KR20190092514A - Photo Lewis Acid Generator - Google Patents

Photo Lewis Acid Generator Download PDF

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KR20190092514A
KR20190092514A KR1020197019652A KR20197019652A KR20190092514A KR 20190092514 A KR20190092514 A KR 20190092514A KR 1020197019652 A KR1020197019652 A KR 1020197019652A KR 20197019652 A KR20197019652 A KR 20197019652A KR 20190092514 A KR20190092514 A KR 20190092514A
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compound
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pentafluorophenyl
borate
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도모아키 다나카
사토시 이시다
도시후미 니시다
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가부시키가이샤 닛폰 쇼쿠바이
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Abstract

종래의 광산 발생제와는 달리, 광에 의해 루이스산을 발생할 수 있는 화합물을 제공한다. 화합물을, 붕소를 중심 원자로 하는 아니온부와, 특정한 카티온부 (예를 들어, HOMO-LUMO 간의 갭이 5.3 eV 이하인 카티온) 로 구성한다. 카티온부는, 예를 들어, N-치환 피리디늄 골격, N-치환 비피리디늄 골격, N-치환 퀴놀리늄, 및 피릴륨 골격에서 선택된 골격을 가지고 있어도 된다.Unlike conventional photoacid generators, compounds that can generate Lewis acids by light are provided. The compound is composed of an anion moiety containing boron as a center atom and a specific cation moiety (eg, cation whose gap between HOMO-LUMO is 5.3 eV or less). The cation moiety may have a skeleton selected from, for example, an N-substituted pyridinium skeleton, an N-substituted bipyridinium skeleton, an N-substituted quinolinium skeleton, and a pyryllium skeleton.

Description

광 루이스산 발생제Photo Lewis Acid Generator

본 발명은 광 조사 (광 에너지) 에 의해 루이스산을 발생 가능한 화합물 및 이 화합물을 포함하는 조성물에 관한 것이다.The present invention relates to a compound capable of generating Lewis acid by light irradiation (light energy) and a composition containing the compound.

산 발생제는, 광이나 열에 의해 프로톤산 (브뢴스테드산) 을 발생시키는 화합물이고, 중합 개시제나 화학 증폭형 레지스트 등에 이용되고 있다 (특허문헌 1 ∼ 3 을 참조).An acid generator is a compound which produces | generates a protonic acid (brasted acid) by light or heat, and is used for a polymerization initiator, a chemically amplified resist, etc. (refer patent documents 1-3).

일본 공개특허공보 2014-205624호Japanese Laid-Open Patent Publication No. 2014-205624 일본 공개특허공보 2014-214129호Japanese Unexamined Patent Publication No. 2014-214129 일본 공개특허공보 2001-183821호Japanese Laid-Open Patent Publication 2001-183821

본 발명의 목적은, 광에 의해 루이스산을 발생 가능한 화합물, 이 화합물로 구성된 광 루이스산 발생제, 및 이들 화합물 또는 제를 포함하는 조성물을 제공하는 것에 있다.An object of the present invention is to provide a compound capable of generating Lewis acid by light, an optical Lewis acid generator composed of the compound, and a composition containing these compounds or agents.

상기 종래의 광산 발생제는, 카티온부에 광이나 열에 의해 프로톤산을 발생시키는 성분과, 아니온부에 SbF6 - 나 BF4 - 등의 무기 아니온, (C6F5)4B- 등의 유기 아니온이 사용되고 있지만, 프로톤산을 적용할 수 있는 계에만 이용할 수 있고, 아니온부에 안티몬과 같은 독성 금속을 사용할 필요가 있는 등, 개선해야 할 점이 있었다.The conventional photoacid generators, components generating a protonic acid by light or heat in the cation moiety, and no piggyback on SbF 6 - or BF 4 -, etc. of the inorganic anion, (C 6 F 5) 4 B - , etc. Although organic anions are used, there is a need to improve such that they can be used only in systems to which protonic acid can be applied, and toxic metals such as antimony need to be used in the anion portion.

이러한 가운데, 본 발명자들은, 종래의 광산 발생제의 개념과는 완전히 달리, 광에 의해 루이스산을 발생할 수 있는 화합물이 얻어지지 않는가하는 관점에서 예의 검토를 거듭한 결과, 붕소를 중심 원자로 하는 아니온부와, 특정한 카티온부를 조합함으로써, 아니온부로부터 루이스산을 발생할 수 있는 화합물 (광 루이스산 발생제) 이 얻어지는 것, 이와 같은 화합물로부터 발생하는 산은, 프로톤산과는 상이한 반응성을 갖는 루이스산인 것 외에, 붕소를 중심 원자로 하는 것이고 일반적으로 강한 루이스산이고, 이용 가치가 높은 것 등을 알아내었다.In the meantime, the present inventors earnestly examined from the viewpoint of not being able to obtain a compound capable of generating Lewis acid by light, unlike the conventional concept of a photoacid generator. And by combining a specific cation moiety, a compound capable of generating Lewis acid from the anion moiety (photo Lewis acid generator) is obtained, and the acid generated from such a compound is a Lewis acid having a different reactivity from protonic acid, They found that boron is the central atom, and is generally a strong Lewis acid and a high value for use.

본 발명자들은 상기 이외에도 하기하는 바와 같이 여러 가지 새로운 지견을 얻고, 또한 예의 검토를 거듭하여 본 발명을 완성하기에 이르렀다.In addition to the above, the present inventors have obtained various new findings as described below, and have intensively studied to complete the present invention.

즉, 본 발명의 화합물은, 붕소를 중심 원자로 하는 아니온부와, 카티온부를 갖는 화합물 (카티온부와 아니온부의 염) 로서, 광 조사에 의해 아니온부로부터 루이스산 (상세하게는, 붕소를 중심 원자로 하는 루이스산) 을 발생할 수 있는 화합물이다.That is, the compound of the present invention is a compound having a boron as a center atom and a cation moiety (a salt of a cation moiety and an anion moiety), which is a Lewis acid (in detail, boron as the center) from the anion moiety by light irradiation. Lewis acid as an atom).

이와 같은 본 발명의 화합물은, 특히, 붕소를 중심 원자로 하고, 적어도 하나의 할로겐 원자를 포함하는 아릴기를 갖는 아니온부와, 카티온부를 갖는 화합물로서, 광 조사에 의해 아니온부로부터 루이스산을 발생할 수 있는 화합물이어도 된다.Such a compound of the present invention is, in particular, an anion moiety having an aryl group containing boron as a center atom and containing at least one halogen atom, and a cation moiety, which can generate Lewis acid from the anion moiety by light irradiation. The compound which exists may be sufficient.

본 발명의 화합물 (광 루이스산 발생제) 은, 광에 의해 루이스산을 발생 가능하다. 그 때문에, 루이스산을 이용 가능한 여러 가지 용도 [예를 들어, 광 중합 개시제 (광 잠재성 중합 개시제), 화학 증폭 레지스트 등] 에 적용할 수 있다.The compound (photo Lewis acid generator) of this invention can generate Lewis acid by light. Therefore, it can be applied to various uses (for example, a photoinitiator (photo latent polymerization initiator), chemically amplified resist, etc.) which can use a Lewis acid.

또한, 본 발명의 화합물은, 아니온부의 중심 원자를 붕소로 구성하고 있고, 안티몬과 같은 금속을 포함할 필요가 없기 때문에, 안전성에 있어서도 우수하고, 매우 유용성이 높다.Moreover, since the compound of this invention comprises the center atom of the anion part from boron, and does not need to contain a metal like antimony, it is excellent also in safety and it is very useful.

[화합물] [compound]

본 발명의 화합물은, 붕소를 중심 원자로 하는 아니온부와 카티온부를 갖는다. 그리고, 이 아니온부는, 광 조사에 의해 루이스산 (붕소를 중심 원자로 하는 루이스산) 을 발생할 수 있다.The compound of this invention has an anion part and a cation part which have boron as a center atom. And this anion part can generate | occur | produce Lewis acid (Lewis acid which has a boron as a center atom) by light irradiation.

(아니온부)(No part)

아니온부는, 붕소를 중심 원자로 하고, 광에 의해 루이스산을 발생할 수 있으면 특별히 한정되지 않는다. 아니온부의 중심 원자인 붕소 원자 (>B<) [또는 붕소 아니온 (>B<)-] 에 치환 (또는 결합) 하는 기 (또는 원자) 는, 특별히 한정되지 않고, 예를 들어, 탄화수소기, 복소 고리기 (헤테로아릴기 등), 하이드록실기, 할로겐 원자, 수소 원자 등을 들 수 있다.Anion part will not be specifically limited if boron is a center atom and can generate Lewis acid by light. The group (or atom) substituted (or bonded) to the boron atom (> B <) [or boron anion (> B <) - ] which is the center atom of the anion part is not specifically limited, For example, a hydrocarbon group And heterocyclic groups (such as heteroaryl groups), hydroxyl groups, halogen atoms and hydrogen atoms.

탄화수소기로는, 예를 들어, 지방족 탄화수소기 [예를 들어, 알킬기 (예를 들어, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, s-부틸기, t-부틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기, 2-에틸헥실기 등의 C1-20 알킬기, 바람직하게는 C2-10 알킬, 더욱 바람직하게는 C2-6 알킬기), 시클로알킬기 (예를 들어, 시클로펜틸기, 시클로헥실기 등의 C3-20 시클로알킬기, 바람직하게는 C4-8 시클로알킬기), 아르알킬기 (예를 들어, 벤질기, 페네틸기 등의 C6-10 아릴 C1-4 알킬기) 등], 방향족 탄화수소기 [예를 들어, 아릴기 (예를 들어, 페닐기, 톨릴기, 자일릴기, 나프틸기 등의 C6-20 아릴기, 바람직하게는 C6-12 아릴기, 더욱 바람직하게는 C6-10 아릴기) 등] 등을 들 수 있다.As the hydrocarbon group, for example, an aliphatic hydrocarbon group [for example, an alkyl group (for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, s-butyl group, t-butyl group, C 1-20 alkyl groups such as n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, preferably C 2-10 alkyl, more preferably C 2-6 Alkyl group), cycloalkyl group (e.g., C 3-20 cycloalkyl group such as cyclopentyl group, cyclohexyl group, preferably C 4-8 cycloalkyl group), aralkyl group (e.g., benzyl group, phenethyl group, etc.) C 6-10 aryl C 1-4 alkyl group)], aromatic hydrocarbon group [for example, an aryl group (e.g., a C 6-20 aryl group such as a phenyl group, tolyl group, xylyl group, naphthyl group), preferably Preferably a C 6-12 aryl group, more preferably a C 6-10 aryl group).

탄화수소기 및 복소 고리기는 치환기를 가지고 있어도 된다. 또한, 치환기를 갖는 탄화수소기란, 치환기를 갖지 않는 탄화수소기를 구성하는 수소 원자의 1 또는 2 이상이 치환기로 치환된 기를 말하고, 치환기를 갖는 복소 고리기란, 치환기를 갖지 않는 복소 고리를 구성하는 수소 원자의 1 또는 2 이상이 치환기로 치환된 기를 말한다. 치환기는, 추가로 치환기로 치환되어 있어도 된다.The hydrocarbon group and the heterocyclic group may have a substituent. In addition, the hydrocarbon group which has a substituent means the group in which 1 or 2 or more of the hydrogen atoms which comprise the hydrocarbon group which do not have a substituent are substituted by the substituent, and the heterocyclic group which has a substituent means the hydrogen atom which comprises the heterocyclic ring which does not have a substituent. 1 or 2 or more substituted with the substituent. The substituent may be further substituted with a substituent.

치환기로는, 특별히 한정되지 않고, 예를 들어, 할로겐 원자 (예를 들어, 불소 원자, 염소 원자, 브롬 원자, 요오드 원자 등), 하이드록실기, 알콕시기 (예를 들어, 메톡시기, 에톡시기 등의 C1-20 알콕시기, 바람직하게는 C1-10 알콕시기, 더욱 바람직하게는 C1-4 알콕시기), 아릴옥시기 (예를 들어, 페녹시기 등의 C6-10 아릴옥시기), 아실기 (예를 들어, 아세틸기 등의 C1-10 알킬카르보닐기 ; 벤조일기 등의 C6-10 아릴카르보닐기 등), 아실옥시기 (예를 들어, 아세톡시기 등의 C1-10 알킬카르보닐옥시기 ; 페닐카르보닐옥시기 등의 C6-10 아릴카르보닐옥시기 등), 알콕시카르보닐기 (예를 들어, 메톡시카르보닐기 등의 C1-10 알콕시카르보닐기), 아릴옥시카르보닐기 (예를 들어, 페녹시카르보닐기 등의 C6-10 아릴옥시카르보닐기), 메르캅토기, 알킬티오기 (예를 들어, 메틸티오기 등의 C1-20 알킬티오기, 바람직하게는 C1-10 알킬티오기, 더욱 바람직하게는 C1-4 알킬티오기), 아릴티오기 (예를 들어, 페닐티오기 등의 C6-10 아릴티오기), 아미노기, 치환 아미노기 (예를 들어, 디메틸아미노기 등의 모노 또는 디 C1-4 알킬아미노기), 아미드기 (예를 들어, N,N'-디메틸아미노카르보닐기 등의 모노 또는 디 C1-4 알킬아미노카르보닐기), 시아노기, 니트로기, 치환 술포닐기 (예를 들어, 메실기 등의 C1-10 알킬술포닐기, C6-10 토실기 등의 아릴술포닐기), 탄화수소기 (예를 들어, 알킬기 등의 상기 예시된 탄화수소기) 등을 들 수 있다.It does not specifically limit as a substituent, For example, a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc.), a hydroxyl group, an alkoxy group (for example, a methoxy group, an ethoxy group) C 1-20 alkoxy groups such as, preferably C 1-10 alkoxy groups, more preferably C 1-4 alkoxy groups), aryloxy groups (eg, C 6-10 aryloxy groups such as phenoxy groups) ), Acyl groups (for example, C 1-10 alkylcarbonyl groups such as acetyl groups; C 6-10 arylcarbonyl groups such as benzoyl groups, etc.), acyloxy groups (for example, C 1-10 such as acetoxy groups) Alkylcarbonyloxy group; C 6-10 arylcarbonyloxy group such as phenylcarbonyloxy group), alkoxycarbonyl group (for example, C 1-10 alkoxycarbonyl group such as methoxycarbonyl group), aryloxycarbonyl group (example For example, a C 6-10 aryloxycarbonyl group such as a phenoxycarbonyl group, a mercapto group, an alkylthio group (for example, C 1-20 alkylthio group such as methylthio group, preferably C 1-10 alkylthio group, more preferably C 1-4 alkylthio group), arylthio group (for example, phenylthio group, etc.) C 6-10 arylthio group), amino group, substituted amino group (e.g., mono or di C 1-4 alkylamino group such as dimethylamino group), amide group (e.g., N, N'-dimethylaminocarbonyl group, etc.) Mono or di C 1-4 alkylaminocarbonyl group), cyano group, nitro group, substituted sulfonyl group (for example, arylsulfonyl group such as C 1-10 alkylsulfonyl group such as mesyl group, C 6-10 tosyl group) And hydrocarbon groups (for example, hydrocarbon groups exemplified above such as alkyl groups).

이들 치환기는, 단독으로 또는 2 종 이상의 조합으로서 사용해도 되고, 탄화수소기 또는 복소 고리기는 1 또는 2 이상의 치환기를 포함하고 있어도 된다.These substituents may be used individually or as a combination of 2 or more types, and a hydrocarbon group or a heterocyclic group may contain 1 or 2 or more substituents.

이들 치환기는, 단독으로 또는 2 종 이상을 사용하여 직접 붕소 원자에 결합하고 있어도 된다.These substituents may be couple | bonded directly to the boron atom individually or using 2 or more types.

바람직한 양태에서는, 아니온부는, 적어도 1 개의 아릴기 (붕소 원자에 결합한 아릴기, 아릴보론 골격) 를 가지고 있어도 되고, 특히, 적어도 1 개의 할로겐 원자를 갖는 아릴기 (플루오로아릴기) 를 적어도 1 개 가지고 있어도 된다.In a preferred embodiment, the anion moiety may have at least one aryl group (aryl group bonded to a boron atom, aryl boron skeleton), and in particular, at least one aryl group (fluoroaryl group) having at least one halogen atom. You may have a dog.

할로겐 원자로는, 염소 및 불소가 바람직하고, 불소가 보다 바람직하다.As the halogen atom, chlorine and fluorine are preferable, and fluorine is more preferable.

그 중에서도, 적어도 3 개의 할로겐 원자를 갖는 아릴기를 적어도 1 개 갖는 것이 보다 바람직하고, 적어도 5 개의 할로겐 원자를 갖는 아릴기를 적어도 1 개 갖는 것이 더욱 바람직하다. 상기 양태이면, 루이스산 강도가 증가하여, 중합 개시제로서의 특성이 향상되는 경향이 있다.Especially, it is more preferable to have at least 1 aryl group which has at least 3 halogen atoms, and it is still more preferable to have at least 1 aryl group which has at least 5 halogen atoms. If it is the said aspect, there exists a tendency for Lewis acid strength to increase and the characteristic as a polymerization initiator will improve.

