로 표시되는 멜라민가교제[사이멜(CYMEL)(등록상표) 303(미쯔이사이텍(주)제)]HMM: Melamine crosslinking agent represented by the following structural formula [CYMEL (registered trademark) 303 (Mitsui Cytec Co., Ltd.)]
[화학식 20][Formula 20]
<D성분><D ingredient>
PTSA: p-톨루엔설폰산·일수화물PTSA: p-toluene sulfonic acid monohydrate
<E성분><E component>
E-1: 하기의 구조식으로 표시되는 N-알콕시메틸기 및 아크릴기를 갖는 화합물E-1: Compound having an N-alkoxymethyl group and an acrylic group represented by the following structural formula
[화학식 21][Formula 21]
<용제><Solvent>
실시예 및 비교예의 각 수지 조성물은 용제를 함유하고, 그 용제로서, 프로필렌글리콜모노메틸에테르(PM)를 이용하였다.Each resin composition of Examples and Comparative Examples contained a solvent, and propylene glycol monomethyl ether (PM) was used as the solvent.
<중합체의 분자량의 측정><Measurement of molecular weight of polymer>
중합예에 있어서의 아크릴 공중합체의 분자량은, (주)Shodex사제 상온 겔침투 크로마토그래피(GPC)장치(GPC-101), Shodex사제 컬럼(KD-803, KD-805)을 이용하고 이하와 같이 하여 측정하였다.The molecular weight of the acrylic copolymer in the polymerization example is a room temperature gel permeation chromatography (GPC) apparatus (GPC-101) manufactured by Shodex Co., Ltd., and a column (KD-803, KD-805) manufactured by Shodex. Was measured.
한편, 하기의 수평균분자량(이하, Mn이라 칭한다.) 및 중량평균분자량(이하, Mw라 칭한다.)은, 폴리스티렌환산값으로 나타내었다.On the other hand, the following number average molecular weight (hereinafter referred to as Mn) and weight average molecular weight (hereinafter referred to as Mw) are represented by polystyrene conversion values.
컬럼온도: 40℃Column temperature: 40 ℃
용리액: 테트라하이드로푸란Eluent: Tetrahydrofuran
유속: 1.0mL/분Flow rate: 1.0 mL / min
검량선작성용 표준샘플: 쇼와덴코사제 표준폴리스티렌(분자량 약 197,000, 55,100, 12,800, 3,950, 1,260, 580).Standard sample for calibration calibration: Standard polystyrene manufactured by Showa Denko Corporation (molecular weights about 197,000, 55,100, 12,800, 3,950, 1,260, 580).
<A성분의 합성><Synthesis of component A>
<중합예 1> <Polymerization Example 1>
GMA 15.0g, 중합촉매로서 AIBN 0.5g을 테트라하이드로푸란 46.4g에 용해하고, 가열환류하에서 20시간 반응시킴으로써 아크릴 중합체용액을 얻었다. 얻어진 아크릴 공중합체용액을 헥산 500.0g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 에폭시기를 갖는 아크릴 중합체(P1)를 얻었다. 얻어진 아크릴 중합체의 Mn은 25,000, Mw는 10,000이었다.Acrylic polymer solution was obtained by dissolving 15.0 g of GMA and 0.5 g of AIBN as a polymerization catalyst in 46.4 g of tetrahydrofuran and reacting for 20 hours under reflux under heating. The obtained acrylic copolymer solution was slowly added dropwise to 500.0 g of hexane to precipitate a solid, followed by filtration and drying under reduced pressure to obtain an acrylic polymer (P1) having an epoxy group. Mn of the obtained acrylic polymer was 25,000 and Mw was 10,000.
