KR20190112278A - 가공 매체, 가공 조성물 및 가공 방법 - Google Patents

가공 매체, 가공 조성물 및 가공 방법 Download PDF

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Publication number
KR20190112278A
KR20190112278A KR1020197023178A KR20197023178A KR20190112278A KR 20190112278 A KR20190112278 A KR 20190112278A KR 1020197023178 A KR1020197023178 A KR 1020197023178A KR 20197023178 A KR20197023178 A KR 20197023178A KR 20190112278 A KR20190112278 A KR 20190112278A
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KR
South Korea
Prior art keywords
acid
processing
weight
processing medium
less
Prior art date
Application number
KR1020197023178A
Other languages
English (en)
Korean (ko)
Inventor
신야 타카나시
케이스케 아이타
카츠라 타카하시
Original Assignee
팰리스 카가쿠 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 팰리스 카가쿠 가부시기가이샤 filed Critical 팰리스 카가쿠 가부시기가이샤
Publication of KR20190112278A publication Critical patent/KR20190112278A/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M173/00—Lubricating compositions containing more than 10% water
    • C10M173/02—Lubricating compositions containing more than 10% water not containing mineral or fatty oils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M129/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing oxygen
    • C10M129/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing oxygen having a carbon chain of less than 30 atoms
    • C10M129/26—Carboxylic acids; Salts thereof
    • C10M129/28—Carboxylic acids; Salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M129/30—Carboxylic acids; Salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having 7 or less carbon atoms
    • C10M129/32—Carboxylic acids; Salts thereof having carboxyl groups bound to acyclic or cycloaliphatic carbon atoms having 7 or less carbon atoms monocarboxylic
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M129/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing oxygen
    • C10M129/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing oxygen having a carbon chain of less than 30 atoms
    • C10M129/26—Carboxylic acids; Salts thereof
    • C10M129/48—Carboxylic acids; Salts thereof having carboxyl groups bound to a carbon atom of a six-membered aromatic ring
    • C10M129/52—Carboxylic acids; Salts thereof having carboxyl groups bound to a carbon atom of a six-membered aromatic ring polycarboxylic
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M133/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen
    • C10M133/02—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing nitrogen having a carbon chain of less than 30 atoms
    • C10M133/04—Amines, e.g. polyalkylene polyamines; Quaternary amines
    • C10M133/06—Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M133/08—Amines, e.g. polyalkylene polyamines; Quaternary amines having amino groups bound to acyclic or cycloaliphatic carbon atoms containing hydroxy groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020197023178A 2017-01-27 2018-01-24 가공 매체, 가공 조성물 및 가공 방법 KR20190112278A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017013617 2017-01-27
JPJP-P-2017-013617 2017-01-27
PCT/JP2018/002150 WO2018139492A1 (fr) 2017-01-27 2018-01-24 Milieu de traitement, composition de traitement et procédé de traitement

Publications (1)

Publication Number Publication Date
KR20190112278A true KR20190112278A (ko) 2019-10-04

Family

ID=62979354

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197023178A KR20190112278A (ko) 2017-01-27 2018-01-24 가공 매체, 가공 조성물 및 가공 방법

Country Status (5)

Country Link
JP (1) JP6661175B2 (fr)
KR (1) KR20190112278A (fr)
CN (1) CN110382655B (fr)
TW (1) TWI757413B (fr)
WO (1) WO2018139492A1 (fr)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS502175A (fr) 1973-05-15 1975-01-10
JPS6443598A (en) 1987-08-12 1989-02-15 Yushiro Chem Ind Water-soluble cutting oil
JPH07145491A (ja) 1993-11-24 1995-06-06 Chiyoda Chem Kk 水溶性金属防食剤
WO2004042812A1 (fr) 2002-11-08 2004-05-21 Fujimi Incorporated Compositions de polissage et de rinçage
JP2005347737A (ja) 2004-05-07 2005-12-15 Nissan Chem Ind Ltd シリコンウェハー用研磨組成物
WO2006046641A1 (fr) 2004-10-28 2006-05-04 Nissan Chemical Industries, Ltd. Composition de polissage pour plaque de silicium
WO2006126432A1 (fr) 2005-05-27 2006-11-30 Nissan Chemical Industries, Ltd. Composition de polissage pour tranche de silicium

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS529871B2 (fr) * 1973-01-22 1977-03-18
JPH1022241A (ja) * 1996-07-08 1998-01-23 Tokyo Fine Chem Kk シリコンウェハ用ラップ液およびラップ剤
JP2005285944A (ja) * 2004-03-29 2005-10-13 Hitachi Chem Co Ltd 金属用研磨液及び研磨方法
JP5317436B2 (ja) * 2007-06-26 2013-10-16 富士フイルム株式会社 金属用研磨液及びそれを用いた研磨方法
US20140011362A1 (en) * 2012-07-06 2014-01-09 Basf Se Chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and an aromatic compound comprising at least one acid group
CN103555410B (zh) * 2013-11-21 2014-11-12 广州粤晖金属机械防护技术有限公司 一种汽车连杆用水基防锈磨削冷却液及其制备方法和用途

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS502175A (fr) 1973-05-15 1975-01-10
JPS6443598A (en) 1987-08-12 1989-02-15 Yushiro Chem Ind Water-soluble cutting oil
JPH07145491A (ja) 1993-11-24 1995-06-06 Chiyoda Chem Kk 水溶性金属防食剤
WO2004042812A1 (fr) 2002-11-08 2004-05-21 Fujimi Incorporated Compositions de polissage et de rinçage
JP2014082509A (ja) 2002-11-08 2014-05-08 Fujimi Inc 研磨用組成物
JP2005347737A (ja) 2004-05-07 2005-12-15 Nissan Chem Ind Ltd シリコンウェハー用研磨組成物
WO2006046641A1 (fr) 2004-10-28 2006-05-04 Nissan Chemical Industries, Ltd. Composition de polissage pour plaque de silicium
WO2006126432A1 (fr) 2005-05-27 2006-11-30 Nissan Chemical Industries, Ltd. Composition de polissage pour tranche de silicium

Also Published As

Publication number Publication date
WO2018139492A1 (fr) 2018-08-02
JPWO2018139492A1 (ja) 2019-11-21
TW201833291A (zh) 2018-09-16
CN110382655B (zh) 2021-05-11
TWI757413B (zh) 2022-03-11
JP6661175B2 (ja) 2020-03-11
CN110382655A (zh) 2019-10-25

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