할로겐 원자를 갖는 아릴기에 있어서, 할로겐 원자는, 아릴기에 직접 결합하고 있어도 되고, 또는 할로겐 원자 함유기가 아릴기에 결합하는 양태로 가지고 있어도 되고, 이들을 조합하는 양태로 가지고 있어도 된다.In the aryl group which has a halogen atom, a halogen atom may be couple | bonded with the aryl group directly, or may have in the aspect which a halogen atom containing group couple | bonds with an aryl group, and may have it in the aspect which combines them.

할로겐 원자 함유기로는, 예를 들어, 할로겐 함유 탄화수소기 [예를 들어, 할로알킬기 (예를 들어, 트리플루오로메틸기, 펜타플루오로에틸기, 헵타플루오로프로필기, 퍼플루오로옥틸기 등의 할로 C1-20 알킬기, 바람직하게는 플루오로 C1-10 알킬기, 더욱 바람직하게는 C1-4 플루오로알킬기, 통상 퍼플루오로알킬기), 할로시클로알킬기 (예를 들어, 퍼플루오로시클로프로필기, 퍼플루오로시클로부틸기, 퍼플루오로시클로펜틸기, 퍼플루오로시클로헥실기 등의 할로 C3-20 시클로알킬기, 바람직하게는 플루오로 C4-8 시클로알킬기, 통상 퍼플루오로시클로알킬기) 등], 할로알콕시기 (예를 들어, 트리플루오로메톡시기, 펜타플루오로에톡시기, 헵타플루오로프로폭시기, 퍼플루오로옥톡시 등의 할로 C1-20 알콕시기, 바람직하게는 플루오로 C1-10 알콕시기, 더욱 바람직하게는 C1-4 플루오로알콕시기, 통상 퍼플루오로알콕시기), 할로겐화 술파닐기 (예를 들어, 펜타플루오로술파닐기 (-SF5) 등) 등을 들 수 있다.As a halogen atom containing group, For example, a halogen containing hydrocarbon group [For example, haloalkyl group (For example, halo, such as a trifluoromethyl group, pentafluoroethyl group, heptafluoropropyl group, a perfluorooctyl group, etc.). C 1-20 alkyl group, preferably fluoro C 1-10 alkyl group, more preferably C 1-4 fluoroalkyl group, usually perfluoroalkyl group, halocycloalkyl group (for example, perfluorocyclopropyl group) , A halo C 3-20 cycloalkyl group such as a perfluorocyclobutyl group, a perfluorocyclopentyl group, a perfluorocyclohexyl group, preferably a fluoro C 4-8 cycloalkyl group, usually a perfluorocycloalkyl group) Haloalkoxy groups (e.g., halo C 1-20 alkoxy groups such as trifluoromethoxy group, pentafluoroethoxy group, heptafluoropropoxy group, perfluorooctoxy, preferably fluoro C 1-10 alkoxy group, more Preferably, a C 1-4 fluoroalkoxy group, usually a perfluoroalkoxy group), a halogenated sulfanyl group (for example, a pentafluorosulfanyl group (-SF 5 ), etc.), etc. may be mentioned.

구체적인 할로겐 원자 (특히 불소 원자) 를 갖는 아릴기로는, 예를 들어, 플루오로아릴기 [예를 들어, 펜타플루오로페닐기, 2-플루오로페닐기, 2,3-디플루오로페닐기, 2,4-디플루오로페닐기, 2,5-디플루오로페닐기, 2,6-디플루오로페닐기, 3,5-디플루오로페닐기, 2,3,6-트리플루오로페닐기, 2,4,6-트리플루오로페닐기, 2,3,4,6-테트라플루오로페닐기, 2,3,5,6-테트라플루오로페닐기, 2,2',3,3',4,4',5,5',6-노나플루오로-1,1'-비페닐기, 바람직하게는 펜타플루오로페닐기, 2,6-디플루오로페닐기, 2,4,6-트리플루오로페닐기, 2,3,5,6-테트라플루오로페닐기, 2,2',3,3',4,4',5,5',6-노나플루오로-1,1'-비페닐기 등], (플루오로알킬)아릴기 [예를 들어, 2-트리플루오로메틸페닐기, 3-트리플루오로메틸페닐기, 4-트리플루오로메틸페닐기, 2-펜타플루오로에틸페닐기, 3-펜타플루오로에틸페닐기, 4-펜타플루오로에틸페닐기, 2,4-비스(트리플루오로메틸)페닐기, 2,5-비스(트리플루오로메틸)페닐기, 2,6-비스(트리플루오로메틸)페닐기, 3,5-비스(트리플루오로메틸)페닐기, 2,4,6-트리스(트리플루오로메틸)페닐기, 2,4,6-트리메틸페닐기, 바람직하게는 2,6-비스(트리플루오로메틸)페닐기, 3,5-비스(트리플루오로메틸)페닐기, 2,4,6-트리스(트리플루오로메틸)페닐기 등], 플루오로-(플루오로알킬)아릴기 [예를 들어, 플루오로-트리플루오로메틸페닐기 (-C6H3FCF3), 플루오로-비스(트리플루오로메틸)페닐기 (-C6H2F(CF3)2), 플루오로-펜타플루오로에틸페닐기 (-C6H3FCF3CF2), 플루오로-비스(펜타플루오로에틸)페닐기 (-C6H2F(CF3CF2)2) 등의 플루오로-(플루오로 C1-20 알킬) C6-10 아릴기, 바람직하게는 플루오로-(플루오로 C1-10 알킬) C6-10 아릴기, 더욱 바람직하게는 플루오로-(C1-4 플루오로알킬)페닐기, 통상 플루오로-퍼플루오로알킬아릴기 등], 클로로아릴기 [예를 들어, 펜타클로로페닐기, 2-클로로페닐기, 2,3-디클로로페닐기, 2,4-디클로로페닐기, 2,5-디클로로페닐기, 2,6-디클로로페닐기, 3,5-디클로로페닐기, 2,3,6-트리클로로페닐기, 2,4,6-트리클로로페닐기, 2,3,4,6-테트라클로로페닐기, 2,3,5,6-테트라클로로페닐기, 바람직하게는 펜타클로로페닐기, 2,6-디클로로페닐기, 2,4,6-트리클로로페닐기 등], (플루오로술파닐)아릴기 [예를 들어, 2-펜타플루오로술파닐페닐기, 3-펜타플루오로술파닐페닐기, 4-펜타플루오로술파닐페닐기, 2,4-비스(펜타플루오로술파닐)페닐기, 2,5-비스(펜타플루오로술파닐)페닐기, 2,6-비스(펜타플루오로술파닐)페닐기, 3,5-비스(펜타플루오로술파닐)페닐기, 2,4,6-트리스(펜타플루오로술파닐)페닐기, 2,4,6-트리메틸페닐기, 바람직하게는 2,6-비스(펜타플루오로술파닐)페닐기, 3,5-비스(펜타플루오로술파닐)페닐기, 2,4,6-트리스(펜타플루오로술파닐)페닐기 등] 등을 들 수 있다.As an aryl group which has a specific halogen atom (especially a fluorine atom), it is a fluoroaryl group [For example, a pentafluorophenyl group, 2-fluorophenyl group, 2,3- difluorophenyl group, 2,4] -Difluorophenyl group, 2,5-difluorophenyl group, 2,6-difluorophenyl group, 3,5-difluorophenyl group, 2,3,6-trifluorophenyl group, 2,4,6- Trifluorophenyl group, 2,3,4,6-tetrafluorophenyl group, 2,3,5,6-tetrafluorophenyl group, 2,2 ', 3,3', 4,4 ', 5,5' , 6-nonnafluoro-1,1'-biphenyl group, preferably pentafluorophenyl group, 2,6-difluorophenyl group, 2,4,6-trifluorophenyl group, 2,3,5,6 -Tetrafluorophenyl group, 2,2 ', 3,3', 4,4 ', 5,5', 6-nonafluoro-1,1'-biphenyl group, etc.], (fluoroalkyl) aryl group [ For example, 2-trifluoromethylphenyl group, 3-trifluoromethylphenyl group, 4-trifluoromethylphenyl group, 2-pentafluoroethylphenyl group, 3-pentafluoroethylphenyl group, 4- Tafluoroethylphenyl group, 2,4-bis (trifluoromethyl) phenyl group, 2,5-bis (trifluoromethyl) phenyl group, 2,6-bis (trifluoromethyl) phenyl group, 3,5-bis (Trifluoromethyl) phenyl group, 2,4,6-tris (trifluoromethyl) phenyl group, 2,4,6-trimethylphenyl group, preferably 2,6-bis (trifluoromethyl) phenyl group, 3, 5-bis (trifluoromethyl) phenyl group, 2,4,6-tris (trifluoromethyl) phenyl group, etc.], fluoro- (fluoroalkyl) aryl group [for example, fluoro-trifluoromethylphenyl Group (-C 6 H 3 FCF 3 ), fluoro-bis (trifluoromethyl) phenyl group (-C 6 H 2 F (CF 3 ) 2 ), fluoro-pentafluoroethylphenyl group (-C 6 H 3 Fluoro- (fluoro C 1-20 alkyl) C 6-10 such as FCF 3 CF 2 ) and fluoro-bis (pentafluoroethyl) phenyl group (-C 6 H 2 F (CF 3 CF 2 ) 2 ) aryl group, preferably fluoro - (C 1-10 fluoroalkyl) C 6-10 aryl groups, more preferably Fluoro-by (C 1-4 fluoro-alkyl) group, typically fluoro-perfluoro-alkyl aryl group or the like], an aryl group, chloro e.g., pentachlorophenyl group, a 2-chlorophenyl group, a 2,3-dichlorophenyl group , 2,4-dichlorophenyl group, 2,5-dichlorophenyl group, 2,6-dichlorophenyl group, 3,5-dichlorophenyl group, 2,3,6-trichlorophenyl group, 2,4,6-trichlorophenyl group, 2 , 3,4,6-tetrachlorophenyl group, 2,3,5,6-tetrachlorophenyl group, preferably pentachlorophenyl group, 2,6-dichlorophenyl group, 2,4,6-trichlorophenyl group, etc.], ( Fluorosulfanyl) aryl groups [For example, 2-pentafluorosulfanylphenyl group, 3-pentafluorosulfanylphenyl group, 4-pentafluorosulfanylphenyl group, 2, 4-bis (pentafluorosulfanyl ) Phenyl group, 2,5-bis (pentafluorosulfanyl) phenyl group, 2,6-bis (pentafluorosulfanyl) phenyl group, 3,5-bis (pentafluorosulfanyl) phenyl group, 2,4,6 -Tris (pentafluorosulfanyl) phenyl group, 2 , 4,6-trimethylphenyl group, preferably 2,6-bis (pentafluorosulfanyl) phenyl group, 3,5-bis (pentafluorosulfanyl) phenyl group, 2,4,6-tris (pentafluoro Sulfanyl) phenyl group etc.] etc. are mentioned.

이들 중에서도, 특히, 펜타플루오로페닐기, 2,6-디플루오로페닐기, 2,4,6-트리플루오로페닐기, 2,3,5,6-테트라플루오로페닐기, 2,2',3,3',4,4',5,5',6-노나플루오로-1,1'-비페닐기, 펜타클로로페닐기, 2,6-디클로로페닐기, 2,4,6-트리클로로페닐기, 2-트리플루오로메틸페닐기, 2,6-비스(트리플루오로메틸)페닐기, 3,5-비스(트리플루오로메틸)페닐기, 2,4,6-트리스(트리플루오로메틸)페닐기 등이 바람직하다.Among these, in particular, pentafluorophenyl group, 2,6-difluorophenyl group, 2,4,6-trifluorophenyl group, 2,3,5,6-tetrafluorophenyl group, 2,2 ', 3, 3 ', 4,4', 5,5 ', 6-nonafluoro-1,1'-biphenyl group, pentachlorophenyl group, 2,6-dichlorophenyl group, 2,4,6-trichlorophenyl group, 2- Trifluoromethylphenyl group, 2,6-bis (trifluoromethyl) phenyl group, 3,5-bis (trifluoromethyl) phenyl group, 2,4,6-tris (trifluoromethyl) phenyl group, etc. are preferable. .

아니온부가 아릴기 (붕소 원자에 결합한 아릴기) 를 갖는 경우, 아릴기의 수는, 4 (붕소 아니온의 원자가) 이하이면 되고, 바람직하게는 1 ∼ 4, 더욱 바람직하게는 2 ∼ 3, 특히 바람직하게는 3 이다.When the anion part has an aryl group (aryl group bonded to a boron atom), the number of aryl groups should just be 4 (a valence of boron anion) or less, Preferably it is 1-4, More preferably, it is 2-3, Especially preferably, it is 3.

특히, 아니온부가 할로겐 원자 (특히 불소 원자) 를 갖는 아릴기 (붕소 원자에 결합한 아릴기) 를 갖는 경우, 할로겐 원자를 갖는 아릴기의 수는 1 ∼ 3, 바람직하게는 2 ∼ 3, 특히 바람직하게는 3 이다.In particular, when the anion part has an aryl group (an aryl group bonded to a boron atom) having a halogen atom (especially a fluorine atom), the number of aryl groups having a halogen atom is 1 to 3, preferably 2 to 3, particularly preferred. To be three.

아니온부 (보레이트 아니온) 는, 바람직하게는 하기 식 (1) 로 나타낸다.The anion moiety (borate anion) is preferably represented by the following formula (1).

[화학식 1][Formula 1]

Figure pct00001
Figure pct00001

(식 중, Ar1, Ar2 및 Ar3 은 동일한 또는 상이한 치환기를 가지고 있어도 되는 아릴기, R1 은 치환기를 나타낸다)(In the formula, Ar 1 , Ar 2 and Ar 3 are an aryl group which may have the same or different substituents, and R 1 represents a substituent.)

상기 식 (1) 에 있어서, Ar1, Ar2 및 Ar3 (치환기를 가지고 있어도 되는 아릴기) 에 있어서, 아릴기 및 치환기로는 상기 예시된 아릴기 및 치환기를 들 수 있다.In said Formula (1), in Ar <1> , Ar <2> and Ar < 3 (an aryl group which may have a substituent), the aryl group and substituent which were illustrated above are mentioned as an aryl group and a substituent.

바람직한 양태에서는, Ar1, Ar2 및 Ar3 중 적어도 1 개 (바람직하게는 2 또는 3 개, 더욱 바람직하게는 3 개) 가 적어도 1 개의 할로겐 원자를 갖는 아릴기 [상기 예시된 기, 예를 들어, 플루오로페닐기, 클로로페닐기, (플루오로알킬)페닐기, 플루오로-(플루오로알킬)페닐기 등] 인 양태 등을 들 수 있다.In a preferred embodiment, at least one of Ar 1 , Ar 2 and Ar 3 (preferably 2 or 3, more preferably 3) has an aryl group having at least one halogen atom [groups exemplified above For example, a fluorophenyl group, a chlorophenyl group, a (fluoroalkyl) phenyl group, a fluoro- (fluoroalkyl) phenyl group, etc.] etc. are mentioned.

그 중에서도, Ar1, Ar2 및 Ar3 중 적어도 2 개가 적어도 1 개의 할로겐 원자를 갖는 아릴기인 것이 보다 바람직하고, Ar1, Ar2 및 Ar3 의 3 개가 적어도 1 개의 할로겐 원자를 갖는 아릴기인 것이 더욱 바람직하다. 상기 양태이면, 루이스산 강도가 증가하여, 중합 개시제로서의 특성이 향상되는 경향이 있다.Especially, it is more preferable that at least 2 of Ar <1> , Ar <2> and Ar <3> is an aryl group which has at least 1 halogen atom, and it is more preferable that 3 of Ar <1> , Ar <2> and Ar <3> are aryl groups which have at least 1 halogen atom. More preferred. If it is the said aspect, there exists a tendency for Lewis acid strength to increase and the characteristic as a polymerization initiator will improve.

또한, Ar1, Ar2 및 Ar3 은 동일해도 되고, 상이해도 된다. 예를 들어, Ar1, Ar2 및 Ar3 모두가 불소 원자를 갖는 아릴기인 경우, 이들은 모두 동일한 수의 불소 원자를 갖는 아릴기 (예를 들어, 펜타플루오로페닐기 등) 이어도 되고, 상이한 수의 불소 원자를 갖는 아릴기의 조합이어도 된다.In addition, Ar <1> , Ar <2> and Ar <3> may be the same and may differ. For example, when Ar 1 , Ar 2, and Ar 3 are all aryl groups having fluorine atoms, they may all be aryl groups (eg, pentafluorophenyl groups, etc.) having the same number of fluorine atoms, and different numbers of The combination of the aryl group which has a fluorine atom may be sufficient.

또, 상기 식 (1) 에 있어서, R1 (치환기) 로는, 상기 예시된 치환기를 들 수 있다. 대표적인 치환기로는, 탄화수소기, 복소 고리기, 하이드록실기 등을 들 수 있다.Moreover, in said Formula (1), the substituent illustrated above is mentioned as R <1> (substituent). As a typical substituent, a hydrocarbon group, a heterocyclic group, a hydroxyl group, etc. are mentioned.