<합성예 1><Synthesis Example 1>
중합예 1에서 얻은 에폭시기를 갖는 아크릴 중합체(P1) 5.2g, CIN1 12.0g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.1g, 중합금지제로서 디부틸하이드록시톨루엔 0.2g을 PM 70.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 1000g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-1)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.Dissolve the acrylic polymer (P1) having the epoxy group obtained in the polymerization example 1 (P1) 5.2 g, CIN1 12.0 g, 0.1 g ethyl triphenylphosphonium bromide as a reaction catalyst, and 0.2 g dibutylhydroxytoluene as a polymerization inhibitor in PM 70.0 g , And reacted at 100 ° C for 20 hours. This solution was slowly added dropwise to 1000 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-1). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<합성예 2><Synthesis Example 2>
중합예 1에서 얻은 에폭시기를 갖는 아크릴 중합체(P1) 5.2g, CIN2 11.0g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.1g, 중합금지제로서 디부틸하이드록시톨루엔 0.2g을 PM 70.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 1000g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-2)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.The acrylic polymer (P1) having the epoxy group obtained in the polymerization example 1, 5.2g, CIN2 11.0g, ethyltriphenylphosphonium bromide 0.1g as a reaction catalyst, and 0.2g dibutylhydroxytoluene as a polymerization inhibitor were dissolved in PM 70.0g. , And reacted at 100 ° C for 20 hours. This solution was slowly added dropwise to 1000 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-2). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<합성예 3><Synthesis Example 3>
중합예 1에서 얻은 에폭시기를 갖는 아크릴 중합체(P1) 5.2g, CIN3 12.0g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.1g, 중합금지제로서 디부틸하이드록시톨루엔 0.2g을 PM 70.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 1000g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-3)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.Dissolve the acrylic polymer (P1) having the epoxy group obtained in the polymerization example 1 (P1) 5.2 g, CIN3 12.0 g, 0.1 g of ethyl triphenylphosphonium bromide as a reaction catalyst, and 0.2 g of dibutylhydroxytoluene as a polymerization inhibitor in PM 70.0 g. , And reacted at 100 ° C for 20 hours. The solution was slowly added dropwise to 1000 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-3). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<합성예 4><Synthesis Example 4>
페놀노볼락형 에폭시 수지 N-775(DIC(주)제 EPICLON시리즈) 5.7g, CIN1 11.0g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.2g, 중합금지제로서 디부틸하이드록시톨루엔 0.2g을 PM 40.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 500g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-4)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.Phenolic novolac-type epoxy resin N-775 (DIC Corporation EPICLON series) 5.7g, CIN1 11.0g, reaction catalyst ethyl triphenylphosphonium bromide 0.2g, polymerization inhibitor dibutylhydroxytoluene 0.2g PM It was dissolved in 40.0 g and reacted at 100 ° C for 20 hours. This solution was slowly added dropwise to 500 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-4). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<합성예 5><Synthesis Example 5>
중합예 1에서 얻은 에폭시기를 갖는 아크릴 중합체(P1) 5.2g, CIN1 10.0g, CIN4 2.0g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.1g, 중합금지제로서 디부틸하이드록시톨루엔 0.2g을 PM 70.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 1000g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-5)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.Acrylic polymer (P1) having an epoxy group obtained in polymerization example 1 5.2g, CIN1 10.0g, CIN4 2.0g, ethyl triphenylphosphonium bromide 0.1g as a reaction catalyst, 0.2g dibutylhydroxytoluene as a polymerization inhibitor PM 70.0 It was dissolved in g and reacted at 100 ° C for 20 hours. The solution was slowly added dropwise to 1000 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-5). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<합성예 6><Synthesis Example 6>
중합예 1에서 얻은 에폭시기를 갖는 아크릴 중합체(P1) 5.2g, CIN4 6.5g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.1g을 PM 48.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 500g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-6)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.Acrylic polymer (P1) having an epoxy group obtained in Polymerization Example 1 (P1) 5.2g, CIN4 6.5g, ethyl triphenylphosphonium bromide 0.1g as a reaction catalyst was dissolved in PM 48.0g, and reacted at 100 ℃ for 20 hours. This solution was slowly added dropwise to 500 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-6). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<합성예 7><Synthesis Example 7>
페놀노볼락형 에폭시 수지 N-775(DIC(주)제 EPICLON시리즈) 5.3g, CIN4 5.0g, 반응촉매로서 에틸트리페닐포스포늄브로마이드 0.2g을 PM 25.0g에 용해시키고, 100℃에서 20시간 반응시켰다. 이 용액을 디에틸에테르 500g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PA-7)를 얻었다. 얻어진 중합체의 에폭시가를 측정하고, 에폭시기가 소실된 것을 확인하였다.Phenolic novolac-type epoxy resin N-775 (DIC Corporation EPICLON series) 5.3g, CIN4 5.0g, ethyltriphenylphosphonium bromide 0.2g as a reaction catalyst was dissolved in PM 25.0g and reacted at 100 ° C for 20 hours Ordered. This solution was slowly added dropwise to 500 g of diethyl ether to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PA-7). The epoxy value of the obtained polymer was measured, and it was confirmed that the epoxy group disappeared.
