KR20180087122A - 현상액의 농도 감시 장치, 및 현상액 관리 장치 - Google Patents

현상액의 농도 감시 장치, 및 현상액 관리 장치 Download PDF

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Publication number
KR20180087122A
KR20180087122A KR1020170161407A KR20170161407A KR20180087122A KR 20180087122 A KR20180087122 A KR 20180087122A KR 1020170161407 A KR1020170161407 A KR 1020170161407A KR 20170161407 A KR20170161407 A KR 20170161407A KR 20180087122 A KR20180087122 A KR 20180087122A
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KR
South Korea
Prior art keywords
developer
carbon dioxide
concentration
density
absorbed carbon
Prior art date
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KR1020170161407A
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English (en)
Korean (ko)
Inventor
도시모토 나카가와
Original Assignee
가부시키가이샤 히라마리카겐큐죠
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Application filed by 가부시키가이샤 히라마리카겐큐죠 filed Critical 가부시키가이샤 히라마리카겐큐죠
Publication of KR20180087122A publication Critical patent/KR20180087122A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G03F7/0022—Devices or apparatus
    • G03F7/0025—Devices or apparatus characterised by means for coating the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020170161407A 2017-01-23 2017-11-29 현상액의 농도 감시 장치, 및 현상액 관리 장치 KR20180087122A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2017-009834 2017-01-23
JP2017009834A JP2018120897A (ja) 2017-01-23 2017-01-23 現像液の濃度監視装置、及び現像液管理装置

Publications (1)

Publication Number Publication Date
KR20180087122A true KR20180087122A (ko) 2018-08-01

Family

ID=62962053

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170161407A KR20180087122A (ko) 2017-01-23 2017-11-29 현상액의 농도 감시 장치, 및 현상액 관리 장치

Country Status (4)

Country Link
JP (1) JP2018120897A (ja)
KR (1) KR20180087122A (ja)
CN (1) CN108345185A (ja)
TW (1) TW201841080A (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
JP2008283162A (ja) 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp 現像液の濃度調節方法および調製装置ならびに現像液
JP2011128455A (ja) 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3534211B2 (ja) * 1995-09-29 2004-06-07 富士写真フイルム株式会社 感光性平版印刷版の自動現像装置
US20020137219A1 (en) * 2001-01-19 2002-09-26 Owens Robert Austin Titration method for aqueous base developer solution
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
JP2006268023A (ja) * 2005-02-23 2006-10-05 Fuji Photo Film Co Ltd 感光性平版印刷版自動現像装置の現像制御方法及びその自動現像装置
JP2012225709A (ja) * 2011-04-18 2012-11-15 Toshiba Corp 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム
JP6713658B2 (ja) * 2015-07-22 2020-06-24 株式会社平間理化研究所 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法
CN106094897B (zh) * 2016-06-24 2019-01-22 重庆广播电视大学 一种基于计算机的二氧化碳浓度监控系统
JP6712415B2 (ja) * 2017-01-23 2020-06-24 株式会社平間理化研究所 現像液管理装置
JP6763608B2 (ja) * 2017-01-23 2020-09-30 株式会社平間理化研究所 現像液の二酸化炭素濃度表示装置、及び現像液管理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2561578B2 (ja) 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
JP2008283162A (ja) 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp 現像液の濃度調節方法および調製装置ならびに現像液
JP2011128455A (ja) 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法

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Publication number Publication date
JP2018120897A (ja) 2018-08-02
TW201841080A (zh) 2018-11-16
CN108345185A (zh) 2018-07-31

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