바람직한 R1 로는, 치환기를 가지고 있어도 되는 탄화수소기 또는 하이드록실기를 들 수 있고, 특히 치환기를 가지고 있어도 되는 탄화수소기가 바람직하다. 상기 양태이면, 루이스산이 보다 효율적으로 발생하는 경향이 있다.As preferable R <1> , the hydrocarbon group or hydroxyl group which may have a substituent is mentioned, The hydrocarbon group which may have a substituent especially is preferable. If it is the said aspect, it exists in the tendency for a Lewis acid to generate | occur | produce more efficiently.

치환기를 가지고 있어도 되는 탄화수소기에 있어서, 치환기 및 탄화수소기로는 상기 예시된 기를 들 수 있다.In the hydrocarbon group which may have a substituent, the group illustrated above is mentioned as a substituent and a hydrocarbon group.

대표적인 R1 에는, 알킬기 (예를 들어, 메틸기, 에틸기, 프로필기, 부틸기 등의 C1-20 알킬기, 바람직하게는 C1-10 알킬기, 더욱 바람직하게는 C2-6 알킬기), 아르알킬기 (예를 들어, 벤질기, 페네틸기 등의 C6-10 아릴 C1-4 알킬기), 아릴기 (예를 들어, 페닐기, 톨릴기 등의 C6-10 아릴기) 등이 포함되고, 특히, R1 은, 알킬기, 아르알킬기 등의 지방족 탄화수소기가 바람직하다.Representative R 1 includes an alkyl group (for example, a C 1-20 alkyl group such as a methyl group, an ethyl group, a propyl group, a butyl group, preferably a C 1-10 alkyl group, more preferably a C 2-6 alkyl group), and an aralkyl group. (For example, a C 6-10 aryl C 1-4 alkyl group such as a benzyl group, a phenethyl group), an aryl group (for example, a C 6-10 aryl group such as a phenyl group, a tolyl group), and the like. , R 1 is preferably an aliphatic hydrocarbon group such as an alkyl group or an aralkyl group.

또한, 본 발명의 화합물은, 광 조사에 의해 아니온부로부터 루이스산을 발생할 수 있다. 이와 같은 루이스산은, 아니온부의 양태 등에 의하지만, 통상, 붕소에 결합한 4 개의 치환기 (붕소를 중심 원자로 하여 결합하는 4 개의 치환기) 로부터 1 개의 치환기가 탈리된 화합물이다.Moreover, the compound of this invention can generate Lewis acid from an anion part by light irradiation. Such Lewis acid is a compound in which one substituent is detached from four substituents (four substituents bonded with boron as a central atom) bonded to boron, although the aspect of the anion part or the like is normal.

예를 들어, 아니온부가 식 (1) 의 아니온부인 경우에는, Ar1, Ar2, Ar3 및 R1 중 어느 1 개의 기가 탈리된 화합물이 루이스산으로서 발생한다.For example, when an anion part is an anion part of Formula (1), the compound in which any one group of Ar <1> , Ar <2> , Ar <3> and R <1> detach | releases is generated as Lewis acid.

특히, R1 이 탈리되는 경우에는, 하기 식으로 나타내는 화합물 [예를 들어, 트리스(펜타플루오로페닐)보란 (Ar1, Ar2 및 Ar3 이 모두 펜타플루오로페닐기인 화합물) 등] 이 루이스산으로서 발생한다.In particular, when R 1 is desorbed, a compound represented by the following formula (for example, tris (pentafluorophenyl) borane (a compound in which Ar 1 , Ar 2 and Ar 3 are all pentafluorophenyl groups)) is Lewis. Occurs as an acid.

[화학식 2][Formula 2]

Figure pct00002
Figure pct00002

(식 중, Ar1, Ar2 및 Ar3 은 상기와 동일하다)(Wherein Ar 1 , Ar 2 and Ar 3 are the same as above)

특히, 본 발명의 화합물은, 광 조사에 의해, 붕소를 중심 원자로 하는 아니온부 유래의 루이스산을 발생할 수 있지만, 이와 같은 아니온부를 선택하는 것 등에 의해, 강루이스산 [예를 들어, 트리스(펜타플루오로페닐)보란 등의 플루오로아릴보란] 을 발생시킬 수도 있다.In particular, the compound of the present invention can generate Lewis acid derived from an anion moiety using boron as a center atom by light irradiation, but by selecting such an anion moiety, a strong Lewis acid [eg, tris ( Fluoroaryl boranes such as pentafluorophenyl) borane] may be generated.

또, SbF6 - 나 BF4 - 등의 무기 아니온에서는 부식성의 HF 가스를 발생해 버려, 유기 아니온으로서 사용되는 (C6F5)4B- 는 고온이 되면 수지가 착색되거나, 분해되거나 하지만, 본 발명에서는 이와 같은 HF 가스의 발생이나 수지의 착색·분해를 억제할 수 있다.In addition, inorganic anions such as SbF 6 - and BF 4 - generate corrosive HF gas, and the (C 6 F 5 ) 4 B - used as the organic anion becomes colored or decomposed when the temperature becomes high. However, in this invention, generation | occurrence | production of such HF gas and coloring and decomposition of resin can be suppressed.

(카티온부)(Cateon part)

카티온부는, 상기 아니온부의 카운터 카티온이고, 아니온부와의 조합에 있어서, 아니온부로부터의 루이스산을 발생할 수 있는 것이면 특별히 한정되지 않는다.The cation moiety is not particularly limited as long as the cation moiety is a counter cation of the anion moiety and can generate Lewis acid from the anion moiety in combination with the anion moiety.

특히, 상기와 같이, 루이스산의 발생은, 광 조사에 의한 아니온으로부터 카티온으로의 전하 이동과, 그에 따라 치환기의 탈리를 수반하는 경우가 많다.In particular, as described above, the generation of Lewis acid often involves charge transfer from anion to cation by irradiation with light and desorption of substituents.

그 때문에, 카티온부는, 아니온부로부터 신속하게 치환기를 탈리 (치환기의 탈리를 촉진) 시키기 위해, 광 아니온부로부터의 전하 (전자) 이동이 용이하게 이루어지는 것임이 바람직하다.Therefore, it is preferable that the charge (electron) transfer from an anion part becomes easy in order for a cation part to detach | desorb a substituent (accelerate | desorption of a substituent) quickly from an anion part.

이와 같은 관점에서, 카티온부는, HOMO-LUMO 간의 갭 (에너지차) 이 비교적 낮은 것, 예를 들어, 5.5 eV 이하 (예를 들어, 5.3 eV 이하), 바람직하게는 5.2 eV 이하 (예를 들어, 5.1 eV 이하), 보다 바람직하게는 5 eV 이하 (예를 들어, 4.5 eV 이하), 더욱 바람직하게는 4.2 eV 이하의 카티온이어도 된다.From this point of view, the cation portion has a relatively low gap (energy difference) between HOMO-LUMO, for example, 5.5 eV or less (for example, 5.3 eV or less), preferably 5.2 eV or less (for example, , 5.1 eV or less), more preferably 5 eV or less (for example, 4.5 eV or less), and more preferably 4.2 cV or less.

또한, 갭의 하한값은, 특별히 한정되지 않지만, 예를 들어, 1 eV, 1.5 eV, 2 eV 등이어도 된다.In addition, although the minimum of a gap is not specifically limited, For example, 1 eV, 1.5 eV, 2 eV, etc. may be sufficient.

카티온부는, 루이스산 (아니온부로부터의 루이스산) 에 대해 비반응성인 것이 바람직하다. 이와 같은 비반응성의 카티온부를 아니온부와 조합함으로써, 아니온부로부터 발생하는 루이스산을 효율적으로 이용할 수 있다.The cation moiety is preferably non-reactive with the Lewis acid (Lewis acid from the anion moiety). By combining such non-reactive cation moiety with the anionic moiety, the Lewis acid generated from the anionic moiety can be efficiently used.

또한, 루이스산에 대해 반응성의 카티온부로는, 예를 들어, 염기성을 나타내고, 루이스산과 염을 형성함으로써 촉매능을 실활시키는 치환기 (예를 들어, 아미노기, N-모노 치환 아미노기, 이미노기 (-NH-) 등) 를 갖는 카티온부 등을 들 수 있다. 그 때문에, 카티온부는, 루이스산과 염을 형성할 수 있는 기를 갖지 않는 카티온부가 바람직하다.Moreover, as a cation part reactive with a Lewis acid, it shows a basicity, for example, the substituent which deactivates a catalytic capability by forming a salt with Lewis acid (for example, an amino group, an N-mono substituted amino group, an imino group (- And cation moieties having NH—). Therefore, the cation part which does not have group which can form a salt with Lewis acid is preferable.

또, 카티온부는, 아니온부로부터 루이스산의 발생을 저해하지 않는 (잘 저해하지 않는) 것임이 바람직하다. 구체적으로는, 카티온부는, 광에 의해 프로톤산을 발생하지 않는 카티온부 (구조) 이거나, 및/또는 광에 의해 분해되지 않는 카티온부 (구조) 이어도 된다.Moreover, it is preferable that a cation part does not inhibit (well inhibits) generation | occurrence | production of Lewis acid from an anion part. Specifically, the cation part may be a cation part (structure) that does not generate protonic acid by light, and / or a cation part (structure) that does not decompose by light.

카티온부의 중심 원자 (카티온성의 원자) 는, 특별히 한정되지 않고, 황 원자 (S), 요오드 원자 (I) 등이어도 되지만, 특히, 질소, 산소 및 인에서 선택된 헤테로 원자, 특히, 질소 및/또는 산소이어도 된다. 이와 같은 헤테로 원자를 중심 원자로 하는 카티온부는, 루이스산의 발생을 저해하지 않는 (예를 들어, 광에 의해 분해되지 않는) 경우가 많아, 효율적으로 루이스산을 발생시키기 쉽다.The center atom (cationic atom) of the cation moiety is not particularly limited and may be a sulfur atom (S), an iodine atom (I), or the like, but in particular a hetero atom selected from nitrogen, oxygen and phosphorus, in particular nitrogen and / Or oxygen may be used. The cation part which makes such a hetero atom the center atom often does not inhibit generation | occurrence | production of Lewis acid (for example, does not decompose by light), and it is easy to generate | occur | produce Lewis acid efficiently.

헤테로 원자를 중심 원자로 하는 카티온부에 있어서, 헤테로 원자의 존재 양태는, 특별히 한정되지 않고, 사슬형 구조를 구성하는 원자이어도 되고, 고리형 구조를 구성하는 원자이어도 되지만, 특히, 복소 고리 (헤테로 고리) 를 구성해도 된다. 즉, 이와 같은 헤테로 원자를 중심 원자로 하는 카티온부는, 질소, 산소 및 인에서 선택된 적어도 1 개의 헤테로 원자를 고리의 구성 원자로 하는 복소 고리 또는 헤테로 고리 (의 카티온) 이어도 된다. 즉, 카티온부는 헤테로 고리를 포함하는 것이 바람직하다. 상기 양태이면, 중합 개시제로서의 특성이 향상되는 경향이 있다.In the cation part which makes a hetero atom the center atom, the presence aspect of a hetero atom is not specifically limited, The atom which comprises a chain structure, and the atom which comprises a cyclic structure may be sufficient, Especially, a hetero ring (hetero ring) ) May be configured. That is, the cation part which makes such a hetero atom the center atom may be a heterocyclic ring or hetero ring (cation of) which makes at least 1 hetero atom selected from nitrogen, oxygen, and phosphorus the constituent atom of a ring. That is, the cation moiety preferably includes a hetero ring. If it is the said aspect, there exists a tendency for the characteristic as a polymerization initiator to improve.

이와 같은 헤테로 고리는, 지방족 고리, 방향족 고리 중 어느 것이어도 되지만, 특히, 방향족 고리 (방향족 복소 고리) 이어도 된다.Such a hetero ring may be either an aliphatic ring or an aromatic ring, but in particular, may be an aromatic ring (aromatic hetero ring).

구체적인 헤테로 고리로는, 예를 들어, 질소 함유 복소 고리 [예를 들어, 단고리형 고리 (피리딘 고리 (피리디늄 고리) 등), 다고리형 고리 (예를 들어, 퀴놀린 고리, 이소퀴놀린 고리, 인돌 고리 등의 축합 고리 ; 비피리디늄 고리 등의 고리 집합 고리) 등의 질소 함유 복소 고리 (특히 질소 함유 방향족 복소 고리)], 산소 함유 복소 고리 [예를 들어, 피릴륨 고리 (피릴리늄 고리) 등의 산소 함유 방향족 복소 고리 등] 등을 들 수 있다.Specific hetero rings include, for example, nitrogen-containing heterocycles [eg, monocyclic rings (pyridine rings (pyridinium rings), etc.), polycyclic rings (eg quinoline rings, isoquinoline rings, indole rings). Nitrogen-containing heterocycles (especially nitrogen-containing aromatic heterocycles), such as condensed rings such as bipyridinium rings), oxygen-containing heterocycles [for example, pyrilium rings (pyridinium rings), etc. And oxygen-containing aromatic heterocycles].

또한, 헤테로 원자에는, 수소 원자 (프로톤성의 수소 원자) 가 치환 (결합) 되어 있지 않은 것이 바람직하다. 예를 들어, 오늄 이온 (예를 들어, 피리디늄 (카티온) 등) 을 구성하는 수소 원자는, 모두 수소 원자 이외의 치환기로 치환되어 있는 것이 바람직하다.In addition, it is preferable that the hydrogen atom (protic hydrogen atom) is not substituted (bonded) to the hetero atom. For example, it is preferable that all the hydrogen atoms which comprise onium ion (for example, pyridinium (cation) etc.) are substituted by substituents other than a hydrogen atom.

이와 같은 헤테로 원자에 치환 (결합) 하는 치환기로는, 예를 들어, 상기 아니온부의 항에서 예시된 치환기 등을 들 수 있다. 대표적인 치환기로는, 예를 들어, 탄화수소기 [예를 들어, 알킬기 (예를 들어, 메틸기, 에틸기, 프로필기, 부틸기, 펜틸기, 헥실기, 헵틸기, 옥틸기, 노닐기, 데실기 등의 C1-20 알킬기, 바람직하게는 C1-10 알킬기 등), 시클로알킬기 (예를 들어, 시클로펜틸기, 시클로헥실기 등의 C3-20 시클로알킬기, 바람직하게는 C4-8 시클로알킬기), 아르알킬기 (예를 들어, 벤질기, 페네틸기 등의 C6-10 아릴 C1-4 알킬기), 아릴기 (예를 들어, 페닐기 등의 C6-10 아릴기) 등의 치환기를 가지고 있어도 되는 탄화수소기) 등] 등을 들 수 있다.As a substituent substituted (bonded) to such a hetero atom, the substituent etc. which were illustrated by the term of the said anion part are mentioned, for example. Representative substituents include, for example, hydrocarbon groups [for example, alkyl groups (eg, methyl groups, ethyl groups, propyl groups, butyl groups, pentyl groups, hexyl groups, heptyl groups, octyl groups, nonyl groups, decyl groups, etc.). A C 1-20 alkyl group, preferably a C 1-10 alkyl group, or the like, a cycloalkyl group (eg, a C 3-20 cycloalkyl group such as a cyclopentyl group, a cyclohexyl group, preferably a C 4-8 cycloalkyl group) ), An aralkyl group (for example, a C 6-10 aryl C 1-4 alkyl group such as a benzyl group, a phenethyl group), an aryl group (for example, a C 6-10 aryl group such as a phenyl group) Hydrocarbon groups which may be present), etc. may be mentioned.

또, 카티온부에 있어서, 헤테로 고리는 치환기를 가지고 있어도 된다. 헤테로 고리에 치환 (결합) 하는 치환기로는, 상기 HOMO-LUMO 간의 갭 등에 따라 적절히 선택할 수 있고, 예를 들어, 상기 아니온부의 항에서 예시된 치환기 [예를 들어, 탄화수소기 (예를 들어, 알킬기, 아릴기 등 치환기를 가지고 있어도 되는 탄화수소기), 아실기 (예를 들어, 아세틸기 등의 C1-10 알킬카르보닐기 ; 벤조일기 등의 C6-10 아릴카르보닐기 (아로일기) 등) 등] 등을 들 수 있다. 치환기를 갖는 혹은 무치환의 헤테로 고리가 치환기이어도 된다.Moreover, in a cation part, the hetero ring may have a substituent. As a substituent substituted (bonded) to a hetero ring, it can select suitably according to the gap between HOMO-LUMO, etc., For example, the substituent illustrated by the term of the said anion part [For example, a hydrocarbon group (for example, A hydrocarbon group which may have a substituent such as an alkyl group, an aryl group), an acyl group (for example, a C 1-10 alkylcarbonyl group such as acetyl group; C 6-10 arylcarbonyl group (aroyl group) such as benzoyl group) Etc. can be mentioned. The substituent may be a substituted or unsubstituted hetero ring.

치환기는, 단독으로 또는 2 종 이상 조합하여 헤테로 고리에 결합하고 있어도 된다.The substituents may be bonded to a hetero ring alone or in combination of two or more thereof.