<B성분의 합성><Synthesis of B component>
<중합예 2><Polymerization Example 2>
BMAA 100.0g, 중합촉매로서 AIBN 4.2g을 PM 193.5g에 용해하고, 90℃에서 20시간 반응시킴으로써 아크릴 중합체용액을 얻었다. 얻어진 아크릴 중합체의 Mn은 2,700, Mw는 3,900이었다. 아크릴 중합체용액을 헥산 2000.0g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써, 중합체(PB-1)를 얻었다.100.0 g of BMAA and 4.2 g of AIBN as a polymerization catalyst were dissolved in 193.5 g of PM and reacted at 90 ° C for 20 hours to obtain an acrylic polymer solution. Mn of the obtained acrylic polymer was 2,700 and Mw was 3,900. The acrylic polymer solution was slowly added dropwise to 2000.0 g of hexane to precipitate a solid, followed by filtration and drying under reduced pressure to obtain a polymer (PB-1).
<C성분의 합성><Synthesis of C component>
<중합예 3><Polymerization Example 3>
MMA 30.0g, HEMA 3.0g, 중합촉매로서 AIBN 0.3g을 PM 146.0g에 용해하고, 80℃에서 20시간 반응시킴으로써 아크릴 공중합체용액을 얻었다. 아크릴 공중합체용액을 헥산 1000.0g에 서서히 적하하여 고체를 석출시키고, 여과 및 감압건조함으로써 아크릴 공중합체(PC-1)를 얻었다. 얻어진 아크릴 공중합체의 Mn은 18,000, Mw는 32,800이었다.An acrylic copolymer solution was obtained by dissolving 30.0 g of MMA, 3.0 g of HEMA, and 0.3 g of AIBN as a polymerization catalyst in 146.0 g of PM and reacting at 80 ° C for 20 hours. The acrylic copolymer solution was slowly added dropwise to 1000.0 g of hexane to precipitate a solid, and the acrylic copolymer (PC-1) was obtained by filtration and drying under reduced pressure. Mn of the obtained acrylic copolymer was 18,000, and Mw was 32,800.
<실시예, 비교예><Example, Comparative Example>
표 1에 나타내는 조성으로 실시예 및 비교예의 각 경화막 형성 조성물을 조제하였다. 다음에, 각 위상차재 형성 조성물을 이용하여 경화막을 형성하고, 얻어진 경화막 각각에 대하여, 배향성 및 밀착성의 평가를 행하였다.The cured film forming compositions of Examples and Comparative Examples were prepared with the compositions shown in Table 1. Next, a cured film was formed using each retardation-forming composition, and the orientation and adhesion were evaluated for each of the obtained cured films.