대표적인 카티온부로는, 예를 들어, 질소 원자 함유 복소 고리 골격 [예를 들어, N-치환 피리디늄 골격, N-치환 비피리디늄 골격, N-치환 퀴놀리늄 골격, N-치환 이소퀴놀리늄 골격 등의 상기 예시된 질소 함유 복소 고리의 질소 원자에 치환기를 갖는 골격] 을 갖는 카티온 {예를 들어, N-치환 피리디늄류 [예를 들어, N-치환-아릴피리디늄 (예를 들어, 4-페닐-1-n-프로필피리디늄, 4-페닐-1-n-부틸피리디늄, 4-페닐-1-벤질피리디늄 등의 N-치환-C6-10 아릴피리디늄, 바람직하게는 N-알킬-C6-10 아릴피리디늄 및 N-아르알킬-C6-10 아릴피리디늄, 더욱 바람직하게는 N-C1-20 알킬-페닐피리디늄 및 N-C6-10 아릴 C1-4 알킬-페닐피리디늄), N-치환-아실피리디늄 (예를 들어, 4-벤조일-1-벤질피리디늄 등의 N-치환-C6-10 아릴카르보닐피리디늄) 등], N-치환 비피리디늄류 [예를 들어, N-치환-비피리디늄 (예를 들어, 1,1'-디옥틸-4,4'-비피리디늄 등의 N,N'-디알킬비피리디늄, 바람직하게는 N,N'-디 C1-20 알킬비피리디늄, 더욱 바람직하게는 N,N'-디 C1-10 알킬비피리디늄) 등], N-치환 퀴놀리늄류 [예를 들어, N-치환-퀴놀리늄 (예를 들어, 1-에틸퀴놀리늄 등의 N-알킬퀴놀리늄, 바람직하게는 N-C1-20 알킬-퀴놀리늄 ; 1-벤질퀴놀리늄 등의 N-아르알킬퀴놀리늄, 바람직하게는 N-C6-10 아릴 C1-4 알킬퀴놀리늄) 등], N-치환 이소퀴놀리늄류 [예를 들어, N-치환-이소퀴놀리늄 (예를 들어, 2-n-부틸이소퀴놀리늄 등의 N-알킬이소퀴놀리늄, 바람직하게는 N-C1-20 알킬-이소퀴놀리늄 ; 2-벤질이소퀴놀리늄 등의 N-아르알킬이소퀴놀리늄, 바람직하게는 N-C6-10 아릴 C1-4 알킬퀴놀리늄) 등] 등}, 산소 원자 함유 복소 고리 골격 (예를 들어, 피릴륨 골격 등의 상기 예시된 산소 함유 복소 고리를 갖는 골격) 을 갖는 카티온 {예를 들어, 피릴륨류 [예를 들어, 알킬피릴륨 (예를 들어, 2,4,6-트리메틸피릴륨 등의 C1-20 알킬피릴륨, 바람직하게는 C1-10 알킬피릴륨, 더욱 바람직하게는 C1-4 알킬피릴륨) 등] 등}, 4 급 포스포늄류 [예를 들어, 테트라나프틸포스포늄, 메틸트리나프틸포스포늄, 페나실트리페닐포스포늄 등] 등을 들 수 있다.Representative cationic moieties include, for example, nitrogen atom-containing heterocyclic skeletons [eg, N-substituted pyridinium skeletons, N-substituted bipyridinium skeletons, N-substituted quinolinium skeletons, N-substituted isoquinoli Cationic {eg, N-substituted pyridiniums [eg, N-substituted-arylpyridinium (eg, a skeleton having a substituent on a nitrogen atom of a nitrogen-containing heterocyclic ring as exemplified above) For example, N-substituted-C 6-10 arylpyridinium such as 4-phenyl-1-n-propylpyridinium, 4-phenyl-1-n-butylpyridinium, 4-phenyl-1-benzylpyridinium, and the like. Preferably N-alkyl-C 6-10 arylpyridinium and N-aralkyl-C 6-10 arylpyridinium, more preferably NC 1-20 alkyl-phenylpyridinium and NC 6-10 aryl C 1-4 Alkyl-phenylpyridinium), N-substituted-acylpyridinium (for example, N-substituted-C 6-10 arylcarbonylpyridinium such as 4-benzoyl-1-benzylpyridinium), and the like. Bipyridiniums [eg, N-values - bipyridinium (e.g., 1,1'-dioctyl-4,4'-bipyridinium such as N, N'- di-alkyl bipyridinium, preferably N, N'- di-C 1- 20 alkylbipyridinium, more preferably N, N'-di C 1-10 alkylbipyridinium) and the like, N-substituted quinoliniums [eg, N-substituted-quinolinium (eg N-alkylquinolinium, such as 1-ethylquinolinium, preferably NC 1-20 alkyl-quinolinium; N-aralkylquinolinium such as 1-benzylquinolinium, preferably NC 6 -10 aryl C 1-4 alkylquinolinium) and the like; N-substituted isoquinoliniums [eg, N-substituted-isoquinolinium (eg, 2-n-butylisoquinolinium and the like) N-alkylisoquinolinium, preferably NC 1-20 alkyl-isoquinolinium, N-aralkylisoquinolinium such as 2-benzylisoquinolinium, preferably NC 6-10 aryl C 1-4 alkyl quinolinyl titanium), etc.], etc.}, an oxygen atom-containing heterocyclic skeleton (e.g., containing the oxygen, such as the illustrated blood rilryum backbone Cation having a skeleton having a small ring) {e.g., piril ryumryu [e.g., alkyl rilryum blood (e.g., C 1-20 alkyl such as 2,4,6-trimethyl blood rilryum blood rilryum, preferably Preferably C 1-10 alkylpyryllium, more preferably C 1-4 alkylpyryllium), etc.], quaternary phosphoniums [for example, tetranaphthyl phosphonium, methyl trinaphthyl phosphonium, Phenacyl triphenyl phosphonium etc.] etc. are mentioned.

카티온부는, 바람직하게는 N-치환 피리디늄 골격, N-치환 비피리디늄 골격, N-치환 퀴놀리늄 골격, 4 급 포스포늄 골격, 및 피릴륨 골격에서 선택된 골격을 가지고 있어도 된다.The cation moiety may preferably have a skeleton selected from an N-substituted pyridinium skeleton, an N-substituted bipyridinium skeleton, an N-substituted quinolinium skeleton, a quaternary phosphonium skeleton, and a pyryllium skeleton.

본 발명의 화합물은, 아니온부와 카티온부를 갖는 화합물 (또는 아니온부와 카티온부가 염을 형성한 화합물) 이다. 아니온부와 카티온부의 조합은, 광에 의해 루이스산을 발생 가능한 한, 특별히 한정되지 않고, 상기 모든 아니온부와 카티온부의 조합이 포함된다.The compound of the present invention is a compound having an anion moiety and a cation moiety (or a compound in which an anion moiety and a cation moiety form a salt). The combination of the anion part and the cation part is not particularly limited as long as it can generate Lewis acid by light, and the combination of all of the anion part and the cation part is included.

루이스산을 발생 가능한 광의 파장은, 특별히 한정되지 않고, 본 발명의 화합물의 용도 등에 따라 선택할 수 있지만, 예를 들어, 1000 ㎚ 이하 (예를 들어, 900 ㎚ 이하), 바람직하게는 800 ㎚ 이하 (예를 들어, 750 ㎚ 이하), 더욱 바람직하게는 650 ㎚ 이하 (예를 들어, 630 ㎚ 이하) 정도이고, 220 ㎚ 이상 (예를 들어, 230 ㎚ 이상), 바람직하게는 240 ㎚ 이상 (예를 들어, 245 ㎚ 이상), 보다 바람직하게는 250 ㎚ 이상 (예를 들어, 275 ㎚ 이상), 더욱 바람직하게는 295 ㎚ 이상이어도 되고, 통상 240 ∼ 700 ㎚ 이어도 된다.The wavelength of the light capable of generating Lewis acid is not particularly limited and can be selected according to the use of the compound of the present invention and the like, but is, for example, 1000 nm or less (for example, 900 nm or less), preferably 800 nm or less ( For example, 750 nm or less), More preferably, it is about 650 nm or less (for example, 630 nm or less), 220 nm or more (for example, 230 nm or more), Preferably it is 240 nm or more (for example, For example, 245 nm or more), More preferably, it may be 250 nm or more (for example, 275 nm or more), More preferably, it may be 295 nm or more, and may be 240-700 nm normally.

루이스산을 발생 가능한 광은, 자외선 ∼ 근적외선의 영역의 광이어도 된다. 통상, 산을 발생 가능한 광은 자외광 영역의 광이 많지만, 본 발명에서는 가시광 ∼ 근적외 영역의 광이어도, 루이스산을 효율적으로 발생 가능하다. 이와 같이 본 발명의 화합물은, 루이스산을 효율적으로 발생할 수 있지만, 차광하 또는 광이 작용하지 않는 환경하에서는, 분해나 루이스산의 발생을 고도로 억제할 수 있고, 안정성 또는 보존 안정성이 우수하다.The light which can generate | occur | produce Lewis acid may be light of the ultraviolet-ray-infrared region. Usually, although the light which can generate | occur | produce an acid has many lights of an ultraviolet-light region, even if it is the light of visible light-a near-infrared region, Lewis acid can be produced efficiently. Thus, although the compound of this invention can generate | occur | produce Lewis acid efficiently, under the shading | shielding or environment where light does not operate, decomposition | disassembly and generation | occurrence | production of a Lewis acid are highly suppressed, and it is excellent in stability or storage stability.

본 발명의 화합물은, 아니온부와 카티온부를 반응시킴으로써 제조할 수 있다. 반응 (염 형성 반응) 은, 관용의 방법을 이용할 수 있다. 예를 들어, 아니온부의 염 (예를 들어, 나트륨염, 칼륨염, 나트륨/디메톡시에탄염 등의 착염 등) 과, 카티온부의 염 (예를 들어, 브롬 등의 할로겐과의 염) 을, 적당한 용매 중에서 반응시킴으로써, 제조해도 된다.The compound of this invention can be manufactured by making an anion part and a cation part react. A usual method can be used for reaction (salt formation reaction). For example, salts of anion moieties (e.g., complex salts such as sodium salts, potassium salts, sodium / dimethoxyethane salts, etc.) and salts of cationic moieties (e.g. salts with halogens such as bromine) You may manufacture by making it react in a suitable solvent.

또한, 아니온부 및 카티온부도 또, 관용의 방법에 의해 제조할 수 있고, 시판품이 존재하는 것에 대해서는 시판품을 사용해도 된다.In addition, the anion part and the cation part can also be manufactured by the conventional method, and a commercial item may be used about the presence of a commercial item.

[화합물의 용도 및 조성물][Uses and Compositions of Compounds]

본 발명의 화합물은, 광 (광 에너지) 에 의해 루이스산을 발생하기 때문에, 말하자면 광 루이스산 발생제라고 할 수 있다. 이와 같은 본 발명의 화합물 (및 광 루이스산 발생제) 은, 루이스산을 이용 가능한 여러 가지 용도, 예를 들어, 중합 개시제 (광 중합 개시제, 광 잠재성 중합 개시제), 화학 증폭 레지스트 재료 등으로서 이용할 수 있다.Since the compound of this invention generates Lewis acid by light (light energy), it can be said to be an optical Lewis acid generator. Such compounds (and photo Lewis acid generators) of the present invention can be used as various applications in which Lewis acids can be used, for example, as polymerization initiators (photo polymerization initiators, photo latent polymerization initiators), chemically amplified resist materials, and the like. Can be.

특히, 본 발명의 화합물 (광 루이스산 발생제) 은, 광 중합 개시제 (바람직하게는 광 카티온 중합 개시제) 로서 바람직하게 사용할 수 있다. 즉, 본 발명의 광 중합 개시제는, 본 발명의 화합물을 포함한다.In particular, the compound (photo Lewis acid generator) of this invention can be used suitably as a photoinitiator (preferably a photocationic polymerization initiator). That is, the photoinitiator of this invention contains the compound of this invention.

본 발명의 광 중합 개시제는, 본 발명의 화합물을 포함하고 있으면 되고, 본 발명의 효과를 저해하지 않는 범위에서, 다른 광 중합 개시제를 포함하고 있어도 된다. 광 중합 개시제에 있어서, 본 발명의 화합물은, 예를 들어, 10 ∼ 100 질량% 정도이어도 된다. 본 발명의 광 중합 개시제는, 후술하는 용매나 첨가제를 포함하고 있어도 된다.The photoinitiator of this invention should just contain the compound of this invention, and may contain the other photoinitiator in the range which does not impair the effect of this invention. In a photoinitiator, the compound of this invention may be about 10-100 mass%, for example. The photoinitiator of this invention may contain the solvent and additive mentioned later.

이와 같은 본 발명의 화합물 (광 루이스산 발생제) 은, 용도에 따라 여러 가지 조성물을 구성할 수 있다. 즉, 본 발명의 조성물은, 상기 화합물 (또는 제) 을 포함하고 있고, 그 밖의 성분은, 용도 등에 따라 선택할 수 있다.Such a compound (photo Lewis acid generator) of this invention can comprise various compositions according to a use. That is, the composition of this invention contains the said compound (or agent), and the other component can be selected according to a use etc.

예를 들어, 상기 화합물을 중합 개시제로서 이용하는 경우, 본 발명의 조성물은, 상기 화합물과, 루이스산에 의해 중합 가능한 중합성 화합물을 포함하고 있어도 된다.For example, when using the said compound as a polymerization initiator, the composition of this invention may contain the said compound and the polymeric compound which can superpose | polymerize with Lewis acid.

이와 같은 중합성 화합물로는, 예를 들어, 카티온 중합성 화합물 [예를 들어, 고리형 에테르류 (에폭시계 화합물, 옥세탄계 화합물 등), 비닐에테르류, 질소 함유 모노머 (예를 들어, N-비닐피롤리돈, N-비닐카르바졸 등) 등] 등이 포함된다. 또한, 중합성 화합물은 올리고머상이어도 된다.As such a polymeric compound, a cation polymeric compound [for example, cyclic ethers (epoxy compound, an oxetane type compound, etc.), vinyl ether, a nitrogen-containing monomer (for example, N -Vinylpyrrolidone, N-vinylcarbazole, etc.); In addition, an oligomer form may be sufficient as a polymeric compound.

중합성 화합물은, 단독으로 또는 2 종 이상 조합하여 사용해도 된다.You may use a polymeric compound individually or in combination of 2 or more types.

중합성 화합물은, 대표적으로는, 상기 카티온 중합성 화합물에서 선택된 적어도 1 종을 포함하고 있어도 된다.The polymerizable compound may typically include at least one selected from the cationic polymerizable compounds.

에폭시계 화합물 (카티온 중합성 에폭시 수지) 로는, 특별히 한정되지 않고, 예를 들어, 지방족 에폭시 화합물 (예를 들어, 헥산디올디글리시딜에테르 등의 지방족 폴리올의 폴리글리시딜에테르), 지환족 (지환식) 에폭시 화합물 [예를 들어, 에폭시시클로알칸류 (예를 들어, 시클로헥센옥사이드, 3',4'-에폭시시클로헥실메틸 3,4-에폭시시클로헥산카르복실레이트)], 방향족 에폭시 화합물 [예를 들어, 페놀류 (페놀, 비스페놀 A, 페놀 노볼락 등) 의 글리시딜에테르 등] 중 어느 것이어도 되고, 이들을 조합해도 된다.It does not specifically limit as an epoxy type compound (cationic polymerizable epoxy resin), For example, an aliphatic epoxy compound (for example, polyglycidyl ether of aliphatic polyols, such as hexanediol diglycidyl ether), alicyclic ring Family (alicyclic) epoxy compounds [eg, epoxycycloalkanes (eg, cyclohexene oxide, 3 ', 4'-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate)], aromatic epoxy Any of the compounds [for example, glycidyl ether of phenols (phenol, bisphenol A, phenol novolak, etc.)] may be sufficient, and these may be combined.

이들 중에서도, 지환족 에폭시 화합물 및 방향족 에폭시 화합물, 특히, 지환족 에폭시 화합물을 바람직하게 사용해도 된다.Among these, an alicyclic epoxy compound and an aromatic epoxy compound, especially an alicyclic epoxy compound may be used preferably.

또한, 에폭시계 화합물에 있어서, 에폭시기의 양태는, 글리시딜에테르형, 글리시딜에스테르형, 올레핀 산화 (지환식) 형 등 중 어느 것이어도 된다.In the epoxy compound, the epoxy group may be any of glycidyl ether type, glycidyl ester type, and olefin oxide (alicyclic) type.

조성물에 있어서, 상기 화합물 (또는 제) 의 비율은, 예를 들어, 중합성 화합물 100 질량부에 대하여, 예를 들어, 0.001 ∼ 20 질량부, 바람직하게는 0.01 ∼ 10 질량부, 더욱 바람직하게는 0.1 ∼ 5 질량부 정도이어도 된다.In the composition, the ratio of the compound (or agent) is, for example, 0.001 to 20 parts by mass, preferably 0.01 to 10 parts by mass, and more preferably, relative to 100 parts by mass of the polymerizable compound. About 0.1-5 mass parts may be sufficient.

조성물은, 필요에 따라, 용매 [예를 들어, 카보네이트류 (예를 들어, 에틸렌카보네이트, 프로필렌카보네이트, 1,2-부틸렌카보네이트, 디메틸카보네이트, 디에틸카보네이트 등) 등의 관용의 용매], 첨가제 (예를 들어, 증감제, 안료, 충전제, 대전 방지제, 난연제, 소포제, 안정제, 산화 방지제 등) 를 포함하고 있어도 된다.The composition is, if necessary, a solvent [for example, conventional solvents such as carbonates (for example, ethylene carbonate, propylene carbonate, 1,2-butylene carbonate, dimethyl carbonate, diethyl carbonate, etc.)], additives (For example, a sensitizer, a pigment, a filler, an antistatic agent, a flame retardant, an antifoamer, a stabilizer, antioxidant, etc.) may be included.

용매나 첨가제는, 단독으로 또는 2 종 이상 조합하여 사용해도 된다.You may use a solvent and an additive individually or in combination of 2 or more types.

조성물이 용매를 포함하는 경우, 조성물에 있어서의 고형분의 비율은, 예를 들어, 0.01 ∼ 50 질량%, 바람직하게는 0.1 ∼ 30 중량% 정도이어도 된다.When a composition contains a solvent, the ratio of solid content in a composition may be 0.01-50 mass%, for example, Preferably it is about 0.1-30 weight%.

또, 조성물은, 필요에 따라, 본 발명의 화합물 (광 루이스산 발생제) 의 범주에 속하지 않는 산 발생제 또는 중합 개시제 [예를 들어, 광산 발생제 (광에 의해 프로톤산을 발생시키는 화합물, 광 프로톤산 발생제)] 를 포함하고 있어도 된다.In addition, the composition is, if necessary, an acid generator or a polymerization initiator not belonging to the category of the compound (photo Lewis acid generator) of the present invention [for example, a photoacid generator (a compound that generates protonic acid by light, Photoprotic acid generator)].

본 발명의 화합물은, 상기와 같이, 비교적 안정적이고, 안정성이 우수한 조성물을 형성할 수 있다. 그 때문에, 본 발명에는, 상기 조성물의 보존 방법 또는 제조 방법을 포함한다. 이와 같은 방법에서는, 통상, 차광하 또는 광이 작용하지 않는 환경하에서, 상기 조성물을 보존 또는 제조해도 된다.As mentioned above, the compound of this invention can form the composition which is comparatively stable and excellent stability. Therefore, this invention includes the storage method or manufacturing method of the said composition. In such a method, the composition may be usually stored or manufactured under light shielding or an environment in which light does not act.

보다 구체적으로는, 본 발명에는, 다음의 방법 (A) 및 (B) 등이 포함된다.More specifically, the present invention includes the following methods (A), (B) and the like.

(A) 차광하에서, 상기 조성물 (예를 들어, 상기 화합물 및 중합성 화합물을 적어도 포함하는 조성물) 을 보존하는 방법.(A) A method of preserving the composition (eg, a composition comprising at least the compound and the polymerizable compound) under shading.

(B) 차광하에서, 상기 화합물과, 그 밖의 성분 (특히, 적어도 중합성 화합물을 포함하는 조성물) 을 혼합하여, 상기 조성물을 제조하는 방법.(B) The method of manufacturing the said composition by mixing the said compound and another component (especially the composition containing at least a polymeric compound) under light shielding.

보존 방법에 있어서, 보존 기간은, 특별히 한정되지 않지만, 예를 들어, 1 일 이상, 3 일 이상, 5 일 이상, 10 일 이상, 20 일 이상, 30 일 이상, 50 일 이상 등이어도 된다. 또한, 보존 기간의 상한은, 특별히 한정되지 않지만, 예를 들어, 5 년, 4 년, 3 년, 2 년, 1 년, 6 개월, 3 개월 등이어도 된다.In the storage method, the storage period is not particularly limited, but may be, for example, 1 day or more, 3 days or more, 5 days or more, 10 days or more, 20 days or more, 30 days or more, or 50 days or more. The upper limit of the storage period is not particularly limited, but may be, for example, five years, four years, three years, two years, one year, six months, three months, or the like.

차광하는 광으로는, 상기 화합물이 루이스산을 발생하는 광 (상기 화합물에 대해 흡수 파장역을 갖는 광) 을 적어도 차광하면 된다. 또, 차광에 있어서, 차광의 정도로는, 예를 들어, 상기 파장 또는 영역의 광선 투과율로서, 20 % 이하, 바람직하게는 10 % 이하, 더욱 바람직하게는 5 % 이하, 특히 3 % 이하 등이어도 된다.As light to light-shield, what is necessary is just to light-shield the light (light which has an absorption wavelength range with respect to the said compound) which the said compound produces Lewis acid. In light shielding, the degree of light shielding may be, for example, 20% or less, preferably 10% or less, more preferably 5% or less, particularly 3% or less, as the light transmittance of the wavelength or region. .

보존 방법 및 제조 방법에 있어서, 보존 또는 혼합시의 온도로는, 특별히 한정되지 않고, 저온하 (예를 들어, 10 ℃ 이하), 상온하 (예를 들어, 10 ∼ 35 ℃) 또는 가온하 (예를 들어, 35 ℃ 이상) 중 어느 것이어도 된다. 본 발명에서는, 비교적 고온하 (예를 들어, 20 ∼ 80 ℃, 25 ∼ 70 ℃, 30 ∼ 60 ℃, 35 ∼ 50 ℃ 등) 이어도 높은 안정성을 실현할 수 있다.In the storage method and the production method, the temperature at the time of preservation or mixing is not particularly limited, and it is low temperature (for example, 10 ° C. or less), normal temperature (for example, 10 to 35 ° C.) or under heating ( For example, 35 degreeC or more) may be sufficient. In this invention, even if it is comparatively high temperature (for example, 20-80 degreeC, 25-70 degreeC, 30-60 degreeC, 35-50 degreeC, etc.), high stability can be implement | achieved.

또한, 차광 방법으로는, 차광 환경하에서 보존 또는 혼합할 수 있으면 특별히 한정되지 않고, 예를 들어, 어두운 곳에서 보존 또는 혼합하는 방법, 차광 용기에 조성물을 보존하는 방법, 이들을 조합하는 방법 등을 들 수 있다.The shading method is not particularly limited as long as it can be stored or mixed in a shading environment, and examples thereof include a method of storing or mixing in a dark place, a method of storing a composition in a shading container, a method of combining them, and the like. Can be.

본 발명의 화합물은, 상기와 같이, 광에 의해 루이스산을 발생한다. 그 때문에, 본 발명에는, 상기 조성물 (상기 화합물 또는 제) 에, 광 조사 (활성 에너지선을 조사) 하여, 루이스산을 발생시키는 방법도 포함된다.As described above, the compound of the present invention generates Lewis acid by light. Therefore, this invention also includes the method of generating a Lewis acid by light irradiation (irradiating an active energy ray) to the said composition (the said compound or agent).

이와 같은 방법에서는, 조성물이 중합성 화합물을 포함하는 경우에는, 루이스산에 의해, 중합성 화합물의 중합이 진행되어, 중합성 화합물의 중합체를 제조할 수 있다. 그 때문에, 본 발명에는, 루이스산에 의해 중합 가능한 중합성 화합물을 포함하는 상기 조성물에 광 조사하여, 중합성 화합물의 중합체를 제조하는 방법도 포함된다.In such a method, when a composition contains a polymeric compound, superposition | polymerization of a polymeric compound advances with Lewis acid and the polymer of a polymeric compound can be manufactured. Therefore, this invention also includes the method of irradiating the said composition containing the polymeric compound which can superpose | polymerize with a Lewis acid, and manufacturing the polymer of a polymeric compound.

또한, 중합성 화합물의 종류에 따라서는, 중합체는 경화물을 형성한다.Moreover, depending on the kind of polymeric compound, a polymer forms hardened | cured material.

광 조사에 있어서, 광원으로는, 루이스산을 발생할 수 있으면 특별히 한정되지 않고, 예를 들어, 형광등, 수은 램프 (저압, 중압, 고압, 초고압 등), 메탈 할라이드 램프, LED 램프, 크세논 램프, 카본 아크 램프, 레이저 (예를 들어, 반도체 고체 레이저, 아르곤 레이저, He-Cd 레이저, KrF 엑시머 레이저, ArF 엑시머 레이저, F2 레이저 등) 등을 들 수 있다. 특히, 본 발명에서는, 가시광 영역의 광원 (LED 램프) 이어도 이용 가능하다.In light irradiation, if a Lewis acid can be generated as a light source, it will not specifically limit, For example, a fluorescent lamp, a mercury lamp (low pressure, medium pressure, high pressure, ultrahigh pressure etc.), a metal halide lamp, an LED lamp, a xenon lamp, carbon Arc lamps, lasers (for example, semiconductor solid lasers, argon lasers, He-Cd lasers, KrF excimer lasers, ArF excimer lasers, F2 lasers, etc.); In particular, in this invention, it is also possible to use the light source (LED lamp) of visible region.

광 조사 시간은, 화합물, 중합성 화합물이나 광원의 종류 등에 따라 적절히 선택할 수 있고, 특별히 한정되지 않는다.Light irradiation time can be suitably selected according to the kind of compound, a polymeric compound, a light source, etc., and is not specifically limited.

상기 방법은 가열하에서 실시해도 된다. 가열하에서 실시함으로써, 보다 더욱, 양호한 효율로 중합 (경화) 을 실현할 수 있다.The method may be carried out under heating. By carrying out under heating, the polymerization (curing) can be further realized with good efficiency.

가열 (가열 공정) 은, 상기 조성물 또는 화합물에 대해 실시할 수 있으면, 광 조사 전, 광 조사시 (광 조사와 함께), 광 조사 후 중 어느 것이어도 되고, 이들을 조합하여 실시해도 된다. 대표적으로는, 가열은, 광 조사시 및/또는 광 조사 후에 실시해도 되고, 특히, 적어도 광 조사시 또는 광 조사 중에 실시해도 된다.As long as heating (heating process) can be performed with respect to the said composition or a compound, any of light irradiation, at the time of light irradiation (with light irradiation), after light irradiation may be sufficient, and you may carry out combining these. Typically, heating may be performed at the time of light irradiation and / or after light irradiation, and in particular, may be performed at least during light irradiation or during light irradiation.

가열 온도로는, 특별히 한정되지 않지만, 예를 들어, 35 ℃ 이상 (예를 들어, 35 ∼ 150 ℃), 40 ℃ 이상 (예를 들어, 40 ∼ 120 ℃), 45 ℃ 이상 (예를 들어, 45 ∼ 100 ℃) 이어도 되고, 50 ℃ 이상 (예를 들어, 50 ∼ 80 ℃), 60 ℃ 이상, 70 ℃ 이상 등이어도 된다.Although it does not specifically limit as heating temperature, For example, 35 degreeC or more (for example, 35-150 degreeC), 40 degreeC or more (for example, 40-120 degreeC), 45 degreeC or more (for example, 45-100 degreeC) may be sufficient, and 50 degreeC or more (for example, 50-80 degreeC), 60 degreeC or more, 70 degreeC or more may be sufficient.

본 발명의 조성물의 용도로는, 예를 들어, 도료, 코팅제, 각종 피복 재료 (하드 코트, 내오염 피복재, 방담 피복재, 내촉 피복재, 광 파이버 등), 점착 테이프의 배면 처리제, 점착 라벨용 박리 시트 (박리지, 박리 플라스틱 필름, 박리 금속박 등) 의 박리 코팅재, 인쇄판, 치과용 재료 (치과용 배합물, 치과용 콤퍼짓) 잉크, 잉크젯 잉크, 포지티브형 레지스트 (회로 기판, CSP, MEMS 소자 등의 전자 부품 제조의 접속 단자나 배선 패턴 형성 등), 레지스트 필름, 액상 레지스트, 네거티브형 레지스트 (반도체 소자 등의 표면 보호막, 층간 절연막, 평탄화막 등의 영구막 재료 등), MEMS 용 레지스트, 포지티브형 감광성 재료, 네거티브형 감광성 재료, 각종 접착제 (각종 전자 부품용 가고정제, HDD 용 접착제, 픽업 렌즈용 접착제, FPD 용 기능성 필름 (편향판, 반사 방지막 등) 용 접착제 등), 홀로그래프용 수지, FPD 재료 (컬러 필터, 블랙 매트릭스, 격벽 재료, 포토스페이서, 리브, 액정용 배향막, FPD 용 시일제 등), 이방 도전성 재료, 광학 부재, 성형 재료 (건축 재료용, 광학 부품, 렌즈), 주형 재료, 퍼티, 유리 섬유 함침제, 필러재, 실링재, 봉지재 (封止材), 광 반도체 (LED) 봉지재, 광 도파로 재료, 나노임프린트 재료, 광조용, 및 마이크로 광조형용 재료 등을 들 수 있다.As a use of the composition of this invention, a coating material, a coating agent, various coating materials (hard coat, a pollution-resistant coating material, an antifogging coating material, a weatherproof coating material, an optical fiber, etc.), the backing agent of an adhesive tape, a peeling sheet for adhesive labels, for example (Coupling, peeling plastic film, peeling metal foil, etc.) peeling coating material, printing plate, dental material (dental compound, dental composite) ink, inkjet ink, electronic resist (circuit board, CSP, MEMS device, etc.) Manufacturing connection terminals, wiring pattern formation, etc.), resist films, liquid resists, negative resists (surface protective films such as semiconductor elements, interlayer insulating films, permanent film materials such as planarization films, etc.), MEMS resists, positive photosensitive materials, Negative photosensitive materials, various adhesives (temporary fixatives for various electronic components, HDD adhesives, adhesives for pickup lenses, functional films for FPD (deflection plates, anti-reflection films) ), Holographic resin, FPD material (color filter, black matrix, partition material, photospacer, rib, alignment film for liquid crystal, sealing compound for FPD), anisotropic conductive material, optical member, molding material (building Materials, optical components, lenses), casting materials, putty, glass fiber impregnating agent, filler material, sealing material, encapsulation material, optical semiconductor (LED) encapsulation material, optical waveguide material, nanoimprint material, light adjustment And micro-optical molding materials.

본 발명은 상기 서술한 각 실시형태에 한정되는 것은 아니며, 여러 가지 변경이 가능하고, 상이한 실시형태에 각각 개시된 기술적 수단을 적절히 조합하여 얻어지는 실시형태에 대해서도 본 발명의 기술적 범위에 포함된다.This invention is not limited to each embodiment mentioned above, A various change is possible and the embodiment obtained by combining suitably the technical means disclosed by each embodiment is also included in the technical scope of this invention.

실시예Example

이하, 실시예를 들어 본 발명을 보다 구체적으로 설명하지만, 본 발명은 본래 하기 실시예에 의해 제한을 받는 것은 아니며, 전·후기의 취지에 적합할 수 있는 범위에서 적당히 변경을 가하여 실시하는 것도 가능하고, 그것들은 모두 본 발명의 기술적 범위에 포함된다.Hereinafter, although an Example is given and this invention is demonstrated further more concretely, this invention is not restrict | limited by the following example originally, It is also possible to change suitably and to implement in the range which may be suitable for the meaning of the previous and the later. All of them are included in the technical scope of the present invention.

[합성예 1] 펜타플루오로페닐마그네슘브로마이드의 제조Synthesis Example 1 Preparation of Pentafluorophenylmagnesium Bromide

온도계, 적하 깔때기, 교반기, 질소 가스 도입관, 및 환류 냉각기를 구비한 반응 용기 내에 마그네슘 (2.64 g, 0.109 ㏖) 을 첨가하고, 충분히 질소 가스로 치환한 후, 그 반응 용기에, 디부틸에테르 (52.3 g) 를 주입하였다. 또, 적하 깔때기에 브롬화노르말부틸 (13.4 g, 0.098 ㏖) 을 주입하였다.Magnesium (2.64 g, 0.109 mol) is added to the reaction vessel provided with a thermometer, a dropping funnel, a stirrer, a nitrogen gas inlet tube, and a reflux condenser, and after sufficiently substituted with nitrogen gas, dibutyl ether ( 52.3 g) was injected. In addition, normal butyl bromide (13.4 g, 0.098 mol) was injected into the dropping funnel.

이어서, 30 ℃ 이하에서 적하 깔때기 내의 브롬화노르말부틸을 적하함으로써, 브롬화노르말부틸마그네슘의 디부틸에테르 용액을 얻었다.Subsequently, the normal butyl bromide in dropping funnel was dripped at 30 degrees C or less, and the dibutyl ether solution of normal butyl magnesium bromide was obtained.

별도로, 적하 깔때기에 브로모펜타플루오로벤젠 (25.3 g, 0.103 ㏖) 을 주입하였다. 상기의 반응에 의해 얻어진 반응액에 30 ℃ 이하에서 적하 깔때기 내의 브로모펜타플루오로벤젠을 적하함으로써, 펜타플루오로페닐마그네슘브로마이드의 디부틸에테르 용액을 얻었다.Separately, bromopentafluorobenzene (25.3 g, 0.103 mol) was injected into the dropping funnel. The dibutyl ether solution of pentafluorophenylmagnesium bromide was obtained by dripping the bromo pentafluorobenzene in the dripping funnel to the reaction liquid obtained by the said reaction at 30 degrees C or less.

F-NMR 에 의해 펜타플루오로페닐마그네슘브로마이드 (하기 화합물) 가 얻어진 것을 확인하였다. 또, 브로모펜타플루오로벤젠의 전화율은 97 % 이상이었다.It was confirmed that pentafluorophenylmagnesium bromide (the following compound) was obtained by F-NMR. Moreover, the conversion rate of bromopentafluorobenzene was 97% or more.