[표 1][Table 1]
[배향성의 평가][Evaluation of orientation]
실시예 및 비교예의 각 경화막 형성 조성물을, 오존처리를 실시한 COP필름 상에 바코터를 이용하여 Wet막두께 4μm로 도포하였다. 각각 온도 110℃에서 60초간, 열순환식 오븐 중에서 가열건조를 행하고, COP필름 상에 각각 경화막을 형성하였다. 이 각 경화막에 313nm의 직선편광을 10mJ/cm2의 노광량으로 수직으로 조사하여, 배향재를 형성하였다. COP필름 상의 배향재의 위에, 머크주식회사제의 수평배향용 중합성 액정용액 RMS03-013C를, 바코터를 이용하여 Wet막두께 6μm로 도포하였다. 이 도막을 300mJ/cm2로 노광하여, 위상차재를 제작하였다. 제작한 기판 상의 위상차재를 한쌍의 편광판으로 끼워넣고, 위상차재에 있어서의 위상차특성의 발현상황을 관찰하여, 위상차가 결함없이 발현하고 있는 것을 ○, 위상차가 발현하고 있지 않은 것을 ×로 하여 「배향성」의 란에 기재하였다. 평가결과는, 뒤에 표 2에 정리하여 나타낸다.Each cured film forming composition of Examples and Comparative Examples was coated on a COP film subjected to ozone treatment to a Wet film thickness of 4 μm using a bar coater. Each was heated and dried in a thermal cycle oven at a temperature of 110 ° C. for 60 seconds, and cured films were respectively formed on the COP film. Each of the cured films was irradiated vertically with a linear polarization of 313 nm at an exposure amount of 10 mJ / cm 2 to form an alignment material. On the alignment material on the COP film, a polymerizable liquid crystal solution RMS03-013C for horizontal alignment manufactured by Merck Co., Ltd. was coated with a Wet film thickness of 6 μm using a bar coater. This coating film was exposed at 300 mJ / cm 2 to prepare a phase difference material. The phase difference material on the produced substrate was sandwiched by a pair of polarizing plates, and the state of expression of the phase difference characteristics in the phase difference material was observed, and the phase difference was expressed without defects. ”Column. The evaluation results are summarized in Table 2 later.
[밀착성의 평가][Evaluation of adhesion]
실시예 및 비교예의 각 경화막 형성 조성물을, 오존처리를 실시한 COP필름 상에 바코터를 이용하여 Wet막두께 4μm로 도포하였다. 각각 온도 110℃에서 60초간, 열순환식 오븐 중에서 가열건조를 행하고, COP필름 상에 각각 경화막을 형성하였다. 이 각 경화막에 313nm의 직선편광을 10mJ/cm2의 노광량으로 수직으로 조사하여, 배향재를 형성하였다. COP필름 상의 배향재의 위에, 머크주식회사제의 수평배향용 중합성 액정용액 RMS03-013C를, 바코터를 이용하여 Wet막두께 6μm로 도포하였다. 이 도막을 300mJ/cm2로 노광하여, 위상차재를 제작하였다. 이 위상차재에 가로세로 1mm 간격으로 10×10칸이 되도록 커터나이프로 칼집을 넣었다. 이 칼집의 위에 스카치테이프를 이용하여 셀로판테이프 박리시험을 행하였다. 평가결과는 「밀착성」으로 하고, 100칸 모두 벗겨지지 않고 남아있는 것을 ○, 1칸이라도 벗겨져 있는 것을 ×로 하였다. 평가결과는, 뒤에 표 2에 정리하여 나타낸다.Each cured film forming composition of Examples and Comparative Examples was coated on a COP film subjected to ozone treatment to a Wet film thickness of 4 μm using a bar coater. Each was heated and dried in a thermal cycle oven at a temperature of 110 ° C. for 60 seconds, and cured films were respectively formed on the COP film. Each of the cured films was irradiated vertically with a linear polarization of 313 nm at an exposure amount of 10 mJ / cm 2 to form an alignment material. On the alignment material on the COP film, a polymerizable liquid crystal solution RMS03-013C for horizontal alignment manufactured by Merck Co., Ltd. was coated with a Wet film thickness of 6 μm using a bar coater. This coating film was exposed at 300 mJ / cm 2 to prepare a phase difference material. A sheath was placed in the phase difference material with a cutter knife so as to be 10 × 10 squares with a width of 1 mm. A cellophane tape peeling test was conducted on the sheath using scotch tape. The evaluation result was set to "adhesiveness", and those that remained without peeling off all 100 spaces were designated as ○ and those that were peeled off even at one space were set to x. The evaluation results are summarized in Table 2 later.