[화학식 3][Formula 3]

Figure pct00003
Figure pct00003

[합성예 2] 트리스(펜타플루오로페닐)보란의 제조Synthesis Example 2 Preparation of Tris (pentafluorophenyl) borane

합성예 1 과 동일한 반응 용기 내를 충분히 질소 가스로 치환한 후, 그 반응 용기에 붕소 화합물로서 3 불화붕소테트라하이드로푸란 착물 (4.70 g, 0.034 ㏖), 및 메틸시클로헥산 (17.0 g) 을 주입하였다. 또, 적하 깔때기에 합성예 1 에서 얻어진 펜타플루오로페닐마그네슘브로마이드를 포함하는 디부틸에테르 용액을 주입하였다.After completely replacing the inside of the reaction vessel as in Synthesis Example 1 with nitrogen gas, a boron trifluoride tetrahydrofuran complex (4.70 g, 0.034 mol) and methylcyclohexane (17.0 g) were injected into the reaction vessel as a boron compound. . In addition, a dibutyl ether solution containing pentafluorophenylmagnesium bromide obtained in Synthesis Example 1 was injected into the dropping funnel.

이어서, 30 ℃ 이하에서 반응 용기 내의 디부틸에테르 용액을 30 분에 걸쳐 적하한 후, 실온에서 추가로 2 시간 교반을 계속하였다. 이로써, 트리스(펜타플루오로페닐)보란의 디부틸에테르 용액을 얻었다.Subsequently, the dibutyl ether solution in the reaction container was dripped over 30 minutes at 30 degrees C or less, and then stirring was continued for 2 hours at room temperature. This obtained the dibutyl ether solution of tris (pentafluorophenyl) borane.

F-NMR 에 의해 트리스(펜타플루오로페닐)보란 (하기 화합물) 이 얻어진 것을 확인하였다.It was confirmed that tris (pentafluorophenyl) borane (the following compound) was obtained by F-NMR.

[화학식 4][Formula 4]

Figure pct00004
Figure pct00004

[합성예 3] 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 제조Synthesis Example 3 Preparation of Normal Butyl-tris (pentafluorophenyl) borate Sodium / Dimethoxyethane Complex

합성예 1 과 동일한 반응 용기 내를 충분히 질소 가스로 치환한 후, 그 반응 용기에, 합성예 1 과 동일한 조작에 의해 취득한 브롬화노르말부틸마그네슘을 포함하는 디부틸에테르 용액을 주입하였다. 또, 적하 깔때기에 합성예 2 에서 얻어진 트리스(펜타플루오로페닐)보란을 포함하는 디부틸에테르 용액을 주입하였다.After sufficiently replacing the reaction vessel in Synthesis Example 1 with nitrogen gas, a dibutyl ether solution containing normal bromide magnesium bromide obtained by the same operation as in Synthesis Example 1 was injected into the reaction vessel. Moreover, the dibutyl ether solution containing the tris (pentafluorophenyl) borane obtained by the synthesis example 2 was injected into the dripping funnel.

이어서, 30 ℃ 이하에서 반응 용기 내의 디부틸에테르 용액을 교반하면서, 적하 깔때기 내의 디부틸에테르 용액을 15 분에 걸쳐 적하한 후, 반응액을 50 ℃ 까지 가열하고, 추가로 3 시간 교반하였다. 이로써, 노르말부틸-트리스(펜타플루오로페닐)보레이트·마그네슘브로마이드를 디부틸에테르 용액으로서 얻었다.Subsequently, the dibutyl ether solution in the dropping funnel was added dropwise over 15 minutes while stirring the dibutyl ether solution in the reaction vessel at 30 ° C. or lower, and then the reaction solution was heated to 50 ° C. and stirred for further 3 hours. This obtained normal butyl tris (pentafluorophenyl) borate magnesium bromide as a dibutyl ether solution.

과잉량의 염산 수용액을 첨가하고 15 분 교반한 후, 반응액을 가만히 정지시키고, 2 상 분리한 수층을 발출하였다. 이어서, 반응 용기에 남아 있는 유기층에 탄산나트륨 1.20 g 을 물 18 g 에 녹인 수용액을 첨가하고 15 분 교반한 후, 반응액을 가만히 정지시키고, 2 상 분리한 수층을 발출하고, 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨염의 디부틸에테르 용액으로 하였다.After adding an excess amount of hydrochloric acid aqueous solution and stirring for 15 minutes, the reaction liquid was stopped still and the two-phase separated aqueous layer was taken out. Subsequently, an aqueous solution in which 1.20 g of sodium carbonate was dissolved in 18 g of water was added to the organic layer remaining in the reaction vessel, followed by stirring for 15 minutes. The reaction solution was then stopped and the aqueous phase separated in two phases was extracted and normal butyl-tris (penta) was added. It was set as the dibutyl ether solution of fluorophenyl) borate sodium salt.

이 디부틸에테르 용액에 디메톡시에탄 (4.56 g, 0.051 ㏖) 을 첨가하고 교반함으로써, 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 결정이 석출되었다. 이것을 여과하고, 헵탄으로 세정 후, 바람 건조시킴으로써 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 결정을 11.8 g 얻었다.Dimethoxyethane (4.56 g, 0.051 mol) was added to this dibutyl ether solution, and the crystal | crystallization of the normal butyl- tris (pentafluorophenyl) borate sodium / dimethoxyethane complex precipitated. This was filtered, washed with heptane, and air dried to obtain 11.8 g of a crystal of a normal butyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex.

H-NMR, F-NMR 에 의해 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물 (하기 화합물) 이 얻어진 것을 확인하였다.It was confirmed that normal butyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex (following compound) was obtained by H-NMR and F-NMR.

[화학식 5][Formula 5]

Figure pct00005
Figure pct00005

[실시예 1] 1,1'-디헵틸-4,4'-비피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트의 제조Example 1 Preparation of 1,1'-diheptyl-4,4'-bipyridinium-normalbutyl-tris (pentafluorophenyl) borate

합성예 1 과 동일한 반응 용기 내를 충분히 질소 가스로 치환한 후, 그 반응 용기에, 합성예 3 에서 얻어진 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 (0.149 g, 0.17 m㏖) 과 아세트산에틸 (3.9 g), 물 (4.0 g) 을 주입하였다. 또, 1,1'-디옥틸-4,4'-비피리디늄브로마이드 (0.089 g, 0.17 m㏖) 를 칭량하여 취하고, 반응 용기에 첨가하였다.After fully replacing the inside of the reaction vessel in the same manner as in Synthesis Example 1 with nitrogen gas, the reaction vessel was then subjected to normal butyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane (0.149 g, 0.17 m) obtained in Synthesis Example 3. Mol), ethyl acetate (3.9 g), and water (4.0 g) were injected. In addition, 1,1'-dioctyl-4,4'-bipyridinium bromide (0.089 g, 0.17 mmol) was weighed out and added to the reaction vessel.

실온에서 추가로 1 시간 교반하였다. 반응액을 가만히 정지시켜 2 층 분리한 후, 하층인 수층을 제거하였다. 또한 물 (5.0 g) 을 유기층에 첨가하고, 교반 세정한 후, 가만히 정지시키고, 하층인 수층을 제거하여, 1,1'-디헵틸-4,4'-비피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트를 포함하는 아세트산에틸 용액을 얻었다. 이 용액에 무수 탄산마그네슘을 첨가하고 탈수 건조시켰다. 이배퍼레이터에 의해 아세트산에틸을 제거함으로써, 1,1'-디헵틸-4,4'-비피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트의 고체 (0.21 g) 를 얻었다.It stirred at room temperature for 1 hour further. The reaction solution was left still to separate the two layers, and then the lower aqueous layer was removed. Further, water (5.0 g) was added to the organic layer, stirred and washed, and then stopped and the lower aqueous layer was removed, thereby obtaining 1,1'-diheptyl-4,4'-bipyridinium normal butyl-tris ( An ethyl acetate solution containing pentafluorophenyl) borate was obtained. Anhydrous magnesium carbonate was added to this solution, and it was dehydrated and dried. By removing the ethyl acetate with an evaporator, a solid (0.21 g) of 1,1'-diheptyl-4,4'-bipyridinium-normalbutyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 1,1'-디헵틸-4,4'-비피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 1,1'-diheptyl-4,4'-bipyridinium normal butyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 6][Formula 6]

Figure pct00006
Figure pct00006

[합성예 4] 에틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 제조Synthesis Example 4 Preparation of ethyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex

브롬화노르말부틸을 브롬화에틸로 변경한 것 이외에는 합성예 1 과 동일한 조작에 의해, 에틸마그네슘브로마이드를 취득하였다.Ethyl magnesium bromide was obtained in the same manner as in Synthesis example 1 except that normal butyl bromide was changed to ethyl bromide.

노르말부틸마그네슘브로마이드를 상기의 반응으로 얻어진 에틸마그네슘브로마이드로 변경한 것 이외에는 합성예 3 과 동일한 조작에 의해, 에틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 결정을 얻었다.Crystals of the ethyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex were obtained by the same operation as in Synthesis Example 3, except that normal butylmagnesium bromide was changed to ethylmagnesium bromide obtained by the above reaction.

H-NMR, F-NMR 에 의해 에틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물 (하기 화합물) 이 얻어진 것을 확인하였다.It was confirmed that ethyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex (following compound) was obtained by H-NMR and F-NMR.

[화학식 7][Formula 7]

Figure pct00007
Figure pct00007

[합성예 5] 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 제조Synthesis Example 5 Preparation of benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex

브롬화노르말부틸을 브롬화벤질로 변경한 것 이외에는 합성예 1 과 동일한 조작에 의해, 벤질마그네슘브로마이드를 취득하였다.Benzyl magnesium bromide was obtained by the same operation as Synthesis Example 1 except that normal butyl bromide was changed to benzyl bromide.

노르말부틸마그네슘브로마이드를 상기의 반응으로 얻어진 벤질마그네슘브로마이드로 변경한 것 이외에는 합성예 3 과 동일한 조작에 의해, 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물의 결정을 얻었다.Crystals of the benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex were obtained by the same operation as in Synthesis Example 3, except that normal butylmagnesium bromide was changed to benzyl magnesium bromide obtained by the above reaction.

H-NMR, F-NMR 에 의해 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물 (하기 화합물) 이 얻어진 것을 확인하였다.It was confirmed that benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex (the following compound) was obtained by H-NMR and F-NMR.

[화학식 8][Formula 8]

Figure pct00008
Figure pct00008

[실시예 2] 1,1'-디헵틸-4,4'-비피리디늄·에틸-트리스(펜타플루오로페닐)보레이트의 제조Example 2 Preparation of 1,1'-Diheptyl-4,4'-bipyridinium Ethyl-tris (pentafluorophenyl) borate

노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 에틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물로 변경한 것 이외에는 실시예 1 과 동일한 조작에 의해, 1,1'-디헵틸-4,4'-비피리디늄·에틸-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.By the same operation as in Example 1, except that the normal butyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex was changed to the ethyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex. Solid of 1,1'-diheptyl-4,4'-bipyridinium ethyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 1,1'-디헵틸-4,4'-비피리디늄·에틸-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 1,1'-diheptyl-4,4'-bipyridinium ethyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 9][Formula 9]

Figure pct00009
Figure pct00009

[실시예 3] 1,1'-디헵틸-4,4'-비피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 3 Preparation of 1,1'-Diheptyl-4,4'-bipyridinium-benzyl-tris (pentafluorophenyl) borate

노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물로 변경한 것 이외에는 실시예 1 과 동일한 조작에 의해, 1,1'-디헵틸-4,4'-비피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.By the same operation as in Example 1, except that the normal butyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex was changed to the benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex, Solid of 1,1'-diheptyl-4,4'-bipyridinium benzyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 1,1'-디헵틸-4,4'-비피리디늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 1,1'-diheptyl-4,4'-bipyridinium benzyl-tris (pentafluorophenyl) borate (following compound) was obtained by H-NMR and F-NMR.

[화학식 10][Formula 10]

Figure pct00010
Figure pct00010

[실시예 4] 4-페닐-1-노르말프로필피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 4 Preparation of 4-phenyl-1-normalpropylpyridinium-benzyl-tris (pentafluorophenyl) borate

1,1'-디헵틸-4,4'-비피리디늄디브로마이드를 4-페닐-1-노르말프로필피리디늄브로마이드로 변경한 것 이외에는 실시예 3 과 동일한 조작에 의해, 4-페닐-1-노르말프로필피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.4-phenyl-1-normal by the same operation as in Example 3, except that 1,1'-diheptyl-4,4'-bipyridinium dibromide was changed to 4-phenyl-1-normalpropylpyridinium bromide. Solid of propylpyridinium benzyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 4-페닐-1-노르말프로필피리디늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 4-phenyl-1-normalpropylpyridinium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 11][Formula 11]

Figure pct00011
Figure pct00011

[실시예 5] 4-벤조일-1-벤질피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 5 Preparation of 4-benzoyl-1-benzylpyridinium-benzyl-tris (pentafluorophenyl) borate

4-벤조일-1-벤질피리디늄브로마이드와 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 사용하여, 실시예 1 과 동일한 조작에 의해, 4-벤조일-1-벤질피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.4-benzoyl-1-benzylpyridinium by the same operation as in Example 1 using 4-benzoyl-1-benzylpyridinium bromide and benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex Solid of benzyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 4-벤조일-1-벤질피리디늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 4-benzoyl-1-benzylpyridinium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 12][Formula 12]

Figure pct00012
Figure pct00012

[실시예 6] 1-벤질퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 6 Preparation of 1-benzylquinolinium benzyl-tris (pentafluorophenyl) borate

1-벤질퀴놀리늄브로마이드와 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 사용하여, 실시예 1 과 동일한 조작에 의해, 1-벤질퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 점조성 (粘稠性) 액체를 얻었다.1-benzylquinolinium benzyl-tris (penta) by the same operation as in Example 1 using 1-benzylquinolinium bromide and benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex A viscous liquid of fluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 1-벤질퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 1-benzylquinolinium benzyl-tris (pentafluorophenyl) borate (following compound) was obtained by H-NMR and F-NMR.

[화학식 13][Formula 13]

Figure pct00013
Figure pct00013

[실시예 7] 2,4,6-트리메틸피릴륨·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 7 Preparation of 2,4,6-trimethylpyryllium benzyl-tris (pentafluorophenyl) borate

2,4,6-트리메틸피릴륨브로마이드와 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 사용하여, 실시예 1 과 동일한 조작에 의해, 2,4,6-트리메틸피릴륨·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.2,4,6-trimethylpyryllium by the same operation as in Example 1 using 2,4,6-trimethylpyryllium bromide and benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex Solid of benzyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 2,4,6-트리메틸피릴륨·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 2,4,6-trimethylpyryllium benzyl-tris (pentafluorophenyl) borate (following compound) was obtained by H-NMR and F-NMR.

[화학식 14][Formula 14]

Figure pct00014
Figure pct00014

[합성예 6] 펜타플루오로페닐마그네슘브로마이드의 제조Synthesis Example 6 Preparation of Pentafluorophenylmagnesium Bromide

합성예 1 과 동일하게 온도계, 적하 깔때기, 교반기, 질소 가스 도입관, 및 환류 냉각기를 구비한 반응 용기 내에 마그네슘 (2.48 g, 0.102 ㏖) 을 첨가하고, 충분히 질소 가스로 치환한 후, 그 반응 용기에, 시클로펜틸메틸에테르 (37.8 g) 를 주입하였다.In the same manner as in Synthesis example 1, magnesium (2.48 g, 0.102 mol) was added to a reaction vessel equipped with a thermometer, a dropping funnel, a stirrer, a nitrogen gas inlet tube, and a reflux condenser, and after sufficiently substituted with nitrogen gas, the reaction vessel Cyclopentyl methyl ether (37.8 g) was injected into the flask.

별도로, 적하 깔때기에 브로모펜타플루오로벤젠 (21.0 g, 0.085 ㏖) 을 주입하였다. 30 ℃ 이하에서 적하 깔때기 내의 브로모펜타플루오로벤젠 대략 2 g 을 적하하고, 잠시 교반함으로써 반응액의 온도가 상승함으로써 반응이 개시한 것을 확인하였다. 그 후, 나머지 브로모펜타플루오로벤젠을 30 ℃ 이하에서 적하함으로써 펜타플루오로페닐마그네슘브로마이드의 시클로펜틸메틸에테르 용액을 얻었다.Separately, bromopentafluorobenzene (21.0 g, 0.085 mol) was injected into the dropping funnel. About 30 g of bromopentafluorobenzene in the dripping funnel was dripped at 30 degreeC or less, and it stirred that for a while, it confirmed that reaction started by raising the temperature of the reaction liquid. Then, the remaining bromopentafluorobenzene was dripped at 30 degrees C or less, and the cyclopentyl methyl ether solution of pentafluorophenylmagnesium bromide was obtained.

F-NMR 에 의해 펜타플루오로페닐마그네슘브로마이드 (하기 화합물) 가 얻어진 것을 확인하였다. 또, 브로모펜타플루오로벤젠의 전화율은 97 % 이상이었다.It was confirmed that pentafluorophenylmagnesium bromide (the following compound) was obtained by F-NMR. Moreover, the conversion rate of bromopentafluorobenzene was 97% or more.

[화학식 15][Formula 15]

Figure pct00015
Figure pct00015

[합성예 7] 트리스(펜타플루오로페닐)보란의 제조Synthesis Example 7 Preparation of Tris (pentafluorophenyl) borane

합성예 1 과 동일한 반응 용기를 사용하여 용기 내를 충분히 질소 가스로 치환한 후, 그 반응 용기에 합성예 6 으로 조제한 펜타플루오로페닐마그네슘브로마이드의 시클로펜틸메틸에테르 용액을 글래스 필터에 통과시켜 이송함으로써, 미반응의 마그네슘 금속을 제거하였다. 적하 깔때기에 삼불화붕소테트라하이드로푸란 착물 (3.8 g, 0.0272 ㏖) 을 주입하였다. 이어서, 30 ℃ 이하에서 30 분에 걸쳐 적하한 후, 실온에서 추가로 2 시간 교반을 계속하였다. 이로써, 트리스(펜타플루오로페닐)보란의 시클로펜틸메틸에테르 용액을 얻었다.After sufficiently replacing the inside of the vessel with nitrogen gas using the same reaction vessel as in Synthesis Example 1, the cyclopentylmethylether solution of pentafluorophenylmagnesium bromide prepared in Synthesis Example 6 was transferred to the reaction vessel by passing through a glass filter. , Unreacted magnesium metal was removed. A boron trifluoride tetrahydrofuran complex (3.8 g, 0.0272 mol) was injected into the dropping funnel. Subsequently, after dripping over 30 minutes at 30 degrees C or less, stirring was continued for 2 hours at room temperature. This obtained the cyclopentyl methyl ether solution of tris (pentafluorophenyl) borane.

합성예 1 과 동일한 반응 용기를 따로 준비하고, 이것에 이소도데칸 (200 g) 을 주입하였다. 상기에서 얻어진 트리스(펜타플루오로페닐)보란의 시클로펜틸메틸에테르 용액을 적하 깔때기에 주입하고, 이소도데칸을 주입한 반응 용기에 설치하였다. 감압하, 70 ℃ 전후에서 트리스(펜타플루오로페닐)보란의 시클로펜틸메틸에테르 용액을 적하함으로써 이소도데칸과 시클로펜틸메틸에테르의 용매 교환을 실시하였다. 반응 용기에는 부생성물인 마그네슘염이 석출되므로 이것을 여과함으로써 제거하여, 트리스(펜타플루오로페닐)보란의 이소도데칸 용액을 얻었다. 액온이 낮아짐으로써 트리스(펜타플루오로페닐)보란의 석출을 방지하기 위해 디부틸에테르 (13.5 g) 를 첨가하였다.The same reaction vessel as in Synthesis example 1 was separately prepared, and isododecane (200 g) was injected into this. The cyclopentylmethylether solution of tris (pentafluorophenyl) borane obtained above was injected into the dropping funnel, and it was installed in the reaction container in which isododecane was injected. The solvent exchange of isododecane and cyclopentyl methyl ether was performed by dripping the cyclopentyl methyl ether solution of tris (pentafluorophenyl) borane under 70 degreeC under reduced pressure. Since magnesium salt which is a by-product precipitated in the reaction container, it was removed by filtration and the isododecane solution of tris (pentafluorophenyl) borane was obtained. Dibutyl ether (13.5 g) was added to prevent precipitation of tris (pentafluorophenyl) borane by lowering the liquid temperature.

F-NMR 에 의해 트리스(펜타플루오로페닐)보란 (하기 화합물) 이 얻어진 것을 확인하였다.It was confirmed that tris (pentafluorophenyl) borane (the following compound) was obtained by F-NMR.

[화학식 16][Formula 16]

Figure pct00016
Figure pct00016

[합성예 8] 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨 수용액의 제조Synthesis Example 8 Preparation of Normal Butyl Tris (Pentafluorophenyl) Borate and Sodium Aqueous Solution

합성예 1 과 동일한 반응 용기를 사용하여 용기 내를 충분히 질소 가스로 치환한 후, 그 반응 용기에, 합성예 1 과 동일한 조작에 의해 취득한 브롬화노르말부틸마그네슘을 포함하는 디부틸에테르 용액을 주입하였다. 또, 적하 깔때기에 합성예 7 에서 얻어진 트리스(펜타플루오로페닐)보란을 포함하는 이소도데칸 용액을 주입하였다.After the inside of the vessel was sufficiently replaced with nitrogen gas using the same reaction vessel as in Synthesis Example 1, a dibutyl ether solution containing normal butylmagnesium bromide obtained by the same operation as in Synthesis Example 1 was injected. In addition, an isododecane solution containing tris (pentafluorophenyl) borane obtained in Synthesis Example 7 was injected into the dropping funnel.

이어서, 30 ℃ 이하에서 반응 용기 내의 디부틸에테르 용액을 교반하면서, 적하 깔때기 내의 이소도데칸 용액을 1 시간에 걸쳐 적하한 후, 반응액을 50 ℃ 까지 가열하여 1 시간 교반하고, 추가로 70 ℃ 까지 온도를 높이고 2 시간 교반하였다. 이로써, 노르말부틸-트리스(펜타플루오로페닐)보레이트·마그네슘브로마이드의 반응액을 얻었다.Subsequently, the isodecane solution in the dropping funnel was added dropwise over 1 hour while the dibutyl ether solution in the reaction vessel was stirred at 30 ° C. or lower, and then the reaction solution was heated to 50 ° C. and stirred for 1 hour, further 70 ° C. The temperature was raised to and stirred for 2 hours. This obtained the reaction liquid of normal butyl tris (pentafluorophenyl) borate magnesium bromide.

과잉량의 염산 수용액을 첨가하여 15 분 교반한 후, 반응액을 가만히 정지시키고, 2 상 분리한 수층을 발출하였다. 이어서, 반응 용기에 남아있는 유기층에 탄산나트륨 (2.7 g, 0.026 ㏖) 을 물 18.0 g 에 녹인 수용액을 첨가하고 15 분 교반한 후, 반응액을 가만히 정지시키고, 2 상 분리한 수층을 발출하여, 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨염의 이소도데칸 용액으로 하였다.After adding an excess amount of hydrochloric acid aqueous solution and stirring for 15 minutes, the reaction liquid was stopped still and the aqueous phase separated by two phases was taken out. Subsequently, an aqueous solution in which sodium carbonate (2.7 g, 0.026 mol) was dissolved in 18.0 g of water was added to the organic layer remaining in the reaction vessel, followed by stirring for 15 minutes. The reaction solution was then stopped and the aqueous phase separated in two phases was taken out. It was set as the isododecane solution of butyl-tris (pentafluorophenyl) borate sodium salt.

이 이소도데칸 용액에 물 (160 g) 을 첨가하고, 감압하에서 물과 함께 유기 용매를 증류 제거함으로써 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨염의 수용액을 얻었다 (84.0 g, 보레이트 고형분 14.7 질량%).Water (160 g) was added to this isododecane solution, and an organic solvent was distilled off together with water under reduced pressure to obtain an aqueous solution of normal butyl-tris (pentafluorophenyl) borate sodium salt (84.0 g, borate solid content 14.7). mass%).

H-NMR, F-NMR 에 의해 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨 수용액이 얻어진 것을 확인하였다.It confirmed that the normal butyl- tris (pentafluorophenyl) borate sodium solution was obtained by H-NMR and F-NMR.

[화학식 17][Formula 17]

Figure pct00017
Figure pct00017

[합성예 9] 벤질-트리스(펜타플루오로페닐)보레이트·나트륨 수용액의 제조Synthesis Example 9 Preparation of benzyl-tris (pentafluorophenyl) borate and sodium aqueous solution

브롬화노르말부틸을 브롬화벤질로 변경한 것 이외에는 합성예 1 과 동일한 조작에 의해, 벤질마그네슘브로마이드를 취득하였다.Benzyl magnesium bromide was obtained by the same operation as Synthesis Example 1 except that normal butyl bromide was changed to benzyl bromide.

노르말부틸마그네슘브로마이드를 상기의 반응으로 얻어진 벤질마그네슘브로마이드로 변경한 것 이외에는 합성예 8 과 동일한 조작에 의해, 벤질-트리스(펜타플루오로페닐)보레이트·나트륨염의 수용액을 얻었다.An aqueous solution of benzyl-tris (pentafluorophenyl) borate and sodium salt was obtained by the same operation as in Synthesis Example 8 except that normal butylmagnesium bromide was changed to benzyl magnesium bromide obtained by the above reaction.

H-NMR, F-NMR 에 의해 벤질-트리스(펜타플루오로페닐)보레이트·나트륨 수용액이 얻어진 것을 확인하였다.It was confirmed that benzyl-tris (pentafluorophenyl) borate and sodium aqueous solution were obtained by H-NMR and F-NMR.

[화학식 18][Formula 18]

Figure pct00018
Figure pct00018

[실시예 8] 4-페닐-1-노르말부틸피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트의 제조Example 8 Preparation of 4-phenyl-1-normalbutylpyridinium normalbutyl-tris (pentafluorophenyl) borate

교반자를 구비한 가지형 플라스크에 4-페닐-1-노르말부틸피리디늄브로마이드 (0.125 g, 0.42 m㏖) 를 주입하고, 물 (0.56 g) 을 첨가하여 수용액으로 하였다. 합성예 8 에서 얻어진 노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨 수용액 (1.70 g, 보레이트 고형분 14.7 질량%) 을 0 ℃ 하에서 교반하면서 적하하였다.4-phenyl-1-normal-butylpyridinium bromide (0.125 g, 0.42 mmol) was injected into the branch flask equipped with the stirrer, and water (0.56 g) was added to make an aqueous solution. The normal butyl-tris (pentafluorophenyl) borate aqueous sodium solution (1.70 g, borate solid content 14.7 mass%) obtained by the synthesis example 8 was dripped under 0 degreeC, stirring.

그대로 1 시간 교반을 계속하고, 추가로 50 ℃ 로 승온시켜 1 시간 교반하였다. 적하 중에 백색의 고체가 석출되었다. 고체를 여과하고, 소량의 물로 세정 후, 건조시킴으로써 4-페닐-1-노르말부틸피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트의 백색 고체 (0.31 g) 를 얻었다.Stirring was continued as it was for 1 hour, and it heated up at 50 degreeC further, and stirred for 1 hour. A white solid precipitated during the dropping. The solid was filtered, washed with a small amount of water, and dried to give a white solid (0.31 g) of 4-phenyl-1-normalbutylpyridinium normalbutyl-tris (pentafluorophenyl) borate.

H-NMR, F-NMR 에 의해 4-페닐-1-노르말부틸피리디늄·노르말부틸-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 4-phenyl-1-normal butylpyridinium normal butyl-tris (pentafluorophenyl) borate (following compound) was obtained by H-NMR and F-NMR.

[화학식 19][Formula 19]

Figure pct00019
Figure pct00019

[실시예 9] 4-페닐-1-노르말부틸피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 9 Preparation of 4-phenyl-1-normalbutylpyridinium benzyl-tris (pentafluorophenyl) borate

노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨 수용액을 벤질-트리스(펜타플루오로페닐)보레이트·나트륨 수용액으로 변경한 것 이외에는 실시예 8 과 동일한 조작에 의해, 4-페닐-1-노르말프로필피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.4-phenyl-1-normalpropyl was produced in the same manner as in Example 8 except that the aqueous normal butyl-tris (pentafluorophenyl) borate solution was changed to the aqueous benzyl-tris (pentafluorophenyl) borate solution. Solid of pyridinium benzyl-tris (pentafluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 4-페닐-1-노르말프로필피리디늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 4-phenyl-1-normalpropylpyridinium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 20][Formula 20]

Figure pct00020
Figure pct00020

[실시예 10] 1-에틸퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 10 Preparation of 1-ethylquinolinium benzyl-tris (pentafluorophenyl) borate

노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨 수용액을 벤질-트리스(펜타플루오로페닐)보레이트·나트륨 수용액으로, 4-페닐-1-노르말부틸피리디늄브로마이드를 1-에틸퀴놀리늄브로마이드로 변경한 것 이외에는 실시예 8 과 동일한 조작에 의해, 1-에틸퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.Normal butyl-tris (pentafluorophenyl) borate aqueous sodium solution to benzyl-tris (pentafluorophenyl) borate aqueous sodium solution, 4-phenyl-1-normal butylpyridinium bromide to 1-ethylquinolinium bromide Except having changed, the solid of 1-ethylquinolinium benzyl- tris (pentafluorophenyl) borate was obtained by operation similar to Example 8.

H-NMR, F-NMR 에 의해 1-에틸퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 1-ethylquinolinium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 21][Formula 21]

Figure pct00021
Figure pct00021

[실시예 11] 2-벤질이소퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Example 11 Preparation of 2-benzylisoquinolinium benzyl-tris (pentafluorophenyl) borate

노르말부틸-트리스(펜타플루오로페닐)보레이트·나트륨 수용액을 벤질-트리스(펜타플루오로페닐)보레이트·나트륨 수용액으로, 4-페닐-1-노르말부틸피리디늄브로마이드를 2-벤질이소퀴놀리늄브로마이드로 변경한 것 이외에는 실시예 8 과 동일한 조작에 의해, 2-벤질이소퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 고체를 얻었다.Normal butyl-tris (pentafluorophenyl) borate and sodium aqueous solution is benzyl-tris (pentafluorophenyl) borate and sodium aqueous solution and 4-phenyl-1-normal butylpyridinium bromide is 2-benzyl isoquinolinium bromide A solid of 2-benzylisoquinolinium benzyl-tris (pentafluorophenyl) borate was obtained by the same operation as in Example 8 except for changing to.

H-NMR, F-NMR 에 의해 2-벤질이소퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 2-benzylisoquinolinium benzyl-tris (pentafluorophenyl) borate (following compound) was obtained by H-NMR and F-NMR.

[화학식 22][Formula 22]

Figure pct00022
Figure pct00022

[비교예 1] 테트라페닐포스포늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조[Comparative Example 1] Production of tetraphenylphosphonium benzyl-tris (pentafluorophenyl) borate

테트라페닐포스포늄브로마이드와 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 사용하여, 실시예 1 과 동일한 조작에 의해, 테트라페닐포스포늄·벤질-트리스(펜타플루오로페닐)보레이트의 점조성 액체를 얻었다.Tetraphenylphosphonium benzyl-tris (pentafluorophenyl) by the same operation as in Example 1 using tetraphenylphosphonium bromide and benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex A viscous viscous liquid was obtained.

H-NMR, F-NMR 에 의해 테트라페닐포스포늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that tetraphenylphosphonium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 23][Formula 23]

Figure pct00023
Figure pct00023

[비교예 2] 테트라노르말부틸암모늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조[Comparative Example 2] Preparation of tetranormalbutylammonium benzyl-tris (pentafluorophenyl) borate

테트라노르말부틸암모늄브로마이드와 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 사용하여, 실시예 1 과 동일한 조작에 의해, 테트라노르말부틸암모늄·벤질-트리스(펜타플루오로페닐)보레이트의 점조성 액체를 얻었다.Tetranormalybutylammonium benzyl-tris (pentafluorophenyl) by the same operation as in Example 1 using tetranormalbutylammonium bromide and benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex A viscous viscous liquid was obtained.

H-NMR, F-NMR 에 의해 테트라노르말부틸암모늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that tetranormalbutylammonium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 24][Formula 24]

Figure pct00024
Figure pct00024

[비교예 3] 1-노르말부틸피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 제조Comparative Example 3 Preparation of 1-normal-butylpyridinium-benzyl-tris (pentafluorophenyl) borate

1-노르말부틸피리디늄브로마이드와 벤질-트리스(펜타플루오로페닐)보레이트·나트륨/디메톡시에탄 착물을 사용하여, 실시예 4 와 동일한 조작에 의해, 1-노르말부틸피리디늄·벤질-트리스(펜타플루오로페닐)보레이트의 점조성 액체를 얻었다.1-Normalbutylpyridinium benzyl-tris (penta) by the same operation as in Example 4 using 1-normal butylpyridinium bromide and benzyl-tris (pentafluorophenyl) borate sodium / dimethoxyethane complex A viscous liquid of fluorophenyl) borate was obtained.

H-NMR, F-NMR 에 의해 1-노르말부틸피리디늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that 1-normal butylpyridinium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 25][Formula 25]

Figure pct00025
Figure pct00025

[루이스산 발생의 유무의 확인][Confirmation of the presence or absence of Lewis acid]

실시예 및 비교예에서 얻어진 화합물을 사용하여 루이스산 발생의 유무의 확인 시험을 실시하였다.Confirmation test of the presence or absence of Lewis acid generation was done using the compound obtained by the Example and the comparative example.

즉, 실시예 및 비교예에서 얻어진 화합물 1 질량부를 프로필렌카보네이트 1 질량부에 용해시켰다. 얻어진 용액 (15 ㎎) 에 대해, 25 ℃ 하, 고압 수은 램프를 사용하여 UV 광을 5 분간 조사하였다 (365 ㎚ 파장의 조사 강도 ; 50 ㎽/㎠).That is, 1 mass part of compounds obtained by the Example and the comparative example were melt | dissolved in 1 mass part of propylene carbonate. The obtained solution (15 mg) was irradiated with UV light for 5 minutes at 25 degreeC using the high pressure mercury lamp (irradiation intensity of 365 nm wavelength; 50 mW / cm <2>).