[표 2][Table 2]
표 2에 나타내는 바와 같이, 실시예의 경화막 형성 조성물을 이용하여 얻어진 배향재는, 양호한 배향성과 밀착성을 나타내었다.As shown in Table 2, the alignment material obtained using the cured film-forming composition of Examples showed good alignment and adhesion.
이에 반해, 비교예의 경화막 형성 조성물을 이용하여 얻어진 배향재는, 양호한 배향성은 나타내었으나, 밀착성이 얻어지지 않았다.On the other hand, although the orientation material obtained using the cured film formation composition of a comparative example showed favorable orientation property, adhesiveness was not obtained.
산업상 이용가능성Industrial availability
본 발명에 따른 경화막 형성 조성물은, 액정표시소자의 액정배향막이나, 액정표시소자에 내부나 외부에 마련되는 광학이방성 필름을 형성하기 위한 배향재를 형성하는 재료로서 매우 유용하며, 특히, IPS-LCD나 유기 EL디스플레이의 반사방지막으로서 사용되는 원편광판의 위상차재용 재료로서 호적하다.The cured film forming composition according to the present invention is very useful as a material for forming an alignment material for forming an optically anisotropic film provided inside or outside a liquid crystal alignment film of a liquid crystal display device or a liquid crystal display device. It is suitable as a material for retardation of a circular polarizing plate used as an antireflection film for LCDs or organic EL displays.
Claims (14)
상기 중합성 이중결합을 포함하는 기가, (메트)아크릴로일기인 경화막 형성 조성물.According to claim 1,
The group containing the polymerizable double bond is a (meth) acryloyl group cured film forming composition.
상기 중합성 이중결합을 포함하는 기를 갖는 계피산 유도체가, 하기 식(1)로 표시되는 화합물인, 경화막 형성 조성물.
[화학식 1]
식(1) 중, A1과 A2는 각각 독립적으로, 수소원자 또는 메틸기를 나타내고,
R1은 하기 식(c-2)
[화학식 2]
(식(c-2) 중, 파선은 결합손을 나타내고, R101은 탄소수 1~30의 알킬렌기를 나타내고, 이 알킬렌기 중 1개 혹은 복수의 수소원자는, 불소원자 또는 유기기로 치환되어 있을 수도 있다. 또한, R101 중의 -CH2CH2-는 -CH=CH-로 치환되어 있을 수도 있고, 나아가, 다음에 드는 어느 하나의 기가 서로 이웃하지 않는 경우에 있어서, -O-, -NHCO-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH- 및 -CO-로 이루어지는 군으로부터 선택되는 기로 치환되어 있을 수도 있고, M1은 수소원자 또는 메틸기를 나타낸다.)로 표시되는 기를 나타내고,
R2는 2가의 방향족기, 2가의 지환족기, 2가의 복소환식기 또는 2가의 축합환식기를 나타내고,
R3은 단결합, 산소원자, -COO-, -OCO-, -CH=CHCOO- 또는 -OCOCH=CH-를 나타내고,
R4~R7은 각각 독립적으로 수소원자, 할로겐원자, 탄소수 1~6의 알킬기, 탄소수 1~6의 할로알킬기, 탄소수 1~6의 알콕시기, 탄소수 1~6의 할로알콕시기, 시아노기, 및 니트로기로 이루어지는 군으로부터 선택되는 치환기를 나타내고,
또한, R2, R3 및 R4 또는 R2, R3 및 R6은 하나가 되어 방향족기를 형성할 수도 있고,
n은 0~3의 정수이다.)The method according to claim 1 or 2,
The cinnamic acid derivative having a group containing a polymerizable double bond is a compound represented by the following formula (1), a cured film forming composition.