광 조사 후의 용액을 F-NMR 분석함으로써 루이스산인 트리스(펜타플루오로페닐)보란의 생성을 확인하였다.F-NMR analysis of the solution after light irradiation confirmed the production of tris (pentafluorophenyl) borane which is a Lewis acid.

[중합성 평가 실험][Polymerization Evaluation Experiment]

실시예 및 비교예에서 얻어진 화합물을 사용하여 중합 시험을 실시하였다.The polymerization test was conducted using the compound obtained by the Example and the comparative example.

즉, 실시예 및 비교예에서 얻어진 화합물 1 질량부를 프로필렌카보네이트 1 질량부에 용해시켰다. 중합성 화합물 [지환식 에폭시 수지 (셀록사이드 2021P, 다이셀사 제조) 또는 방향족 에폭시 수지 (비스페놀 A 디글리시딜에테르, 도쿄 화성 공업사 제조)] 99 질량부에, 당해 혼합 용액 1 질량부를 혼합하였다.That is, 1 mass part of compounds obtained by the Example and the comparative example were melt | dissolved in 1 mass part of propylene carbonate. 1 mass part of the said mixed solution was mixed with 99 mass parts of polymeric compounds [alicyclic epoxy resin (Celoxide 2021P, the Daicel company make) or aromatic epoxy resin (bisphenol A diglycidyl ether, the Tokyo Chemical Co., Ltd. make).

또한, 실시예 1 ∼ 7 및 비교예 1 ∼ 3 에서 얻어진 화합물에는, 지환식 에폭시 수지를, 실시예 8 ∼ 11 에서 얻어진 화합물에는, 각각, 지환식 에폭시 수지 및 방향족 에폭시 수지의 양방을 사용하였다.In addition, the alicyclic epoxy resin was used for the compound obtained in Examples 1-7 and Comparative Examples 1-3, and both the alicyclic epoxy resin and aromatic epoxy resin were used for the compound obtained in Examples 8-11, respectively.

얻어진 용액 (5 ㎎) 에 대해, 25 ℃ (가열하지 않음), 50 ℃ 또는 80 ℃ 하, 고압 수은 램프를 사용하여 UV 광을 5 분간 조사 (365 ㎚ 파장의 조사 강도 ; 20 ㎽/㎠) 하고, 그 때의 중합 발열량을 포토-DSC 에 의해 측정하였다. 중합 발열량의 피크에 대해, 광 조사의 개시점과 종료점을 직선으로 연결하고, 얻어진 면적을 발열량으로 하였다.The obtained solution (5 mg) was irradiated with UV light for 5 minutes (irradiation intensity of 365 nm wavelength; 20 Hz / cm 2) using a high pressure mercury lamp at 25 ° C. (not heated), 50 ° C. or 80 ° C. The amount of polymerization calorific value at that time was measured by photo-DSC. The start point and the end point of light irradiation were connected linearly with respect to the peak of the polymerization calorific value, and the obtained area was taken as the calorific value.

또한, 실시예 1 ∼ 7 및 비교예 1 ∼ 3 에서 얻어진 화합물에 대해서는, 50 ℃ 하에서만 실시하였다.In addition, about the compound obtained in Examples 1-7 and Comparative Examples 1-3, it implemented only at 50 degreeC.

[카티온부의 HOMO-LUMO Gap 의 계산 수법][Calculation Method of HOMO-LUMO Gap of Cation Part]

실시예 및 비교예에서 얻어진 화합물의 HOMO, LUMO 에너지는, 미국 Gaussian 사 제조의 분자 궤도 계산용 소프트웨어인 Gaussian09 를 사용하여 계산하였다.HOMO and LUMO energies of the compounds obtained in Examples and Comparative Examples were calculated using Gaussian09, software for calculating molecular orbits, manufactured by Gaussian, USA.

계산 수법은 밀도범 함수법 B3LYP 를 선택하고, 기저 함수는 6-311G(d, p) 를 사용하였다. 대상으로 하는 분자 구조의 구조 최적화를 실시하고, 구조 최적화가 완료한 후의 HOMO, LUMO 의 에너지 레벨 (eV 단위 환산값) 을 계산하였다.As the calculation method, the density range function method B3LYP was selected, and the basis function was 6-311 G (d, p). The structural optimization of the target molecular structure was performed, and the energy levels (eV unit conversion value) of HOMO and LUMO after structural optimization were computed.

결과를 화합물의 구조와 함께 표 1, 표 2, 표 3 및 표 4 에 나타낸다.The results are shown in Tables 1, 2, 3 and 4 together with the structures of the compounds.

Figure pct00026
Figure pct00026

Figure pct00027
Figure pct00027

Figure pct00028
Figure pct00028

Figure pct00029
Figure pct00029

상기 표의 결과로부터 분명한 바와 같이, 실시예의 화합물에서는, 광에 의해 루이스산이 발생하였다. 그리고, 실시예의 화합물을 사용함으로써, 중합이 양호하게 진행되었다.As is clear from the results of the above table, in the compound of the example, Lewis acid was generated by light. And the polymerization advanced satisfactorily by using the compound of the example.

[1 액 안정성 평가 시험][1 liquid stability evaluation test]

실시예에서 얻어진 화합물과, 비교로서 대표적인 광산 발생제인 쿠멘-4-일(p-톨릴)요오드늄·테트라키스(펜타플루오로페닐)보레이트 (이하, 요오드늄보레이트염으로 한다) 를 사용하여, 1 액 안정성 평가 시험을 실시하였다.Using the compound obtained in the Example and cumene-4-yl (p-tolyl) iodonium tetrakis (pentafluorophenyl) borate (henceforth iodonium borate salt) which is a typical photo-acid generator as a comparison, it is 1 Liquid stability evaluation test was done.

실시예 8 에서 얻어진 화합물, 실시예 9 에서 얻어진 화합물 또는 요오드늄보레이트염 1 질량부를 프로필렌카보네이트 1 질량부에 용해시켜, 혼합 용액을 얻었다.1 mass part of the compound obtained in Example 8, the compound obtained in Example 9, or iodonium borate salt was melt | dissolved in 1 mass part of propylene carbonate, and the mixed solution was obtained.

지환식 에폭시 수지 (셀록사이드 2021P, 다이셀사 제조) 99 부에, 당해 혼합 용액 1 질량부를 혼합하고, 밀폐하여 차광하에서 40 ℃ 에서 보관하였다.1 part by mass of the mixed solution was mixed with 99 parts of an alicyclic epoxy resin (Celoxide 2021P, manufactured by Daicel Co., Ltd.), sealed, and stored at 40 ° C under light shielding.

점도 측정에 의해 1 액 안정성을 평가하였다. 초기 점도 (경과 일수 0 일) 를 기준 (증점 배수 1) 으로 하여, 일수가 경과했을 때의 점도와 비교한 값을 증점 배수 (측정시의 점도/초기 점도) 로 하였다.1 liquid stability was evaluated by viscosity measurement. The value compared with the viscosity when days were passed was made into the initial viscosity (0 days of elapsed days) as a reference | standard (thickened multiple 1), and it was set as the thickening multiple (viscosity at the time of measurement / initial viscosity).

이하의 표에 결과를 나타낸다.The results are shown in the following table.

Figure pct00030
Figure pct00030

상기 표의 결과로부터 분명한 바와 같이, 실시예 8 및 9 에서 얻어진 화합물은 1 액 안정성이 크고, 수지 조성물의 점도 증가가 억제되어 있었다.As is clear from the results of the above table, the compounds obtained in Examples 8 and 9 had a high one-liquid stability, and the increase in viscosity of the resin composition was suppressed.

이와 같이 실시예에서 얻어진 화합물은, 차광하에 있어서의 루이스산의 발생이 고도로 억제되어 있고, 우수한 안정성을 갖는 것을 알 수 있었다.Thus, it turned out that the compound obtained by the Example is highly suppressed in generation | occurrence | production of Lewis acid under light shielding, and has the outstanding stability.

(실시예 12)(Example 12)

실시예 6 에 있어서, 1-벤질퀴놀리늄브로마이드 대신에, 퀴놀리늄브로마이드를 사용한 것 이외에는, 실시예 6 과 동일하게 하여, 퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트의 점조성 액체를 얻었다.Viscosity of quinolinium benzyl-tris (pentafluorophenyl) borate in the same manner as in Example 6 except that quinolinium bromide was used instead of 1-benzylquinolinium bromide in Example 6 A liquid was obtained.

H-NMR, F-NMR 에 의해 퀴놀리늄·벤질-트리스(펜타플루오로페닐)보레이트 (하기 화합물) 가 얻어진 것을 확인하였다.It was confirmed that quinolinium benzyl-tris (pentafluorophenyl) borate (the following compound) was obtained by H-NMR and F-NMR.

[화학식 26][Formula 26]

Figure pct00031
Figure pct00031

얻어진 화합물에 대해, 상기와 동일한 방법으로, 루이스산의 발생의 유무를 확인한 결과, 루이스산이 발생하고 있는 것을 확인하였다.About the obtained compound, when the presence or absence of generation | occurrence | production of Lewis acid was confirmed by the same method as the above, it confirmed that Lewis acid was generated.

또, 얻어진 화합물에 있어서, 상기와 동일한 방법으로, 카티온부의 HOMO-LUMO Gap 을 계산한 결과, 4.287 eV 이었다.Moreover, in the obtained compound, HOMO-LUMO Gap of the cation part was calculated by the same method as the above, and it was 4.287 eV.

산업상 이용가능성Industrial availability

본 발명의 화합물에 의하면, 광에 의해 루이스산을 발생할 수 있다. 그 때문에, 본 발명의 화합물은, 루이스산을 이용하는 여러 가지 용도, 예를 들어, 중합 개시제, 레지스트 등에 적용할 수 있다.According to the compound of the present invention, Lewis acid can be generated by light. Therefore, the compound of this invention can be applied to various uses using a Lewis acid, for example, a polymerization initiator, a resist, etc.

Claims (13)

붕소를 중심 원자로 하고, 적어도 1 개의 할로겐 원자를 포함하는 아릴기를 갖는 아니온부와, 카티온부를 갖는 화합물로서, 광 조사에 의해 아니온부로부터 루이스산을 발생할 수 있는 화합물.A compound having an anion moiety having an aryl group containing boron as a center atom and containing at least one halogen atom and a cation moiety, wherein the compound can generate Lewis acid from the anion moiety by light irradiation. 제 1 항에 있어서,
아니온부가 하기 식 (1) 로 나타내는 화합물.
Figure pct00032

(식 중, Ar1, Ar2 및 Ar3 은 동일한 또는 상이한 치환기를 가지고 있어도 되는 아릴기, R1 은 치환기를 나타낸다)
The method of claim 1,
The compound whose anion part is represented by following formula (1).
Figure pct00032

(In the formula, Ar 1 , Ar 2 and Ar 3 are an aryl group which may have the same or different substituents, and R 1 represents a substituent.)
제 2 항에 있어서,
식 (1) 에 있어서, Ar1, Ar2 및 Ar3 중 적어도 1 개가, 적어도 1 개의 할로겐 원자를 갖는 아릴기이고, R1 이 치환기를 가지고 있어도 되는 탄화수소기 또는 하이드록실기인 화합물.
The method of claim 2,
In the formula (1), at least one of Ar 1 , Ar 2 and Ar 3 is an aryl group having at least one halogen atom, and R 1 is a hydrocarbon group or a hydroxyl group which may have a substituent.
제 1 항 내지 제 3 항 중 어느 한 항에 있어서,
카티온부가 HOMO-LUMO 간의 갭이 5.3 eV 이하인 카티온으로 구성되는 화합물.
The method according to any one of claims 1 to 3,
The compound in which the cation moiety consists of cation whose gap between HOMO-LUMO is 5.3 eV or less.
제 1 항 내지 제 4 항 중 어느 한 항에 있어서,
카티온부가 루이스산에 대해 비반응성인 화합물.
The method according to any one of claims 1 to 4,
Compounds in which the cation moiety is unreactive to Lewis acids.
제 1 항 내지 제 5 항 중 어느 한 항에 있어서,
카티온부가 광에 의해 프로톤산을 발생하지 않는 화합물.
The method according to any one of claims 1 to 5,
A compound in which the cation moiety does not generate protonic acid by light.
제 1 항 내지 제 6 항 중 어느 한 항에 있어서,
카티온부가 질소, 산소 및 인에서 선택된 헤테로 원자를 중심 원자로 하는 카티온인 화합물.
The method according to any one of claims 1 to 6,
A compound in which the cation moiety is a cation having a hetero atom selected from nitrogen, oxygen, and phosphorus as a central atom.
제 1 항 내지 제 7 항 중 어느 한 항에 있어서,
광의 파장이 240 ㎚ 이상인 화합물.
The method according to any one of claims 1 to 7,
The compound whose wavelength of light is 240 nm or more.
제 1 항 내지 제 8 항 중 어느 한 항에 기재된 화합물을 포함하는 광 중합 개시제.The photoinitiator containing the compound as described in any one of Claims 1-8. 제 1 항 내지 제 9 항 중 어느 한 항에 기재된 화합물 또는 제를 포함하는 조성물.A composition comprising the compound or agent according to any one of claims 1 to 9. 추가로, 루이스산에 의해 중합 가능한 중합성 화합물을 포함하는 제 10 항에 기재된 조성물에 광 조사하여, 중합성 화합물의 중합체를 제조하는 방법.Furthermore, the method of irradiating the composition of Claim 10 containing the polymeric compound which can superpose | polymerize with Lewis acid to manufacture the polymer of a polymeric compound. 제 11 항에 있어서,
가열하에서 제조하는 제조 방법.
The method of claim 11,
Manufacturing method produced under heating.
제 10 항에 기재된 조성물을 차광하에서 보존하는 방법.The method of storing the composition of Claim 10 under light shielding.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001183821A (en) 1999-12-27 2001-07-06 Nippon Shokubai Co Ltd Photoacid producing agent for chemically amplified resist
JP2014205624A (en) 2013-04-11 2014-10-30 サンアプロ株式会社 Onium borate-based acid generator
JP2014214129A (en) 2013-04-26 2014-11-17 サンアプロ株式会社 Curable composition and cured body using the same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY132867A (en) * 1995-11-24 2007-10-31 Ciba Specialty Chemicals Holding Inc Acid-stable borates for photopolymerization
JPH09183960A (en) * 1995-12-28 1997-07-15 Toyo Ink Mfg Co Ltd Actinic-radiation-sensitive acid generator, actinic-radiation-sensitive acid generator composition and curing composition
JP3873310B2 (en) * 1996-01-22 2007-01-24 東洋インキ製造株式会社 Energy-sensitive linear acid generator, energy-sensitive linear acid generator composition, curable composition, and cured product thereof
JPH09241614A (en) * 1996-03-04 1997-09-16 Toyo Ink Mfg Co Ltd Energy ray-sensitive acid-generating agent, energy ray-sensitive acid-generating agent composition, curable composition and its cured product
JPH101508A (en) * 1996-06-17 1998-01-06 Toyo Ink Mfg Co Ltd Active ray sensitive acid generating agent composition, responsive composition, and image recording composition
DE59903270D1 (en) * 1998-08-21 2002-12-05 Ciba Sc Holding Ag PHOTO-ACTIVATED NITROGEN BASES
JP2000319283A (en) * 1999-03-08 2000-11-21 Fuji Photo Film Co Ltd Borate compound and photopolymerizable composition and recording material containing the same
DE112004000832T5 (en) * 2003-05-12 2006-03-23 Sumitomo Chemical Co. Ltd. Light-emitting polymer composition
JP2009019145A (en) * 2007-07-13 2009-01-29 Toyo Ink Mfg Co Ltd Antistatic agent and its use
JP5433933B2 (en) * 2007-07-18 2014-03-05 東洋インキScホールディングス株式会社 Antistatic agent and its use
WO2009057600A1 (en) * 2007-11-01 2009-05-07 Adeka Corporation Salt compound, cationic polymerization initiator and cationically polymerizable composition
JP2010171373A (en) * 2008-12-25 2010-08-05 Sumitomo Chemical Co Ltd Organic electroluminescent element
WO2013142956A1 (en) * 2012-03-28 2013-10-03 Uti Limited Partnership Methods and compounds for photo lewis acid generation and uses thereof
WO2014155960A1 (en) * 2013-03-28 2014-10-02 サンアプロ株式会社 Photobase generator
EP3058423B1 (en) * 2013-10-17 2018-04-18 Covestro Deutschland AG Photopolymer formulation for producing holographic media with low tg borates
EP3098226B1 (en) * 2014-01-24 2018-12-12 FUJIFILM Wako Pure Chemical Corporation Borate-based base generator, and base-reactive composition comprising such base generator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001183821A (en) 1999-12-27 2001-07-06 Nippon Shokubai Co Ltd Photoacid producing agent for chemically amplified resist
JP2014205624A (en) 2013-04-11 2014-10-30 サンアプロ株式会社 Onium borate-based acid generator
JP2014214129A (en) 2013-04-26 2014-11-17 サンアプロ株式会社 Curable composition and cured body using the same

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