[Formula 1]
In Formula (1), A 1 and A 2 each independently represent a hydrogen atom or a methyl group,
R 1 is the following formula (c-2)
[Formula 2]
(In the formula (c-2), the broken line represents a bond, R 101 represents an alkylene group having 1 to 30 carbon atoms, and one or more hydrogen atoms in the alkylene group may be substituted with a fluorine atom or an organic group. Further, -CH 2 CH 2 -in R 101 may be substituted with -CH = CH-, and further, when any one of the following groups is not adjacent to each other, -O-, -NHCO It may be substituted with a group selected from the group consisting of-, -CONH-, -COO-, -OCO-, -NH-, -NHCONH- and -CO-, and M 1 represents a hydrogen atom or a methyl group.) Represents the displayed group,
R 2 represents a divalent aromatic group, a divalent alicyclic group, a divalent heterocyclic group, or a divalent condensed cyclic group,
R 3 represents a single bond, an oxygen atom, -COO-, -OCO-, -CH = CHCOO- or -OCOCH = CH-,
R 4 to R 7 are each independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a cyano group, And a substituent selected from the group consisting of nitro groups,
Further, R 2 , R 3 and R 4 or R 2 , R 3 and R 6 may be united to form an aromatic group,
n is an integer from 0 to 3.)
(B)성분의 가교제가 메틸올기 또는 알콕시메틸기를 갖는 가교제인, 경화막 형성 조성물.The method according to any one of claims 1 to 3,
(B) The cured film formation composition whose crosslinking agent of a component is a crosslinking agent which has a methylol group or an alkoxymethyl group.
(C)하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기를 갖는 폴리머를 추가로 함유하는 경화막 형성 조성물.The method according to any one of claims 1 to 4,
(C) A cured film forming composition further comprising a polymer having at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group.
(D)가교촉매를 추가로 함유하는 경화막 형성 조성물.The method according to any one of claims 1 to 5,
(D) Cured film forming composition further containing a crosslinking catalyst.
(E)1개 이상의 중합성기와, 하이드록시기, 카르복실기, 아미드기, 아미노기, 및 알콕시실릴기로 이루어지는 군으로부터 선택되는 적어도 1개의 기A 또는 이 기A와 반응하는 적어도 1개의 기를 갖는 화합물을 함유하는 경화막 형성 조성물.The method according to any one of claims 1 to 6,
(E) Contains a compound having at least one polymer A, at least one group A selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, and an alkoxysilyl group, or at least one group reacting with the group A Cured film forming composition.
(A)성분 100질량부에 기초하여, 1질량부~500질량부의 (B)성분을 함유하는 경화막 형성 조성물.The method according to any one of claims 1 to 7,
(A) The cured film formation composition containing 1 mass part-500 mass parts (B) component based on 100 mass parts of components.
(A)성분 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1질량부~400질량부의 (C)성분을 함유하는 경화막 형성 조성물.The method according to any one of claims 5 to 8,
The cured film formation composition containing 1 mass part-400 mass parts (C) component with respect to 100 mass parts which is the total amount of the crosslinking agent of (A) component and (B) component.
(A)성분 및 (B)성분의 가교제의 합계량인 100질량부에 대해 0.01질량부~20질량부의 (D)성분을 함유하는 경화막 형성 조성물.The method according to any one of claims 6 to 9,
The cured film formation composition containing 0.01 mass part-20 mass parts (D) component with respect to 100 mass parts which is the total amount of the crosslinking agent of (A) component and (B) component.
(A)성분 및 (B)성분의 가교제의 합계량인 100질량부에 대해 1질량부~100질량부의 (E)성분을 함유하는 경화막 형성 조성물.The method according to any one of claims 7 to 10,
The cured film formation composition containing 1 mass part-100 mass parts (E) component with respect to 100 mass parts which is the total amount of the crosslinking agent of (A) component and (B) component.
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